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    • 2. 发明专利
    • METHOD AND APPARATUS FOR INSPECTION OF SEMICONDUCTOR DEVICE
    • JPH06181244A
    • 1994-06-28
    • JP35306992
    • 1992-12-11
    • HITACHI LTD
    • SHIGYO YOSHIHARUMIYAMOTO YOSHIYUKIOSHIMA TAKAYUKI
    • H01L21/66H01L21/82
    • PURPOSE:To reduce time for inspection by converting a position information based on a logic adress arrangement of the first and last failure cells regarding a failure cell group into a position information formed by a substantial adress arrangement based on a simple layout information. CONSTITUTION:A means 21 for compressing defective cell position information compresses a position information on a failure cell group in which at least 2 continue on the same line and the same row into only position information on the first and last defective cells. Meanwhile, a simple layout information generating device 5 generates simple layout information according to the information on the origin of arrangement, the information on the position of cells from the origin, and the information on the direction of arrangement of cells out of the layout information on a semiconductor device. In a defective cell position information converting means 7, the position information based on logic adress arrangement of the first and last defective cells is converted into position information based substantial adress arrangement based on the simple layout information. Next, a defective cell automatic arrangement means 12 arranges the first and last defective cells within a visual field of a detective cell observing device 13 automatically.