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1. 发明专利

JPH0473989A PERIODIC MAGNETIC FIELD GENERATOR 失效
公开(公告)号：JPH0473989A
公开(公告)日：1992-03-09
申请号：JP18751290
申请日：1990-07-16
申请人： HITACHI METALS LTD , JAPAN ATOMIC ENERGY RES INST
发明人： KURIYAMA YOSHIHIKO , SAKAMOTO KEIJI , MAEHARA SUNAO , KISHIMOTO YASUAKI
IPC分类号： G21K1/093 , H01S3/30 , H05H7/04
摘要： PURPOSE:To prevent diffusion of an electron beam and to improve a converging function by so forming a distance between poles opposed to a magnetic gap as to be larger in the vicinity of an inlet than that at an intermediate part and gradually reduced along an electron beam propagating direction. CONSTITUTION:A distance l between N-and S-poles opposed to a magnetic gap 2 of permanent magnets l is so formed as to be larger in the vicinity of an inlet than a distance L at an intermediate part and gradually reduced along the propagating direction of an electron beam 3. An envelope for connecting the maximum values of air gap magnetic flux densities near the inlet is formed to be a cosine curve.

2. 发明专利

JPH04230899A GENERATION OF PERIODIC MAGNETIC FIELD 失效
公开(公告)号：JPH04230899A
公开(公告)日：1992-08-19
申请号：JP12169891
申请日：1991-05-28
申请人： HITACHI METALS LTD , JAPAN ATOMIC ENERGY RES INST
发明人： KURIYAMA YOSHIHIKO , SAKAMOTO KEIJI , MAEHARA SUNAO , KISHIMOTO YASUAKI
IPC分类号： G21K1/093 , H01S3/30 , H05H7/04
摘要： PURPOSE:To offer a generating device of a periodic magnetic field with improved focusing function by preventing diffusion of electron beam. CONSTITUTION:A region is formed so as to make the region exist, where distance between magnetic poles facing to magnetic gap, is decreasing along with departing gradually and rectangularly to flow direction of electron beam and a center line of magnetic poles of a permanent magnet, from a center of the electron beam. When a center axis of the electron beam is a z axis, a center line of NS magnetic poles crossing the z axis orthogonally, is a y axis, and an axis orthogonally crossing the z and the y axes, is an x axis, the outline of the magnetic pole face of the permanent magnet is formed by a curve expressed by following equations: cosh(Kw./sq. rt. 2).sinh(Kw.y/sq. rt. 2)=Co (eq. 1) where, Kw=2pi/lambdaw and lambdaw is the wiggler period Co=sinh(Kw.yo/sq. rt. 2) (eq. 2) where, y0 is the distance to the magnetic pole face on the y axis, at x=0.

3. 发明专利

DE10216865A1 未知
公开(公告)号：DE10216865A1
公开(公告)日：2002-12-12
申请号：DE10216865
申请日：2002-04-16
申请人： HITACHI METALS LTD
发明人： KURIYAMA YOSHIHIKO , USHIJIMA MAKOTO , AZUMA YASUYUKI
IPC分类号： H01L21/68 , C21D1/04 , H05B6/22 , H05B6/00
摘要： A heat-treating furnace with a magnetic field comprising (a) a magnetic field-generating means constituted by an outer, ring-shaped, permanent magnet assembly comprising a plurality of permanent magnet segments combined with their magnetization directions oriented such that a magnetic flux flows in a diameter direction, and an inner, ring-shaped, permanent magnet assembly disposed inside the outer, ring-shaped, permanent magnet assembly and comprising a plurality of permanent magnet segments combined with their magnetization directions oriented such that a magnetic flux flows in a diameter direction; and (b) a heat treatment means disposed in a center hole of the inner, ring-shaped, permanent magnet assembly and comprising a cooling means, a heating means, and a heat-treating container containing heat-treating holder for holding a plurality of articles to be heat-treated in this order from outside, wherein an axial center of a magnetic field generated by the inner and outer ring-shaped, permanent magnet assemblies is substantially identical with an axial center of an article assembly in the heat-treating container.

4. 发明专利

DE10306030A1 未知
公开(公告)号：DE10306030A1
公开(公告)日：2003-10-02
申请号：DE10306030
申请日：2003-02-13
申请人： HITACHI LTD , HITACHI METALS LTD
发明人： KOMURO MATAHIRO , KITAMURA MASASHI , ITOU MOTOYA , KURIYAMA YOSHIHIKO
IPC分类号： H01F1/08 , H01F7/02 , H01F13/00 , H01F41/02 , H02K1/27 , H02K15/03 , H02K1/12

5. 发明专利

DE112012001988T5 Racetrack-förmige Magnetfeld-erzeugende Vorrichtung für Magnetron-Sputtern 未知
公开(公告)号：DE112012001988T5
公开(公告)日：2014-02-20
申请号：DE112012001988
申请日：2012-05-28
申请人： HITACHI METALS LTD
发明人： KURIYAMA YOSHIHIKO
IPC分类号： C23C14/35
摘要： Eine Racetrack-förmige Magnetfeld-erzeugende Vorrichtung für Magnetron-Sputtern, mit einem linearen Abschnitt und Kurvenabschnitten, beinhaltet ein zentrales Magnetpol-Element; ein peripheres Magnetpol-Element; Mehrzahlen von zwischen dem zentralen Magnetpol-Element und dem peripheren Magnetpol-Element so angeordneten Permanentmagneten, dass ihre Magnetpole in eine Richtung ausgerichtet sind; und ein diese halterndes nicht-magnetisches Basiselement, wobei wenigstens in dem linearen Abschnitt angeordnete Permanentmagnete derart geneigt sind, dass ihre Oberflächen an der Seite des zentralen Magnetpol-Elements tiefer liegen, und ihre äußeren Magnetpoloberflächen in unteren Bereichen nicht in Kontakt mit dem peripheren Magnetpol-Element stehen; wobei der Abstand zwischen dem zentralen Magnetpol-Element und dem Target derselbe ist wie der Abstand zwischen dem peripheren Magnetpol-Element und dem Target, so dass an der Target-Oberfläche ein gleichförmiges Magnetfeld erzeugt wird.

6. 发明专利

DE112014000416T5 Magnetfeld-erzeugende Vorrichtung für Magnetron Sputtern 未知
公开(公告)号：DE112014000416T5
公开(公告)日：2015-10-15
申请号：DE112014000416
申请日：2014-01-23
申请人： HITACHI METALS LTD
发明人： KURIYAMA YOSHIHIKO
IPC分类号： C23C14/35
摘要： Eine Racetrack-förmige Magnetfeld-erzeugende Vorrichtung zum Magnetron-Sputtern beinhaltet einen geraden Abschnitt und Kurvenabschnitte, wobei auf einer nicht-magnetischen Basis (a) ein gerades zentrales Magnetpol-Element; (b) ein peripheres Magnetpol-Element, welches das zentrale Magnetpol-Element umgibt; (c) mehrere vertikale Permanentmagnet derart zwischen dem zentralen Magnetpol-Element und dem peripheren Magnetpol-Element angeordnet sind, dass sie in einer Richtung senkrecht zur Target-Oberfläche magnetisiert sind; und (d) mehrere erste und zweite horizontale Permanentmagnete zu beiden Seiten davon angeordnet sind, die in der Richtung parallel zur Target-Oberfläche magnetisiert sind; wobei die Magnetpole der ersten und zweiten horizontalen Permanentmagnete, die den vertikalen Permanentmagneten gegenüberliegen, dieselbe Polarität haben wie die der der Target-Oberfläche gegenüberliegenden vertikalen Permanentmagnete.

7. 发明公开

EP2669403A4 MAGNETIC FIELD GENERATION DEVICE FOR MAGNETRON SPUTTERING 有权
标题翻译：磁场发生装置磁控管喷涂
公开(公告)号：EP2669403A4
公开(公告)日：2015-05-20
申请号：EP12738968
申请日：2012-01-12
申请人： HITACHI METALS LTD
发明人： KURIYAMA YOSHIHIKO , MITA MASAHIRO
IPC分类号： C23C14/35 , H01J37/34 , H05H1/46
CPC分类号： C23C14/351 , C23C14/35 , H01J37/3405 , H01J37/3408 , H01J37/345 , H01J37/3452 , H01J37/3461

8. 发明专利

JP2009127109A Magnetron sputtering device 有权
标题翻译： MAGNETRON喷射装置
公开(公告)号：JP2009127109A
公开(公告)日：2009-06-11
申请号：JP2007305514
申请日：2007-11-27
申请人： Hitachi Metals Ltd , Neomax Kiko Co Ltd , Neomax機工株式会社 , 日立金属株式会社
发明人： KURIYAMA YOSHIHIKO
IPC分类号： C23C14/35 , C23C14/34 , H01L21/285
摘要： PROBLEM TO BE SOLVED: To provide a magnetron sputtering device which is inexpensive compared with the conventional one, and also, can improve the productivity of a thin film.
SOLUTION: The magnetron sputtering device is provided with: a vacuum vessel 2; a pair of targets 4a, 4b installed so as to face each other at the inside thereof; a magnet unit 3 generating tunnel-shaped stray magnetic field along the surface of each target; an electric field generating means 5 for generating an electric field in a direction orthogonal to the magnetic field; and a pair of substrates 6a on which thin films are formed by a lace track-shaped plasma generated by the magnetic field and electric field. The magnet unit 3 has a straight line part and corners on both the sides thereof. At least the straight line part has: a central yoke 31 composed of a ferromagnetic substance; an outer circumferential yoke 32 surrounding the central yoke 31; and a permanent magnet 34 installed between the central yoke 31 and the outer circumferential yoke 32, and magnetized in such a manner that, to the central yoke, a magnetic pole having a polarity same as that of the same turns.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种与常规方法相比便宜的磁控溅射装置，并且还可以提高薄膜的生产率。解决方案：磁控溅射装置设有：真空容器2; 一对在其内部彼此相对地安装的目标4a，4b; 磁体单元3沿着每个目标表面产生隧道状杂散磁场; 用于在与磁场正交的方向上产生电场的电场产生装置5; 以及通过由磁场和电场产生的花边轨道状等离子体形成薄膜的一对基板6a。磁体单元3具有直线部分和两侧的角部。至少直线部具有：由铁磁性物质构成的中心轭31; 围绕中心磁轭31的外周磁轭32; 以及安装在中心磁轭31和外周磁轭32之间的永久磁铁34，并以这样一种方式被磁化，使得对于中心磁轭，具有与相同磁极相同极性的磁极。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2008156735A Magnetic circuit for magnetron sputtering 有权
标题翻译：用于MAGNETRON SPUTTERING的磁电路
公开(公告)号：JP2008156735A
公开(公告)日：2008-07-10
申请号：JP2006349496
申请日：2006-12-26
申请人： Hitachi Metals Ltd , Neomax Kiko Co Ltd , Neomax機工株式会社 , 日立金属株式会社
发明人： KURIYAMA YOSHIHIKO
IPC分类号： C23C14/35
摘要： PROBLEM TO BE SOLVED: To provide a magnetic circuit for a magnetron sputtering system which is low-cost, compact and lightweight compared with the conventional one.
SOLUTION: The magnetic circuit for magnetron sputtering comprises: a base 2 made of a nonmagnetic substance; a rectangular central magnetic pole piece 3 installed in the surface thereof; a rectangular outer circumferential magnetic pole piece 4 provided therearound; a plurality of permanent magnets 5a, 5b for straight line parts connectedly provided along the longitudinal direction in a rectangular space between the central magnetic pole piece 3 and the outer circumferential magnetic pole piece 4; and a plurality of permanent magnets 6a, 6b for corner parts installed in a circular space between the central magnetic pole piece 3 and the outer circumferential magnetic pole piece 4. The permanent magnets 5a, 5b for straight line parts and the permanent magnets 6a, 6b for corner parts are arranged so as to be magnetized in the horizontal direction, and also in such a manner that their magnetic pole with the same porosity faces that of the central magnetic pole piece 3, and further, the central magnetic pole piece 3 and the outer circumferential magnetic pole piece are higher than the permanent magnets 5a, 5b for straight line parts and the permanent magnets 6a, 6b for corner parts.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种磁控溅射系统的磁路，该磁控溅射系统与传统的磁控溅射系统相比，成本低，体积小，重量轻。解决方案：磁控溅射用磁路包括：由非磁性物质制成的基体2; 安装在其表面上的矩形中心磁极片3; 设置在其周围的矩形外周磁极片4; 在中心磁极片3和外周磁极片4之间的矩形空间中沿着纵向方向连接设置的多个用于直线部分的永磁体5a，5b; 以及安装在中央磁极片3和外周磁极片4之间的圆形空间中的角部的多个永久磁铁6a，6b。用于直线部分的永磁体5a，5b和永磁体6a，6b 角部分布置为在水平方向上被磁化，并且还以这样的方式使得具有相同孔隙率的磁极与中心磁极片3相同的磁极，以及中心磁极片3和外周磁极片高于用于直线部分的永磁体5a，5b和用于角部的永磁体6a，6b。版权所有（C）2008，JPO＆INPIT

10. 发明专利

JP2003171765A FILM DEPOSITION APPARATUS 审中-公开
公开(公告)号：JP2003171765A
公开(公告)日：2003-06-20
申请号：JP2001373748
申请日：2001-12-07
申请人： HITACHI METALS LTD
发明人： KURIYAMA YOSHIHIKO , USHIJIMA MAKOTO
IPC分类号： B01J19/08 , C23C14/58 , C23C16/56 , G11B5/39 , H01F41/02 , H01L43/12
摘要： PROBLEM TO BE SOLVED: To perform the heat treatment in the magnetic field in a same vessel after the deposition of a magnetic thin film by continuously providing a high magnetic field applying means on a film deposition apparatus. SOLUTION: A plurality of permanent magnets with at least two kinds of magnetizing directions are magnetized at the required position and in the required direction, and two ring-like magnetic circuits are disposed in a concentric manner to constitute a magnetic field applying means to generate the parallel magnetic field capable of adjusting the magnetic field. This magnetic field applying means has a ring shape which surrounds a substrate in a center cavity part, and is installed in a reaction vessel. A similar magnetic field applying means is disposed outside the vessel to adjust the parallel magnetic field generated in the center cavity part. COPYRIGHT: (C)2003,JPO

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