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1. 发明申请

WO2008013798A2 ALIGNMENT FOR CONTACT LITHOGRAPHY 审中-公开
标题翻译：对接接触光刻
公开(公告)号：WO2008013798A2
公开(公告)日：2008-01-31
申请号：PCT/US2007/016621
申请日：2007-07-24
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WU, Wei , WANG, Shih-Yuan , WILLIAMS, R. Stanley,
发明人： WU, Wei , WANG, Shih-Yuan , WILLIAMS, R. Stanley,
CPC分类号： G03F7/7035 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7038 , G03F9/7042 , G03F9/7088 , G03F9/7096
摘要： A contact lithography system includes a patterning tool (110) having a pattern for transfer to a substrate (130); and at least one alignment device (140) coupled to the patterning tool (110). The alignment device (140) is configured to measure alignment between the patterning tool (110) and a substrate (130) for receiving the pattern of the patterning tool (110). A contact lithograpny method includes aligning a patterning tool (110) having a pattern for transfer with a substrate (130) for receiving the pattern of the patterning tool (110) using at least one alignment device (140) coupled to the patterning tool (110).
摘要翻译：接触式光刻系统包括具有用于转移到衬底（130）的图案的图案化工具（110）; 以及耦合到图案形成工具（110）的至少一个对齐装置（140）。对准装置（140）被配置为测量图案化工具（110）和用于接收图案化工具（110）的图案的基板（130）之间的对准。接触石印方法包括使用耦合到图案化工具（110）的至少一个对准装置（140）将具有用于转印的图案的图案化工具（110）与衬底（130）对准以接收图案化工具（110）的图案）。

2. 发明申请

WO2008048491A2 CONTACT LITHOGRAPHY APPARATUS, SYSTEM AND METHOD 审中-公开
标题翻译：联系人地平线设备，系统和方法
公开(公告)号：WO2008048491A2
公开(公告)日：2008-04-24
申请号：PCT/US2007/021813
申请日：2007-10-12
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WU, Wei , WANG, Shih-Yuan , LI, Zhiyong , WALMSLEY, Robert
发明人： WU, Wei , WANG, Shih-Yuan , LI, Zhiyong , WALMSLEY, Robert
IPC分类号： G03F7/00 , G03F7/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/7035
摘要： A contact lithography system (100, 200) includes a patterning tool (110, 228a, 510) bearing a pattern (112); a substrate chuck (214) for chucking a substrate (130, 228b) to receive the pattern (112) from the patterning tool (110, 228a, 510); where the system (100, 200) deflects a portion of either the patterning tool (110, 228a, 510) or the substrate (130, 228b) to bring the patterning tool (110, 228a, 510) and a portion of the substrate (130, 228b) into contact; and a stepper (260) for repositioning either or both of the patterning tool (110, 228a, 510) and substrate (130, 228b) to align the pattern (112) with an additional portion of the substrate (130, 228b) to also receive the pattern (112). A method of performing contact lithography comprising: deflecting a portion of either a patterning tool (110, 228a, 510) or a substrate (130, 228b) to bring the patterning tool (110, 228a, 510) and a portion of the substrate (130, 228b) into contact; and repositioning either or both of the patterning tool (110, 228a, 510) and substrate (130, 228b) to align a pattern (112) on the patterning tool (110, 228a, 510) with an additional portion of the substrate (130, 228b) to also receive the pattern (112).
摘要翻译：接触光刻系统（100,200）包括具有图案（112）的图案形成工具（110,228a，510）; 用于夹持基板（130,228b）以从所述图形化工具（110,228a，510）接收所述图案（112）的基板卡盘（214）; 其中所述系统（100,200）偏转所述图案形成工具（110,228a，510）或所述衬底（130,228b）的一部分以使所述图案形成工具（110,228a，510）和所述衬底的一部分 130，228b）接触; 以及用于重新定位所述图案形成工具（110,228a，510）和衬底（130,228b）中的一个或两个以使所述图案（112）与所述衬底（130,228b）的附加部分对准的步进器（260）接收图案（112）。一种执行接触光刻的方法，包括：使图案形成工具（110,228a，510）或衬底（130,228b）的一部分偏转以使图案形成工具（110,228a，510）和衬底的一部分 130，228b）接触; 以及重新定位图案形成工具（110,228a，510）和衬底（130,228b）中的一个或两个以使图案形成工具（110,228a，510）上的图案（112）与衬底的附加部分（130 ，228b）以也接收图案（112）。

3. 发明申请

WO2008156743A1 OPTICAL INTERCONNECT 审中-公开
标题翻译：光学互联
公开(公告)号：WO2008156743A1
公开(公告)日：2008-12-24
申请号：PCT/US2008/007513
申请日：2008-06-16
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , SANTORI, Charles , FATTAL, David , WU, Wei , BICKNELL, Robert , WANG, Shih-Yuan , WILLIAMS, R. Stanly , STEWART, Duncan , QUITORIANO, Nathaniel
发明人： SANTORI, Charles , FATTAL, David , WU, Wei , BICKNELL, Robert , WANG, Shih-Yuan , WILLIAMS, R. Stanly , STEWART, Duncan , QUITORIANO, Nathaniel
IPC分类号： G02B6/32
CPC分类号： H04B10/803 , G02B6/4206 , G02B6/43
摘要： An optical interconnect (100, 200, 300, 400, 500, 645) has a plurality of optical sources (110, 360, 460, 560), a first lens (115, 225, 325, 425, 525, 625) configured to collimate optical beams (320, 350) from the plurality of optical sources (110, 360, 460. 560), a second lens (120, 230, 335, 435, 535, 640) configured to refocus the optical beams (320, 350), and a plurality of optical receivers (125, 365, 465, 565) configued to receive the refocused optical beams (320, 350) from the second lens (120, 230, 335, 435, 535, 640).
摘要翻译：光互连（100,200,300,400,500,655）具有多个光源（110,360,460,560），第一透镜（115,225,325,425,525,625）被配置为从多个光源（110,360,460,560）中校准光束（320,350）;被配置为重新聚焦光束（320,350）的第二透镜（120,230,335,435,535,640））和多个光接收器（125,365,465,565）被配置为从第二透镜（120,230,335,435,535,640）接收重新聚焦的光束（320,350）。

4. 发明申请

WO2007084184A1 RAMAN SPECTROSCOPY SYSTEM AND METHOD USING A SUBWAVELENGTH RESONANT GRATING FILTER 审中-公开
标题翻译：拉曼光谱系统和使用亚波长共振滤光片的方法
公开(公告)号：WO2007084184A1
公开(公告)日：2007-07-26
申请号：PCT/US2006/028301
申请日：2006-07-21
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WU, Wei , LI, Zhiyong , WANG, Shih-Yuan
发明人： WU, Wei , LI, Zhiyong , WANG, Shih-Yuan
IPC分类号： G01J3/44 , G02B5/18
CPC分类号： G01J3/44 , G01J3/02 , G01J3/0227 , G01J3/0256 , G01J3/18 , G01N21/65 , G01N21/658 , G02B5/1809
摘要： A Raman spectroscopy system (600) is disclosed which includes a sub-wavelength responant. grating filter (508) and a photodiode with integrated sub-wavelength resonant grating filter are disclosed. The resonant grating filter (608) comprises an array of diffraction elements (104) having a periodic spacing that is less than the wavelength of radiation to be filtered and which are formed over a waveguide layer (110). The filter (608), which can reject a specific wavelength of radiation, can be placed between a Raman sample and a Raman detector (602) in order to filter radiation that is elastically scattered from the sample while transmitting other wavelengths. The wavelength rejected by the filter can be selected by tilting the filter (608) with respect to the radiation incident upon the filter.
摘要翻译：公开了一种拉曼光谱系统（600），其包括亚波长响应物。光栅滤光器（508）和具有集成子波长谐振光栅滤光器的光电二极管。谐振光栅滤波器（608）包括衍射元件（104）的阵列，其具有小于待滤波的辐射的波长并且在波导层（110）上形成的周期性间隔。可以将能够抑制特定波长的辐射的滤光器（608）放置在拉曼样品和拉曼检测器（602）之间，以便过滤从样品弹性散射的辐射，同时传输其他波长。可以通过使过滤器（608）相对于入射到过滤器上的辐射倾斜来选择由过滤器拒绝的波长。

5. 发明申请

WO2008013778A2 COMPENSATION FOR DISTORTION IN CONTACT LITHOGRAPHY 审中-公开
标题翻译：补偿接触光刻中的失真
公开(公告)号：WO2008013778A2
公开(公告)日：2008-01-31
申请号：PCT/US2007/016580
申请日：2007-07-24
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WU, Wei , STEWART, Duncan , WANG, Shih-Yuan , WILLIAMS, R., Stanley
发明人： WU, Wei , STEWART, Duncan , WANG, Shih-Yuan , WILLIAMS, R., Stanley
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method of contact lithography includes predicting distortions likely to occur in transferring a pattern from a mold (110) to a substrate (130) during a contact lithography process: and modifying the mold (110) to compensate for the distortions. A contact lithography system includes a design subsystem (210) configured to generate data describing a lithography pattern: an analysis subsystem (220) configured to identify one or more distortions likely to occur when using a mold (110) created from the data; and a mold modification subsystem (230) configured to modify the data to compensate for the one or more distortions identified by the analysis subsystem (220).
摘要翻译：接触光刻的方法包括预测在接触光刻过程中将图案从模具（110）转印到基板（130）时可能发生的扭曲：以及修改模具（110）以补偿为扭曲。一种接触光刻系统包括被配置为产生描述光刻图案的数据的设计子系统（210）：分析子系统（220），其被配置为识别在使用从数据创建的模具（110）时可能发生的一个或多个失真; 和模具修改子系统（230），其被配置为修改数据以补偿由分析子系统（220）识别的一个或多个失真。

6. 发明申请

WO2011031261A1 OPTICAL MODULATORS 审中-公开
标题翻译：光学调制器
公开(公告)号：WO2011031261A1
公开(公告)日：2011-03-17
申请号：PCT/US2009/056479
申请日：2009-09-10
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , WU, Wei , LI, Jingjing , WANG, Shih-Yuan , BRATKOVSKI, Alexandre M. , WILLIAMS, R. Stanley
发明人： WU, Wei , WANG, Shih-Yuan , BRATKOVSKI, Alexandre M. , WILLIAMS, R. Stanley
IPC分类号： H01S3/14
CPC分类号： G02F1/0102 , G02F1/0121 , G02F2202/06 , G02F2202/10 , G02F2202/16 , G02F2203/12 , G03H1/02 , G03H1/2294 , G03H2001/2271 , G03H2001/303 , G03H2225/22 , G03H2225/32 , G03H2225/33 , G03H2225/35 , G03H2225/60
摘要： Various embodiments of the present invention are directed to external, electronically controllable modulators. In one embodiment, a modulating device (100,400) includes a first electrode (104,404), a second electrode (106,406), and an active region (102,402). The active region is configured so that at least a portion of the active region is disposed between the first electrode and the second electrode. Applying a voltage of an appropriate magnitude and polarity to the electrodes changes the conductivity of the active region which in turn shifts the phase and/or amplitude of electromagnetic radiation transmitted through the active region.
摘要翻译：本发明的各种实施方案涉及外部的电子可控制调节剂。在一个实施例中，调制装置（100,400）包括第一电极（104,404），第二电极（106,406）和有源区域（102,402）。有源区被配置为使得有源区的至少一部分设置在第一电极和第二电极之间。向电极施加适当幅度和极性的电压改变了有源区的电导率，而有源区的电导又转移了透过有源区的电磁辐射的相位和/或振幅。

7. 发明申请

WO2007146031A2 IMPRINT LITHOGRAPHY APPARATUS AND METHODS 审中-公开
公开(公告)号：WO2007146031A2
公开(公告)日：2007-12-21
申请号：PCT/US2007/013374
申请日：2007-06-06
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , WU, Wei , WANG, Shih-Yuan , YU, Zhaoning , WILLIAMS, R. Stanley,
发明人： WU, Wei , WANG, Shih-Yuan , YU, Zhaoning , WILLIAMS, R. Stanley,
CPC分类号： B29C37/005 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An apparatus for forming a pattern in a curable material carried on a substrate (108) having one or more components with coefficients of thermal expansion that are substantially equal to the coefficient of thermal expansion of the substrate (108).
摘要翻译：在具有一个或多个具有基本上等于基板（108）的热膨胀系数的热膨胀系数的部件的基板（108）上形成图案的装置。

8. 发明申请

WO2009017770A2 MICRORESONANTOR SYSTEMS AND METHODS OF FABRICATING THE SAME 审中-公开
标题翻译：微波分解系统及其制备方法
公开(公告)号：WO2009017770A2
公开(公告)日：2009-02-05
申请号：PCT/US2008/009225
申请日：2008-07-30
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , TAN, Michael , WANG, Shih-Yuan , STEWART, Duncan , FATTAL, David
发明人： TAN, Michael , WANG, Shih-Yuan , STEWART, Duncan , FATTAL, David
IPC分类号： H01S3/08 , H01S3/109
CPC分类号： H01S5/1075 , B82Y20/00 , G02B6/12007 , H01S5/026 , H01S5/0424 , H01S5/1032 , H01S5/1042 , H01S5/34306
摘要： Various embodiments of the present invention are related to microresonator systems and to methods of fabricating the microresonator systems. In one embodiment, a microresonator system (200) comprises a substrate (206) having a top surface layer (204) and at least one waveguide (214,216) embedded in the substrate and positioned adjacent to the top surface layer of the substrate. The microresonator system also includes a microresonator (202,402) having a top layer (218), an intermediate layer (222), a bottom layer (220), a peripheral region, and a peripheral coating (224). The bottom layer (220) of the microresonator is attached to and in electrical communication with the top surface layer (204) of the substrate. The microresonator is positioned so that at least a portion of the peripheral region is located above the at least one waveguide (214, 216). The peripheral coating (224) covers at least a portion of the peripheral surface and has a relatively lower index of refraction than the top, intermediate, and bottom layers of the microresonator.
摘要翻译：本发明的各种实施例涉及微谐振器系统和制造微谐振器系统的方法。在一个实施例中，微谐振器系统（200）包括具有顶表面层（204）的衬底（206）和嵌入衬底中的至少一个波导（214,216），并且邻近衬底的顶表面层定位。微谐振器系统还包括具有顶层（218），中间层（222），底层（220），周边区域和外围涂层（224）的微谐振器（202,402）。微谐振器的底层（220）附着到衬底的顶表面层（204）并且与衬底的顶表面层（204）电连通。微谐振器被定位成使得周边区域的至少一部分位于至少一个波导（214,216）之上。周边涂层（224）覆盖周边表面的至少一部分并且具有比微谐振器的顶层，中间层和底层更低的折射率。

9. 发明申请

WO2006133438A3 OPTICALLY COUPLED INTEGRATED CIRCUIT LAYERS USING A SUPERLENS ELEMENT 审中-公开
公开(公告)号：WO2006133438A3
公开(公告)日：2006-12-14
申请号：PCT/US2006/022668
申请日：2006-06-09
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WANG, Shih-Yuan
发明人： WANG, Shih-Yuan
IPC分类号： G02B6/43 , G02B27/58 , G02B3/00 , G02B1/00 , H01Q15/00 , G02B6/12
摘要： In an optoelectronic integrated circuit device (102) comprising a vertical arrangement of integrated circuit layers, an optical signal is coupled between a first integrated circuit layer (104) thereof and a second integrated circuit layer (106) thereof . The optical signal is projected through a superlensing element (110) positioned between the first (104) and second (106) untegrated circuit layers. Also known as perfect lens, negatively refracting lens, composite material lens, flat lens, and metamaterial lens, a superlens element under proper conditions is generally not subject to diffraction limitations associated with positive-index optical lenses, and can therefore image light to a resolution much finer than a wavelength. The vertical distance between the emitting and receiving apertures (108) and (112) is less than one wavelength of the emitted light, and each is in the near field relative to the superlensing element (110) . The superlensing element (110) may comprise a thin slab of a highly conductive metal such as silver.

10. 发明申请

WO2006036902A1 MACH ZEHNDER PHOTONIC CRYSTAL SENSORS AND METHODS 审中-公开
标题翻译： MACH ZEHNDER光电晶体传感器和方法
公开(公告)号：WO2006036902A1
公开(公告)日：2006-04-06
申请号：PCT/US2005/034448
申请日：2005-09-23
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WANG, Shih-Yuan , ISLAM, M. Saiful , BRATKOVSKI, Alexandre M , BEAUSOLEIL, Raymond G
发明人： WANG, Shih-Yuan , ISLAM, M. Saiful , BRATKOVSKI, Alexandre M , BEAUSOLEIL, Raymond G
IPC分类号： G01N21/77 , G01N21/45
CPC分类号： G01N21/552 , G01N21/45
摘要： A sensor apparatus (800) includes a photonic crystal structure (802) including a Mach Zehnder interferometer with a reference arm (812) and a sensor arm (810) configured to provide an evanescent field through a sensed medium region (814) adjacent to the sensor arm (810).
摘要翻译：传感器设备（800）包括光子晶体结构（802），该光子晶体结构包括具有参考臂（812）的马赫曾德尔干涉仪和传感器臂（810），其配置成通过邻近传感器臂（810）。

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