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1. 发明申请

WO2004101651A1 MINIMIZATION OF COATING DEFECTS FOR COMPOSITIONS COMPRISING SILICON-BASED COMPOUNDS AND METHODS OF PRODUCING AND PROCESSING 审中-公开
标题翻译：包含硅基化合物的组合物的涂层缺陷的最小化以及生产和加工方法
公开(公告)号：WO2004101651A1
公开(公告)日：2004-11-25
申请号：PCT/US2004/014317
申请日：2004-05-07
申请人： HONEYWELL INTERNATIONAL INC. , BEDWELL, William , XIE, Songyuan , SEPA, Jelena , DUONG, Anh , IWAMOTO, Nancy , APEN, Paul , LEUNG, Roger
发明人： BEDWELL, William , XIE, Songyuan , SEPA, Jelena , DUONG, Anh , IWAMOTO, Nancy , APEN, Paul , LEUNG, Roger
IPC分类号： C08G77/06
CPC分类号： C08J3/091 , C08J2383/04
摘要： Polymer solutions are described herein that comprise: a) at least one silicon-based polymer having high molecular weight species and low molecular weight species after solvation with a compatible primary solvent, wherein the low molecular weight species crystallize in or precipitate out of the polymer solution; b) a primary solvent that solvates the high molecular weight species in the solution; and c) at least one additional solvent that solvates the low molecular weight species in the solution. Methods of producing a polymer solution are also described herein that comprise: a) providing at least one silicon-based polymer having high molecular weight species and low molecular weight species after solvation with a compatible primary solvent, wherein the low molecular weight species crystallize in or precipitate out of the polymer solution; b) providing a primary solvent that solvates the high molecular weight species in the solution; c) providing at least one additional solvent that solvates the low molecular weight species in the solution; and d) blending the at least one silicon-based polymer, the primary solvent and the at least one additional solvent to form the polymer solution. Methods of processing a polymer solution include: a) providing a filtration method or device, b) providing a polymer solution comprising high molecular weight species and low molecular weight species, wherein the low molecular weight species are in the form of crystals or precipitates, and c) utilizing the filtration method or device to filter the low molecular weight species out from the polymer solution.
摘要翻译：本文描述了聚合物溶液，其包含：a）至少一种具有高分子量物质和低分子量物质的硅基聚合物，在用相容的主要溶剂溶剂化之后，其中低分子量物质在聚合物溶液中结晶或沉淀出聚合物溶液 ; b）溶解溶液中高分子量物质的主要溶剂; 和c）溶解溶液中低分子量物质的至少一种另外的溶剂。本文还描述了生产聚合物溶液的方法，其包括：a）在用相容的主要溶剂溶剂化后，提供至少一种具有高分子量物质和低分子量物质的硅基聚合物，其中低分子量物质在从聚合物溶液中沉淀出来; b）提供溶解溶液中的高分子量物质的主要溶剂; c）提供溶解溶液中低分子量物质的至少一种另外的溶剂; 和d）共混所述至少一种硅基聚合物，所述主要溶剂和所述至少一种另外的溶剂以形成所述聚合物溶液。处理聚合物溶液的方法包括：a）提供过滤方法或装置，b）提供包含高分子量物质和低分子量物质的聚合物溶液，其中低分子量物质是晶体或沉淀物的形式，以及 c）利用过滤方法或装置从聚合物溶液中过滤低分子量物质。

2. 发明申请

WO2004037877A2 ORGANOSILOXANES 审中-公开
标题翻译：有机硅氧烷
公开(公告)号：WO2004037877A2
公开(公告)日：2004-05-06
申请号：PCT/US2003/017658
申请日：2003-06-03
申请人： HONEYWELL INTERNATIONAL INC. , BEDWELL, William , HACKER, Nigel , LEUNG, Roger , IWAMOTO, Nancy , NEDBAL, Jan , XIE, Songyuan , MORO, Lorenzo , MUKHERJEE, Shyama
发明人： BEDWELL, William , HACKER, Nigel , LEUNG, Roger , IWAMOTO, Nancy , NEDBAL, Jan , XIE, Songyuan , MORO, Lorenzo , MUKHERJEE, Shyama
IPC分类号： C08G
CPC分类号： C08G77/12 , C09D183/04 , G03F7/0751 , H01L21/02126 , H01L21/02211 , H01L21/02282 , H01L21/3122 , H01L21/76807 , H01L21/76829 , H01L2924/12044
摘要： The present invention provides an organosiloxane comprising at least 80 weight percent of Formula I: [Y 0.01-1.0 SiO 1.5-2 ] a [Z 0.01-1.0 SiO 1.5-2 ]b[H 0.01-1.0 SiO 1.5-2 ] c where Y is aryl; Z is alkenyl; a is from 15 percent to 70 percent of Formula I; b is from 2 percent to 50 percent of Formula I; and c is from 20 percent to 80 percent of Formula I.The present organosiloxane may be used as ceramic binder, high temperature encapsulant, and fiber matrix binder. The present composition is also useful as an adhesion promoter in that it exhibits good adhesive properties when coupled with other materials in non-microelectronic or microelectronic applications. Preferably, the present compositions are used in microelectronic applications as etch stops, hardmasks, and dielectrics.
摘要翻译：本发明提供了包含至少80重量％的式I的有机硅氧烷：[Y0.01-1.0SiO1.5-2] a [Z 0.01-1.0SiO1.5-2] b [H0.01-1.0SiO1.5 -2] c其中Y是芳基; Z是烯基; a是一级方程式的15％至70％; b是式I的2％至50％; c为式I的20％至80％。本发明的有机硅氧烷可用作陶瓷粘合剂，高温密封剂和纤维基质粘合剂。本发明的组合物也可用作粘合促进剂，因为当与非微电子或微电子应用中的其它材料结合时，其具有良好的粘合性能。优选地，本发明的组合物用作微电子应用中的蚀刻停止，硬掩模和电介质。

3. 发明申请

WO2004078814A2 FLUORINATED POLYMERS, METHODS OF PRODUCTION AND USES IN FERROELECTRIC DEVICES THEREOF 审中-公开
标题翻译：氟化聚合物，其生产方法及其在其电子设备中的用途
公开(公告)号：WO2004078814A2
公开(公告)日：2004-09-16
申请号：PCT/US2004/006680
申请日：2004-03-04
申请人： HONEYWELL INTERNATIONAL INC. , IWAMOTO, Nancy , BEDWELL, William , NALEWAJEK, David , CURRAN, Sean , WILLIAMS, Thomas, Jr. , ENDISCH, Denis , LEVY, Alan , SWAN, Ellen
发明人： IWAMOTO, Nancy , BEDWELL, William , NALEWAJEK, David , CURRAN, Sean , WILLIAMS, Thomas, Jr. , ENDISCH, Denis , LEVY, Alan , SWAN, Ellen
IPC分类号： C08G
CPC分类号： C08F14/18 , C08K5/02 , C09D127/12 , C08F2/14 , C08F2/46 , C08F2/22
摘要： Fluorinated polymers having ferroelectric properties are described herein that include: a) at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof; and b) at least one adhesion promoter. Fluorinated polymer coating compositions having ferroelectric properties are also described herein that include: a) at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof; b) at least one adhesion promoter; and c) at least one solvent. Methods of producing a fluorinated polymer having ferroelectric properties are described herein that include: a) providing at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof; b) providing at least one adhesion promoter; c) polymerizing the at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof to produce the fluorinated polymer; and d) incorporating the at least one adhesion promoter with the fluorinated polymer. Methods of producing a fluorinated polymer coating composition having ferroelectric properties are also described herein that include: a) providing at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof; b) providing at least one adhesion promoter; c) providing at least one solvent; d) polymerizing the at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof to produce the fluorinated polymer; and e) incorporating the at least one adhesion promoter and the solvent with the fluorinated polymer.
摘要翻译：本文描述了具有铁电性能的氟化聚合物，其包括：a）至少一种氟基单体前体，至少一种氟基聚合物或其组合; 和b）至少一种粘合促进剂。本文还描述了具有铁电性能的氟化聚合物涂料组合物，其包括：a）至少一种氟基单体前体，至少一种氟基聚合物或其组合; b）至少一种粘合促进剂; 和c）至少一种溶剂。本文描述了制备具有铁电性能的氟化聚合物的方法，其包括：a）提供至少一种氟基单体前体，至少一种氟基聚合物或其组合; b）提供至少一种粘合促进剂; c）聚合至少一种氟基单体前体，至少一种氟基聚合物或其组合以制备氟化聚合物; 和d）将所述至少一种粘合促进剂与所述含氟聚合物结合。本文还描述了制备具有铁电性能的氟化聚合物涂料组合物的方法，其包括：a）提供至少一种氟基单体前体，至少一种氟基聚合物或其组合; b）提供至少一种粘合促进剂; c）提供至少一种溶剂; d）聚合至少一种氟基单体前体，至少一种氟基聚合物或其组合以产生氟化聚合物; 和e）将所述至少一种粘合促进剂和所述溶剂与所述含氟聚合物结合。

4. 发明申请

WO2003044078A1 ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF 审中-公开
标题翻译：用于光刻胶的抗反射涂层及其制备方法
公开(公告)号：WO2003044078A1
公开(公告)日：2003-05-30
申请号：PCT/US2002/036327
申请日：2002-11-12
申请人： HONEYWELL INTERNATIONAL INC. , BALDWIN, Teresa , KENNEDY, Joseph , IWAMOTO, Nancy , NAKANO, Tadashi , BEDWELL, William , STUCK, Jason , HEBERT, Mello , SUEDMEYER, Arlene
发明人： BALDWIN, Teresa , KENNEDY, Joseph , IWAMOTO, Nancy , NAKANO, Tadashi , BEDWELL, William , STUCK, Jason , HEBERT, Mello , SUEDMEYER, Arlene
IPC分类号： C08G77/08
CPC分类号： C08G77/04 , C09D183/04 , G03F7/091
摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
摘要翻译：用于紫外光刻的抗反射涂层材料包括至少一种吸收化合物和至少一种材料改性剂，例如至少一种造孔剂，至少一种高沸点溶剂，至少一种封端剂，至少一种流平剂，至少一种催化剂，至少一种替代溶剂，至少一种pH调节剂和/或其组合，其掺入无机基材料或无机组合物和/或化合物中。合适的吸收化合物是可以在光刻中使用的波长如365nm，248nm，193nm和157nm的那些吸收化合物。

5. 发明申请

WO2004044025A2 ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF 审中-公开
标题翻译：用于光刻的抗反射涂层及其制备方法
公开(公告)号：WO2004044025A2
公开(公告)日：2004-05-27
申请号：PCT/US2003/036354
申请日：2003-11-12
申请人： HONEYWELL INTERNATIONAL INC , BALDWIN, Teresa , KENNEDY, Joseph , IWAMOTO, Nancy , NAKANO, Tadashi , BEDWELL, William , STUCK, Jason , SUEDEMEYER, Arlene , HEBERT, Mello , LI, Bo
发明人： BALDWIN, Teresa , KENNEDY, Joseph , IWAMOTO, Nancy , NAKANO, Tadashi , BEDWELL, William , STUCK, Jason , SUEDEMEYER, Arlene , HEBERT, Mello , LI, Bo
IPC分类号： C08G
CPC分类号： C08G77/14 , C08G77/22 , C09D183/06 , C09D183/08 , G03F7/0757 , G03F7/091
摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one densifying agent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
摘要翻译：用于紫外光刻的抗反射涂层材料包括至少一种吸收化合物和至少一种材料改性剂，例如至少一种致孔剂，至少一种高沸点溶剂，至少一种致密剂，至少一种封端剂，至少一种流平剂，至少一种催化剂，至少一种置换溶剂，至少一种pH调节剂和/或其组合和/或掺入无机基材料或无机组合物和/ 或化合物。合适的吸收化合物是吸收可用于光刻法的波长例如365nm，248nm，193nm和157nm附近的吸收化合物。

6. 发明申请

WO2004017335A1 NANOPOROUS MATERIALS AND METHODS OF FORMATION THEREOF 审中-公开
标题翻译：纳米材料及其形成方法
公开(公告)号：WO2004017335A1
公开(公告)日：2004-02-26
申请号：PCT/US2002/026276
申请日：2002-08-15
申请人： HONEYWELL INTERNATIONAL INC. , HACKER, Nigel , LEFFERT, Scott , FIGGE, Lisa , SPEAR, Richard , BEDWELL, William , RAMOS, Teresa
发明人： HACKER, Nigel , LEFFERT, Scott , FIGGE, Lisa , SPEAR, Richard , BEDWELL, William , RAMOS, Teresa
IPC分类号： H01B3/02
CPC分类号： H01L21/02126 , C08G77/12 , C08G77/20 , H01B3/46 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/31695
摘要： Low dielectric materials are described herein that comprise a plurality of pores or nanopores in addition to the ultrananopores.It is further contemplated that the low dielectric materials described herein will have a dielectric constant of less than about 3. The dielectric materials are fromed from polymer compositions, wherein the polymer compositions comprise a plurality of monomersand wherein at least one monomer comprises a radical precursor bonded to a structural precursor. Further, methods of forming dielectric materials from polymer compositions are presented. The figure shows the chemical structure for a methyl/t-butyl Low organic Content/Low Organic Siloxane Polymer.
摘要翻译：本文描述的低电介质材料除了超极子纳米孔之外还包含多个孔或纳米孔。进一步考虑到，本文所述的低电介质材料将具有小于约3的介电常数。介电材料来自聚合物组合物，其中聚合物组合物包含多种单体，并且其中至少一种单体包含基团前体键合结构前体。此外，提出了从聚合物组合物形成电介质材料的方法。该图显示了甲基/叔丁基低有机含量/低有机硅氧烷聚合物的化学结构。

7. 发明申请

WO2012177803A1 SELF - STERILIZING CATHETER WITH TITANIUM DIOXIDE PHOTOCATALYST THIN FILM UPON UV RADIATION 审中-公开
标题翻译：自动灭菌导管与二氧化钛光催化剂薄膜紫外线辐射
公开(公告)号：WO2012177803A1
公开(公告)日：2012-12-27
申请号：PCT/US2012/043403
申请日：2012-06-20
申请人： SRI INTERNATIONAL , THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY , BEDWELL, William , MORO, Lorenza , ARONS, Eric A. , GARCIA, Pablo E. , ONUGHA, Osita , DUTTA, Sanjeev , YOUNG, Sarah , SHAKESPEAR, Karen F. , HAAGENSEN, Janus A.J.
发明人： BEDWELL, William , MORO, Lorenza , ARONS, Eric A. , GARCIA, Pablo E. , ONUGHA, Osita , DUTTA, Sanjeev , YOUNG, Sarah , SHAKESPEAR, Karen F. , HAAGENSEN, Janus A.J.
IPC分类号： A61L29/10 , A61L29/14 , A61L2/10 , A61M25/00 , A61L2/00
CPC分类号： A61L29/106 , A61L2/0047 , A61L29/14 , A61L2202/24 , A61M25/0017 , A61M25/0045 , A61M25/005 , A61M2025/0056
摘要： An implantable catheter is provided that may be disinfected without removal from the body of a patient, using a photocatalytic method to activate a reaction on the catheter surface that generates oxidizing agents in the form of Reactive Oxygen Species ("ROS") and thus destroy microorganisms in a biofilm that is present or forming. A catheter system includes the implantable catheter, a light source, and a source of power operably connected to the light source. Methods are also provided for disinfecting the implantable catheter in vivo.
摘要翻译：提供可植入的导管，其可以在不从患者身体移除的情况下使用光催化方法进行消毒，以激活导致表面上产生以活性氧物质（“ROS”）形式的氧化剂的反应，从而破坏微生物在存在或形成的生物膜中。导管系统包括可植入导管，光源和可操作地连接到光源的电源。还提供了用于在体内消毒可植入导管的方法。

8. 发明公开

EP1535290A1 NANOPOROUS MATERIALS AND METHODS OF FORMATION THEREOF 审中-公开
标题翻译： NANOPORRÖSE材料及其制备方法
公开(公告)号：EP1535290A1
公开(公告)日：2005-06-01
申请号：EP02761416.3
申请日：2002-08-15
申请人： Honeywell International Inc.
发明人： HACKER, Nigel , LEFFERT, Scott , FIGGE, Lisa , SPEAR, Richard , BEDWELL, William , RAMOS, Teresa
IPC分类号： H01B3/02 , H01B3/30 , H01B3/46 , B32B3/26 , C08G65/00 , C08G77/04
CPC分类号： H01L21/02126 , C08G77/12 , C08G77/20 , H01B3/46 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/31695
摘要： Low dielectric materials are described herein that comprise a plurality of pores or nanopores in addition to the ultrananopores. It is further contemplated that the low dielectric materials described herein will have a dielectric constant of less than about 3. The dielectric materials are fromed from polymer compositions, wherein the polymer compositions comprise a plurality of monomersand wherein at least one monomer comprises a radical precursor bonded to a structural precursor. Further, methods of forming dielectric materials from polymer compositions are presented. The figure shows the chemical structure for a methyl/t-butyl Low organic Content/Low Organic Siloxane Polymer.

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