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    • 2. 发明申请
    • AUTONOMUS FLUID CONTROL DEVICE HAVING A MOVABLE VALVE PLATE FOR DOWNHOLE FLUID SELECTION
    • 具有可移动阀板的自动液体控制装置,用于下游液体选择
    • WO2013066295A1
    • 2013-05-10
    • PCT/US2011/058606
    • 2011-10-31
    • HALLIBURTON ENERGY SERVICES, INCLOPEZ, Jean-marcZHAO, Liang
    • LOPEZ, Jean-marcZHAO, Liang
    • E21B34/08E21B43/12
    • E21B34/08E21B43/12E21B2034/005F16K15/03
    • An apparatus and method are described for autonomously controlling flow of fluid in a subterranean well, where fluid flow is controlled based on a fluid characteristic, such as viscosity or density, which changes over time. Fluid flows into a vortex assembly where a centrifugal force is imparted to the fluid. A less viscous fluid will have a relatively greater velocity and centrifugal force than a more viscous fluid. The fluid exits the vortex chamber by both a vortex outlet and a peripheral outlet. An autonomous valve element moves between an open position, in which fluid flows freely through the peripheral outlet, and a closed position, in which fluid flow through the peripheral outlet is restricted. The valve element is moved by the centrifugal force of the fluid, such that a fluid having a higher centrifugal force moves the valve element to the closed position, thereby reducing the total fluid flow through the vortex assembly.
    • 描述了一种用于自主控制地下井中的流体流动的装置和方法,其中基于随时间变化的流体特性(例如粘度或密度)来控制流体流动。 流体流入涡流组件,其中离心力被施加到流体。 较粘稠的流体将具有比较粘稠的流体相对更大的速度和离心力。 流体通过涡流出口和外围出口都离开涡流室。 自主阀元件在流体通过周边出口自由流动的打开位置和闭合位置之间移动,在该位置中流过外围出口的流体受到限制。 阀元件通过流体的离心力移动,使得具有较高离心力的流体将阀元件移动到关闭位置,从而减少通过涡流组件的总流体流量。
    • 6. 发明申请
    • DOWNHOLE FLUID FLOW CONTROL SYSTEM AND METHOD HAVING DIRECTION DEPENDENT FLOW RESISTANCE
    • 井下流体流动控制系统及具有方向依赖流动阻力的方法
    • WO2012082343A2
    • 2012-06-21
    • PCT/US2011/062190
    • 2011-11-28
    • HALLIBURTON ENERGY SERVICES, INC.LOPEZ, Jean-marc
    • LOPEZ, Jean-marc
    • E21B43/12
    • E21B43/12
    • A downhole fluid flow control system (100). The flow control system (100) includes a flow control component (122) having direction dependent flow resistance created by a vortex chamber (144). Production fluids (140) that travel through the flow control component (122) in a first direction enter the vortex chamber (144) traveling primarily in a tangential direction (148) to experience a first pressure drop. Injection fluids (150) that travel through the flow control component (122) in a second direction enter the vortex chamber (144) traveling primarily in a radial direction (152) to experience a second pressure drop. The pressure drop created by the tangential flow (148) of the production fluids (140) is greater than the pressure drop created by the radial flow (152) of the injection fluids (150).
    • 井下流体流量控制系统(100)。 流量控制系统(100)包括具有由涡流室(144)产生的方向依赖的流动阻力的流量控制部件(122)。 沿着第一方向行进通过流量控制部件(122)的生产流体(140)进入主要沿切线方向(148)行进的涡流室(144)以经历第一压降。 沿第二方向行进通过流量控制部件(122)的注入流体(150)进入主要沿径向方向(152)行进的涡流室(144),以经历第二压降。 由生产流体(140)的切向流(148)产生的压降大于由注射流体(150)的径向流(152)产生的压降。
    • 7. 发明公开
    • DOWNHOLE FLUID FLOW CONTROL SYSTEM AND METHOD HAVING DIRECTION DEPENDENT FLOW RESISTANCE
    • 系统和方法用于控制方向流动阻力井渗流
    • EP2652258A2
    • 2013-10-23
    • EP11847917.9
    • 2011-11-28
    • Halliburton Energy Services, Inc.
    • LOPEZ, Jean-marc
    • E21B43/12
    • E21B43/12
    • A downhole fluid flow control system (100). The flow control system (100) includes a flow control component (122) having direction dependent flow resistance created by a vortex chamber (144). Production fluids (140) that travel through the flow control component (122) in a first direction enter the vortex chamber (144) traveling primarily in a tangential direction (148) to experience a first pressure drop. Injection fluids (150) that travel through the flow control component (122) in a second direction enter the vortex chamber (144) traveling primarily in a radial direction (152) to experience a second pressure drop. The pressure drop created by the tangential flow (148) of the production fluids (140) is greater than the pressure drop created by the radial flow (152) of the injection fluids (150).
    • 一种井下流体流动控制系统(100)。 流动控制系统(100)包括具有由涡流室(144)中创建依赖于方向的流动阻力的流动控制部件(122)。 生产流体(140)通过做在第一方向上流动控制部件(122)行进进入涡流室(144)在切线方向(148)主要行进体验第一压降。 注入流体(150)通过做在第二方向上流动控制部件(122)行进进入涡流室(144)在径向方向(152)主要行进体验的第二压降。 由生产流体(140)的切向流(148)产生的压力降比由喷射流体(150)的径向流动(152)产生的压力降较大。