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    • 7. 发明授权
    • Method for producing an optical emission module having at least two vertically emitting lasers
    • 用于制造具有至少两个垂直发射激光器的光发射模块的方法
    • US07125733B2
    • 2006-10-24
    • US10840826
    • 2004-05-06
    • Gunther Steinle
    • Gunther Steinle
    • H01L21/465
    • G02B6/4202H01S5/0264H01S5/0422H01S5/18341H01S5/18347H01S5/2081H01S5/423
    • A method for producing an emission module having at least two vertically emitting lasers in which an optically active laser layer is arranged on a substrate and at least one upper covering layer is arranged on said laser layer. In a first etching step, upper mesa regions are formed by etching the upper covering layer, wherein the etching depth of the first etching step is chosen such that the first etching step is ended above the optically active laser layer, and the first etching step is carried out such that the resulting distance between adjacent upper mesa regions is so small that the radiation generated by the finished lasers can be coupled directly into a single optical waveguide. In a second etching step, the optically active layer is severed to form lower mesa regions, the second etching step being a wet-chemical or dry-chemical etching step with a predominantly chemical etching component.
    • 一种用于制造具有至少两个垂直发射激光器的发射模块的方法,其中光学活性激光器层布置在衬底上,并且至少一个上覆盖层布置在所述激光器层上。 在第一蚀刻步骤中,通过蚀刻上覆盖层形成上台面区域,其中选择第一蚀刻步骤的蚀刻深度,使得第一蚀刻步骤在光学活性激光层上方结束,并且第一蚀刻步骤 使得相邻上台面区域之间的所得距离如此之小,使得由成品激光器产生的辐射可以直接耦合到单个光波导中。 在第二蚀刻步骤中,切割光学活性层以形成下台面区域,第二蚀刻步骤是具有主要化学蚀刻部件的湿化学或干化学蚀刻步骤。
    • 8. 发明申请
    • Optical emission module
    • 光发射模块
    • US20050151137A1
    • 2005-07-14
    • US10840826
    • 2004-05-06
    • Gunther Steinle
    • Gunther Steinle
    • G02B6/42H01S5/02H01S5/026H01S5/042H01S5/20H01S5/42H01L21/00G02B6/36H01L27/15H01L29/26H01L31/12H01L33/00H01S3/08
    • G02B6/4202H01S5/0264H01S5/0422H01S5/18341H01S5/18347H01S5/2081H01S5/423
    • A method for producing an emission module having at least two vertically emitting lasers in which an optically active laser layer is arranged on a substrate and at least one upper covering layer is arranged on said laser layer. In a first etching step, upper mesa regions are formed by etching the upper covering layer, wherein the etching depth of the first etching step is chosen such that the first etching step is ended above the optically active laser layer, and the first etching step is carried out such that the resulting distance between adjacent upper mesa regions is so small that the radiation generated by the finished lasers can be coupled directly into a single optical waveguide. In a second etching step, the optically active layer is severed to form lower mesa regions, the second etching step being a wet-chemical or dry-chemical etching step with a predominantly chemical etching component.
    • 一种用于制造具有至少两个垂直发射激光器的发射模块的方法,其中光学活性激光器层布置在衬底上,并且至少一个上覆盖层布置在所述激光器层上。 在第一蚀刻步骤中,通过蚀刻上覆盖层形成上台面区域,其中选择第一蚀刻步骤的蚀刻深度,使得第一蚀刻步骤在光学活性激光层上方结束,并且第一蚀刻步骤 使得相邻上台面区域之间的所得距离如此之小,使得由成品激光器产生的辐射可以直接耦合到单个光波导中。 在第二蚀刻步骤中,切割光学活性层以形成下台面区域,第二蚀刻步骤是具有主要化学蚀刻部件的湿化学或干化学蚀刻步骤。