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    • 2. 发明专利
    • HALL ELEMENT
    • JPS63293986A
    • 1988-11-30
    • JP12828387
    • 1987-05-27
    • HITACHI LTD
    • TANBARA HIDEONAKAGOME HIDEAKI
    • H01L43/06
    • PURPOSE:To lower offset voltage generated between output terminals for a Hall element by electrically connecting the positive pole of an input terminal for one Hall element and the positive pole of an input terminal for the other Hall element so that the positive pole of the input terminal for one Hall element is used as an input terminal in the direction tying a pair of input terminals on a semiconductor wafer and the positive pole of the input terminal for the other Hall element is employed as an input terminal formed on another end side. CONSTITUTION:Arbitrary two of a plurality of Hall elements H1, H2, H3... shaped so that AB axes tying pairs of input terminals 3a, 3b on a wafer 1 are made mutually parallel are paired, and the Hall elements are connected electrically so that the positive pole of one Hall element H1 is used as the input terminal 3a shaped on the end A of the axis AB and the positive pole of the other Hall element H2 is employed as the input terminal 3b formed on the end B of the axis AB. Accordingly, even when each output terminal 4a, 4b for the Hall elements H1, H2, H3... is formed to a geometrically asymmetric shape by reason of the shortage, etc., of the accuracy of mask alignment and photosensitive accuracy, the offset voltage VHO of one Hall element H1 and the offset voltage VHO of the other Hall element H2 are offset, thus acquiring the Hall elements having low offset voltage VHO.
    • 3. 发明专利
    • SCHOTTKY TYPE SEMICONDUCTOR ELEMENT
    • JPS6245158A
    • 1987-02-27
    • JP18410685
    • 1985-08-23
    • HITACHI LTD
    • NAKAGOME HIDEAKITANBARA HIDEO
    • H01L29/872H01L21/60H01L23/48H01L29/47
    • PURPOSE:To avoid fluctuation of characteristics and deterioration in reliability by a method wherein a semi-insulating layer is formed at the position which is horizontally different from the position of a Schottky junction in a semiconduc tor substrate and an electrode is extended over the semi-insulating layer to form a bonding part. CONSTITUTION:A semiconductor substrate 1 for a Schottky diode is composed of an N type substrate 1a and an N-type epitaxial layer 1b formed on the substrate 1a. A CVD film 2 is formed on the layer 1b and, after a hole is drilled in the Schottky junction region, an electrode 3 is formed by evaporation. The electrode 3 is extended from the Schottky junction part 4 to a bonding part 5 of a wire 6 along the CVD film 2. On the other hand, a square semi-insulating layer 7 is formed in the epitaxial layer 1b. A plurality of electrodes 3 and semi-insulating layers 7 are formed on one pellet 8 and the wire 6 is bonded to any one of the bonding parts 5. A scribing grid region 9, on which the CVD film 2 is not formed, is provided on the substrate 1 along the circumference of the pellet 8.
    • 4. 发明专利
    • Contact electrode and manufacture thereof
    • 接触电极及其制造
    • JPS58213469A
    • 1983-12-12
    • JP9615582
    • 1982-06-07
    • Hitachi Ltd
    • YAMADA KOUHEINAKAGOME HIDEAKITERAKADO HAJIME
    • H01L29/43H01L21/28H01L29/45
    • H01L29/456H01L29/8611
    • PURPOSE:To prevent the abnormal reaction and the formation excessive silicide when the titled contact electrode is exposed to a high temperature by a method wherein the contact electrode is composed of an alloy consisting of Ti, Pd and Ag or Ti, Pt and Ag. CONSTITUTION:A P-N junction 9 has a diode construction by providing a P type conductive region on the center surface layer part located on the main surface of a semiconductor substrate 1. The circumference of said region 2 and the main surface of the substrate 1 are covered by an insulating film 3. A contact electrode 8 is formed on the region 2 (contact hole region) which will be exposed from the film 3. This electrode 8 is composed of a ternary-alloy consisting of Ti, Pd (or Pt) and Ag. As no abnormal reaction occurs on the electrode 8 located at the contact hole part, there is no increase of inverce leak current. Also, in view of the fact that the growth of silicide at the hole edge part is not large, a high integration can be accomplished and, on the contrary, the element can be made smaller in size.
    • 目的:为了防止标题接触电极暴露于高温时的异常反应和形成过量的硅化物,其中接触电极由由Ti,Pd和Ag或Ti,Pt和Ag组成的合金构成。 构成:PN结9通过在位于半导体衬底1的主表面上的中心表面层部分上提供P型导电区域而具有二极管结构。所述区域2的周边和衬底1的主表面被覆盖 通过绝缘膜3.在从膜3露出的区域2(接触孔区域)上形成接触电极8.该电极8由Ti,Pd(或Pt)和 Ag。 由于在位于接触孔部的电极8上没有发生异常反应,因此不会产生反转泄漏电流的增加。 此外,考虑到硅化物在孔边缘部分的生长不大,可以实现高的一体化,相反,可以使元件的尺寸更小。