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1. 发明申请

WO2005114328A2 QUARTZ GLASS BLANK AND METHOD FOR PRODUCING SAID BLANK 审中-公开
标题翻译：石英玻璃坯料和方法生产同样
公开(公告)号：WO2005114328A2
公开(公告)日：2005-12-01
申请号：PCT/EP2005005059
申请日：2005-05-11
申请人： HERAEUS QUARZGLAS , SHINETSU QUARTZ PROD , ENGLISCH WOLFGANG , TAKKE RALF , KUEHN BODO , UEBBING BRUNO , KOEPPLER RAINER
发明人： ENGLISCH WOLFGANG , TAKKE RALF , KUEHN BODO , UEBBING BRUNO , KOEPPLER RAINER
IPC分类号： C03B19/01 , C03B19/14 , C03C3/06 , G03F7/00
CPC分类号： C03B19/1469 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2201/42
摘要： The invention relates to a quartz glass blank for an optical component for transmitting radiation with a wavelength of 15 nm and shorter. Said blank consists of a highly pure quartz glass, doped with titanium and/or fluorine, which is characterised by an extremely high degree of homogeneity. The homogeneity relates to the following characteristics: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution ( in relation to the mean value of the TiO2 content), b) an absolute, maximum inhomogeneity in the thermal expansion coefficient Deltaalpha in the main functional direction (
摘要翻译：本发明涉及一种石英玻璃坯料的光学组件，用于发射波长为15nm和更短的高纯度的的辐射，与钛和/或氟掺杂的石英玻璃，其特点是非常高的均匀性。均一性是指以下特征：a）通过在TiO 2分布的局部方差微不均匀性（<0.05％的TiO 2，平均超过（5微米的体积元素）<3>相比TiO2Gehalts的平均值），b）中的绝对最大不均匀性在主工作方向（<5ppb的/ K）的热膨胀德尔塔阿尔法的系数，c）中具有超过最大0.4 ppb的/（K'cm）的的石英玻璃坯料的可用表面的热膨胀系数的径向变化; D）在最大为2纳米/厘米的主要功能，特定历史，以及e）根据（b）中德尔塔阿尔法光学表面上的平均的特定路线的方向633nm的应力双折射（SDB）。此石英玻璃坯料是仅获得由通过火焰水解而得到的产物和含钛和/或含氟化合物掺杂的石英玻璃的形状为大体积的含硅基，棒状起始体进入由若干成形步骤和均化装置空白的均匀的石英玻璃。

2. 发明申请

WO2005102950A3 QUARTZ GLASS COMPONENT FOR A UV RADIATION SOURCE AND METHOD FOR PRODUCING AND TESTING THE APTITUDE 审中-公开
标题翻译：石英玻璃部件，用于诊断的生产性和适用性UV辐射源和方法
公开(公告)号：WO2005102950A3
公开(公告)日：2006-03-02
申请号：PCT/EP2005003549
申请日：2005-04-05
申请人： HERAEUS QUARZGLAS , SHINETSU QUARTZ PROD , SCHREIBER ANDREAS , KUEHN BODO , SCHILLING FRANZ-JOSEF , ARNOLD ERICH , WITZKE HANS-DIETER
发明人： SCHREIBER ANDREAS , KUEHN BODO , SCHILLING FRANZ-JOSEF , ARNOLD ERICH , WITZKE HANS-DIETER
IPC分类号： C03B19/01 , C03B19/14 , C03B32/00 , C03C3/06 , C03C4/00 , H01J61/30 , G01N21/64
CPC分类号： C03B19/01 , C03B19/1453 , C03B32/00 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/23 , C03C3/06
摘要： A conventional method for producing a quartz glass component for a UV radiation source includes melting SiO 2 containing grains. The aim of the invention is to provide an improved and inexpensive method which allows for the production of a quartz glass component that is characterized by high radiation resistance. For this purpose, synthetically produced quartz crystals are smelted to give an initial product that consists of quartz glass, and contains hydroxyl groups in a number greater than the number of SiH groups. In order to remove the SiH groups, the initial product is subjected to a tempering step at a temperature of at least 850 °C, thereby obtaining the quartz glass component. The inventive quartz glass component is characterized in that the quartz glass is smelted from synthetically produced quartz crystals and has an SiH group content of less than 5 x 10 17 molecules/cm 3 . The invention also relates to a method for testing the aptitude of a quartz glass component for the use thereof with a UV radiation source.
摘要翻译：在已知的处理的石英玻璃部件的制造中的SiO _{2 砂砾的熔化进行一个用于含UV辐射源。要指定此基础上具有成本效益的方法，通过其获得石英玻璃元件，其特征是高耐辐射性，本发明提出的是合成产生的熔融石英的晶体，以形成一个初步的产品，它由石英玻璃含有以羟基数比SiH基团的数量越多，并且进行消除SiH基团，所述前体的退火在至少850℃的温度，而获得石英玻璃元件。在本发明的石英玻璃元件，合成产生的石英晶体的石英玻璃被熔化并具有小于5×10 ^{17 分子/ cm ^{3 到的SiH基团的含量，对于石英玻璃元件的适用性使用用UV辐射的源的诊断方法也被要求保护。}}}

3. 发明申请

WO2014128148A3 OPTICAL COMPONENT MADE OF QUARTZ GLASS FOR USE IN ARF EXCIMER LASER LITHOGRAPHY, AND METHOD FOR PRODUCING THE COMPONENT 审中-公开
标题翻译：光学部件QUARZGLAS FOR USE IN ArF准分子激光光刻法和制造方法COMPONENT
公开(公告)号：WO2014128148A3
公开(公告)日：2014-11-27
申请号：PCT/EP2014053199
申请日：2014-02-19
申请人： HERAEUS QUARZGLAS , SHINETSU QUARTZ PROD
发明人： KUEHN BODO
IPC分类号： C03C4/00 , C03B19/01 , C03B19/14 , C03B20/00 , C03B32/00 , C03C3/06 , G02B1/00 , G02B1/02
CPC分类号： C03C3/06 , C03B19/1453 , C03B32/00 , C03B32/02 , C03B2201/07 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2201/24 , C03C4/04 , C03C2201/11 , C03C2201/12 , C03C2201/21 , C03C2201/23 , C03C2201/24 , C03C2203/54 , C03C2204/00 , G02B1/00 , G02B1/02 , Y02P40/57
摘要： The invention relates to an optical component made of synthetic quartz glass for use in an ArF excimer laser lithography process with an applied wavelength of 193 nm, comprising a glass structure substantially free of oxygen defect sites, a hydrogen content ranging from 0.1 x 1016 molecules/cm3 to 1.0 x 1018 molecules/cm3, an SiH group content of less than 2 x 1017 molecules/cm3, and a hydroxyl group content ranging from 0.1 to 100 wt. ppm, said glass structure having a fictive temperature of less than 1070 °C. The aim of the invention is to allow a reliable prediction of the compacting behavior when using UV laser radiation with the applied wavelength on the basis of a measurement of the compacting behavior using a measured wavelength of 633 nm. This is achieved by an optical component design in which the component undergoes a laser-induced change in the refractive index in response to irradiation by means of a radiation with a wavelength of 193 nm using 5x109 pulses with a pulse width of 125 ns and a respective energy density of 500 µJ/cm2 at a pulse repetition frequency of 2000 Hz, said change totaling a first measured value M193nm when measured using the applied wavelength of 193 nm and totaling a second measured value M633nm when measured using a measured wavelength of 633 nm, wherein M193nm/M633nm
摘要翻译：本发明涉及一种用于在ArF准分子激光光刻法使用具有193nm的波长使用的光合成的石英玻璃部件，用玻璃结构基本没有氧缺陷，在0.1×1016分子/立方厘米至1的范围内的氢含量 0×1018分子/厘米3，SiH基团的含量小于2×1017摩尔/厘米3，并且具有羟基的0.1重量和100ppm之间的范围内，其中所述玻璃结构的含量为少的假想温度具有1070℃ 为了在633测量波长为使得能够与所使用的波长的紫外激光辐射使用时，压实行为的可靠预测从Kompaktierungsverhaltens的测量开始，该光学装置的结构，提出了，这是对照射的193纳米与5×10 9的波长的辐射用的125毫微秒的脉冲宽度和各500μJ/ cm 2的能量密度和2000Hz的与折射率的激光诱导的变化的脉冲重复频率的脉冲进行反应，所述量在测量用的193nm的第一测量值M193nm和测量与633nm的测定波长使用波长第二测量值M633nm的产率，其中：M193nm / M633nm <1.7。

4. 发明专利

JP2008285400A Method of producing optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component 有权
标题翻译：生产具有增强耐辐射电阻的合成石英玻璃的光学元件的方法和用于生产组件的空白
公开(公告)号：JP2008285400A
公开(公告)日：2008-11-27
申请号：JP2008100081
申请日：2008-04-08
申请人： Heraeus Quarzglas Gmbh & Co Kg , Shinetsu Quartz Prod Co Ltd , ヘレウス・クアルツグラース・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンディット・ゲゼルシャフトHeraeus Quarzglas GmbH & Co. KG , 信越石英株式会社
发明人： KUEHN BODO , KAISER STEFFEN , KASSUBE DENIS , MERGET KERSTIN
IPC分类号： C03B20/00 , G03F1/14 , H01L21/027
CPC分类号： C03B25/02 , C03B19/1453 , C03B32/00 , C03B2201/075 , C03B2201/21 , C03C3/06 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/42 , C03C2203/52 , Y02P40/57
摘要： PROBLEM TO BE SOLVED: To provide an optical component of synthetic quartz glass optimized with respect to compaction and central birefringence.
SOLUTION: The production method for an optical component of synthetic quartz glass includes subjecting a quartz glass blank to a multistage annealing treatment comprising the processes of: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1,130°C and 1,240°C; (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1,100°C, a fictive temperature with a high mean value of 1,100°C or more being reached in the quartz glass; and (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950°C and 1,100°C such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50°C lower than the high mean value of the fictive temperature according to the process (b).
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供在压实和中心双折射方面优化的合成石英玻璃的光学部件。解决方案：合成石英玻璃的光学部件的制造方法包括对石英玻璃坯料进行多阶段退火处理，包括以下工序：（a）第一处理阶段，石英玻璃坯料在上部处理温度范围介于1130°C至1240°C之间; （b）将第一高平均冷却速度的石英玻璃坯料冷却至1100℃以下的淬火温度，在石英玻璃中达到1100℃以上的高平均值的假想温度; 和（c）第二处理阶段，其包括以第二低平均冷却速度冷却石英玻璃坯料，并且其中石英玻璃坯料在950℃至1100℃之间的较低温度范围内处理，使得根据方法（b），石英玻璃中的低温平均值比假想温度的平均值低至少50℃。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2007302554A Manufacturing method of synthetic quartz glass having predetermined hydroxy group content 有权
标题翻译：具有预测羟基组合的合成石英玻璃的制备方法
公开(公告)号：JP2007302554A
公开(公告)日：2007-11-22
申请号：JP2007126669
申请日：2007-05-11
申请人： Heraeus Quarzglas Gmbh & Co Kg , Shinetsu Quartz Prod Co Ltd , ヘレウス・クアルツグラース・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンディット・ゲゼルシャフトHeraeus Quarzglas GmbH & Co. KG , 信越石英株式会社
发明人： OCHS STEPHAN , KUEHN BODO
IPC分类号： C03B8/04 , G02B1/02
CPC分类号： C03B19/1453 , C03B37/01446
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of an ultraviolet ray radiation resistant synthetic quartz glass having a predetermined hydroxy group content and a low chlorine content.
SOLUTION: The manufacture of the synthetic quartz glass having the predetermined hydroxy group content includes (a) a step of forming a porous SiO
2 soot material by a flame hydrolysis reaction or oxidation of a silicon-containing starting compound and lamellar deposition of SiO
2 particle on a rotary supporting body and (b) a step of dehydrating the soot material at drying temperature in a reaction gas-containing dry atmosphere to remove the hydroxy group and (c) a step of forming the synthetic quartz glass by vitrifying the SiO
2 soot material, and the dehydrating treatment by the step (b) includes a drying stage using ozone as a reaction gas, and an ozone content in the dry atmosphere at that time is 0.5-10 vol.%, and the drying temperature is selected in a range of 1,200-1,300°C, which results in that halogen is not supplied the dry atmosphere.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：解决的问题：提供具有预定羟基含量和低氯含量的耐紫外线辐射合成石英玻璃的制造方法。解决方案：具有预定羟基含量的合成石英玻璃的制造包括：（a）通过火焰水解反应或硅 - 氧化硅的氧化形成多孔SiO 2 烟灰材料的步骤，含有起始化合物和SiO 2 SBS颗粒在旋转支撑体上的层状沉积，（b）在含反应气体的干燥气氛中的干燥温度下使烟灰材料脱水以除去羟基，（c）通过玻璃化SiO 2 烟灰材料形成合成石英玻璃的步骤，并且步骤（b）的脱水处理包括使用臭氧作为反应气体的干燥阶段和臭氧此时的干燥气氛中的含量为0.5〜10体积％，干燥温度选择在1200〜1300℃的范围内，导致不向干燥气氛供给卤素。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2005239537A Method for producing optical element 审中-公开
标题翻译：生产光学元件的方法
公开(公告)号：JP2005239537A
公开(公告)日：2005-09-08
申请号：JP2005039918
申请日：2005-02-17
申请人： Heraeus Quarzglas Gmbh & Co Kg , Shinetsu Quartz Prod Co Ltd , ヘレウスクワルツグラスゲーエムベーハーウントコンパニーカーゲー , 信越石英株式会社
发明人： KUEHN BODO , UEBBING BRUNO , RADOSEVIC IGOR
IPC分类号： G02B1/00 , C03B19/14 , C03B20/00 , C03B32/00 , C03C3/06 , C03C4/00 , G02B3/00
CPC分类号： C03B32/00 , C03B19/1453 , C03B19/1469 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C2201/21 , C03C2201/23
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a cylindrical optical element in which changes are hardly shown in density and the index of refraction during irradiation with UV (ultraviolet rays) radiation, thus damages due to UV radiation are eliminated, and on the other hand, optimization is attained regarding the residual stress birefringence.
SOLUTION: In the method for producing the optical element, ultraviolet rays with a wavelength of 250 nm or shorter is transmitted. The optical element is made of a cylindrical quartz glass stock having a mean OH content of >50 wt.ppm, and subjected to first annealing for removing the stress birefringence. In accordance with the invention, second annealing is performed to the quartz glass stock, and, in the second annealing treatment, heating is performed at a low annealing temperature in the range of 350 to 800°C for one hour or more. Further, in the quartz glass stock to be used, the condition that the deviation from the mean OH content in a direction vertical to the cylindrical longitudinal axis is ≤20 wt.ppm has to be satisfied.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决的问题：为了提供一种在UV（紫外线）辐射照射期间密度和折射率几乎不显示变化的圆柱形光学元件的制造方法，因此消除了由于紫外线辐射而造成的损伤，另一方面，关于残余应力双折射获得优化。解决方案：在制造光学元件的方法中，传输波长为250nm或更短的紫外线。光学元件由平均OH含量> 50重量ppm的圆柱形石英玻璃原料制成，并进行第一次退火以去除应力双折射。根据本发明，对石英玻璃原料进行第二退火，在第二退火处理中，在350〜800℃的低退火温度下进行1小时以上的加热。此外，在所使用的石英玻璃原料中，必须满足与垂直于圆筒纵轴的方向的平均OH含量的偏差≤20重量ppm的条件。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2006298754A Optical component of quartz glass, its production method and its use 有权
标题翻译： QUARTZ玻璃的光学部件，其生产方法及其使用
公开(公告)号：JP2006298754A
公开(公告)日：2006-11-02
申请号：JP2006112974
申请日：2006-04-17
申请人： Heraeus Quarzglas Gmbh & Co Kg , Shinetsu Quartz Prod Co Ltd , ヘレウスクワルツグラスゲーエムベーハーウントコンパニーカーゲー , 信越石英株式会社
发明人： KUEHN BODO , OCHS STEFAN , KAISER STEFFEN , KASSUBE DENIS
IPC分类号： C03C3/06 , C03B8/04 , C03B20/00 , G02B1/02 , G03F7/20 , H01L21/027
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1469 , C03B2201/07 , C03B2201/075 , C03B2201/21 , C03C4/0085 , C03C2201/11 , C03C2201/12 , C03C2201/21 , C03C2201/23 , Y02P40/57
摘要： PROBLEM TO BE SOLVED: To provide an optical component of quartz glass which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change and suitable for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm. SOLUTION: The quartz glass shows the combination of several characteristics: particularly a glass structure essentially without oxygen defects; a mean content of hydroxy groups of less than 60 wt ppm; a mean content of fluorine of less than 10 wt ppm; and a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following steps: producing and drying an SiO 2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供优化用于线偏振UV激光辐射的石英玻璃的光学部件，特别是关于由各向异性密度变化引起的压实和双折射，并适用于投影透镜系统工作波长低于250nm的浸没光刻技术。
解决方案：石英玻璃显示出几个特征的组合：特别是基本上没有氧缺陷的玻璃结构; 羟基的平均含量小于60重量ppm; 氟的平均含量小于10重量ppm; 氯的平均含量小于1重量ppm。一种制造这种光学元件的方法包括以下步骤：在还原条件下制备和干燥SiO 2 SBS烟炱体，并在玻璃化之前或玻璃化期间用与氧气缺陷反应的试剂处理干燥的烟炱体石英玻璃结构。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2007230860A Method for manufacturing material of objective projection lens for liquid immersion lithography 审中-公开
标题翻译：用于制造用于液体渗透层析的目标投影镜头材料的方法
公开(公告)号：JP2007230860A
公开(公告)日：2007-09-13
申请号：JP2007045131
申请日：2007-02-26
申请人： Heraeus Quarzglas Gmbh & Co Kg , Shinetsu Quartz Prod Co Ltd , ヘレウスクワルツグラスゲーエムベーハーウントコンパニーカーゲー , 信越石英株式会社
发明人： KUEHN BODO , OCHS STEFAN , TROMMER MARTIN , WIEDEMANN KARL-HEINZ
IPC分类号： C03B8/04 , G02B1/00 , G03F7/20 , H01L21/027
CPC分类号： G02B21/33 , C03B19/143 , C03B2201/70 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a material for an objective projection lens for liquid immersion lithography which contacts with a liquid immersion medium. SOLUTION: A phosphate glass containing an alkaline earth oxide is formed by preparing a reaction zone on a deposition burner, supplying a synthetic phosphorus compound to be oxidized and an alkaline earth compound, forming amorphous oxide particles under the existence of an oxygen-containing gas, and depositing the particles on a carrier. The refractive index of the phosphate glass is at least 1.6 at a wave length of 193 nm. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于制造与液浸介质接触的液浸光刻用目标投影透镜的材料的方法。解决方案：含有碱土金属氧化物的磷酸盐玻璃通过在沉积燃烧器上制备反应区，提供合成的待氧化的磷化合物和碱土金属化合物，在氧气存在下形成无定形氧化物颗粒而形成，并且将颗粒沉积在载体上。磷酸盐玻璃的折射率在波长193nm处为至少1.6。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2005289801A Optical element of quartz glass, method of manufacturing the optical element and its use 有权
标题翻译：石墨玻璃的光学元件，制造光学元件的方法及其使用
公开(公告)号：JP2005289801A
公开(公告)日：2005-10-20
申请号：JP2005100522
申请日：2005-03-31
申请人： Heraeus Quarzglas Gmbh & Co Kg , Shinetsu Quartz Prod Co Ltd , ヘレウスクワルツグラスゲーエムベーハーウントコンパニーカーゲー , 信越石英株式会社
发明人： KUEHN BODO , THOMAS STEPHAN , KAISER STEFFEN
IPC分类号： C03B19/14 , C03B20/00 , C03C3/06 , C03C4/00 , G02B1/00 , G03F7/20 , H01L21/027
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1469 , C03B2201/21 , C03B2201/23 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/44 , C03C2203/52 , C03C2203/54 , G02B1/00 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： PROBLEM TO BE SOLVED: To reduce a variation of an anisotropic density of an optical element used for a linearly polarized UV laser beam radiation.
SOLUTION: The optical element especially suitable for a linearly polarized UV laser beam radiation is provided starting from an optical element of a quartz glass, which comprises a glass structure substantially having no oxygen defect, an average hydrogen content of 0.1×10
16 -5.0×10
16 molecules/cm
3 , and an SiH content of 16 molecules/cm
3 and transmitting an ultraviolet radiation with a wavelength of 190-250 nm. The quartz glass of this invention has a content of hydroxyl group of 10-250 wt.ppm and a virtual temperature of ≥1,000°C.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：减少用于线偏振UV激光束辐射的光学元件的各向异性密度的变化。解决方案：特别适用于线性偏振UV激光束辐射的光学元件是从石英玻璃的光学元件开始提供的，该石英玻璃包括基本上没有氧缺陷的玻璃结构，平均氢含量为0.1×10 < SP> 16 -5.0×10 16分子/ cm 3 / SP>，SiH含量<5×10 cm 3，并且透射波长为190-250nm的紫外线。本发明的石英玻璃的羟基含量为10-250重量ppm，虚拟温度为≥1000℃。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2007290950A Material suitable for optical device used for microlithography, and method of fabricating blank from the material 有权
标题翻译：用于微结构的光学装置的材料以及从材料中制造空白的方法
公开(公告)号：JP2007290950A
公开(公告)日：2007-11-08
申请号：JP2007045132
申请日：2007-02-26
申请人： Heraeus Quarzglas Gmbh & Co Kg , Shinetsu Quartz Prod Co Ltd , ヘレウスクワルツグラスゲーエムベーハーウントコンパニーカーゲー , 信越石英株式会社
发明人： KUEHN BODO , OCHS STEFAN
IPC分类号： C03B20/00 , C03B8/04 , G02B1/02
CPC分类号： C04B35/14 , C03C10/0009 , C04B35/645 , C04B2235/6565 , C04B2235/77 , C04B2235/785 , C04B2235/786 , C04B2235/94 , C04B2235/95 , C04B2235/9661
摘要： PROBLEM TO BE SOLVED: To provide a material which is low in absorption for an ultraviolet ray having a wavelength of 250 nanometer, low in birefringence, high in chemical resistance, and high in radiation resistance and therefore suitable for fabrication of optical devicess in microlithography.
SOLUTION: The material forms polycrystalline structure and comprises synthetic quartz crystallites having an average grain size in the range of 500 nm to 30 μm. The blank is made from this material, and the method for making the blank comprises the steps of preparing particles comprising synthetic quartz crystals having the average particle size in the range of 500 nm to 30μm and sintering these particles to prepare polycrystalline quartz blanks.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种波长为250纳米，双折射低，耐化学性高，耐辐射性高的紫外线吸收性低的材料，因此适合制造光学装置在微光刻中。解决方案：该材料形成多晶结构，并且包括平均晶粒尺寸在500nm至30μm范围内的合成石英微晶。坯料由该材料制成，制造坯料的方法包括以下步骤：制备包含平均粒径在500nm至30μm范围内的合成石英晶体的颗粒，并烧结这些颗粒以制备多晶石英坯。版权所有（C）2008，JPO＆INPIT

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