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    • 2. 发明专利
    • METHOD AND DEVICE FOR SHAPE AND DIMENSION MEASUREMENT
    • JPH04105010A
    • 1992-04-07
    • JP22250990
    • 1990-08-27
    • HITACHI LTDHITACHI MAXELL
    • KATO KEIZOMATSUOKA GENYANAKAYAMA YOSHINORIHORIGOME SHINKICHIFURUYA HISAHIRO
    • G01B15/00H01J37/244H01J37/28
    • PURPOSE:To provide accurate measurability for the pattern shape dimension of the specimen surface by irradiating specimen with an electron beam, sensing secondary electrons emitted, determining the inclination angle of the specimen surface, and calculating and displaying the section shape. CONSTITUTION:An electron beam generated by an electron gun 11 when a low acceleration voltage is impressed, is passed through a deflector 14 and a lens system 13 and cast onto a pattern to be measured on a specimen wafer 12 placed on a specimen table 15, and there scanning is made. Signals from a secondary electron sensor 16 (16a, 16b) are added and averaged by a signal processing circuit 21 according to the set number of deflection scanning passes. An inclination angle converter 22 determines the inclination angle of projections and recesses on the surface of specimen from these signals added and averaged by the circuit 21, while a shape calculating device 23 determines the z-coordinates of the depth in the scanning direction (x) from the correlationship before and after the inclination angle. At a shape dimension measuring device 24, on the other hand, the x-coordinate of the deflection signal given by a deflection control circuit 25 and the z-coordinate determined by the shape calculating device 23 are fed to a display device, where the section shape of the specimen surface is displayed figuratively, and the shape dimensions are measured.
    • 5. 发明专利
    • PRODUCTION OF OPTICAL MASTER DISK
    • JPH09245383A
    • 1997-09-19
    • JP5133396
    • 1996-03-08
    • HITACHI LTDHITACHI MAXELL
    • KATO KEIZOUENO TAKUMIANDO TETSUO
    • G11B7/26
    • PROBLEM TO BE SOLVED: To form groove pits which are stable to a fluctuation in film thicknesses and are made finer by forming a photoresist film and a color fadable film on the surface of a glass substrate and exposing pit patterns thereto. SOLUTION: The photoresist film 2 is applied on the surface of the flat glass substrate 1 polished with high accuracy and is subjected to a heat treatment. The color fadable film 3 is further applied thereon after cooling and a heat-treated. The concentrical pit patterns are then exposed thereon by an optical disk exposure device. The exposure is executed by condensing the collimating beams 5 on an Ar laser beam to a condenser lens 4 and irradiating the color fadable film 3 and the photoresist film 2 with a laser spot. The color fadable film 3 induces photoreaction only in the irradiated parts, thereby forming color fading 6 and allowing the transmission of the beams. At this time, the film thickness D of the color fadable film 3 and the photoresist film 2 is formed within the range of the equation when the wavelength of the laser beam 5 is defined as λ and the numerical aperture of the condenser lens 4 as NA. The laser spot transmitted through the film forms a latent image 7 on the photoresist film 2 and forms rugged pits 8 after the development. As a result, the groove pits which are stable to the fluctuation in the film thickness and are made finer are formed.
    • 7. 发明专利
    • INFORMATION RECORDING MASTER DISK
    • JPS63281239A
    • 1988-11-17
    • JP11469287
    • 1987-05-13
    • HITACHI LTDHITACHI MAXELL
    • KATO KEIZOHORIGOME SHINKICHIOKAMOTO KAZUHISA
    • G11B7/26G11B7/24
    • PURPOSE:To enable formation of pits and guide grooves by a photopolymer method or photocast method, etc., even to an opaque substrate consisting of metals, etc., by adopting an information recording master disk having UV transmittivity. CONSTITUTION:The information recording master disk 6 is formed of a material which allows transmission of UV rays. Namely, a UV curing resin 7 is formed on the information recording master disk 6 and further, the metallic substrate 8 consisting of Al, Cu, Fe, ceramics, etc., is formed on the same, then the UV rays 9 are projected thereon from the information recording master disk 6 side. The information recording master disk 6 is, for example, a quartz glass substrate and, therefore, allows the transmission of the UV rays 9. The UV curing resin 7 irradiated with the UV rays 9 is cured and the pits and guide grooves 6 of the information recording master disk 6 are formed at this time; in addition, the master disk is adhered to the substrate 8. Ruggedness such as pits and guide grooves can be thereby formed to a replica disk formed by using the opaque substrate and the replica disk having high resistance to breakage is obtd.
    • 9. 发明专利
    • INFORMATION RECORDING MEDIUM
    • JPS63308745A
    • 1988-12-16
    • JP14317187
    • 1987-06-10
    • HITACHI LTDHITACHI MAXELL
    • KATO KEIZOKIRINO FUMIYOSHIHORIGOME SHINKICHIOKAMOTO KAZUHISA
    • G11B7/26
    • PURPOSE:To decrease surface roughness and to obtain an information recording medium having high reliability by forming guide grooves and pits respectively independently, thereby forming the guide grooves and pits having arbitrary depths. CONSTITUTION:A dielectric film 2 is formed on a polished glass substrate 1 and a photoresist film 3 having 1,000-2,000Angstrom thickness is formed thereon. The dielectric film 2 consists of SiO, ZnS, etc. The exposed parts of the photoresist film 3 are removed by development by which the guide grooves 4 are formed. The recording master disk formed with the guide grooves 4 is etched under a high-frequency discharge in a vacuum where gaseous Ar is present in an etching deice. The dielectric film 2 corresponding to the parts of the guide grooves 4 where the photoresist film 3 is removed is etched to obtain the guide grooves 5. A photoresist film 7 is freshly formed after the removal of the photoresist film 3 and the guide grooves 5 are reproduced. Exposure for the additional recording of the pits is executed and the resist film 7 of the exposed parts is removed by the development to form the pits 6. The additional recording maser disk subjected to the etching is subjected to the treatments similar to the treatment at the time of forming the guide grooves to form the pits 8 in the dielectric film 2; thereafter, the resist film 7 is removed.