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1. 发明申请

WO2006019633A2 FORMATION OF A SELF-ASSEMBLED RELEASE MONOLAYER IN THE VAPOR PHASE 审中-公开
标题翻译：在蒸汽相中形成自组装释放单体
公开(公告)号：WO2006019633A2
公开(公告)日：2006-02-23
申请号：PCT/US2005/024362
申请日：2005-07-08
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , JUNG, Gun-Young , YONG, Chen , WILLIAMS, Stanley, R. , GANAPATHIAPPAN, Sivapackia
发明人： JUNG, Gun-Young , YONG, Chen , WILLIAMS, Stanley, R. , GANAPATHIAPPAN, Sivapackia
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B29C33/58 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： A method is provided for coating a surface (10) having features (12) thereon with a self-assembled monolayer (20) for aiding release of the surface during an imprinting procedure. The method comprises exposing the surface to a vapor of a mold release agent (120).
摘要翻译：提供了一种用于在其上具有特征（12）的表面（10）的涂覆方法，该表面具有自组装单层（20），用于在压印过程期间帮助释放表面。该方法包括将表面暴露于脱模剂（120）的蒸气。

2. 发明申请

WO2006041777A1 LITHOGRAPHIC MASK ALIGNMENT 审中-公开
标题翻译： LITHOGRAPHIC MASK对齐
公开(公告)号：WO2006041777A1
公开(公告)日：2006-04-20
申请号：PCT/US2005/035495
申请日：2005-09-30
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , YONG, Chen
发明人： YONG, Chen
IPC分类号： G03F9/00
CPC分类号： G03F9/7076 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7042 , G03F9/7053
摘要： Systems and methods of aligning a lithographic mask (62) are described. In one aspect, a substrate (8) and a lithographic mask (62) are aligned based at least in part on a motive force between a substrate alignment mark (70) on the substrate (8) and a mask alignment mark (68) on the lithographic mask (62) that induces movement of at least one of the substrate (8) and the lithographic mask (62) into mutual alignment.
摘要翻译：描述了对准光刻掩模（62）的系统和方法。在一个方面，至少部分基于衬底（8）上的衬底对准标记（70）和衬底（8）上的掩模对准标记（68）之间的动力，基板（8）和光刻掩模（62）使基板（8）和光刻掩模（62）中的至少一个移动的光刻掩模（62）相互对准。

3. 发明申请

WO2005086256A1 BOTTOM ELECTRODE CHEMICALLY-BONDED LANGMUIR-BLODGETT FILMS VIA PHOTOLABILE GROUPS 审中-公开
标题翻译： BOTTOM电极化学粘合的LANGMUIR-BLODGETT薄膜通过可爱的组合
公开(公告)号：WO2005086256A1
公开(公告)日：2005-09-15
申请号：PCT/US2005/006845
申请日：2005-03-02
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY L.P. , ZHOU, Zhang-Lin , YONG, Chen , ZHANG, Xiao-An
发明人： ZHOU, Zhang-Lin , YONG, Chen , ZHANG, Xiao-An
IPC分类号： H01L51/40
CPC分类号： G11C13/0009 , B05D1/204 , B05D3/061 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G11C13/0014 , G11C2213/14 , G11C2213/77 , G11C2213/81 , H01L51/0075 , H01L51/0595
摘要： Langmuir-Blodgett films are provided in which a molecule (30, 130) is chemically bonded with a bottom electrode (14) substrate (42) as part of a crossed wire device (10) comprising two electrodes (12, 14) and a molecular layer (16) therebetween. The molecule (30, 130), which comprises a switchable moiety (32) and a connecting moiety (34, 134), is provided with a photolabile capping group (36, 236) attached to the connecting moiety (34, 134). The photoabile capping group (36, 236) temporarily caps the reactive connecting roup (34, 134) of the molecule (30, 130). The capped molecules (30', 130', 230') are processed to form a LB film on the water-air interface (38a) of water (38). The films are then exposed to UV light. The photolabile capping group (36, 236) decomposes to give back the connecting group (34, 134), which remains in the water (38). As the uncapped LB films are transferred to the bottom electrode (14) substrate (42), the surface of the electrode reacts with the reactive connecting group (34, 134) of the molecule (30, 130) to form a chemically bonded LB layer on the substrate (42), thereby providing improved LB films.
摘要翻译：提供Langmuir-Blodgett膜，其中分子（30,130）与底部电极（14）衬底（42）化学键合，作为包括两个电极（12,14）和分子（12）的交叉线器件（10）的一部分，层（16）之间。包含可切换部分（32）和连接部分（34,134）的分子（30,130）设置有连接到连接部分（34,134）的光不透明封盖基团（36,236）。光敏封盖组（36,236）临时盖住分子（30,130）的反应性连接体（34,134）。加热封端的分子（30'，130'，230'）以在水（38）的水 - 空气界面（38a）上形成LB膜。然后将膜暴露于UV光。光不透明封盖组（36,236）分解以返回留在水（38）中的连接组（34,134）。当未封盖的LB膜被转移到底部电极（14）衬底（42）时，电极的表面与分子（30,130）的反应性连接基团（34,134）反应以形成化学键合的LB层在基板（42）上，从而提供改进的LB膜。

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