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1. 发明申请

US20110216300A1 LITHOGRAPHIC APPARATUS AND METHOD FOR MEASURING A POSITION 有权
标题翻译：平面设备和测量位置的方法
公开(公告)号：US20110216300A1
公开(公告)日：2011-09-08
申请号：US13022498
申请日：2011-02-07
申请人： Hans BUTLER , Engelbertus Antonius Fransiscus VAN DER PASCH
发明人： Hans BUTLER , Engelbertus Antonius Fransiscus VAN DER PASCH
IPC分类号： G03B27/58 , G01B11/14
CPC分类号： G01B11/14 , G03B27/58 , G03F7/70775
摘要： A lithographic apparatus includes a support configured to hold an object, the support being moveable relative to a reference structure in a direction; a first position measurement system configured to provide a first measurement signal in a first frequency range, the first measurement signal representative of a position of the support relative to the reference structure in the direction; a second position measurement system configured to provide a second measurement signal in a second frequency range, the second measurement signal representative of the position of the support relative to the reference structure in the direction; and a processor configured to (a) filter the first measurement signal so as to attenuate a signal component having a frequency in the second frequency range, (b) filter the second measurement signal so as to attenuate a signal component having a frequency in the first frequency range, and (c) combine the filtered first measurement signal and the filtered second measurement signal into a combined measurement signal representative of the position of the support relative to the reference structure in the direction.
摘要翻译：光刻设备包括被配置为保持物体的支撑件，所述支撑件可相对于参考结构在一个方向上移动; 第一位置测量系统，被配置为在第一频率范围内提供第一测量信号，所述第一测量信号表示所述支撑件相对于所述参考结构在所述方向上的位置; 第二位置测量系统，被配置为在第二频率范围内提供第二测量信号，所述第二测量信号表示所述支撑件相对于所述参考结构在所述方向上的位置; 以及处理器，其被配置为（a）对所述第一测量信号进行滤波，以便衰减具有在所述第二频率范围内的频率的信号分量，（b）滤除所述第二测量信号，以便衰减具有所述第一频率的信号分量频率范围，以及（c）将滤波的第一测量信号和滤波的第二测量信号组合成表示支撑件相对于参考结构在该方向上的位置的组合测量信号。

2. 发明申请

US20090115987A1 POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS 有权
标题翻译：位置测量系统和平面设备
公开(公告)号：US20090115987A1
公开(公告)日：2009-05-07
申请号：US12255328
申请日：2008-10-21
申请人： Hans BUTLER , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Hans BUTLER , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G01B11/00 , G03B27/52
CPC分类号： G01D5/38 , G03F9/7015 , G03F9/7049 , G03F9/7084 , G03F9/7088
摘要： A measurement system includes a sensor arranged to co-operate with a first pattern arranged on a structure of the measurement system to determine a first position quantity of the sensor relative to the structure, and arranged to co-operate with a second pattern arranged on the structure to determine a second position quantity of the sensor relative to the structure, wherein the first and second patterns are arranged on different surfaces of the structure.
摘要翻译：测量系统包括被布置成与布置在测量系统的结构上的第一图案配合的传感器以确定传感器相对于该结构的第一位置量，并被布置成与布置在该测量系统上的第二图案配合结构，以确定传感器相对于结构的第二位置量，其中第一和第二图案布置在结构的不同表面上。

3. 发明申请

US20110317141A1 LITHOGRAPHIC APPARATUS 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：US20110317141A1
公开(公告)日：2011-12-29
申请号：US13115334
申请日：2011-05-25
申请人： Doede Frans KUIPER , Hans BUTLER
发明人： Doede Frans KUIPER , Hans BUTLER
IPC分类号： G03B27/54
CPC分类号： G03F7/70775 , G03F7/70716 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the device being capable of imparting the beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a stage system to position the table relative to a reference structure; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; an optical measurement system including a sensor part and an optical part, the optical part being configured to optically interact with the patterned radiation beam and to transmit a result from the interaction as output to the sensor part, wherein the optical part is arranged on the table, and the sensor part is arranged on the stage system or the reference structure.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 构造为支撑图案形成装置的支撑件，所述装置能够在其横截面中赋予所述梁的图案以形成图案化的辐射束; 构造成保持基板的基板台; 一个用于将表相对于参考结构定位的阶段系统; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 包括传感器部分和光学部件的光学测量系统，所述光学部件被配置为与所述图案化的辐射束光学相互作用并且将所述相互作用的结果作为输出传输到所述传感器部分，其中所述光学部件布置在所述台面上并且传感器部分布置在平台系统或参考结构上。

4. 发明申请

US20110149265A1 ACTIVE MOUNT, LITHOGRAPHIC APPARATUS COMPRISING SUCH ACTIVE MOUNT AND METHOD FOR TUNING SUCH ACTIVE MOUNT 有权
标题翻译：主动安装，包含此类活动安装的平铺设备和用于调整此类活动安装的方法
公开(公告)号：US20110149265A1
公开(公告)日：2011-06-23
申请号：US12969234
申请日：2010-12-15
申请人： Hans BUTLER , Pieter Johannes Gertrudis Meijers , Hendrikus Johannes Schellens
发明人： Hans BUTLER , Pieter Johannes Gertrudis Meijers , Hendrikus Johannes Schellens
IPC分类号： G03B27/58 , H01L41/04
CPC分类号： G03F7/70833 , F16F15/005 , G03F7/70825 , H01L41/0825
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The projection system is mounted on a reference structure of the lithographic apparatus by a mount of the lithographic apparatus. The mount includes a first piezoelectric element to exert a force on the projection system, a second piezoelectric element to measure the force, and an interconnection member interposed between the first and second piezoelectric elements, the interconnection member comprising a cut.
摘要翻译：光刻设备包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底被构造成保持衬底的工作台以及配置成将图案化的辐射束投影到衬底的目标部分上的投影系统。投影系统通过光刻设备的安装件安装在光刻设备的参考结构上。支架包括在投影系统上施加力的第一压电元件，用于测量力的第二压电元件，以及插在第一和第二压电元件之间的互连构件，所述互连构件包括切口。

5. 发明申请

US20100020525A1 Cable Connection, Control System, and Method to Decrease the Passing on of Vibrations from a First Object to a Second Object 有权
标题翻译：电缆连接，控制系统和减少从第一个对象到第二个对象的振动传递的方法
公开(公告)号：US20100020525A1
公开(公告)日：2010-01-28
申请号：US12470773
申请日：2009-05-22
申请人： Hans BUTLER , Martinus Van Duijnhoven , Johan Hendrik Geerke , Joost De Pee , Cornelius Adrianus Lambertus De Hoon
发明人： Hans BUTLER , Martinus Van Duijnhoven , Johan Hendrik Geerke , Joost De Pee , Cornelius Adrianus Lambertus De Hoon
IPC分类号： H02B1/20 , G03B27/00
CPC分类号： G03F7/709 , G03F7/70691 , G03F7/70833 , G03F7/70991
摘要： A cable connection between a first object and a second object includes a cable bundle of one or more cables having a certain length. One end of the cable bundle is fixed to the first object and another end of the bundle is fixed to the second object. A cable bundle holder configured to hold the cable bundle at a certain location along the length of the cable bundle, and a control system configured to control the position of the cable bundle holder with respect to the second object are presented. A control system for cable connection, and a method of reducing the transfer of vibrations from a first object to a second object via a cable connection are presented.
摘要翻译：第一物体和第二物体之间的电缆连接包括具有一定长度的一根或多根电缆的电缆束。电缆束的一端固定在第一物体上，另一端固定在第二物体上。电缆束保持器被配置为沿着电缆束的长度将电缆束保持在特定位置，并且呈现配置为控制电缆束保持器相对于第二对象的位置的控制系统。提出了一种用于电缆连接的控制系统，以及通过电缆连接减少振动从第一物体传递到第二物体的方法。

6. 发明申请

US20090103066A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20090103066A1
公开(公告)日：2009-04-23
申请号：US12244326
申请日：2008-10-02
申请人： Hans BUTLER , Marc Wilhelmus Maria Van Der Wijst , Cornelius Adrianus Lambertus De Hoon
发明人： Hans BUTLER , Marc Wilhelmus Maria Van Der Wijst , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G03B27/42 , G01B11/14
CPC分类号： G03F7/70775 , G03F7/709 , G05D19/02
摘要： A control system for controlling a position or position related quantity of an object is provided. A measurement system is configured to measure a position or position related quantity of the object. A controller is configured to provide a control signal on the basis of the measured position or position related quantity. A actuator actuates the object on the basis of the control signal. A filter unit, which may be a partial order filter unit, filters the measured position or position related quantity.
摘要翻译：提供了一种用于控制物体的位置或位置相关量的控制系统。测量系统被配置为测量对象的位置或位置相关量。控制器被配置为基于所测量的位置或位置相关量提供控制信号。执行器基于控制信号致动物体。可以是部分级过滤器单元的过滤器单元过滤所测量的位置或位置相关量。

7. 发明申请

US20120147355A1 Positioning System, Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：定位系统，平版印刷设备和器件制造方法
公开(公告)号：US20120147355A1
公开(公告)日：2012-06-14
申请号：US13398890
申请日：2012-02-17
申请人： Hans BUTLER , Martinus Agnes Willem CUIJPERS , Christiaan Alexander HOOGENDAM , Robertus Johannes Marinus DE JONGH , Michael Jozef Mathijs RENKENS , Marc Wilhelmus Maria VAN DER WIJST , Maurice Willem Jozef Etiënne WIJCKMANS , Robertus Leonardus TOUSAIN , Ronald Petrus Hendricus FAASSEN , Adrianus Hendrik KOEVOETS
发明人： Hans BUTLER , Martinus Agnes Willem CUIJPERS , Christiaan Alexander HOOGENDAM , Robertus Johannes Marinus DE JONGH , Michael Jozef Mathijs RENKENS , Marc Wilhelmus Maria VAN DER WIJST , Maurice Willem Jozef Etiënne WIJCKMANS , Robertus Leonardus TOUSAIN , Ronald Petrus Hendricus FAASSEN , Adrianus Hendrik KOEVOETS
IPC分类号： G03B27/58
CPC分类号： G03F7/709 , G03F7/70758 , G03F7/70766
摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.
摘要翻译：一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。第一执行器在桌子上施加致动力。第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第一致动器施加在平衡块上的致动力引起的扭矩。

8. 发明申请

US20120105819A1 LITHOGRAPHIC APPARATUS FOR TRANSFERRING PATTERN FROM PATTERNING DEVICE ONTO SUBSTRATE, AND DAMPING METHOD 有权
标题翻译：用于将图案从图案设备传输到基板上的平面设备和阻尼方法
公开(公告)号：US20120105819A1
公开(公告)日：2012-05-03
申请号：US13281214
申请日：2011-10-25
申请人： Hans BUTLER , Marco Hendrikus Hermanus OUDE NIJHUIS
发明人： Hans BUTLER , Marco Hendrikus Hermanus OUDE NIJHUIS
IPC分类号： G03B27/58
CPC分类号： G03F7/709 , G03F7/70833 , G03F7/7085
摘要： A lithographic apparatus includes a support frame which is supported by a base via a vibration isolation system; a projection system arranged to transfer a pattern from a patterning device onto a substrate, wherein the projection system includes a first frame which is spring-supported by the support frame; and an active damping system configured to damp movement of the first frame, including: a first sensor system configured to provide a first sensor output representative of absolute movement of the first frame, a first actuator system arranged to apply a force between the first frame and the support frame, and a control system configured to provide a drive signal to the first actuator system based on the first sensor output.
摘要翻译：光刻设备包括：支撑框架，其经由隔振系统由基座支撑; 投影系统，布置成将图案从图案形成装置传送到基板上，其中所述投影系统包括由所述支撑框架弹簧支撑的第一框架; 以及主动阻尼系统，被配置为阻止所述第一框架的运动，所述主动阻尼系统包括：第一传感器系统，其被配置为提供表示所述第一框架的绝对运动的第一传感器输出;布置成在所述第一框架和支撑框架和被配置为基于第一传感器输出向第一致动器系统提供驱动信号的控制系统。

9. 发明申请

US20100007867A1 Lithographic Apparatus and Calibration Method 有权
标题翻译：平版印刷设备和校准方法
公开(公告)号：US20100007867A1
公开(公告)日：2010-01-14
申请号：US12367193
申请日：2009-02-06
申请人： Marinus Aart VAN DEN BRINK , Hans BUTLER , Emiel Jozef Melanie EUSSEN , Engelbertus Antonius Fransiscu VAN DER PASCH , Marc Wilhelmus Maria VAN DER WIJST , Georgo ANGELIS , Renatus Gerardus KLAVER , Martijn Robert HAMERS , Boudewijn Theodorus VERHAAR , Peter HOEKSTRA
发明人： Marinus Aart VAN DEN BRINK , Hans BUTLER , Emiel Jozef Melanie EUSSEN , Engelbertus Antonius Fransiscu VAN DER PASCH , Marc Wilhelmus Maria VAN DER WIJST , Georgo ANGELIS , Renatus Gerardus KLAVER , Martijn Robert HAMERS , Boudewijn Theodorus VERHAAR , Peter HOEKSTRA
IPC分类号： G03B27/58 , G03B27/32
CPC分类号： G03F7/70775 , G03F7/70516
摘要： In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.
摘要翻译：在一个实施例中，舞台系统校准方法包括响应于设定点信号相对于编码器网格移动舞台，并通过与编码器网格协作的传感器头测量舞台的位置。舞台的位置由舞台控制器控制。记录表示由传感器头测量的设定点信号和台的位置之间的差异的信号。舞台系统根据代表差异的注册信号进行校准。

10. 发明申请

US20160282727A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20160282727A1
公开(公告)日：2016-09-29
申请号：US15178522
申请日：2016-06-09
申请人： Joeri LOF , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MElJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertu MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Helmar VAN SANTEN
发明人： Joeri LOF , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MElJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertu MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Helmar VAN SANTEN
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

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