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1. 发明授权

US08758511B2 Film forming apparatus and vaporizer 失效
标题翻译：成膜装置和蒸发器
公开(公告)号：US08758511B2
公开(公告)日：2014-06-24
申请号：US11660091
申请日：2005-08-12
申请人： Hachishiro Iizuka , Akira Yasumuro , Koichiro Kimura , Norihiko Tsuji
发明人： Hachishiro Iizuka , Akira Yasumuro , Koichiro Kimura , Norihiko Tsuji
IPC分类号： C23C16/448 , C23C16/455 , C23C16/00 , C23C16/44 , C23C16/458
CPC分类号： C23C16/4402 , C23C16/4401 , C23C16/4486 , C23C16/45561 , C23C16/4585
摘要： A film forming apparatus including a raw material supplying section for supplying a raw material of a liquid or a gas-liquid mixture, a raw material vaporizing section for vaporizing the raw material to form a raw material gas, and a film forming section for conducting a film forming treatment using the formed raw material gas, and a filter on the transport path for the raw material gas from the raw material vaporizing section to the film forming section. An outer edge of the filter is pressed to the inner surface of the transport path over the whole perimeter thereof by a cyclic supporting member, which is less prone to be deformed by a loading in the pressing direction than the outer edge, and is fixed to the inner surface of the transport path in a compressed state between the inner surface of the transport path and the supporting member.
摘要翻译：一种成膜装置，包括用于供给液体或气液混合物的原料的原料供给部，用于蒸发原料以形成原料气体的原料蒸发部，以及用于导入使用所形成的原料气体的成膜处理，以及从原料蒸发部到成膜部的原料气体的输送路径上的过滤器。过滤器的外边缘通过循环支撑构件在其整个周边上被压靠在输送路径的内表面上，循环支撑构件通过沿着挤压方向的加载不如外边缘而变形，并被固定到传送路径的内表面处于压缩状态，在传送路径的内表面和支撑构件之间。

2. 发明申请

US20070022954A1 Gas treatment device and heat readiting method 审中-公开
标题翻译：气体处理装置和热读取方法
公开(公告)号：US20070022954A1
公开(公告)日：2007-02-01
申请号：US10570603
申请日：2004-08-30
申请人： Hachishiro Iizuka , Koichiro Kimura , Kyoko Ikeda , Tomoyuki Sakoda , Akira Yasumuro
发明人： Hachishiro Iizuka , Koichiro Kimura , Kyoko Ikeda , Tomoyuki Sakoda , Akira Yasumuro
IPC分类号： C23F1/00 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/455
摘要： A shower head formed by stacking a shower base, a gas diffusion plate, and a shower plate and supplying material gas and oxidizer gas to a wafer on a loading table through a first gas diffusion part and a second gas diffusion part formed in both faces of the gas diffusion plate, first gas outlets formed in the shower plate and communicating with a first gas diffusion space, and second gas outlets formed in the shower plate and communicating with a second gas diffusion space. A plurality of heat transfer columns fitted closely to the lower surface of the shower base are installed in the first gas diffusion part so that portions therebetween can form the first gas diffusion space, and radiant heat from the loading table is transmitted by the heat transfer columns in the thickness direction of the shower head.
摘要翻译：喷淋头，其通过堆叠淋浴器基座，气体扩散板和喷淋板而形成，并且通过第一气体扩散部和第二气体扩散部将第二气体扩散部和第二气体扩散部供给到装载台上的晶片，所述气体扩散板，形成在所述喷淋板中并与第一气体扩散空间连通的第一气体出口和形成在所述喷淋板中并与第二气体扩散空间连通的第二气体出口。在第一气体扩散部中安装有与淋浴器基座的下表面紧密配合的多个传热塔，使得它们之间的部分可以形成第一气体扩散空间，并且来自装载台的辐射热量通过传热塔在淋浴头的厚度方向上。

3. 外观设计

USD581012S1 Middle plate for the shower head 有权
标题翻译：中间淋浴头
公开(公告)号：USD581012S1
公开(公告)日：2008-11-18
申请号：US29226149
申请日：2005-03-24
申请人： Hachishiro Iizuka , Koichiro Kimura , Akira Yasumuro
设计人： Hachishiro Iizuka , Koichiro Kimura , Akira Yasumuro

4. 发明申请

US20070266944A1 Film Forming Apparatus and Vaporizer 失效
标题翻译：成膜装置和蒸发器
公开(公告)号：US20070266944A1
公开(公告)日：2007-11-22
申请号：US11660091
申请日：2005-08-12
申请人： Hachishiro Iizuka , Akira Yasumuro , Koichiro Kimura , Norihiko Tsuji
发明人： Hachishiro Iizuka , Akira Yasumuro , Koichiro Kimura , Norihiko Tsuji
IPC分类号： C23C16/02
CPC分类号： C23C16/4402 , C23C16/4401 , C23C16/4486 , C23C16/45561 , C23C16/4585
摘要： A film forming apparatus including a raw material supplying section for supplying a raw material of a liquid or a gas-liquid mixture, a raw material vaporizing section for vaporizing the raw material to form a raw material gas, and a film forming section for conducting a film forming treatment using the formed raw material gas, and a filter on the transport path for the raw material gas from the raw material vaporizing section to the film forming section. An outer edge of the filter is pressed to the inner surface of the transport path over the whole perimeter thereof by a cyclic supporting member, which is less prone to be deformed by a loading in the pressing direction than the outer edge, and is fixed to the inner surface of the transport path in a compressed state between the inner surface of the transport path and the supporting member.
摘要翻译：一种成膜装置，包括用于供给液体或气液混合物的原料的原料供给部，用于蒸发原料以形成原料气体的原料蒸发部，以及用于导入使用所形成的原料气体的成膜处理，以及从原料蒸发部到成膜部的原料气体的输送路径上的过滤器。过滤器的外边缘通过循环支撑构件在其整个周边上被压靠在输送路径的内表面上，循环支撑构件通过沿着挤压方向的加载不如外边缘而变形，并被固定到传送路径的内表面处于压缩状态，在传送路径的内表面和支撑构件之间。

5. 发明申请

US20070261735A1 Liquid Amount Monitoring Apparatus, Semiconductor Manufacturing Apparatus Having the Liquid Amount Monitoring Apparatus Mounted Thereon, and Liquid Material/Liquid Amount Monitoring Method 审中-公开
标题翻译：液体量监测装置，具有安装在其上的液量监测装置的半导体制造装置和液体材料/液体量监测方法
公开(公告)号：US20070261735A1
公开(公告)日：2007-11-15
申请号：US11577456
申请日：2005-10-18
申请人： Akira Yasumuro , Hachishiro Iizuka
发明人： Akira Yasumuro , Hachishiro Iizuka
IPC分类号： B01J4/00 , H01L21/56
CPC分类号： C23C16/4481 , C23C16/409 , C23C16/4485 , C23C16/52 , C30B25/14 , G01F23/2962 , G01F23/2968 , Y10T137/2931
摘要： A semiconductor manufacturing apparatus includes a container (Xb, Ab, Bb, or Cb) for receiving a liquid material, a liquid material supply section for supplying the liquid material from the container, a liquid vaporizing section for vaporizing the liquid material supplied from the liquid material supply section to generate a gas, a processing section for using the gas supplied from the liquid vaporizing section to execute deposition processing, an exhaust section for exhausting a gas from the processing section, and a liquid level detector (Xs, As, Bs, or Cs) arranged in a bottom of the container to detect a liquid level of the liquid material based on an acoustic wave.
摘要翻译：半导体制造装置包括用于接收液体材料的容器（Xb，Ab，Bb或Cb），用于从容器供应液体材料的液体材料供应部分，用于蒸发从液体供应的液体材料的液体蒸发部分用于产生气体的材料供应部分，用于使用从液体蒸发部分供应的气体执行沉积处理的处理部分，用于从处理部分排出气体的排气部分和液面检测器（Xs，As，Bs，或Cs），其基于声波检测液体材料的液面。

6. 发明授权

US09734993B2 Semiconductor manufacturing apparatus 有权
公开(公告)号：US09734993B2
公开(公告)日：2017-08-15
申请号：US13528504
申请日：2012-06-20
申请人： Atsushi Kobayashi , Kazuyuki Miura , Akira Yasumuro
发明人： Atsushi Kobayashi , Kazuyuki Miura , Akira Yasumuro
IPC分类号： F27D11/00 , H01J37/32
CPC分类号： H01J37/32467 , H01J37/32522 , H01J37/32532
摘要： A semiconductor manufacturing apparatus is capable of reducing power consumption. The semiconductor manufacturing apparatus 1 includes a processing chamber 2 that has a top surface 2a and forms a processing space S therein; a mounting table 3 provided in the processing space S; an upper electrode 20 provided above the mounting table 3 to face the mounting table 3; heaters 35 and 36 provided around the upper electrode 20 and below the top surface 2a of the processing chamber 2 and configured to heat the upper electrode 20; and a heat insulating unit 50, mounted on the top surface 2a of the processing chamber 2, having a plate-shaped member 51 and a heat insulating member 52 that is provided on one main surface 51a of the plate-shaped member 51.

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