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    • 1. 发明专利
    • DEFECT INSPECTION DEVICE
    • JPH09213255A
    • 1997-08-15
    • JP798597
    • 1997-01-20
    • HITACHI LTD
    • HOSOKI SHIGEYUKIICHIHASHI MIKIOWADA YASUOMUNAKATA TADASUKEHONDA YUKIO
    • G01N23/225H01J37/073H01J37/28H01L21/66
    • PROBLEM TO BE SOLVED: To detect the size, the number, and the minute defective position of the defects of an insulating membrane, by radiating the electron beams of a low energy to a sample, and detecting the generated secondary charged particles. SOLUTION: The electrons generated from an electrolyte radiating cathode 11 are made in an energy less than 1KeV at the level not permeating an insulating membrane 2, and radiated on a sample 32. Of the generated secondary electrons, a part or the majority of the electrons passing through an auxiliary electrode 9 are collected by a secondary electron detector 22. The detected current output from the secondary electron detector 22 is amplified by an amplifier 28, and input to a display unit 29. And a deflecting signal produced by an oscillator 24 is amplified by a power source 23, and given to a deflecting coil to scan the electron beams. The deflecting signal of the oscillator 24 is synchronized and given to also the display unit 29, and the data signals corresponding to the defects of the insulating membrane 2 such as a two-dimensional brightness modulation display and a linear display are displayed in the display unit 29. In this case, the field emission cathode 11 is preferable to furnish a sharp needle of a single crystal with the axial azimuth .
    • 2. 发明专利
    • SURFACE EVALUATION DEVICE OF SEMICONDUCTOR WAFER
    • JPH0287543A
    • 1990-03-28
    • JP23875888
    • 1988-09-26
    • HITACHI LTDHITACHI ELECTR ENG
    • SHIMIZU HIROBUMIMUNAKATA TADASUKEHONMA NORIAKIKATO NOBORU
    • H01L21/66
    • PURPOSE:To enable the semiconductor wafers to be surface-evaluated automatically and efficiently by a method wherein the semiconductor wafers are carried by a carrier system from a loader part to a surface evaluation means and after finishing the surface evaluation, they are carried again by the carrier system to an unloader part to be recovered. CONSTITUTION:Every one each of semiconductor wafers 1 set on a cassette 33 of a loader part 3 is taken out by a wafer chuck arm 34 of a carrier arm mechanism 4 to be loaded on a wafer chuck spindle 48 of an alignment part 6. An aligned semiconductor wafer 1 is loaded on a vacuum chuck 28 of a specimen unit 7 by a swivelling transfer arm 61 to be suction-fixed on a specified position. In such a state, the surface of the wafer 1 is irradiated with photonic beams from a scanning photon microscope 2 for scanning to evaluate the surface of the wafer 1 by the produced scanning picture image. Through these procedures, the semiconductor wafer 1 after finishing the surface evaluation is recovered one by one into a cassette of an unloader part 8 through the specimen unit part 7, a wafer transfer part 6, the alignment part 6 and the transfer arm mechanism 4 to be unloaded.
    • 4. 发明专利
    • CONFOCAL MICROSCOPE
    • JPS63131116A
    • 1988-06-03
    • JP27654886
    • 1986-11-21
    • HITACHI LTD
    • HASE SHINOBUMUNAKATA TADASUKEKIMURA SHIGEJI
    • G02B21/00G01B11/00
    • PURPOSE:To reduce up/down variation when an optional plane at the waist position of a beam for irradiation scans on a sample by interposing piezoelectric elements for correcting an up/down displacement quantity between a sample holding base and an (x)-(y) stage, and applying voltages to the respective elements individually. CONSTITUTION:Light from a semiconductor laser 1 is made circular through a collimator lens 8 and a cylindrical lens 9 and made incident on a 1/4-wavelength plate 10. The beam converted by the plate 10 from a linear polarized light state to a circular polarized light state is split by a half-prism 12 into a component changed in polarization and a straight traveling component for reference light. A signal for three-dimensional shape measurement is reflected by the sample 3 to travel backward and then passes through two half-prisms 12. Light from a condenser lens 4 is converged on the surface of a pinhole 5, its transmitted light is detected by an infrared detector 6, and a signal corresponding to the projections and recesses of the sample 3 is stored in respective (x) and (y) coordinates by a processing circuit 17 and displayed on a display device 18. When the inclination and up/down displacement quantity of the sample are measured, the interference effect between a reference light signal from a detector 23 and a reflected light signal from the sample 3 is utilized and the individual voltages are applied to the respective piezoelectric elements 15 for displacement quantity correction.
    • 5. 发明专利
    • MONITOR FOR FOREIGN MATTER IN LIQUID
    • JPS62285042A
    • 1987-12-10
    • JP12790986
    • 1986-06-04
    • HITACHI LTD
    • MUNAKATA TADASUKEITO YOSHITOSHI
    • G01N21/85G01N15/02G01N21/51G01N21/64G01N21/94
    • PURPOSE:To enable the realtime measurement of foreign matters in a fluoric acid solution, by measuring a number of foreign matters simultaneously. CONSTITUTION:Optical fiber bundles 16 and 17 are covered with a cover 18 made of a fluorocarbon resin immune to fluoric acid. For light to move into or out of end faces 16' and 17' of the fiber bundles 16 and 17, the thickness of the fluorocarbon resin is minimized at the end faces thereof. The fiber bundle 16 thus obtained is placed into a fluoric acid solution and when an irradiation light is transmitted thereto, it is made to radiate an area 19 through the end face 16' with no loss. On the other hand, the fiber bundle 17 having the end face 17' is placed into the fluoric acid solution with the end face 17' set near the end face 16'. As a result, a light receiving area of the end face 17' is limited to an area 20, which makes scattered light or the like reach the end face 17', as caused by foreign matters generated at an area 21 as defined when the areas 20 and 19 cross. Thus, the fiber bundle 17 can detect foreign matters in the solution. Since the quantity of light such as scattered light increases in proportion to the number of the foreign matters in the area 21, the number of foreign matters in the solution can be determined immediately by calibrating the relationship between the quantity of light and the number of foreign matters preliminarily.
    • 6. 发明专利
    • SCANNING PHOTON MICROSCOPE
    • JPS62255912A
    • 1987-11-07
    • JP9793186
    • 1986-04-30
    • HITACHI LTD
    • KONAME KANJIMUNAKATA TADASUKE
    • G01N21/88G01R31/265G02B21/00H01J37/28
    • PURPOSE:To analyze characteristics of a sample from various aspects by displaying the distribution of signal on the samples as a color picture while allowing the phase and the amplitude of an AC photovoltage or AC photocurrent signal to correspond to the hue and the luminance respectively. CONSTITUTION:A device is provided with a color cathode-ray tube 21, a color signal generator 15, color cathode-ray tube drivers 16, 17, and 18 etc., and drivers 16, 17, and 18 are used to individually emit light of primary colors, red, green, and blue of the tube 21. The generator 15 converts signals obtained from integrators 13 and 14 to give such color signal to drivers 16, 17, and 18 that a color picture where the phase of the output signal of an amplifier 6 corresponds to the hue and the amplitude corresponds to the luminance is displayed. The color picture where the phase difference between the output signal of the amplifier 6, namely, the phase of the AC photovoltage or the AC photocurrent of a sample 5 and that of a reference signal from a phase adjuster 9 corresponds to the hue and the amplitude corresponds to the luminance is displayed on the tube 21, thereby analyzing the electric characteristic of the sample 5 in two sides of amplitude and phase.
    • 8. 发明专利
    • INFRARED COFOCAL MICROSCOPE
    • JPS62208017A
    • 1987-09-12
    • JP5037186
    • 1986-03-10
    • HITACHI LTD
    • HASE SHINOBUMUNAKATA TADASUKEKIMURA SHIGEJIITO YOSHITOSHI
    • H01L21/66G02B7/28G02B21/00
    • PURPOSE:To put a pinhole nearby the center of a beam speedily by utilizing a visible light beams for an optical element which constitutes an infrared cofocal microscope simultaneously with an infrared-ray source. CONSTITUTION:Light beams from the light source 1 are collimated by a collimator 8 into parallel luminous flux, which is converged on a sample surface which is at a distance of focal length F through an objective 2. A 1/4-wavelength plate 10 is arranged at a polarization beam splitter 9 which is coated matching with the wavelength of the light source in the middle of an optical system so as to obtain enough energy to photodetect light beams by a photodetector 6 after the light beams are reflected by the sample 3. Image processing and final three-dimensional display are carried out by converting the current of an electric signal from the photodetector 6 into a voltage by a signal processing circuit 11, finding the quantity of Z-directional variation by a zero-cross point detecting circuit 12, and then storing it in an image memory 13 in synchronism with an (x) and (y) axis and transmitting information of one image plane to a display monitor 14.
    • 9. 发明专利
    • SCANNING TYPE LASER MICROSCOPE
    • JPS62138819A
    • 1987-06-22
    • JP27891885
    • 1985-12-13
    • HITACHI LTD
    • KIMURA SHIGEJIMUNAKATA TADASUKE
    • G01N21/17G02B21/00
    • PURPOSE:To easily position a fine pinhole by using a mask pattern which has the pinhole and mutually orthogonal straight line patterns formed on the same plane. CONSTITUTION:A control circuit 15 moves the mask pattern 10 in an (x) direction by a stage 14 firstly to shift the mask pattern 10 from the projecting position of a transmitted laser beam 16. The control circuit 15 stores a middle point 17, i.e. (x) coordinate when a light output is about a half as much as a maximum value and then the mask pattern 10 is returned to the position where the transmitted laser light 16 is cut off. Similar movement is carried out in a (y) direction as well and the (y) coordinate (yo) for realizing a middle point is stored. Lastly, the control circuit 5 moves the mask pattern 10 to the stored coordinates (xo, yo) and then moves the mask pattern 10 by distance (-a) in the (x) direction and by distance (-b) in the (y) direction. At this time, the pinhole pattern 11 is projected with the transmitted laser light 16.
    • 10. 发明专利
    • PHOTO-VOLTAGE TESTER
    • JPS60169772A
    • 1985-09-03
    • JP2500484
    • 1984-02-15
    • HITACHI LTD
    • HONMA NORIAKIMUNAKATA TADASUKE
    • G01R19/155H01L31/00H01L31/02
    • PURPOSE:To make it possible to perform the partial diagnosis of a specimen by the magnitude relation of photo-voltage, by measuring photo-voltage in a semiconductor in such a state that a metal electrode is not formed to or contacted with the surface of the semiconductor. CONSTITUTION:A specimen 9 is arranged to a metal specimen table 10 also used as an electrode and photo-voltage is measured by bringing the head part 8' of a probe cable 8 into contact with the specimen 9. Semiconductor laser 6 is used as a beam source and the output beam 6' thereof is coupled to an optical fiber by a coupler 7. Further, the intermittence of beam is performed by directly modulating the semiconductor laser 6 by using the reference signal of a phase detection type synchronous amplifier 17. On the other hand, intermittent beam is allowed to irradiate the specimen 9 through the probe cable 8. The generated photo-voltage is detected by the head 8' and detected by the phase detection type synchronous amplifier 17 by the coupler 7 through the probe cable 8.