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    • 9. 发明申请
    • Maskless Exposure Apparatus
    • 无掩模曝光装置
    • US20120140194A1
    • 2012-06-07
    • US13293445
    • 2011-11-10
    • Sang Woo BaeSang Don Jang
    • Sang Woo BaeSang Don Jang
    • G03B27/52
    • G03B27/52G03B27/522G03F7/70391
    • According to example embodiments, a maskless exposure apparatus includes a light source array including a plurality of light sources, a focusing element array including a plurality of focusing elements, and an image forming lens unit between the focusing element array and a substrate. The focusing element array is configured to perform a first focusing operation to focus light beams emitted from the plurality of light sources. The image forming lens unit is configured to perform a second focusing operation on the focused light beams to form focused light spots on the surface of the substrate. The focused light spots form a pattern on the substrate.
    • 根据示例性实施例,无掩模曝光装置包括包括多个光源的光源阵列,包括多个聚焦元件的聚焦元件阵列,以及在聚焦元件阵列和基底之间的成像透镜单元。 聚焦元件阵列被配置为执行第一聚焦操作以聚焦从多个光源发射的光束。 图像形成透镜单元被配置为对聚焦光束执行第二聚焦操作,以在基板的表面上形成聚焦光点。 聚焦的光斑在基底上形成图案。