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1. 发明授权

US06710856B2 Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby 有权
标题翻译：操作光刻设备的方法，光刻设备，制造设备的方法以及由此制造的设备
公开(公告)号：US06710856B2
公开(公告)日：2004-03-23
申请号：US09943088
申请日：2001-08-31
申请人： Hans Van Der Laan , Marcel Dierichs , Hendrikus Robertus Marie Van Greevenbroek , Markus Franciscus Antonius Eurlings
发明人： Hans Van Der Laan , Marcel Dierichs , Hendrikus Robertus Marie Van Greevenbroek , Markus Franciscus Antonius Eurlings
IPC分类号： G03B2772
CPC分类号： G03F7/70133
摘要： A method of operating a lithographic projection apparatus including forming a spot of radiation at the wafer level using a pinhole at reticle level. A sensor is defocused with respect to the spot such that it is spaced apart from the wafer level. The sensor is scanned beneath the spot to measure the angular intensity distribution of radiation at the spot and to determine the intensity distribution at the pupil plane of the projection lens system.
摘要翻译：一种操作光刻投影设备的方法，包括在标线片级使用针孔在晶片级形成辐射点。传感器相对于斑点散焦，使得其与晶片级间隔开。传感器被扫描在现场以下，以测量在现场的辐射的角度强度分布，并确定在投影透镜系统的光瞳平面处的强度分布。

2. 发明授权

US08279405B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08279405B2
公开(公告)日：2012-10-02
申请号：US12709151
申请日：2010-02-19
申请人： Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
发明人： Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
IPC分类号： G03B27/72 , G03B27/42
CPC分类号： G03F7/70075 , G03F7/70091 , G03F7/70108 , G03F7/70191 , G03F7/702
摘要： A lithographic apparatus includes a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation. The reflective optical elements include a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror. The lithographic apparatus also includes a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror. The facet mask includes a masking blade selectively interposable into the beam.
摘要翻译：光刻设备包括具有构造和布置成调节辐射束的反射光学元件的辐射系统。反射光学元件包括构造和布置成在第二反射镜上产生多个源图像的第一刻面镜。光刻设备还包括构造和布置成选择性地掩蔽第一分面镜的一个或多个面的小面掩模。小面掩模包括选择性地相对于梁的掩模刀片。

3. 发明申请

US20100141918A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100141918A1
公开(公告)日：2010-06-10
申请号：US12709151
申请日：2010-02-19
申请人： Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
发明人： Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
IPC分类号： G03B27/72
CPC分类号： G03F7/70075 , G03F7/70091 , G03F7/70108 , G03F7/70191 , G03F7/702
摘要： A lithographic apparatus includes a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation. The reflective optical elements include a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror. The lithographic apparatus also includes a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror. The facet mask includes a masking blade selectively interposable into the beam.
摘要翻译：光刻设备包括具有构造和布置成调节辐射束的反射光学元件的辐射系统。反射光学元件包括构造和布置成在第二反射镜上产生多个源图像的第一刻面镜。光刻设备还包括构造和布置成选择性地掩蔽第一分面镜的一个或多个面的小面掩模。小面掩模包括选择性地相对于梁的掩模刀片。

4. 发明授权

US07697116B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07697116B2
公开(公告)日：2010-04-13
申请号：US11636586
申请日：2006-12-11
申请人： Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
发明人： Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
IPC分类号： G03B27/72
CPC分类号： G03F7/70075 , G03F7/70091 , G03F7/70108 , G03F7/70191 , G03F7/702
摘要： A lithographic apparatus includes a device having a blade selectively insertable into the beam. The device is in a first plane intermediate a second plane conjugate to a plane of the substrate and a third plane conjugate to a pupil plane of the projection system. The blade may include a partially opaque blade and a solid blade or have a predetermined transmissibility pattern. The transmissibility may vary in a second direction perpendicular to the first direction in which the substrate and the patterning device are movable. In an illumination system including a field faceted mirror and a pupil faceted mirror, a reflecting blade is selectively insertable into the beam to reflect a portion of the beam to a beam dump that may be cooled to reduce a heat load. The reflecting element may have a coating that scatters the portion of radiation or changes the phase.
摘要翻译：光刻设备包括具有可选择性地插入光束中的刀片的装置。该装置处于第一平面中间，与第二平面共轭于基板平面，第三平面与投影系统的光瞳平面共轭。刀片可以包括部分不透明的刀片和固体刀片，或者具有预定的传递性图案。透射率可以在垂直于衬底和图案形成装置可移动的第一方向的第二方向上变化。在包括场分面镜和瞳孔刻面镜的照明系统中，反射片可选择性地插入光束中，以将光束的一部分反射到可以被冷却以减少热负荷的光束倾倒。反射元件可以具有散射辐射部分或改变相位的涂层。

5. 发明授权

US07170587B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07170587B2
公开(公告)日：2007-01-30
申请号：US10784895
申请日：2004-02-24
申请人： Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
发明人： Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
IPC分类号： G03B27/54 , G03B27/70 , G03B27/72
CPC分类号： G03F7/70075 , G03F7/70091 , G03F7/70108 , G03F7/70191 , G03F7/702
摘要： A lithographic apparatus includes a device having a plurality blades, each blade selectively insertable into the beam. The device is in a first plane intermediate a second plane conjugate to a plane of the substrate and a third plane conjugate to a pupil plane of the projection system. The blades include a plurality of partially opaque and solid blades or have a predetermined transmissibility pattern. The transmissibility may vary in a second direction perpendicular to the first direction in which the substrate and the patterning device are movable. In an illumination system including a field faceted mirror and a pupil faceted mirror, a plurality of reflecting blades are selectively insertable into the beam to reflect a portion of the beam to a beam dump that may be cooled to reduce a heat load. The reflecting elements may have a coating that scatters the portion of radiation or changes the phase.
摘要翻译：光刻设备包括具有多个叶片的装置，每个叶片可选择性地可插入光束中。该装置处于第一平面中间，与第二平面共轭于基板平面，第三平面与投影系统的光瞳平面共轭。叶片包括多个部分不透明和实心的叶片或具有预定的传递性图案。透射率可以在垂直于衬底和图案形成装置可移动的第一方向的第二方向上变化。在包括场分面镜和瞳孔分面镜的照明系统中，多个反射片可选择性地插入光束中，以将光束的一部分反射到可以被冷却以减少热负荷的光束倾倒。反射元件可以具有散射辐射部分或改变相位的涂层。

6. 发明授权

US07177010B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07177010B2
公开(公告)日：2007-02-13
申请号：US10979798
申请日：2004-11-03
申请人： Hans Van Der Laan , Uwe Mickan , Markus Franciscus Antonius Eurlings , Jan Bernard Plechelmus Van Schoot
发明人： Hans Van Der Laan , Uwe Mickan , Markus Franciscus Antonius Eurlings , Jan Bernard Plechelmus Van Schoot
IPC分类号： G03B27/42
CPC分类号： G03F7/70941 , G03F7/70558 , G03F7/70666
摘要： A lithographic apparatus comprises an illumination system for providing a projection beam of radiation, a support structure for supporting patterning device, the patterning device serving to transmit or reflect radiation in the projection beam and impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. A sensor is provided for measuring the spatial intensity distribution of the projection beam at the substrate. The spatial distribution of transmission or reflectance of the patterning device, together with the distribution of the projection beam incident on the patterning device, may be determined from the measured intensity distribution. By comparing the transmission or reflectance from regions having identical patterns the overall (macroscopic) distribution of the transmission or reflectance of the patterning device can be determined.
摘要翻译：光刻设备包括用于提供投影辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于透射或反射投影光束中的辐射并且在其横截面中赋予投影光束图案，用于保持基板的基板台，以及用于将图案化的光束投影到基板的目标部分上的投影系统。提供了一种传感器，用于测量投影光束在基板处的空间强度分布。可以根据测量的强度分布来确定图案形成装置的透射或反射率的空间分布以及入射在图案形成装置上的投影光束的分布。通过比较具有相同图案的区域的透射率或反射率，可以确定透射率的总体（宏观）分布或图案形成装置的反射率。

7. 发明申请

US20070115449A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070115449A1
公开(公告)日：2007-05-24
申请号：US11636586
申请日：2006-12-11
申请人： Marcel Mathijs Dierichs , Hans Van Der Laan , Hendrikus Van Greevenbroek
发明人： Marcel Mathijs Dierichs , Hans Van Der Laan , Hendrikus Van Greevenbroek
IPC分类号： G03B27/80
CPC分类号： G03F7/70075 , G03F7/70091 , G03F7/70108 , G03F7/70191 , G03F7/702
摘要： A lithographic apparatus includes a device having a blade selectively insertable into the beam. The device is in a first plane intermediate a second plane conjugate to a plane of the substrate and a third plane conjugate to a pupil plane of the projection system. The blade may include a partially opaque blade and a solid blade or have a predetermined transmissibility pattern. The transmissibility may vary in a second direction perpendicular to the first direction in which the substrate and the patterning device are movable. In an illumination system including a field faceted mirror and a pupil faceted mirror, a reflecting blade is selectively insertable into the beam to reflect a portion of the beam to a beam dump that may be cooled to reduce a heat load. The reflecting element may have a coating that scatters the portion of radiation or changes the phase.
摘要翻译：光刻设备包括具有可选择性地插入光束中的刀片的装置。该装置处于第一平面中间，与第二平面共轭于基板平面，第三平面与投影系统的光瞳平面共轭。刀片可以包括部分不透明的刀片和固体刀片，或者具有预定的传递性图案。透射率可以在垂直于衬底和图案形成装置可移动的第一方向的第二方向上变化。在包括场分面镜和瞳孔刻面镜的照明系统中，反射片可选择性地插入光束中，以将光束的一部分反射到可以被冷却以减少热负荷的光束倾倒。反射元件可以具有散射辐射部分或改变相位的涂层。

8. 发明授权

US07112813B2 Device inspection method and apparatus using an asymmetric marker 有权
标题翻译：装置检查方法和使用不对称标记的装置
公开(公告)号：US07112813B2
公开(公告)日：2006-09-26
申请号：US10665720
申请日：2003-09-22
申请人： Arie Jeffrey Den Boef , Frank Bornebroek , Hugo Augustinus Joseph Cramer , Mircea Dusa , Richard Johannes Franciscus Van Haren , Antoine Gaston Marie Kiers , Justin Lloyd Kreuzer , Maurits Van Der Schaar , Paul Jacques Van Wijnen , Everhardus Cornelis Mos , Pieter Willem Herman De Jager , Hans Van Der Laan , Paul Frank Luehrmann
发明人： Arie Jeffrey Den Boef , Frank Bornebroek , Hugo Augustinus Joseph Cramer , Mircea Dusa , Richard Johannes Franciscus Van Haren , Antoine Gaston Marie Kiers , Justin Lloyd Kreuzer , Maurits Van Der Schaar , Paul Jacques Van Wijnen , Everhardus Cornelis Mos , Pieter Willem Herman De Jager , Hans Van Der Laan , Paul Frank Luehrmann
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： A method of device inspection, the method comprising providing an asymmetric marker on a device to be inspected, the form of asymmetry of the marker being dependent upon the parameter to be inspected, directing light at the marker, obtaining a first measurement of the position of the marker via detection of diffracted light of a particular wavelength or diffraction angle, obtaining a second measurement of the position of the marker via detection of diffracted light of a different wavelength or diffraction angle, and comparing the first and second measured positions to determine a shift indicative of the degree of asymmetry of the marker.
摘要翻译：一种设备检查方法，所述方法包括在要检查的设备上提供不对称标记，标记的不对称形式取决于待检查的参数，将光引导到标记处，获得第一测量位置通过检测特定波长或衍射角的衍射光，通过检测不同波长或衍射角的衍射光来获得标记的位置的第二测量，并且比较第一和第二测量位置以确定偏移指示标记物的不对称程度。

9. 发明授权

US07075620B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US07075620B2
公开(公告)日：2006-07-11
申请号：US10820103
申请日：2004-04-08
申请人： Jan Evert Van Der Werf , Mark Kroon , Wilhelmus Cornelis Keur , Vadim Yevgenyevich Banine , Hans Van Der Laan , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra
发明人： Jan Evert Van Der Werf , Mark Kroon , Wilhelmus Cornelis Keur , Vadim Yevgenyevich Banine , Hans Van Der Laan , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra
IPC分类号： G01B11/00
CPC分类号： G03F7/70558 , G01J1/58 , G03F7/70741 , G03F7/7085 , G03F7/70916 , G03F7/70983
摘要： A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength λ1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.
摘要翻译：光刻投影设备包括用于提供具有小于50nm的波长λ1的辐射的投影光束的辐射系统; 用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构; 用于保持衬底的衬底台; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。该装置还包括辐射传感器，其被定位成能够将辐射从投影光束中接收，所述传感器包括辐射敏感材料，其将波长λ1的入射辐射转换成二次辐射 ; 以及能够检测从所述层出射的所述次级辐射的感测装置。

10. 发明授权

US08937705B2 Lithographic apparatus and device manufacturing method with radiation beam inspection using moveable reflecting device 有权
标题翻译：使用可移动反射装置的放射线检查的平版印刷装置和装置制造方法
公开(公告)号：US08937705B2
公开(公告)日：2015-01-20
申请号：US12437009
申请日：2009-05-07
申请人： Wim Tjibbo Tel , Hans Van Der Laan , Cassandra May Owen , Todd J. Davis , Todd David Hiar , Theodore Allen Paxton
发明人： Wim Tjibbo Tel , Hans Van Der Laan , Cassandra May Owen , Todd J. Davis , Todd David Hiar , Theodore Allen Paxton
IPC分类号： G03B27/68 , G03F7/20
CPC分类号： G03F7/70375 , G03F7/70666
摘要： A lithographic apparatus can include the following devices: a patterning system, a projection system, and a radiation beam inspection device. The patterning system can be configured to provide a patterned radiation beam. The projection system can be configured to project the patterned radiation beam onto a target portion of a substrate. Further, the radiation beam inspection device can be configured to inspect at least a part of the patterned radiation beam. In a substrate exposure position, the projection system is configured to expose a pattern of radiation on the substrate using the patterned radiation beam and the radiation beam device is configured to move the reflecting device away from a light path of the patterned radiation beam. In a radiation beam inspection position, the radiation beam inspection device is configured to move the reflecting device into the light path of the patterned radiation beam.
摘要翻译：光刻设备可以包括以下装置：图案形成系统，投影系统和辐射束检查装置。图案化系统可以被配置成提供图案化的辐射束。投影系统可以被配置为将图案化的辐射束投影到基板的目标部分上。此外，辐射束检查装置可以被配置为检查图案化的辐射束的至少一部分。在基板曝光位置中，投影系统被配置为使用图案化的辐射束来暴露基板上的辐射图案，并且辐射束装置被配置为使反射装置远离图案化的辐射束的光路。在辐射束检查位置，辐射束检查装置被配置成将反射装置移动到图案化的辐射束的光路中。

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