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1. 发明授权

US07765832B2 Method of producing reflectors from glass or glass ceramics 有权
标题翻译：从玻璃或玻璃陶瓷生产反射镜的方法
公开(公告)号：US07765832B2
公开(公告)日：2010-08-03
申请号：US11801097
申请日：2007-05-08
申请人： Hans-Walter Abraham , Armin Zehner , Gernot Frei , Hans-Juergen Klein , Thomas Niklos , Ulrich Zirfas , Willi Mattheis
发明人： Hans-Walter Abraham , Armin Zehner , Gernot Frei , Hans-Juergen Klein , Thomas Niklos , Ulrich Zirfas , Willi Mattheis
IPC分类号： C03B23/26 , C03B23/00 , C03B11/00
CPC分类号： C03B23/26
摘要： The invention provides a method of producing reflectors from glass or glass ceramics comprising the steps of: molding a reflector being open to the outside and having a closed bottom in a mold at a temperature above the transformation temperature; placing the reflector in a recess of a holder; heating up the reflector in the area of its bottom; lifting the bottom of the reflector from below using a die; punching out at least one opening from the bottom by moving at least one plunger into at least one matching opening in the die.
摘要翻译：本发明提供了一种从玻璃或玻璃陶瓷制造反射器的方法，包括以下步骤：在高于转变温度的温度下模制反射器在外部开口并具有在模具中的封闭底部; 将反射器放置在保持器的凹部中; 在其底部的区域加热反射器; 使用模具从下面提升反射器的底部; 通过将至少一个柱塞移动到模具中的至少一个匹配的开口中，从底部冲出至少一个开口。

2. 发明申请

US20080174034A1 Method of producing reflectors from glass or glass ceramics 有权
标题翻译：从玻璃或玻璃陶瓷生产反射镜的方法
公开(公告)号：US20080174034A1
公开(公告)日：2008-07-24
申请号：US11801097
申请日：2007-05-08
申请人： Hans-Walter Abraham , Armin Zehner , Gernot Frei , Hans-Juergen Klein , Thomas Niklos , Ulrich Zirfas , Willi Mattheis
发明人： Hans-Walter Abraham , Armin Zehner , Gernot Frei , Hans-Juergen Klein , Thomas Niklos , Ulrich Zirfas , Willi Mattheis
IPC分类号： B29D11/00
CPC分类号： C03B23/26
摘要： The invention provides a method of producing reflectors from glass or glass ceramics comprising the steps of: molding a reflector being open to the outside and having a closed bottom in a mold at a temperature above the transformation temperature; placing the reflector in a recess of a holder; heating up the reflector in the area of its bottom; lifting the bottom of the reflector from below using a die; punching out at least one opening from the bottom by moving at least one plunger into at least one matching opening in the die.
摘要翻译：本发明提供了一种从玻璃或玻璃陶瓷制造反射器的方法，包括以下步骤：在高于转变温度的温度下模制反射器在外部开口并具有在模具中的封闭底部; 将反射器放置在保持器的凹部中; 在其底部的区域加热反射器; 使用模具从下面提升反射器的底部; 通过将至少一个柱塞移动到模具中的至少一个匹配的开口中，从底部冲出至少一个开口。

3. 发明申请

US20080124488A1 Method and apparatus for plasma enhanced chemical vapor deposition 有权
标题翻译：等离子体增强化学气相沉积的方法和装置
公开(公告)号：US20080124488A1
公开(公告)日：2008-05-29
申请号：US11937280
申请日：2007-11-08
申请人： Thomas Kuepper , Lars Bewig , Christoph Moelle , Lars Brandt , Thomas Niklos
发明人： Thomas Kuepper , Lars Bewig , Christoph Moelle , Lars Brandt , Thomas Niklos
IPC分类号： H05H1/24 , B05C11/00
CPC分类号： C23C16/405 , C23C16/402 , C23C16/505 , C23C16/511 , C23C16/52 , H01J37/32266
摘要： The invention is based on the object of reducing the heating of substrates during plasma enhanced chemical vapor deposition. For this purpose, a method and an apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas. The electromagnetic energy is radiated in in the form of a multiplicity of pulse sequences, preferably microwave or radiofrequency pulses, with a multiplicity of pulses spaced apart temporally by first intermissions, wherein the electromagnetic energy radiated in is turned off in the intermissions, and wherein the intermissions between the pulse sequences are at least a factor of 3, preferably at least a factor of 5, longer than the first intermissions between the pulses within a pulse sequence.
摘要翻译：本发明基于在等离子体增强化学气相沉积期间减少衬底的加热的目的。为此，提供了一种通过等离子体增强气相沉积来涂覆基板的方法和装置，其中待涂覆的基板的基板表面的至少部分周围环境被抽真空，并且具有起始物质的处理气体对于涂层是允许的，其中通过在填充有工艺气体的衬底表面的周围的电磁能中辐射的等离子体来沉积涂层。电磁能以多种脉冲序列的形式辐射，优选为微波或射频脉冲，其中多个脉冲通过第一次间隔在时间上间隔开，其中辐射的电磁能在中断期间被关闭，并且其中脉冲序列之间的间隔至少比脉冲序列内脉冲之间的第一次间隔长3倍，优选至少5倍。

4. 发明授权

US07947337B2 Method and apparatus for plasma enhanced chemical vapor deposition 有权
标题翻译：等离子体增强化学气相沉积的方法和装置
公开(公告)号：US07947337B2
公开(公告)日：2011-05-24
申请号：US11937280
申请日：2007-11-08
申请人： Thomas Kuepper , Lars Bewig , Christoph Moelle , Lars Brandt , Thomas Niklos
发明人： Thomas Kuepper , Lars Bewig , Christoph Moelle , Lars Brandt , Thomas Niklos
IPC分类号： H05H1/24
CPC分类号： C23C16/405 , C23C16/402 , C23C16/505 , C23C16/511 , C23C16/52 , H01J37/32266
摘要： A method and apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas. The electromagnetic energy is radiated in by a multiplicity of pulse sequences, preferably microwave or radiofrequency pulses, with a multiplicity of pulses spaced apart temporally by first intermissions, wherein the electromagnetic energy radiated in is turned off in the intermissions, and wherein the intermissions between the pulse sequences are at least a factor of 3, preferably at least a factor of 5, longer than the first intermissions between the pulses within a pulse sequence.
摘要翻译：提供了一种通过等离子体增强气相沉积来涂覆衬底的方法和装置，其中待涂覆的衬底的衬底表面的至少部分周围环境被抽真空，并且允许具有用于涂层的起始物质的工艺气体，其中通过在填充有工艺气体的衬底表面的周围的电磁能辐射而被等离子体沉积涂层。电磁能通过多个脉冲序列辐射，优选地是微波或射频脉冲，其中多个脉冲通过第一次间歇在时间上间隔开，其中辐射的电磁能量在间歇中被截断，并且其中，脉冲序列至少比脉冲序列中的脉冲之间的第一次间隔长3倍，优选至少5倍。

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