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1. 发明专利

DE10012848A1 Particle induced X-ray emission analysis apparatus comprises nuclear fusion apparatus, charged particle line, and analysis unit 未知
公开(公告)号：DE10012848A1
公开(公告)日：2001-04-05
申请号：DE10012848
申请日：2000-03-16
申请人： HITACHI LTD
发明人： HONDA TAKURO , TAKEUCHI KAZUHIRO , OKAZAKI TAKASHI
IPC分类号： G01N23/225 , G21K5/04 , G01N23/223 , G21G1/00
摘要： An analysis apparatus comprises a nuclear fusion apparatus (101) with electrostatic inertia which produces charged particles by a nuclear fusion reaction, a charged particle line and an irradiation unit for irradiating a sample. The analysis apparatus (106) detects X-rays produced by the sample when it is irradiated with charged particles. Part of the charged particle line is curved.

2. 发明专利

JP2009058528A Radiation inspecting device 审中-公开
标题翻译：辐射检测装置
公开(公告)号：JP2009058528A
公开(公告)日：2009-03-19
申请号：JP2008305840
申请日：2008-12-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： KOJIMA SHINICHI , OKAZAKI TAKASHI , UENO YUICHIRO , UMEGAKI KIKUO , AMAMIYA KENSUKE , TAKEUCHI KAZUHIRO , KITAGUCHI HIROSHI , YOKOI KAZUMA
IPC分类号： G01T1/161 , A61B6/03
CPC分类号： G01N2223/419 , G01N2223/612
摘要： PROBLEM TO BE SOLVED: To provide a radiation inspecting device allowing a user to grasp an accurate arrival position of radiation and capable of improving the precision of an image to be formed. SOLUTION: The radiation inspecting device includes a flat panel detector, which has a plurality of radiation detectors for detecting radiation from an object to be inspected in the directions of height, width, and depth, and signal processors connected with the radiation detectors, respectively, and processing the radiation detection signals detected by the radiation detectors. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种辐射检查装置，其允许用户掌握辐射的准确到达位置并且能够提高要形成的图像的精度。解决方案：辐射检查装置包括平板检测器，其具有多个辐射检测器，用于检测来自被检测物体的高度，宽度和深度方向的辐射，以及与辐射探测器连接的信号处理器并且处理由辐射检测器检测到的放射线检测信号。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2004108912A Detecting apparatus using neutron and its method 审中-公开
公开(公告)号：JP2004108912A
公开(公告)日：2004-04-08
申请号：JP2002271185
申请日：2002-09-18
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TADOKORO TAKAHIRO , KITAGUCHI HIROSHI , TAKEUCHI KAZUHIRO
IPC分类号： G01N23/09
摘要： PROBLEM TO BE SOLVED: To rapidly inspect elements constituting an object to be tested without suppressing generation of neutrons so that the amount of their generation is little, thereby enabling to detect a specific substance or the like. SOLUTION: The detecting apparatus with a neutron generating device 4 which generates neutrons by using a nuclear fusion reaction, generates γ-rays by projecting the neutrons generated in the nuclear fusion reaction onto an object to be tested W, detects the γ-rays by using a γ-ray detector 51, locates the generating position of the γ-rays by detecting α-rays generated simultaneously with the neutrons, and specifies the elements constituting the object to be tested W. In the method, the position and the shape of the object to be tested W are measured before projecting the neutrons, and γ-ray data to be calculated are selected in response to the measured results. COPYRIGHT: (C)2004,JPO

4. 发明专利

JP2002062388A INERTIA ELECTROSTATIC CONTAINMENT NUCLEAR FUSION DEVICE AND RADIOISOTOPE PRODUCTION SYSTEM 失效
公开(公告)号：JP2002062388A
公开(公告)日：2002-02-28
申请号：JP2000250290
申请日：2000-08-21
申请人： HITACHI LTD
发明人： TANAKA MASANOBU , TAKEUCHI KAZUHIRO , KAWAKUBO YUKIO
IPC分类号： G21B1/03 , G21B1/00 , G21G1/06 , G21G1/10 , H01J27/16 , H01J37/08
摘要： PROBLEM TO BE SOLVED: To provide an inertia electrostatic containment device and a radioisotope production device capable of reducing loss of ion beam by controlling the initial velocity of ion beam regardless of extracting voltage of an ion source. SOLUTION: The ion source has a discharge vessel 1a producing plasma and extraction electrodes 4a, 4b and 4c for extracting and accelerating the produced plasma. The ion beam accelerated with the ion source is decelerated immediately before the incidence in an anode 10.

5. 发明专利

JP2001143629A ION SOURCE 失效
公开(公告)号：JP2001143629A
公开(公告)日：2001-05-25
申请号：JP32503699
申请日：1999-11-16
申请人： HITACHI LTD
发明人： TANAKA MASANOBU , AMAMIYA KENSUKE , TAKEUCHI KAZUHIRO , SATO TADASHI
IPC分类号： H01J27/08 , H01J37/08
摘要： PROBLEM TO BE SOLVED: To simplify a structure of a discharging vessel top plate, minimize a plasma loss and enhance an ion production efficiency. SOLUTION: A structure for insulating a discharging vessel top plate 2 from a discharging vessel 1 which is a discharging cathode by an insulating spacer 12, while removing a plasma closing magnet on a discharging vessel top plate 2 having been mounted as a conventional ion source, is provided. Thereby, the structure on the discharging vessel top plate 2 is simplified, a plasma loss on the discharging vessel top plate in the absence of the magnet is minimized and the reduction of an ion production efficiency can be prevented. Further, to set a potential of the discharging vessel top plate 2, a resistor 15 is disposed between the discharging vessel 1 and the discharging the vessel top plate 2 to connect them. Furthermore, according to the present invention, by enhancing the ion production efficiency, the life of a filament can be lengthened by a high current of an ion beam 9 and/or the reduction of a discharging power.

6. 发明专利

JP2001084948A CHARGED PARTICLE BEAM IRRADIATION APPARATUS 失效
公开(公告)号：JP2001084948A
公开(公告)日：2001-03-30
申请号：JP26319299
申请日：1999-09-17
申请人： HITACHI LTD
发明人： TAKEUCHI KAZUHIRO , KAWAKUBO YUKIO , SATO TADASHI
IPC分类号： H01J37/18 , G21K5/04 , H01J37/301
摘要： PROBLEM TO BE SOLVED: To shorten the time for interrupting irradiation with charged particle beam during maintenance of a diaphragm to approximately consecutively continue processing with irradiation with the charged particle beam during the maintenance, by making the diaphragm partitioning between a reactor and an irradiated object movable. SOLUTION: It is preferable to allow to interchange or maintain a diaphragm 3 without opening a charged particle source side to air, by providing a gate valve 8 between the diaphragm 3 and a charged particle source, and a sealing mechanism 7 between the diaphragm 3 and a wall of the device. Electron beam 1 is stopped by turning off a switch of the acceleration voltage of the electron beam 1. Upstream and downstream sides of the diaphragm 3 are then under atmospheric pressure by closing the gate valve 8. The diaphragm 3 is slid by the sealing mechanism 7 and moved, and new diaphragm 3 is placed on an optical path of the electron beam 1. The gate valve 8 is opened and the acceleration voltage of the electron beam 1 is turned on, and new micro aperture 5 is pierced by the electron beam itself to continue operation. The diaphragm 3 moved is maintained by performing filling of the enlarged micro aperture 5 through welding and the like.

7. 发明专利

JPH11329114A FORCED COOLING SUPERCONDUCTIVE CONDUCTOR AND SUPERCONDUCTING COIL USING THE CONDUCTOR 失效
公开(公告)号：JPH11329114A
公开(公告)日：1999-11-30
申请号：JP13630498
申请日：1998-05-19
申请人： HITACHI LTD , JAPAN ATOMIC ENERGY RES INST
发明人： TAKEUCHI KAZUHIRO , OTSUKA MICHIO , ASANO KATSUHIKO , USHIKUSA KENKICHI , TAKAHASHI YOSHIKAZU , KIKUCHI MITSURU
IPC分类号： H01F6/04 , H01B12/16
摘要： PROBLEM TO BE SOLVED: To heighten stability of a forced cooling superconductive conductor, by setting the flow rate of a cooling medium in the twisted wire part parallel to a high-resistance channel part to be larger than the flow rate in the twisted wire part parallel to a low-resistance channel part, therefore by enlarging the amount of heat removed by the cooling medium, in the twisted part where the flow rate of the cooling medium is larger. SOLUTION: In this forced cooling superconductive conductor, perforated holes 4 are formed in the wall surface of a channel 3 to permit replacement of a cooling medium in a conduit 1 containing a twisted wire part 2 and a channel part 3. Although the outside diameter of the channel part 3 is constant over the length of it, the inside diameter of the channel 3 is lessened in the portions where higher stability is required.

8. 发明专利

JPH11297464A ELECTROMAGNETIC MOLTEN FURNACE 失效
公开(公告)号：JPH11297464A
公开(公告)日：1999-10-29
申请号：JP9294898
申请日：1998-04-06
申请人： HITACHI LTD
发明人： ABE MITSUJI , TAKEUCHI KAZUHIRO
IPC分类号： H05B6/06 , F23G5/00 , F27B14/20 , F27D11/06 , H05B6/18
摘要： PROBLEM TO BE SOLVED: To provide stable heating distribution by providing a magnetic measuring system for finding the eddy current intensity distribution and a calorific value by measuring a magnetic sensor around a molten furnace. SOLUTION: The distribution of an eddy current is found from the distribution of magnetic field intensity, a time change in the eddy current in respective places is known by finding the time change in this distribution, and a phase of the eddy current to an input electric current in the respective places can also be known, by comparing the change with an input electric current waveform to a coil. The intensity of the eddy current relates to a quantity of electric conductor, and a delay of the phase depends on electric conductivity of the electric conductor, so that the eddy current/heating distribution and electrical conductivity inside of a furnace can be estimated by knowing intensity and a waveform of the eddy current. The time change in the eddy current in the furnace can be found by making a prescribed calculation on measuring data of time series, and reduction in a heating element in the furnace can be obtained from the result when the eddy current weakens, so that a heating element can be added.

9. 发明专利

JPH0694867A PLASMA SECTION FORM DISPLAY DEVICE 失效
公开(公告)号：JPH0694867A
公开(公告)日：1994-04-08
申请号：JP24166392
申请日：1992-09-10
申请人： HITACHI LTD
发明人： HARA SHIGEMITSU , TAKEUCHI KAZUHIRO , ABE MITSUJI
IPC分类号： G21B1/00
摘要： PURPOSE:To carry out a high speed operation of a plasma section form, and to realize the actual time display, by dividing the contents of a plasma section form operation into an operation of sum of products to find the magnetic flux distribution from the input magnetic signal, and an operation to find the plasma surface coordinates from the magnetic flux distribution, and allocating one processor or more to each operation. CONSTITUTION:A plasma 1 to display the section form is produced in a vacuum container 2, and a signal detected by a magnetic sensor 3 is integrated by an integrator 4, and made into an analog data signal of a poloidal magnetic field. This signal is transferred from a CPU (host) 6 to a DSP 7 through an A/D converter 5. In the DSP 7, the calculation of the magnetic flux distribution of the operation main body of the sum of products is carried out, the magnetic flux distribution data is transferred to a DSP 8 and a DSP 9, and the plasma surface coordinates are operated in parallel. The result of the calculation is written in the image memory on a graphic board 10 through the CPU 6, the plasma section form is displayed on the screen of a CRT 11, and the actual time of the plasma section form can be displayed.

10. 发明专利

JPH0572365A PLASMA POSITION AND SHAPE CONTROLLER OF NUCLEAR FUSION DEVICE 失效
公开(公告)号：JPH0572365A
公开(公告)日：1993-03-26
申请号：JP23331991
申请日：1991-09-12
申请人： HITACHI LTD
发明人： TAKEUCHI KAZUHIRO , ABE MITSUJI , KINOSHITA SHIGEMI
IPC分类号： G21B1/11 , G21B1/00 , G21B1/25
摘要： PURPOSE:To heighten the safety of the device by providing an operation part for evaluating quenching probability and selecting a control method having a small risk of quenching by means of measured data of temperature, electric current and a magnetic field of a superconducting coil. CONSTITUTION:The position and shape of plasma 1 is controlled with a superconducting coil 2. Measured data Tj, Hj, Jj transmitted from coil temperature, electric current and magnetic field meters 16, 17, 18 are sent to a plasma position and shape operation part 3 and a quenching probability operation part 4. An control error deltai between plasma a position-shape and its aimed value is calculated from the operation part 3. Quenching probability Pj is calculated from temperature Tj, a magnetic field Hj and electric current Jj in the operation part 4. The probability Pj and the error deltai are considered, and a control method with a small risk of quenching is selected from an evaluation function of a control system to determine a voltage command value of the coil 2. The voltage Vj is applied to the coil 2 by the use of a power source 6 on the basis of its command value and the plasma position and shape are controlled.

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