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    • 10. 发明申请
    • ION SOURCE WITH RECESS IN ELECTRODE
    • 离子源与电极接触
    • WO2008010882A2
    • 2008-01-24
    • PCT/US2007/013717
    • 2007-06-12
    • GUARDIAN INDUSTRIES CORP.MURPHY, Nestor, P.ROCK, David
    • MURPHY, Nestor, P.ROCK, David
    • C23C16/00
    • H01J37/08H01J27/024H01J27/143H01J2237/31
    • An ion source capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions is provided. The ion source includes at least one anode and at least one cathode. In certain example embodiments, the anode may. have a recess formed therein in which ions to be included in the ion beam may accelerate. Walls of the recess optionally may be insulated using, for example, ceramic. One or more holes may be provided to allow a supply of gas to flow into the recess, and those holes optionally may be tapered such that they narrow towards the recess. Thus, certain example embodiments produce an ion source having a higher energy efficiency (e.g., having increasing ion energy).
    • 提供了能够产生和/或发射可用于沉积衬底上的层或执行其它功能的离子束的离子源。 离子源包括至少一个阳极和至少一个阴极。 在某些示例性实施例中,阳极可以。 其中形成有其中包含在离子束中的离子可以加速的凹陷。 凹部的壁可以任选地使用例如陶瓷绝缘。 可以设置一个或多个孔以允许气体供应流入凹部,并且这些孔任选地可以是锥形的,使得它们朝向凹部变窄。 因此,某些示例性实施例产生具有较高能量效率(例如具有增加的离子能量)的离子源。