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    • 1. 发明授权
    • Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
    • 投影物镜包括多个镜子,前视镜M3
    • US07190530B2
    • 2007-03-13
    • US11356525
    • 2006-02-16
    • Hans-Jurgen MannRussell HudymaAlexander Epple
    • Hans-Jurgen MannRussell HudymaAlexander Epple
    • G02B17/00
    • G02B17/0892G02B17/0844G02B17/0856G03F7/70225
    • According to one exemplary embodiment, a projection objective is provided and includes at least two non-planar (curved) mirrors, wherein an axial distance between a next to last non-planar mirror and a last non-planar mirror, as defined along a light path, is greater than an axial distance between the last non-planar mirror and a first refracting surface of lenses following in the light path. In one exemplary embodiment, the first refracting surface is associated with a single pass type lens. The present objectives form images with numerical apertures of at least about 0.80 or higher, e.g., 0.95. Preferably, the objective does not include folding mirrors and there is no intermediate image between the two mirrors, as well as the pupil of the objective being free of obscuration.
    • 根据一个示例性实施例,提供了一种投影物镜,并且包括至少两个非平面(弯曲)反射镜,其中,沿着光线定义的下一个至最后的非平面镜与最后的非平面镜之间的轴向距离 路径大于最后的非平面镜与在光路中跟随的透镜的第一折射表面之间的轴向距离。 在一个示例性实施例中,第一折射表面与单遍型透镜相关联。 当前目标形成具有至少约0.80或更高(例如0.95)的数值孔径的图像。 优选地,该目的不包括折叠反射镜,并且在两个反射镜之间不存在中间图像,以及物镜的瞳孔没有遮蔽。
    • 5. 发明申请
    • Projection system for EUV lithography
    • EUV光刻投影系统
    • US20070070322A1
    • 2007-03-29
    • US11604997
    • 2006-11-28
    • Russell HudymaHans-Jurgen MannUdo Dinger
    • Russell HudymaHans-Jurgen MannUdo Dinger
    • G03B27/54
    • G03F7/70233G02B17/0652G02B17/0657G03F7/70275
    • An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the third mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.
    • EUV光学投影系统包括用于将物体(OB)成像到图像(IM)的至少六个反射镜(M 1,M 2,M 3,M 4,M 5,M 6)。 优选地,至少一个镜对配置为至少相位补偿镜对。 该系统优选地被配置成沿着从物体(OB)到第二反射镜(M 2)和第三反射镜(M 3)之间的图像(IM))的光路形成中间图像(IMI),使得第一 反射镜(M 1)和第二反射镜(M 2)形成第一光学组(G 1)和第三反射镜(M 3),第四反射镜(M 4),第五反射镜(M5)和第六反射镜 (M 6)形成第二光学组(G 1)。 该系统还优选地包括沿着从物体(OB)到第一反射镜(M 1)和第二反射镜(M 2)之间的图像(IM))的光路定位的孔径光阑(APE)。 第二镜(M 2)优选为凸面,第三镜(M 3)优选为凹面。 该系统优选地形成数值孔径大于0.18的图像(IM)。
    • 10. 发明授权
    • Projection system for EUV lithography
    • EUV光刻投影系统
    • US07151592B2
    • 2006-12-19
    • US10454830
    • 2003-06-04
    • Russell HudymaHans-Jürgen MannUdo Dinger
    • Russell HudymaHans-Jürgen MannUdo Dinger
    • G03B27/54G03B27/72G02B5/10
    • G03F7/70233G02B17/0652G02B17/0657G03F7/70275
    • An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the third mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.
    • EUV光学投影系统包括用于将物体(OB)成像到图像(IM)的至少六个反射镜(M 1,M 2,M 3,M 4,M 5,M 6)。 优选地,至少一个镜对配置为至少相位补偿镜对。 该系统优选地被配置成沿着从物体(OB)到第二反射镜(M 2)和第三反射镜(M 3)之间的图像(IM))的光路形成中间图像(IMI),使得第一 反射镜(M 1)和第二反射镜(M 2)形成第一光学组(G 1)和第三反射镜(M 3),第四反射镜(M 4),第五反射镜(M5)和第六反射镜 (M 6)形成第二光学组(G 1)。 该系统还优选地包括沿着从物体(OB)到第一反射镜(M 1)和第二反射镜(M 2)之间的图像(IM))的光路定位的孔径光阑(APE)。 第二镜(M 2)优选为凸面,第三镜(M 3)优选为凹面。 该系统优选地形成数值孔径大于0.18的图像(IM)。