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1. 发明申请

US20090021714A1 COMBINATION STOP FOR CATOPTRIC PROJECTION ARRANGEMENT 有权
标题翻译：用于投影安排的组合停止
公开(公告)号：US20090021714A1
公开(公告)日：2009-01-22
申请号：US12173595
申请日：2008-07-15
申请人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
发明人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
IPC分类号： G03B27/54
CPC分类号： G03F7/70941 , G02B5/005 , G02B17/0657 , G03F7/70233 , G03F7/7025
摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.
摘要翻译：本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。投影装置包括反射元件，通过该反射元件定义光线路径。光束路径中的光瞳组合停止。组合止动件具有用作孔径光阑的第一开口（孔口）。组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。

2. 发明授权

US07463422B2 Projection exposure apparatus 有权
标题翻译：投影曝光装置
公开(公告)号：US07463422B2
公开(公告)日：2008-12-09
申请号：US11657925
申请日：2007-01-25
申请人： Vladimir Kamenow , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc , David Shafer , Wilhelm Ulrich , Rudolf von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： Vladimir Kamenow , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc , David Shafer , Wilhelm Ulrich , Rudolf von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/00
CPC分类号： G02B27/0012 , G02B1/02 , G02B17/08 , G03F7/70225 , G03F7/70966 , G03F7/70975
摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.
摘要翻译：描述了确定投影曝光装置的光学系统中所包含的透镜的材料的方法。首先，对于多个透镜的每个透镜，确定敏感度因子KLT / LH。该因子是由寿命效应和透镜加热效果中的至少一种引起的各透镜对恶化的敏感性的量度。然后选择双折射氟化物晶体作为敏感度因子KLT / LH高于预定阈值的每个透镜的材料。这些镜头被分配到第一组透镜。对于这些透镜，确定了减少由氟化物晶体固有的双折射引起的不利影响的措施。

3. 发明申请

US20070195423A1 Method of determining lens materials for a projection exposure apparatus 有权
公开(公告)号：US20070195423A1
公开(公告)日：2007-08-23
申请号：US11657925
申请日：2007-01-25
申请人： Vladimir Kamenov , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc , David Shafer , Wilhelm Ulrich , Rudolf Buenau , Hans-Juergen Mann , Alexander Epple
发明人： Vladimir Kamenov , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc , David Shafer , Wilhelm Ulrich , Rudolf Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B3/00
CPC分类号： G02B27/0012 , G02B1/02 , G02B17/08 , G03F7/70225 , G03F7/70966 , G03F7/70975
摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.

4. 发明授权

US08436985B2 Combination stop for catoptric projection arrangement 有权
标题翻译：组合停止投影安排
公开(公告)号：US08436985B2
公开(公告)日：2013-05-07
申请号：US13479768
申请日：2012-05-24
申请人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
发明人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
IPC分类号： G03B27/72 , G03B27/54 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70941 , G02B5/005 , G02B17/0657 , G03F7/70233 , G03F7/7025
摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.
摘要翻译：本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。投影装置包括反射元件，通过该反射元件定义光线路径。光束路径中的光瞳组合停止。组合止动件具有用作孔径光阑的第一开口（孔口）。组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。

5. 发明申请

US20120236272A1 COMBINATION STOP FOR CATOPTRIC PROJECTION ARRANGEMENT 有权
标题翻译：用于投影安排的组合停止
公开(公告)号：US20120236272A1
公开(公告)日：2012-09-20
申请号：US13479768
申请日：2012-05-24
申请人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
发明人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
IPC分类号： G03B27/32
CPC分类号： G03F7/70941 , G02B5/005 , G02B17/0657 , G03F7/70233 , G03F7/7025
摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.
摘要翻译：本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。投影装置包括反射元件，通过该反射元件定义光线路径。光束路径中的光瞳组合停止。组合止动件具有用作孔径光阑的第一开口（孔口）。组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。

6. 发明申请

US20100208225A1 PROJECTION OBJECTIVE FOR MICRLOLITHOGRAPHY HAVING AN OBSCURATED PUPIL 审中-公开
标题翻译：用于具有观察平板的微结构的投影目标
公开(公告)号：US20100208225A1
公开(公告)日：2010-08-19
申请号：US12723456
申请日：2010-03-12
申请人： Daniel Kraehmer , Aurelian Dodoc , Hans-Juergen Mann , Toralf Gruner
发明人： Daniel Kraehmer , Aurelian Dodoc , Hans-Juergen Mann , Toralf Gruner
IPC分类号： G03B27/54 , G02B9/00
CPC分类号： G02B5/003 , G02B5/005 , G02B17/0657 , G02B27/0018 , G03F7/70233
摘要： A projection objective with obscurated pupil for microlithography has a first optical surface, which has a first region provided for application of useful light, and at least one second optical surface, which has a second region provided for application of useful light. A beam envelope of the useful light extends between the first region and the second region. At least one tube open on the input side and on the output side in the light propagation direction severs to screen scattered light. The at least one tube is between the first optical surface and the second optical surface. The wall of the tube is opaque in the wavelength range of the useful light. The tube extends in the propagation direction of the useful light over at least a partial length of the beam envelope and circumferentially surrounds the beam envelope.
摘要翻译：具有用于微光刻的遮蔽光瞳的投影物镜具有第一光学表面，其具有提供用于施加有用光的第一区域和至少一个第二光学表面，该第二光学表面具有用于施加有用光的第二区域。有用光的束包络在第一区域和第二区域之间延伸。在光传播方向上的至少一个在输入侧和输出侧开口的管切断以屏蔽散射光。所述至少一个管在所述第一光学表面和所述第二光学表面之间。管的壁在有用光的波长范围内是不透明的。管在有用光的传播方向上延伸到束包络的至少一部分长度上并且周向地包围光束包络。

7. 发明授权

US08208127B2 Combination stop for catoptric projection arrangement 有权
标题翻译：组合停止投影安排
公开(公告)号：US08208127B2
公开(公告)日：2012-06-26
申请号：US12173595
申请日：2008-07-15
申请人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
发明人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
IPC分类号： G03B27/72 , G03B27/54 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70941 , G02B5/005 , G02B17/0657 , G03F7/70233 , G03F7/7025
摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.
摘要翻译：本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。投影装置包括反射元件，通过该反射元件定义光线路径。光束路径中的光瞳组合停止。组合止动件具有用作孔径光阑的第一开口（孔口）。组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。

8. 发明申请

US20090073392A1 Illumination System Including Grazing Incidence Mirror For Microlithography Exposure System 审中-公开
标题翻译：包括用于微光刻曝光系统的放映入射镜的照明系统
公开(公告)号：US20090073392A1
公开(公告)日：2009-03-19
申请号：US11855359
申请日：2007-09-14
申请人： Hans-Juergen Mann , Wilhelm Ulrich , Daniel Kraemer , Toralf Gruner , Aurelian Dodoc
发明人： Hans-Juergen Mann , Wilhelm Ulrich , Daniel Kraemer , Toralf Gruner , Aurelian Dodoc
IPC分类号： G03B21/28 , G03B21/06
CPC分类号： G03F7/70233 , G03F7/702
摘要： In general, in one aspect, the invention features a system that includes a catoptric projection objective having an optical axis and including a plurality of projection objective elements positioned between an object plane and an image plane, the object and image planes being orthogonal to the optical axis, the projection objective being configured so that during operation the projection objective directs radiation reflected at the object plane to the image plane to form an image at the image plane of an object positioned in a field at the object plane, the field having a first dimension of 8 mm or more and a second dimension of 8 mm or more, the first and second dimensions being along orthogonal directions. The system also includes an illumination system including a plurality of illumination system elements, the illumination system being configured so that during operation the illumination system directs the radiation to the field at the object plane, where a chief ray of the radiation has an angle of incidence of 10° or less at the object plane.
摘要翻译：通常，在一个方面，本发明的特征在于一种系统，其包括具有光轴并且包括位于物平面和图像平面之间的多个投影物镜元件的反射投影物镜，物体和像平面正交于光学所述投影物镜被配置为使得在操作期间，投影物镜将在物平面处反射的辐射引导到像平面以在位于物平面处的场中的物体的像平面处形成图像，该场具有第一尺寸为8mm以上，第二尺寸为8mm以上，第一尺寸和第二尺寸沿正交方向。该系统还包括包括多个照明系统元件的照明系统，照明系统被配置为使得在操作期间照明系统将辐射引导到物平面处的场，其中辐射的主射线具有入射角在物平面上为10°以下。

9. 发明申请

US20090115986A1 Microlithography projection objective 审中-公开
标题翻译：微光刻投影物镜
公开(公告)号：US20090115986A1
公开(公告)日：2009-05-07
申请号：US11916162
申请日：2006-05-23
申请人： Heiko Feldmann , Daniel Kraehmer , Jean-Claude Perrin , Julian Kaller , Aurelian Dodoc , Vladimir Kamenov , Olaf Conradi , Toralf Gruner , Thomas Okon , Alexander Epple
发明人： Heiko Feldmann , Daniel Kraehmer , Jean-Claude Perrin , Julian Kaller , Aurelian Dodoc , Vladimir Kamenov , Olaf Conradi , Toralf Gruner , Thomas Okon , Alexander Epple
IPC分类号： G03F7/20 , G02B17/08
CPC分类号： G03F7/70225 , G02B17/08 , G03F7/702 , G03F7/70283 , G03F7/70941
摘要： Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
摘要翻译：关于在这样的投影物镜中抑制假光，描述用于成像到平面中的布置在物体平面中的图案的微光刻投影物镜。

10. 发明授权

US07239450B2 Method of determining lens materials for a projection exposure apparatus 有权
标题翻译：确定投影曝光装置的透镜材料的方法
公开(公告)号：US07239450B2
公开(公告)日：2007-07-03
申请号：US11181694
申请日：2005-07-14
申请人： Vladimir Kamenov , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc
发明人： Vladimir Kamenov , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc
IPC分类号： G02B3/00
CPC分类号： G03F7/70891 , G02B1/02 , G02B1/08 , G02B17/0812 , G02B17/0892 , G03F7/70966
摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.
摘要翻译：描述了确定投影曝光装置的光学系统中所包含的透镜的材料的方法。首先，对于多个透镜的每个透镜，确定敏感度因子K LT / LH 。该因子是由寿命效应和透镜加热效果中的至少一种引起的各透镜对恶化的敏感性的量度。然后选择双折射氟化物晶体作为敏感度因子K LT / LH <>高于预定阈值的每个透镜的材料。这些镜头被分配到第一组透镜。对于这些透镜，确定了减少由氟化物晶体固有的双折射引起的不利影响的措施。

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