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2. 发明专利

DE3919829C2 未知
公开(公告)号：DE3919829C2
公开(公告)日：1994-11-03
申请号：DE3919829
申请日：1989-06-16
申请人： HITACHI LTD
发明人： KAWASAKI TAKESHI , ENDO JUNJI , ISAKOZAWA SHIGETO , TOMITA MASAHIRO , TONOMURA AKIRA
IPC分类号： H01J29/48 , H01J37/073 , H01J37/145

3. 发明专利

DE19860988B4 Energy filter for electron microscope 未知
公开(公告)号：DE19860988B4
公开(公告)日：2007-12-13
申请号：DE19860988
申请日：1998-08-25
申请人： HITACHI LTD
发明人： KIMOTO KOJI , TANIGUCHI YOSHIFUMI , TAYA SHUNROKU , ISAKOZAWA SHIGETO , AOYAMA TAKASHI , SAITO MASAKAZU , SEKIGUCHI TOMOKO
IPC分类号： H01J49/46 , H01J37/05 , H01J37/153
摘要： The energy filter has a number of electron spectrometers (18a-18d), for deflecting electrons from a focal plane (10) towards an energy dispersion plane (15) and deflecting electrons from an input image plane (12) towards an achromatic image plane (14), with a mean electron path symmetrical to a symmetry plane (13) with a normal (13') at between 0 and 180 [deg] to the electron beam incidence direction.

4. 发明专利

DE10237881B4 未知
公开(公告)号：DE10237881B4
公开(公告)日：2006-11-16
申请号：DE10237881
申请日：2002-08-19
申请人： HITACHI LTD , HITACHI SCIENCE SYSTEMS LTD , NAT INST OF ADVANCED IND SCIEN
发明人： MORITA KAZUHIRO , UKIANA MOTOHIDE , FUJII KAZUHIRO , ISAKOZAWA SHIGETO , KOIKE HIDEMI , TANIKAWA TAMIO
IPC分类号： B25J7/00 , G02B21/32 , B25J17/02
摘要： A three-link mechanism (6) connects a base (2) and end effector (3) and performs parallel three-degree-of-freedom (3-DOF) operation. The three-link mechanism are fabricated into single unit, by cutting and folding a sheet of flexible metal plate.

5. 发明专利

DE69229432D1 未知
公开(公告)号：DE69229432D1
公开(公告)日：1999-07-22
申请号：DE69229432
申请日：1992-10-22
申请人： HITACHI LTD
发明人： AOYAMA TAKASHI , HOSOI KISHU , MISAWA YUTAKA , KIMOTO KOJI , ISAKOZAWA SHIGETO , UEDA KAZUHIRO
IPC分类号： H01J37/20

6. 发明专利

DE19808768A1 Transmission electron microscopy method 未知
公开(公告)号：DE19808768A1
公开(公告)日：1998-09-10
申请号：DE19808768
申请日：1998-03-02
申请人： HITACHI LTD
发明人： TANIGUCHI YOSHIFUMI , ISAKOZAWA SHIGETO
IPC分类号： G01N23/04 , H01J37/22 , H01J37/26
摘要： The microscopy method provides an image of the distribution of a specific element by subtraction of an image for an energy range containing energy loss electrons and an image for an energy range without these electrons, provided via a transmission electron microscope (1) with an energy filter (6). The exposure time for provision of the image for the energy range without the energy loss electrons is less than the exposure time for provision of the image for the energy range with the energy loss electrons.

7. 发明专利

DE10237881A1 Micro manipulator for semiconductor integrated circuit manufacture/inspection, has three-link mechanisms fabricated into single unit, by cutting and folding sheet of flexible metal plate 未知
公开(公告)号：DE10237881A1
公开(公告)日：2003-03-13
申请号：DE10237881
申请日：2002-08-19
申请人： HITACHI LTD , HITACHI SCIENCE SYSTEMS LTD , NAT INST OF ADVANCED IND SCIEN
发明人： MORITA KAZUHIRO , UKIANA MOTOHIDE , FUJII KAZUHIRO , ISAKOZAWA SHIGETO , KOIKE HIDEMI , TANIKAWA TAMIO
IPC分类号： G02B21/32 , B25J7/00 , B25J17/02
摘要： A three-link mechanism (6) connects a base (2) and end effector (3) and performs parallel three-degree-of-freedom (3-DOF) operation. The three-link mechanism are fabricated into single unit, by cutting and folding a sheet of flexible metal plate.

8. 发明专利

NL1008401C2 未知
公开(公告)号：NL1008401C2
公开(公告)日：2002-09-24
申请号：NL1008401
申请日：1998-02-24
申请人： HITACHI LTD
发明人： TANIGUCHI YOSHIFUMI , ISAKOZAWA SHIGETO
IPC分类号： G01N23/04 , H01J37/22 , H01J37/26
摘要： Letting core-loss energy of an objective element be Ec, and width of the energy selection slit be DELTA E. Initially, a pre-edge image obtained by increasing an acceleration voltage of an electron gun by Ec- DELTA E and a pre-pre-edge image obtained by increasing an acceleration voltage by Ec- DELTA E are taken with the same exposure time, and an intensity ratio R of the pre-edge image to the pre-pre-edge image is calculated. Next, a post-edge image obtained by increasing an acceleration voltage by Ec is taken with an exposure time tpre, and a pre-edge image is taken with an exposure time Rxtpre. An element distribution image of the objective element can be obtained by simply performing image subtraction of the pre-edge image from the post-edge image in a computer.

9. 发明专利

DE19808768C2 未知
公开(公告)号：DE19808768C2
公开(公告)日：2002-03-14
申请号：DE19808768
申请日：1998-03-02
申请人： HITACHI LTD
发明人： TANIGUCHI YOSHIFUMI , ISAKOZAWA SHIGETO
IPC分类号： G01N23/04 , H01J37/22 , H01J37/26
摘要： Letting core-loss energy of an objective element be Ec, and width of the energy selection slit be DELTA E. Initially, a pre-edge image obtained by increasing an acceleration voltage of an electron gun by Ec- DELTA E and a pre-pre-edge image obtained by increasing an acceleration voltage by Ec- DELTA E are taken with the same exposure time, and an intensity ratio R of the pre-edge image to the pre-pre-edge image is calculated. Next, a post-edge image obtained by increasing an acceleration voltage by Ec is taken with an exposure time tpre, and a pre-edge image is taken with an exposure time Rxtpre. An element distribution image of the objective element can be obtained by simply performing image subtraction of the pre-edge image from the post-edge image in a computer.

10. 发明专利

NL1010087A1 未知
公开(公告)号：NL1010087A1
公开(公告)日：1999-03-22
申请号：NL1010087
申请日：1998-09-14
申请人： HITACHI LTD
发明人： SATO YUJI , ISAKOZAWA SHIGETO , SHIMOYAMA WATARU
IPC分类号： H01J37/22 , G21K7/00 , H01J37/252 , H01J37/26 , H01J37/244
摘要： In order to provide an analysis electron microscope which is capable of effectively performing elementary analysis of plural analysis points of a sample, an electron beam 2 discharged from an electronic source 1 irradiates the sample through a condenser lens aperture 3. The electron beam 2 transmitted through the sample 12 is magnified by an objective lens and a plural focussing lens 18 and forms an electron microscope image of the sample 12 on a fluorescent plate 13. A characteristic X-ray emitted from the sample 12 is detected by the elementary analysis device having the elementary analysis detecting element 16 and an elementary analysis control equipment 17 and is analyzed. The position of the analysis points 1 and 2 of the sample and the spot size of the irradiation electron beam is stored in an electron microscope control equipment 14 beforehand, and when the analysis starts, the stored position and size information begin to be read, the analysis points 1 and 2 and the electron beam size are set automatically based on the information, and the elementary analysis of the analysis points 1 and 2 is thereby performed automatically.

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