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1. 发明申请

US20110273791A1 CATOPTRIC OBJECTIVES AND SYSTEMS USING CATOPTRIC OBJECTIVES 有权
标题翻译：使用目标目标的CATOPR目标和系统
公开(公告)号：US20110273791A1
公开(公告)日：2011-11-10
申请号：US13183823
申请日：2011-07-15
申请人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
发明人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
IPC分类号： G02B17/02
CPC分类号： G03F7/70233 , G02B13/143 , G02B17/061 , G02B17/0652 , G02B17/0657
摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.
摘要翻译：通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。

2. 发明申请

US20080137183A1 8-Mirror microlithography projection objective 失效
标题翻译： 8镜微光投影物镜
公开(公告)号：US20080137183A1
公开(公告)日：2008-06-12
申请号：US12012825
申请日：2008-02-06
申请人： Hans-Jurgen Mann , Wilhelm Ulrich , Gunther Seitz
发明人： Hans-Jurgen Mann , Wilhelm Ulrich , Gunther Seitz
IPC分类号： G02B27/18 , G02B17/06
CPC分类号： G03F7/70233 , G02B17/0657 , G03F7/70275
摘要： A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes a first mirror (S1), a second mirror (S2), a third mirror (S3), a fourth mirror (S4), a fifth mirror (S5), a sixth mirror (S6), a seventh mirror (S7), and an eighth mirror (S8). The light path is provided via the eight mirrors, and in the light path exactly one intermediate image of the object field is provided.
摘要翻译：投影物镜提供从物体平面中的物场到像平面中的图像场的光束的光路。投影物镜包括第一镜（S 1），第二镜（S 2），第三镜（S 3），第四镜（S 4），第五镜（S 5），第六镜），第七反射镜（S7）和第八反射镜（S8）。通过八个反射镜提供光路，并且在光路中提供了物场的一个中间图像。

3. 发明申请

US20070047069A1 8-Mirror microlithography projection objective 失效
标题翻译： 8镜微光投影物镜
公开(公告)号：US20070047069A1
公开(公告)日：2007-03-01
申请号：US11592065
申请日：2006-11-02
申请人： Hans-Jurgen Mann , Wilhelm Ulrich , Gunther Seitz
发明人： Hans-Jurgen Mann , Wilhelm Ulrich , Gunther Seitz
IPC分类号： G02B17/00 , G02B23/00
CPC分类号： G03F7/70233 , G02B17/0657 , G03F7/70275
摘要： A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes eight mirrors. The light path is provided via the eight mirrors, and is free of obscuration.
摘要翻译：投影物镜提供从物体平面中的物场到像平面中的图像场的光束的光路。投影物镜包括八个镜子。光路通过八个镜子提供，并且没有遮蔽。

4. 发明申请

US20100134908A1 Catoptric Objectives And Systems Using Catoptric Objectives 有权
标题翻译：使用图解目标的图解目标和系统
公开(公告)号：US20100134908A1
公开(公告)日：2010-06-03
申请号：US12700169
申请日：2010-02-04
申请人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
发明人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
IPC分类号： G02B5/10
CPC分类号： G03F7/70233 , G02B13/143 , G02B17/061 , G02B17/0652 , G02B17/0657
摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.
摘要翻译：通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。

5. 发明授权

US07682031B2 Catoptric objectives and systems using catoptric objectives 失效
标题翻译：使用反射目标的目标和系统
公开(公告)号：US07682031B2
公开(公告)日：2010-03-23
申请号：US11317851
申请日：2005-12-22
申请人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
发明人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
IPC分类号： G02B5/10
CPC分类号： G03F7/70233 , G02B13/143 , G02B17/061 , G02B17/0652 , G02B17/0657
摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.
摘要翻译：通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。

6. 发明申请

US20050201514A1 Reflective X-ray microscope and inspection system for examining objects with wavelengths < 100 nm 有权
标题翻译：用于检查波长小于100nm的物体的反射X射线显微镜和检查系统
公开(公告)号：US20050201514A1
公开(公告)日：2005-09-15
申请号：US10983362
申请日：2004-11-08
申请人： Hans-Jurgen Mann , Udo Dinger , Wilhelm Ulrich , Wolfgang Reinecke , Thomas Engel , Axel Zibold , Wolfgang Harnisch , Marco Wedowski , Dieter Pauschinger
发明人： Hans-Jurgen Mann , Udo Dinger , Wilhelm Ulrich , Wolfgang Reinecke , Thomas Engel , Axel Zibold , Wolfgang Harnisch , Marco Wedowski , Dieter Pauschinger
IPC分类号： G03F1/16 , G21K1/06 , G21K7/00 , H01L21/027
CPC分类号： G21K7/00 , B82Y10/00 , G21K1/062
摘要： There is provided a reflective X-ray microscope for examining an object in an object plane. The reflective X-ray microscope includes (a) a first subsystem, having a first mirror and a second mirror, disposed in a beam path from the object plane to the image plane, and (b) a second subsystem, having a third mirror, situated downstream of the first subsystem in the beam path. The object is illuminated with radiation having a wavelength
摘要翻译：提供了用于检查物平面中的物体的反射X射线显微镜。所述反射型X射线显微镜包括：（a）具有第一反射镜和第二反射镜的第一子系统，该第一子系统设置在从所述物体平面到所述像面的光束路径中，以及（b）具有第三反射镜的第二子系统，位于光束路径中的第一子系统的下游。用波长<100nm的辐射照射物体，反射X射线显微镜将物体放大成像到平面内。

7. 发明申请

US20080316451A1 CATOPTRIC OBJECTIVES AND SYSTEMS USING CATOPTRIC OBJECTIVES 审中-公开
标题翻译：使用目标目标的CATOPR目标和系统
公开(公告)号：US20080316451A1
公开(公告)日：2008-12-25
申请号：US12198344
申请日：2008-08-26
申请人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
发明人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
IPC分类号： G03F7/20
CPC分类号： G03F7/70233 , G02B13/143 , G02B17/061 , G02B17/0652 , G02B17/0657
摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.
摘要翻译：通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。

8. 发明授权

US07209286B2 Objective with pupil obscuration 有权
标题翻译：目的是瞳孔遮蔽
公开(公告)号：US07209286B2
公开(公告)日：2007-04-24
申请号：US11102524
申请日：2005-04-08
申请人： Hans-Jurgen Mann , Wilhelm Ulrich
发明人： Hans-Jurgen Mann , Wilhelm Ulrich
IPC分类号： G02B23/00 , G02B5/08
CPC分类号： G03F7/70291 , G02B17/0652 , G03F7/70225 , G03F7/70233
摘要： In accordance with the present invention, a projection exposure apparatus includes an illuminating system to illuminate a drivable micromirror array and an objective which projects the drivable micromirror array onto the photosensitive substrate. The objective includes mirrors which are arranged coaxial with respect to a common optical axis. The objective can be a catoptric objective and can have a numerical aperture at the substrate greater than 0.1 and can have an imaging scale ratio of greater than 20:1. The objective can also include at least two partial objectives with an intermediate image plane between the at least two partial objectives and can consist of mirrors that are coated with reflecting layers which are adapted to reflect two mutually separated operating wavelengths.
摘要翻译：根据本发明，投影曝光装置包括用于照亮可驱动微镜阵列的照明系统和将可驱动微镜阵列投影到感光基板上的物镜。该目的包括相对于公共光轴同轴布置的反射镜。目标可以是一个反射目标，并且可以在基板上具有大于0.1的数值孔径，并且可以具有大于20:1的成像比例。该目的还可以包括至少两个部分目标，其中在至少两个部分目标之间具有中间图像平面，并且可以由涂覆有适于反射两个相互分离的工作波长的反射层的反射镜组成。

9. 发明申请

US20060232867A1 Catoptric objectives and systems using catoptric objectives 失效
标题翻译：使用反射目标的目标和系统
公开(公告)号：US20060232867A1
公开(公告)日：2006-10-19
申请号：US11317851
申请日：2005-12-22
申请人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
发明人： Hans-Jurgen Mann , David Shafer , Wilhelm Ulrich
IPC分类号： G02B5/10
CPC分类号： G03F7/70233 , G02B13/143 , G02B17/061 , G02B17/0652 , G02B17/0657
摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.
摘要翻译：通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。

10. 发明申请

US20050180011A1 Objective with pupil obscuration 有权
公开(公告)号：US20050180011A1
公开(公告)日：2005-08-18
申请号：US11102524
申请日：2005-04-08
申请人： Hans-Jurgen Mann , Wilhelm Ulrich
发明人： Hans-Jurgen Mann , Wilhelm Ulrich
IPC分类号： G02B17/00 , G02B13/14 , G02B13/18 , G02B13/24 , G02B17/06 , G02B17/08 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70291 , G02B17/0652 , G03F7/70225 , G03F7/70233
摘要： An objective is configured with a first partial objective and a second partial objective. The first partial objective, which projects a first field plane onto an intermediate image, has a first, convex mirror and a second, concave mirror. The second partial objective, which projects the intermediate image onto a second field plane, has a third and a fourth mirror, both concave. All of the four mirrors have central mirror apertures. The axial distance between the first and second mirrors is in a ratio between 0.95 and 1.05 relative to the distance between the second mirror and the intermediate image. The axial distance ZM3-IM between the third mirror and the second field plane conforms to the relationship 0.03 · Du M3 + 5.0 ⁢ ⁢ mm

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