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1. 发明专利

JP2007141863A Display 有权
标题翻译：显示
公开(公告)号：JP2007141863A
公开(公告)日：2007-06-07
申请号：JP2007017264
申请日：2007-01-29
申请人： Hitachi Displays Ltd , Hitachi Ltd , 株式会社日立ディスプレイズ , 株式会社日立製作所
发明人： TAKEMOTO KAZUNARI , MATSUZAKI EIJI , MORI YUJI , USHIFUSA NOBUYUKI , MATSUURA HIROYASU
IPC分类号： H05B33/04 , H01L51/50
摘要： PROBLEM TO BE SOLVED: To avoid in a simple structure a deterioration of a characteristics due to an ultraviolet ray irradiation on a display area and a driving circuit area in a display device which is composed of a structure in which a driving circuit area is provided inside a sealed area between a first substrate and a second substrate.
SOLUTION: A cathode membrane CD composing an OLED element of a display area AR in the first substrate SUB1 shields the driving circuit area DR. The ultraviolet rays irradiated from the side of the second substrate SUB2 to harden a sealing agent SL are shielded by the cathode membrane CD and a characteristics deterioration of the display area AR as well as the driving circuit area DR is prevented.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题为了避免在简单的结构中，显示装置中的显示区域和驱动电路区域上的紫外线照射引起的特性劣化，其由以下结构组成：驱动电路区域设置在第一基板和第二基板之间的密封区域内。解决方案：构成第一基板SUB1中的显示区域AR的OLED元件的阴极膜CD屏蔽驱动电路区域DR。从第二基板SUB2侧照射以使密封剂SL硬化的紫外线被阴极膜CD屏蔽，并且防止了显示区域AR的特性劣化以及驱动电路区域DR。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2002149346A TOUCH PANEL AND PICTURE INPUT-TYPE DISPLAY DEVICE 失效
公开(公告)号：JP2002149346A
公开(公告)日：2002-05-24
申请号：JP2000345323
申请日：2000-11-13
申请人： HITACHI LTD , HITACHI DEVICE ENG
发明人： IMAYAMA HIROTAKA , TAKEMOTO KAZUNARI , SAITOU TERUJI
IPC分类号： G02F1/1333 , G06F3/03 , G06F3/033 , G06F3/041 , G06F3/045 , H01H13/70 , H01H13/712
摘要： PROBLEM TO BE SOLVED: To provide a touch panel for preventing the occurrence of Newton ring in an input area, improving visibility and preventing the damage of comfortable operation feeling. SOLUTION: A plurality of columnar spacers 100 which hold facing gaps to prescribed values at time except for a depression input operation, are deformed with the depression input operation of an upper substrate 4A-side and are deformed in such a way that an upper substrate 4A is brought into contact with a lower substrate 4B are arranged in the facing gaps of the input areas AR of the upper substrate 4A and the lower substrate 4B in a touch panel where the upper substrate 4A in which an upper resistance film 11 is formed in the input area on the inner face of a soft film member and the lower substrate 4B in which a lower resistance film 12 is formed in the input area on the inner face of a hard plate are stuck by a sealing area SL circulating the input area AR.

3. 发明专利

JP2001166306A METHOD FOR FORMATION OF ALIGNMENT IN LIQUID CRYSTAL 失效
公开(公告)号：JP2001166306A
公开(公告)日：2001-06-22
申请号：JP34583999
申请日：1999-12-06
申请人： HITACHI LTD
发明人： IMAYAMA HIROTAKA , TAKEMOTO KAZUNARI , IWAMURA RYOJI , MORIMOTO MASATERU , IWATA TOSHIRO
IPC分类号： G02F1/1337
摘要： PROBLEM TO BE SOLVED: To provide a method for the formation of alignment in a liquid crystal in which a cleaning process after the aligning treatment is not required, the management for jigs and tools can be easier and uniform aligning treatment can be performed. SOLUTION: A fluid 100 such as water is controlled to about 60 to 100 deg.C, supplied through a fluid supply nozzle 8 to an alignment film 6 and accelerated with a brush rotator 1 to flow at >=140 m/s flow rate in the direction shown as arrow A on the alignment film 6 on a substrate 5 to generate the distribution of pressure in the direction of arrow A. The substrate 7 with the alignment film is moved in the direction shown as arrow B to align the alignment film 6.

4. 发明专利

JPH11259838A MAGNETIC DISK DEVICE PROVIDED WITH MAGNETIC HEAD 失效
公开(公告)号：JPH11259838A
公开(公告)日：1999-09-24
申请号：JP1403699
申请日：1999-01-22
申请人： HITACHI LTD
发明人： KOKADO YUICHI , FUJIMAKI SHIGEHIKO , MATSUNUMA SATORU , TAKEMOTO KAZUNARI , KITO MAKOTO
IPC分类号： G11B5/60 , G11B5/187 , G11B21/21
摘要： PROBLEM TO BE SOLVED: To prevent a damage on the sliding part of both a head and a magnetic disk and to reduce the change of a friction coefficient at the time of sliding. SOLUTION: This magnetic disk device is provided with a floating magnetic head in which a slider with a magnetic recording and reproducing element floats on the magnetic disk rotating at a high speed. In this case, the magnetic recording and reproducing element is disposed adjacently to the sliding surface of the slider while forming a non-siliding surface and the magnetic head composed by coating the amorphous carbon thin film of Vickers hardness >=1500 Hv containing hydrogen on the sliding surface of the slinder and the magnetic disk in which the carbon thin film of the same quality as the one coated on the slider sliding surface of the magnetic head is coated on the recording medium layer as a protective layer are provided.

5. 发明专利

JPH09191050A WIRING STRUCTURE BODY, ITS MANUFACTURE, AND INTERLAYER INSULATING FILM 失效
公开(公告)号：JPH09191050A
公开(公告)日：1997-07-22
申请号：JP251396
申请日：1996-01-10
申请人： HITACHI LTD
发明人： TANAKA JUN , YOSHIKAWA HARUHIKO , ISODA KEIKO , TAKEMOTO KAZUNARI , KATAOKA FUMIO
IPC分类号： G03F7/027 , C08G73/10 , C08L79/08 , G03F7/038 , H01L21/31 , H01L21/312 , H01L21/768 , H01L23/522 , H05K1/03 , H05K3/00
摘要： PROBLEM TO BE SOLVED: To prevent cracks from developing in an interlayer insulating film, and improve reliability of a wiring structure body, by forming a polyimide film by using polyimide precursor composition containing photosensitive polyim ide precursor obtained by introducing photosensitive groups in high-molecular weight polyamide acid. SOLUTION: Polyamide acid having repeating units is made to react with isocyanate compound having carbon-carbon double bonds in the presence of catalyst, and photosensitive polyimide precursor having repeating units shown by a formula is manufactured. Polyimide precursor composition containing the photosensitive polyimide precursor is heated and cured, and a polyimide film is formed. In the formula, R is a tetravalent organic group containing at least 4 carbons, R is a bivalent organic group containing aromatic ring or silicon, R , R and R are independently selected groups from hydrogen, alkyl group, vinyl group and propenyl group, respectively, and R shows a bivalent organic group.

6. 发明专利

JPH0829986A PATTERN FORMING METHOD 失效
公开(公告)号：JPH0829986A
公开(公告)日：1996-02-02
申请号：JP16137394
申请日：1994-07-13
申请人： HITACHI LTD
发明人： HIRAIWA TOMOKO , TAKEMOTO KAZUNARI , AMATATSU ATSUSHI , SAITO HARUNOBU
IPC分类号： G03F7/037 , C23C14/12 , C23F4/00 , G03F7/038 , G03F7/075 , G03F7/36 , H01L21/027 , H01L21/302 , H01L21/3065
摘要： PURPOSE:To form a thin film pattern at a high accuracy by dry etching using the resist, which has high performance. CONSTITUTION:Sensitive polyimide or sensitive polyamide acid is formed into the film by the vapor phase polymerization, and this vapor phase polymerization film 1 is used as the resist so as to form the accurate pattern of the thin film 2 to be processed, which is provided under the resist. Consequently, since the film is synthesized by the vapor polymerization, generation of damage of the photosensitive group during the forming of film is eliminated so as to show the stabilized photosensitivity. Since this resist has high etching resistance, pattern can be directly formed on an organic film or a carbon film provided under the resist. Accuracy and productivity of the thin film pattern processing can be improved.

7. 发明专利

JPH087227A THIN FILM MAGNETIC HEAD AND ITS PRODUCTION 失效
公开(公告)号：JPH087227A
公开(公告)日：1996-01-12
申请号：JP13476494
申请日：1994-06-17
申请人： HITACHI LTD
发明人： AZUMA KAZUFUMI , TAKEMOTO KAZUNARI , TASAKA KENJI , NAKANO ASAO , SAIKI NORIYUKI , OGATA KIYOSHI
IPC分类号： G11B5/31 , G11B5/255 , G11B5/60
摘要： PURPOSE:To manufacture the thin film magnetic head which realize reduced floating eight and high recording density with high reliability. CONSTITUTION:The magnetic head is manufactured by forming the lower magnetic film 2, gap insulating film 3, coil conductor 4, upper magnetic film 5 and air-supported surface protective film 9, etc., on the slider substrate 1. The protective film 9 comprises at least one first constituent element group consisting of silicon, aluminum, and/or boron and at least one second constituent element and/or compound group consisting of tungsten carbide, boron nitride, aluminum nitride, silicon nitride, aluminum carbide, aluminum oxide, boron carbide, silicon carbide and/or carbon. Also, the protective film 9 is composed of a non-magnetic single-layer inorganic protective film within which the abundance ratio of the first constituent element group decreases in the direction toward the film surface while the abundance ratio of the second constituent element and/or compound group increases in the same direction to concurrently realize the formation of its extremely thin film and the improvement in adhesion between the film and the undercoat and in sliding resistance of the film.

8. 发明专利

JPH07254556A PATTERN FORMING METHOD AND EQUIPMENT THEREFOR 失效
公开(公告)号：JPH07254556A
公开(公告)日：1995-10-03
申请号：JP20846694
申请日：1994-09-01
申请人： HITACHI LTD
发明人： TAKEMOTO KAZUNARI , HIRAIWA TOMOKO , OTSUBO TORU , OSHIDA YOSHITADA
IPC分类号： G03F7/26 , H01L21/027 , H01L21/302 , H01L21/3065
摘要： PURPOSE:To make it possible to perform pattern formation by a full dry integrated process by producing Si radical in non-oxidizing atmosphere under a reduced pressure, by forming a photoresist by recombination and by radiating electromagnetic wave to the photoresist through a mask. CONSTITUTION:Gases are exhausted by vacuum from a reaction chamber 6-3 and a decomposition chamber 6-2, a substrate holder 10 is carried to the reaction chamber 6-3, N2 gas is introduced to a gasification chamber 6-1, a sample boat 11 is filled with a sample 12 containing Si and it is exhausted by vacuum, the sample 12 is heated and gasified in a gasification chamber 6-1, Si-Si bonding is cleavaged by the temperature inside a quartz tube 17 in the decomposition chamber 6-2, it is then recombined in the reaction chamber 6-3 and the photoresist is formed on the substrate. Next, the substrate holder 10 is carried to an exposure and developing chamber, laser light is radiated to a photomask having a predetermined pattern by means of illuminating optical system, and the pattern image of the photomask is transferred to the photoresist.

9. 发明专利

JPH06264267A PATTERN FORMING METHOD 失效
公开(公告)号：JPH06264267A
公开(公告)日：1994-09-20
申请号：JP5078393
申请日：1993-03-11
申请人： HITACHI LTD
发明人： TAKEMOTO KAZUNARI , AMATATSU ATSUSHI , HIRAIWA TOMOKO , SAITO HARUNOBU
IPC分类号： C08G73/10 , C08J7/00 , C23F1/00 , C23F4/00 , G03F7/038 , G03F7/075
摘要： PURPOSE:To form a highly precise pattern by using a resist with the sensitivity improved and capable of forming a film on a substrate having sharp steps in uniform thickness. CONSTITUTION:A resist pattern is formed by vapor-deposition polymerization on a thin film formed on a substrate having sharp steps on its surface to be worked, and the thin film is patterned. In this method, the thin film is formed with a polyimide formed from bis(4-aminophenyl)tetramethyldisilane and an acid dihydride or a polyamic acid. Otherwise, a laminated film obtained by forming a carbon film, a metal thin film and a photosensitive vapor-deposited and polymerized film on a thin film to be worked is patterned, and the vapor- deposited and polymerized film is formed with a polyimdie obtained from bis(4- aminophenyl)tetramethyldisilane and an acid dihydride by vapor-deposition polymerization or a polyamic acid.

10. 发明专利

JPH06131631A PRODUCTION OF THIN-FILM MAGNETIC HEAD 失效
公开(公告)号：JPH06131631A
公开(公告)日：1994-05-13
申请号：JP27697192
申请日：1992-10-15
申请人： HITACHI LTD
发明人： TAKEMOTO KAZUNARI , AMATATSU ATSUSHI , HIRAIWA TOMOKO , IKEDA HIROSHI , SAITO HARUNOBU , HAYASHI MASAYUKI , HASHIMOTO NAOKO
IPC分类号： G11B5/31
摘要： PURPOSE:To eliminate the adverse influence of residual carbon films by removing the carbon which is unnecessary after patterning at the time of patterning upper cores by etching using a carbon mask. CONSTITUTION:A first magnetic film consisting of 'PermalloyR' is deposited by sputtering over the entire surface of a substrate 1 and is patterned by a photoetching technique to form the lower cores 2. Alumina is then deposited similarly by sputtering thereon and a gap layer 3 is similarly formed by the photoetching technique. A polyimide resin is thereafter applied thereon by spin coating and is cured by heating. The polyimide resin is patterned to form insulating layers 4. Further, spiral coils 5 consisting of Cu formed by etching are provided thereon and are coated with similar insulating layers 6. A second magnetic film consisting of the 'PermalloyR' is again deposited to form an upper magnetic film 7. An Si film 8 and a carbon film 9 are laminated and formed thereon and the exposed parts of the film 7 are selectively removed by Ar ion milling with the film 9 as a mask. The 'PermalloyR' film to constitute the upper cores is thereby patterned.

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