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1. 发明专利

JP2000181078A DEVELOPER CONTROL DEVICE 失效
公开(公告)号：JP2000181078A
公开(公告)日：2000-06-30
申请号：JP36022698
申请日：1998-12-18
申请人： HITACHI LTD , HITACHI DEVICE ENG
发明人： NAKAYAMA HIROTSUGU , KONO HITOSHI , SHINOHARA MASAAKI , NISHIMURA YUICHI , UEHARA JUNICHI
IPC分类号： B05C11/10 , B01J4/00 , G03F7/30 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To stably supply developer to a developing device by providing a means for replenishing a 3rd storage means with an undiluted solution and a monitoring means for monitoring the concentration of the developer stored in the 3rd storage means, and replenishing the 3rd storage means with the undiluted solution based on monitoring output. SOLUTION: A controller always monitors alkali concentration in a receive tank 103 which is a 3rd storage means and keeps it a specified value, based on the measured value by an alkali concentration measuring device 114. The concentration of the recovered solution supplied to a mixing tank 101 which is a 2nd storage means is kept at a nearly constant value. Therefore, the replenishing quantity of undiluted solution for the tank 101 is kept nearly constant. Then, a service tank 102 which is a 1st storage means is equipped with a piping 117 for supplying the stored developer to each developing device, and the developer of required quantity is supplied to each developing device through the piping 117.

2. 发明专利

JPH10100036A SUBSTRATE POSITIONING DEVICE 失效
公开(公告)号：JPH10100036A
公开(公告)日：1998-04-21
申请号：JP25694996
申请日：1996-09-27
申请人： HITACHI LTD , HITACHI DEVICE ENG
发明人： TOUJIYOU KENJIROU , OTAKA TAKASHI , NEKATA TAKEYASU , NISHIMURA YUICHI
IPC分类号： G02F1/13 , B23Q3/18 , G02F1/1333
摘要： PROBLEM TO BE SOLVED: To position a glass substrate and the other substrates at a predetermined position of a finishing machine with high accuracy. SOLUTION: In a substrate positioning device for positioning a substrate 4 at the predetermined position of the working table 7 of a finishing machine in a manufacturing process for manufacturing a predetermined product by performing various kinds of film forming treatments and patternings on the substrate 4 in a series of working processes by a plurality of finishing machines, the working table 7 has a plurality of vertical supporting rods 6 for supporting the bottom surface of the substrate 4 and a plurality of positioning pins 9 which abut on and move to and from the periphery of the substrate 4 placed on the supporting rods 6 in parallel to the working table 7 to position the substrate 4 at a predetermined position. The supporting rod 6 has a conduit 10 for guiding fluid supplied from a fluid supply source 12 and jetting the fluid from an opening made in the tip thereof contacting the substrate 4 and the substrate 4 is positioned by the positioning pins 9 in a state where the substrate 4 is slightly floated by the pressure of the fluid jetted from the opening of the conduit 10.

3. 发明专利

JPH0961798A EXPOSURE DEVICE 失效
公开(公告)号：JPH0961798A
公开(公告)日：1997-03-07
申请号：JP21838195
申请日：1995-08-28
申请人： HITACHI LTD
发明人： NISHIMURA YUICHI , TSUBOI YUZO
IPC分类号： G02F1/13 , G02F1/1333 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To make it possible to execute exposure by entirely obviating the breakage of a glass substrate by forming the placing surface of a stage to the same size and shape as the size and shape of the glass substrate to be placed thereon and forming tapers on the peripheries of the placing surface. SOLUTION: The stage 3 in the lower part of a photomask 1 has the placing surface formed to the same size and shape as the size and shape of the glass substrate 4 to be placed thereon. The tapers 3A are formed on the peripheries of the placing surface. Even if, for example, the foreign matter of photoresist, etc., exist on the surface coated with the photoresist film on the glass substrate 4, the force from the photomask 1 generated according to ascending of the stage 3 is merely applied on the glass substrate 4 in the part on the stage 3. Then, the easy breakage of the glass substrate 4 like heretofore does not arise. The tapers 3A are formed so as to prevent the contact of the photoresist film 5 sticking to the rear surface of the glass substrate 4 with the placing surface of the stage 3 when the photoresist film 5 infiltrates to the peripheries of the glass substrate 4 and stick to its rear surface.

4. 发明专利

JPH0882919A PHOTOMASK AND EXPOSURE DEVICE USING THE SAME 失效
公开(公告)号：JPH0882919A
公开(公告)日：1996-03-26
申请号：JP21700494
申请日：1994-09-12
申请人： HITACHI LTD
发明人： NISHIMURA YUICHI , NAITOU TAKAMASA
IPC分类号： G03F1/62 , G03F7/20 , H01L21/027 , G03F1/14
摘要： PURPOSE: To make it possible to easily and exactly uniformizing the gap over the entire surface between a photomask and an object to be exposed, to correct the deflection of the photomask even if the photomask is formed to have a larger size and to realize patterning with a high throughput, low cost high accuracy. CONSTITUTION: This exposure device has the photomask 10 including an approximately plate-shape mask 4 with patterns drawn on it, a transparent plate 2 in parallel with the mask 4 and a frame-like body 3 arranged at the marginal circumference between the mask 4 and the transparent plate 2, means 6, 7, 8, 9, 11 which evacuate the space 5 composed by mask 4, the transparent plate 2 and the frame-like body 3, a base 14 which holds the object 13 for exposure arranged under the photomask 10 and a light source which irradiates the photomask 10 with light for exposing from above the photomask.

5. 发明专利

JPH09243332A FILM THICKNESS MEASURING DEVICE 失效
公开(公告)号：JPH09243332A
公开(公告)日：1997-09-19
申请号：JP4969996
申请日：1996-03-07
申请人： HITACHI LTD , HITACHI DEVICE ENG
发明人： MIYAMOTO YOSHIAKI , MATSUZAKI HIDEO , KIKUMOTO ATSUSHI , TSUBOI YUZO , SUNAHARA KAZUO , SHINOHARA MASAAKI , NISHIMURA YUICHI , AIDA TAKAHIRO , OTAKA TAKASHI
IPC分类号： G01P3/486 , G01B11/06 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To automatically execute unmanned inspection and control of all number of pieces of a sample in line by emitting a measuring light to the sample between a measuring instrument body and a sensor part through an optical fiber, and alternately transmitting and receiving the reflected light from the sample. SOLUTION: A measuring light is emitted to a base which is a sample, and the reflected light from the sample is alternately transmitted and received between a measuring instrument body and a sensor part through an optical fiber 6. The reflected light is guided to a slit 40 from the optical fiber 6, reflected by a mirror 41, emitted to a concave diffraction grating 42 from the mirror 41, and emitted to a light receiving part 43. It is diffracted and spectrally divided by a diffraction grating arranged within the light receiving part 43. In a control part, to judge in which process the subject is obtained, the rank is judged by the preliminarily programmed reflecting intensity of reflected light is judged, and a predetermined selected condition every process is automatically selected to identify the process. The film thickness is measured through a prescribed operation on the basis of the profile of the reflected light incident from the optical fiber 6, or the relation of wavelengthreflecting intensity.

6. 发明专利

JPH11253893A WASHER 失效
公开(公告)号：JPH11253893A
公开(公告)日：1999-09-21
申请号：JP5671898
申请日：1998-03-09
申请人： HITACHI LTD
发明人： NISHIMURA YUICHI , SHINOHARA MASAAKI , TSUBOI YUZO , UCHIDA MORIO , NAKANO YASUSHI , KANEKO TOSHITERU
IPC分类号： B08B3/02 , G02F1/13 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To prevent chemicals from being deposited on a nozzle to cause foreign matter and also to simplify constitution irrespectively of the number of kinds of chemicals to be used. SOLUTION: This washer for washing an insulating substrate 10 by using chemicals and water in this order during the process in which a photosensitive photoresist film is formed on the surface of the substrate 10 to form a desired pattern by photolithography is equipped with a turntable 9 on which the substrate 10 is mounted to rotate it, one nozzle 7 arranged above the substrate 10, and at least two systems of liquid supply paths consisting of a chemical check valve 5 and a water check valve 6 connected in common to the nozzle 7 on the outlet side thereof and a chemical supply valve 3 and a pure water supply valve 4 connected to the check valves 5, 6 on the inlet sides thereof respectively. In this way, to the substrate 10 mounted on the turntable 9, the chemicals and the water are fed with a time-lag by alternately opening/closing the chemical supply valve 3 and the pure water supply valve 4.

7. 发明专利

JPH09251203A EXPOSING DEVICE 失效
公开(公告)号：JPH09251203A
公开(公告)日：1997-09-22
申请号：JP5813496
申请日：1996-03-14
申请人： HITACHI LTD
发明人： NISHIMURA YUICHI , TSUBOI YUZO
IPC分类号： G02F1/13 , G03F1/00 , G03F1/68 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To prevent blurring from partially occurring in the projection of a photomask pattern with respect to a photoresist film. SOLUTION: This device is at least provided with a placing plate 3 and the photomask 1, and the plate 3 is arranged, so that a substrate coated with the photoresist film 5 abuts on a placing surface. And also as to the photomask 1, the peripheral part of the photomask 1 is supported so that the photomask 1 is arranged to face oppositely to the surface coated with the film 5. In this case, deflection is formed on the placing surf ace of the plate 3 in accordance with the amount of the deflection due to the gravity of the photomask 1.

8. 发明专利

JP2009288828A Actual work result input support system 审中-公开
标题翻译：实际工作结果输入支持系统
公开(公告)号：JP2009288828A
公开(公告)日：2009-12-10
申请号：JP2008137392
申请日：2008-05-27
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NISHIMURA YUICHI
IPC分类号： G06Q10/00 , G06Q10/06 , G06Q50/00
摘要： PROBLEM TO BE SOLVED: To provide a system and method for registering the actual work results of an employee accurately in more detail, and for making a labor charge for each charging destination calculated by summing them up, become closer to an actual situation. SOLUTION: Based on the record of the actual residence location of the employee stored in a room entry/exit management server, the actual charging destination is determined in a schedule management server by collating with a cost code registered in advance. Accordingly, it is possible to make the labor charge on the basis of each cost code closer to the actual situation. Also, based on the record of the software/document use state of the employee concerned, stored in a terminal operation history management server, the actual charging destination is also determined in a project management server by a method of collating with software/document information being linked with the cost code and registered in advance. Accordingly, even in regard to a time zone unable to calculate by the method described above, it is possible to make the actual work result close to the actual situation. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种更详细地准确地登记员工的实际工作结果的系统和方法，并且通过对每个计费目的地进行求和计算的每个计费目的地的劳动费用变得更接近实际情况。解决方案：根据存储在房间入/出管理服务器中的员工的实际居住地点的记录，通过与预先登记的成本代码进行核对，在日程管理服务器中确定实际收费目的地。因此，可以根据每个成本代码更接近实际情况来进行劳务费用。此外，根据存储在终端操作历史管理服务器中的有关员工的软件/文档使用状态的记录，还通过与软件/文档信息进行对照的方法在项目管理服务器中确定实际计费目的地与成本代码相关联并提前注册。因此，即使对于不能通过上述方法计算的时区，也可以使实际工作结果接近实际情况。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JPH11252723A GAS INSULATED SWITCHGEAR INTEGRATED WITH TRANSFORMER 失效
公开(公告)号：JPH11252723A
公开(公告)日：1999-09-17
申请号：JP4682298
申请日：1998-02-27
申请人： HITACHI LTD , CHUGOKU ELECTRIC POWER , CHUGOKU ELECTRIC MANUFACTURE CO LTD
发明人： TAKIURA NOBUYOSHI , SATO HIDEAKI , OSAKI MAKOTO , KAWASAKI SEIJI , NISHIMURA YUICHI , FUKUDA SATORU
IPC分类号： H02B5/00 , H02B13/02
摘要： PROBLEM TO BE SOLVED: To provide a transforming facility which is capable of reducing the area of facility site with a gas insulated switchgear and connecting them directly. SOLUTION: A gas insulated switchgear 2 made up of bushings 3, disconnectors 4, grounding switches 5, breakers 6 and connecting buses 7, 8 is provided on the top surface of a transformer 1. Outlets 10 to 12 of a three- phase main circuit are connected to the breakers 6 via oil-gas bushings 9 provided on the outlets 10 to 12, connecting buses 8 branched in a traverse direction on the top parts of the oil-gas bushing 9 and connecting buses 7 connected to the bottom parts of the breakers 6 and branched in the traverse direction. The grounding switches 5, the disconnectors 4 and the gas bushings 3 are connected to the top parts of the breakers 6. The gas insulated switchgear 2 is fixed to the fixing bases 13 of the transformer 1 by a frame 15.

10. 发明专利

JPH11221532A SUBSTRATE WASHING METHOD AND SUBSTRATE WASHING DEVICE 失效
公开(公告)号：JPH11221532A
公开(公告)日：1999-08-17
申请号：JP2410398
申请日：1998-02-05
申请人： HITACHI LTD
发明人： NAKANO YASUSHI , KANEKO TOSHITERU , NISHIMURA YUICHI , UCHIDA MORIO
IPC分类号： B08B3/08 , C11D7/04 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To drastically decrease the amt. of the static electricity to be generated and to prevent the occurrence of a defect occurring in static electricity, as metallic wiring dissolution, by using the washing water prepd. by dissolving a salt not contg. metal elements or gaseous carbon dioxide at a high concn. into ultrapure water to lower the resistivity thereof. SOLUTION: This washing device senses the flow rate of the ultrapure water flowing into a washing water pipe 110a by a flow meter 111. Ammonium carbonate water which is the salt not contg. the metal elements in a tank 113 is intermittently injected by an injection pump 114 in accordance with the flow rate into a washing water pipe 110a. At this time, if the flow rate of the ultrapure water sensed by the flow meter 111 is large, the intermittent intervals are made shorter by the control of a controller 115 and if the flow rate is small, the intermittent intervals are made longer to a maintain the concn. of the ammonium carbonate which is the washing water constant. The setting of the concn. is executed by inputting desired electroconductivity into the controller 115. The information from an electroconductivity meter 112 is fed back to the injection pump 114 to maintain the desired electroconductivity of the washing water. For example, a static mixer 117 is disposed between the injection pump 114 and the electroconductivity meter 112 to well mix the ultrapure water and the ammonium carbonate water.

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