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1. 发明专利

DE3644160A1 未知
公开(公告)号：DE3644160A1
公开(公告)日：1988-07-14
申请号：DE3644160
申请日：1986-12-23
申请人： HOECHST AG
发明人： PAWLOWSKI GEORG DIPL CHEM DR , LEHMANN PETER DIPL CHEM DR
IPC分类号： G03F7/021 , G03F7/095 , G03F7/08 , G03F7/16
摘要： Light-sensitive registration material with a layer base and a light-sensitive layer which essentially contains a diazonium salt polycondensation product, a water-insoluble polymeric binder which is soluble in organic solvents and is soluble, or at least swellable, in aqueous alkaline solutions, a polymerisation initiator which forms radicals on exposure to actinic radiation and a polymerisable, ethylenically unsaturated compound containing at least one unsaturated group and having a boiling point above 100 DEG C at normal pressure, characterised in that the registration material contains, between the light-sensitive layer and the layer base, a light-sensitive intermediate layer which essentially contains a diazonium salt polycondensation product and a water-insoluble polymeric binder which is soluble in organic solvents and is soluble, or at least swellable, in aqueous alkaline solvents.

2. 发明专利

DE3404366A1 未知
公开(公告)号：DE3404366A1
公开(公告)日：1985-08-14
申请号：DE3404366
申请日：1984-02-08
申请人： HOECHST AG
发明人： PAWLOWSKI GEORG DIPL CHEM DR
IPC分类号： G03F7/016 , G03F7/021 , G03F7/032 , G03F7/038 , G03F7/08 , G03C1/54
摘要： Disclosed is a photosensitive composition which comprises a diazonium salt polycondensation product and, as the binder, a reaction product of an intramolecular anhydride of an organic polycarboxylic acid with a polymer containing hydroxyl groups, which does not contain any further functional groups which are capable of reaction with acid anhydrides. The composition is suitable for use in the production of printing plates and photoresists. It can be developed with neutral or alkaline aqueous solutions and yields printing plates having a good ink receptivity and producing large print runs.

3. 发明专利

DE3930086A1 未知
公开(公告)号：DE3930086A1
公开(公告)日：1991-03-21
申请号：DE3930086
申请日：1989-09-09
申请人： HOECHST AG
发明人： PAWLOWSKI GEORG DIPL CHEM DR , MERREM HANS-JOACHIM DIPL CHEM , LINGNAU JUERGEN DIPL CHEM DR , DAMMEL RALPH DIPL CHEM DR , ROESCHERT HORST DIPL CHEM DR
IPC分类号： G03F7/039 , G03F7/004 , G03F7/016 , G03F7/075 , H01L21/027 , H01L21/30
摘要： A positive-working radiation-sensitive mixture is described which contains, as essential constituents, a) an alpha , alpha -bis(sulphonyl)diazomethane which forms a strong acid on irradiation and has the general formula where R is an optionally substituted alkyl, cycloalkyl, aryl or heteroaryl radical, b) a compound containing at least one acid-cleavable C-O-C or C-O-Si bond, and c) a water-insoluble binder which is soluble, or at least swellable, in aqueous alkaline solutions. The radiation-sensitive mixture according to the invention is remarkable for a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and does not form any corrosive photolysis products on exposure.

4. 发明专利

DE3644162A1 未知
公开(公告)号：DE3644162A1
公开(公告)日：1988-07-07
申请号：DE3644162
申请日：1986-12-23
申请人： HOECHST AG
发明人： PAWLOWSKI GEORG DIPL CHEM DR
IPC分类号： C08L29/14 , C08F2/44 , C08F2/48 , C08F8/28 , C08F16/38 , C08F216/38 , G03C1/00 , G03F7/00 , G03F7/012 , G03F7/021 , G03F7/023 , G03F7/032 , G03F7/033 , G03C1/71 , G03F7/02 , G03F7/10 , G03F7/08
摘要： The polyvinyl acetal contains from 4 to 40 mol-% of vinyl alcohol units, from 1 to 20 mol-% of vinyl acetate units, from 0 to 85 mol-% of vinyl acetal units derived from an aldehyde containing no OH groups, and from 1 to 85 mol-% of vinyl acetal units derived from an aldehyde containing OH groups. The polymer is suitable as a binder for light-sensitive mixtures, in particular for the production of printing plates and photoresists. The coatings obtained using the polymer can be developed using neutral or slightly alkaline, purely aqueous solutions and give printing plates which are suitable for long print runs and have good ink acceptance.

5. 发明专利

DE3615612A1 未知
公开(公告)号：DE3615612A1
公开(公告)日：1987-11-12
申请号：DE3615612
申请日：1986-05-09
申请人： HOECHST AG
发明人： PAWLOWSKI GEORG DIPL CHEM DR , KLEINER HANS-JERG DIPL ING DR , GERDAU THOMAS DIPL CHEM DR
IPC分类号： C08F2/48 , G03F7/021 , G03F7/038 , G03F7/09 , G03F7/10 , G03F7/08 , G03C1/72 , C08L29/04 , C08L29/06 , C08L33/14 , C08L63/00 , C08L67/00 , C08L77/00 , C08L75/04 , C08K5/22
摘要： A photosensitive mixture that contains a photosensitive compound, for example, a photoinitiator or a diazo compound, and a reaction product of a polymer containing active hydrogen with an olefinically unsaturated compound represented by the formula (I) wherein X and Y are the same or different and denote oxygen or sulfur, R1 is an olefinically unsaturated aliphatic radical containing 2 to 8 carbon atoms and R2 is a saturated aliphatic radical containing 1 to 8 carbon atoms or an aryl radical containing 6 to 10 carbon atoms, is suitable for producing photoresists and printing plates.

6. 发明专利

DE4014648A1 未知
公开(公告)号：DE4014648A1
公开(公告)日：1991-11-14
申请号：DE4014648
申请日：1990-05-08
申请人： HOECHST AG
发明人： ROESCHERT HORST DIPL CHEM DR , PAWLOWSKI GEORG DIPL CHEM DR , MERREM HANS-JOACHIM DIPL CHEM , DAMMEL RALPH DIPL CHEM DR , SPIESS WALTER DIPL PHYS DR
IPC分类号： G03F7/004 , G03F7/016 , G03F7/039 , H01L21/027
摘要： A description is given of a positive-working radiation-sensitive mixture essentially containing a photoactive component and a water-insoluble binder which is soluble, or at least swellable, in aqueous alkali solution. The mixture is characterised in that the photoactive component used is a compound containing alpha -diazo- beta -keto ester and sulphonic acid ester units of the general formula I … … where …… R and R are, independently of one another, an aliphatic, cycloaliphatic, araliphatic or aromatic radical containing 4 to 20 carbon atoms, in which individual CH2 groups may be replaced by oxygen or sulphur atoms or by -NR - or -NH- groups and/or contain keto groups, … X is an aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical containing 2 to 22 carbon atoms, in which individual CH2 groups may be replaced by oxygen or sulphur atoms or by the groups -NR -, -C(O)-O-, -C(O)-NR -, … … -NR -C(O)-NR -, -O-C(O)-NR -, … … -O-C(O)-O- or CH- groups by … … where … R and R are, independently of one another, hydrogen or an aliphatic, carbocyclic or araliphatic radical, … m is an integer from 3 to 8 and … n is an integer from 1 to 3. …… The radiation-sensitive mixture is particularly suitable for exposure with radiation of a wavelength of 190 to 300 nm.

7. 发明专利

DE3807378A1 未知
公开(公告)号：DE3807378A1
公开(公告)日：1989-09-21
申请号：DE3807378
申请日：1988-03-07
申请人： HOECHST AG
发明人： PAWLOWSKI GEORG DIPL CHEM DR , ERDMANN FRITZ DIPL CHEM DR , LUTZ HEIDRUN
IPC分类号： G03F7/031 , C07D251/24 , C08F2/50 , G03C1/72 , G03F7/004 , G03F7/027 , G03F7/029
摘要： Compounds of general formula (I) are disclosed in which R1 and R2 are different from one another and denote either a hydrogen atom or a radical of the formula R3 denotes a substituted or unsubstituted alkoxy, alkenyloxy, alkynyloxy or aryloxy radical, a hydroxyl group or a halogen atom and n the number 0 or 1. The compounds are useful intermediates for the preparation of photoinitiators and are themselves active as photoinitiators.

8. 发明专利

DE3644163A1 未知
公开(公告)号：DE3644163A1
公开(公告)日：1988-07-07
申请号：DE3644163
申请日：1986-12-23
申请人： HOECHST AG
发明人： PAWLOWSKI GEORG DIPL CHEM DR , HULTZSCH GUENTER DIPL CHEM DR , MACK GERHARD DIPL CHEM DR
IPC分类号： G03F7/021 , G03F7/08
摘要： A photosensitive composition is described, which contains a diazonium salt polycondensation product and a polymeric binder which is soluble or at least swellable in aqueous-alkaline solutions and comprises a reaction product of a trimellitic anhydride, the free carboxyl group of which is esterified with an alcohol containing a urethane group, with a polymer containing hydroxyl groups and having no further functional groups capable of reaction with acid anhydrides. The composition yields an increased print run and has, at the same time, good storability and developability.

9. 发明专利

DE3528309A1 未知
公开(公告)号：DE3528309A1
公开(公告)日：1987-02-12
申请号：DE3528309
申请日：1985-08-07
申请人： HOECHST AG
发明人： MACK GERHARD DIPL CHEM DR , PAWLOWSKI GEORG DIPL CHEM DR
IPC分类号： G03F7/016 , G03F7/095 , G03C1/72 , G03F7/00

10. 发明专利

DE3930087A1 未知
公开(公告)号：DE3930087A1
公开(公告)日：1991-03-14
申请号：DE3930087
申请日：1989-09-09
申请人： HOECHST AG
发明人： PAWLOWSKI GEORG DIPL CHEM DR , MERREM HANS-JOACHIM DIPL CHEM , LINGNAU JUERGEN DIPL CHEM DR , DAMMEL RALPH DIPL CHEM DR , ROESCHERT HORST DIPL CHEM DR
IPC分类号： G03F7/039 , G03F7/004 , G03F7/016 , G03F7/075 , H01L21/027 , H01L21/30
摘要： A positive-working radiation-sensitive mixture is described which contains, as essential constituents, a) an alpha -carbonyl- alpha -sulphonyldiazomethane which forms a strong acid on irradiation and has the general formula where R and R are, independently of one another, an optionally substituted alkyl, cycloalkyl, aryl or heteroaryl radical, b) a compound containing at least one acid-cleavable C-O-C or C-O-Si bond, and c) a water-insoluble binder which is soluble, or at least swellable, in aqueous alkaline solutions. The radiation-sensitive mixture according to the invention is remarkable for a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and does not form any corrosive photolysis products on exposure.

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