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    • 8. 发明授权
    • Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges
    • 玻璃基板涂覆有在红外和/或太阳能范围内具有反射性质的薄层堆叠
    • US06602587B2
    • 2003-08-05
    • US09337463
    • 1999-06-21
    • Philippe MacquartOlivier GuiselinVeronique Rondeau
    • Philippe MacquartOlivier GuiselinVeronique Rondeau
    • B32B1706
    • C03C17/3618B32B17/10174C03C17/36C03C17/3626C03C17/3634C03C17/3639C03C17/3644C03C17/3652C03C17/366C03C17/3681G02B1/116Y10T428/12493Y10T428/12542Y10T428/12896Y10T428/12944Y10T428/24975Y10T428/265
    • A transparent substrate particularly of glass, provided with a stack of thin layers having at least one metallic layer (4) having properties in the infrared range particularly having low emissivity and two coatings having a base of dielectric material located one (8) under and the other (9) over the layer having properties in the infrared range, as well as a protective metallic layer (5) place immediately over an in contact with the layer having properties in the infrared range, characterized in that in order to prevent the modification of properties of the stack, particularly optical and thermal properties, in the case where the substrate is submitted to a thermal treatment of the tempering or bending kind, firstly the second coating (9) having a base of dielectric material, includes a barrier layer for the diffusion of oxygen chosen from the following materials: components of silicon SiO2, SiOxCy, SiONNy, nitrates such as Si3N4 or AlN, carbides such as SiC, TiC, CrC, TaC of a thickness of at least 10 nanometers and preferably of at least 20 nanometers, and secondly the layer having properties in the infrared range is directly in contact with the underlying dielectric coating.
    • 一种特别是玻璃的透明衬底,其具有一层薄层,该薄层具有至少一个在红外范围内具有特性,具有低发射率的金属层(4),以及两个涂层,其中介电材料的底部位于下面(8) 在具有红外范围的性质的层上的其它(9)以及保护性金属层(5)立即与具有红外范围性质的层接触,其特征在于,为了防止改变 在基板进行回火或弯曲类型的热处理的情况下,首先具有电介质材料的基底的第二涂层(9)包括用于所述电介质材料的阻挡层的叠层的特性,特别是光学和热性质 从以下材料中选择的氧的扩散:硅SiO 2,SiO x C y,SiON N y,硝酸盐如Si 3 N 4或AlN的组分,碳化物如SiC,TiC,CrC,厚度的TaC 至少10纳米,优选至少20纳米,其次具有红外范围性质的层直接与下面的介电涂层接触。