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1. 发明申请

US20110070740A1 CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE 有权
标题翻译：钳式单声道淋浴电极
公开(公告)号：US20110070740A1
公开(公告)日：2011-03-24
申请号：US12884269
申请日：2010-09-17
申请人： Gregory R. Bettencourt , Gautam Bhattacharyya , Simon Gosselin Eng. , Sandy Chao , Anthony de la Llera , Pratik Mankidy
发明人： Gregory R. Bettencourt , Gautam Bhattacharyya , Simon Gosselin Eng. , Sandy Chao , Anthony de la Llera , Pratik Mankidy
IPC分类号： H01L21/3065 , C23C16/54
CPC分类号： H01J37/32541 , H01J37/3244 , H01J37/32532 , H01J37/32568
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the showerhead electrode.
摘要翻译：用于等离子体反应室的电极组件，用于半导体衬底处理。该组件包括上部喷头电极，其通过一系列间隔开的凸轮锁定机械地附接到背板。防护环围绕背板并且可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以用工具旋转以释放从喷头电极的上表面延伸的锁定销。

2. 发明申请

US20100261354A1 GASKET WITH POSITIONING FEATURE FOR CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE 有权
标题翻译：具有夹紧单片水平电极定位特征的垫圈
公开(公告)号：US20100261354A1
公开(公告)日：2010-10-14
申请号：US12421845
申请日：2009-04-10
申请人： GREGORY R. BETTENCOURT , Gautam Bhattacharyya , Simon Gosselin Eng , Sandy Chao
发明人： GREGORY R. BETTENCOURT , Gautam Bhattacharyya , Simon Gosselin Eng , Sandy Chao
IPC分类号： H01L21/3065 , C23C16/44 , H01L21/306 , B23P6/00
CPC分类号： H01L21/67069 , H01J37/16 , H01J37/3244 , H01J37/32541 , H01J37/32605 , H01J2237/166
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.
摘要翻译：用于等离子体反应室的电极组件，用于半导体衬底处理。该组件包括上部喷头电极，其通过一系列间隔开的凸轮锁定机械地附接到背板。在其上具有突起的导电和导电垫片在喷头电极和背板之间在距离喷头电极的中心三至四英寸的位置处被压缩。保护环围绕背板并且可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以用工具旋转以释放从电极的上表面延伸的锁定销。

3. 发明申请

US20130034967A1 GASKET WITH POSITIONING FEATURE FOR CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE 有权
标题翻译：具有夹紧单片水平电极定位特征的垫圈
公开(公告)号：US20130034967A1
公开(公告)日：2013-02-07
申请号：US13591039
申请日：2012-08-21
申请人： Gregory R. Bettencourt , Gautam Bhattacharyya , Simon Gosselin Eng. , Sandy Chao
发明人： Gregory R. Bettencourt , Gautam Bhattacharyya , Simon Gosselin Eng. , Sandy Chao
IPC分类号： H01L21/3065 , B23P6/00
CPC分类号： H01L21/67069 , H01J37/16 , H01J37/3244 , H01J37/32541 , H01J37/32605 , H01J2237/166
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.
摘要翻译：用于等离子体反应室的电极组件，用于半导体衬底处理。该组件包括上部喷头电极，其通过一系列间隔开的凸轮锁定机械地附接到背板。在其上具有突起的导电和导电垫片在喷头电极和背板之间在距离喷头电极的中心三至四英寸的位置处被压缩。保护环围绕背板并且可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以用工具旋转以释放从电极的上表面延伸的锁定销。

4. 发明授权

US08272346B2 Gasket with positioning feature for clamped monolithic showerhead electrode 有权
标题翻译：垫片具有夹紧单片喷头电极的定位功能
公开(公告)号：US08272346B2
公开(公告)日：2012-09-25
申请号：US12421845
申请日：2009-04-10
申请人： Gregory R. Bettencourt , Gautam Bhattacharyya , Simon Gosselin Eng , Sandy Chao
发明人： Gregory R. Bettencourt , Gautam Bhattacharyya , Simon Gosselin Eng , Sandy Chao
IPC分类号： C23C16/50 , C23C16/503 , C23C16/509 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： H01L21/67069 , H01J37/16 , H01J37/3244 , H01J37/32541 , H01J37/32605 , H01J2237/166
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.
摘要翻译：用于等离子体反应室的电极组件，用于半导体衬底处理。该组件包括上部喷头电极，其通过一系列间隔开的凸轮锁定机械地附接到背板。在其上具有突起的导电和导电垫片在喷头电极和背板之间在距离喷头电极的中心三至四英寸的位置处被压缩。保护环围绕背板并且可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以用工具旋转以释放从电极的上表面延伸的锁定销。

5. 发明授权

US08419959B2 Clamped monolithic showerhead electrode 有权
标题翻译：夹紧单片喷头电极
公开(公告)号：US08419959B2
公开(公告)日：2013-04-16
申请号：US12884269
申请日：2010-09-17
申请人： Gregory R. Bettencourt , Gautam Bhattacharyya , Simon Gosselin Eng. , Sandy Chao , Anthony de la Llera , Pratik Mankidy
发明人： Gregory R. Bettencourt , Gautam Bhattacharyya , Simon Gosselin Eng. , Sandy Chao , Anthony de la Llera , Pratik Mankidy
IPC分类号： C03C15/00 , C03C25/68 , H01L21/302 , H01L21/461 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32541 , H01J37/3244 , H01J37/32532 , H01J37/32568
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the showerhead electrode.
摘要翻译：用于等离子体反应室的电极组件，用于半导体衬底处理。该组件包括上部喷头电极，其通过一系列间隔开的凸轮锁定机械地附接到背板。防护环围绕背板并且可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以用工具旋转以释放从喷头电极的上表面延伸的锁定销。

6. 发明申请

US20110104884A1 HOT EDGE RING WITH SLOPED UPPER SURFACE 有权
标题翻译：带有斜面上表面的热边缘环
公开(公告)号：US20110104884A1
公开(公告)日：2011-05-05
申请号：US12917969
申请日：2010-11-02
申请人： Akira Koshiishi , Sathya Mani , Gautam Bhattacharyya , Gregory R. Bettencourt , Sandy Chao
发明人： Akira Koshiishi , Sathya Mani , Gautam Bhattacharyya , Gregory R. Bettencourt , Sandy Chao
IPC分类号： H01L21/443 , H01L21/465 , H01L21/469
CPC分类号： H01J37/20 , H01J37/317 , H01J37/32091 , H01J37/32623 , H01J2237/2001
摘要： A hot edge ring with extended lifetime comprises an annular body having a sloped upper surface. The hot edge ring includes a step underlying an outer edge of a semiconductor substrate supported in a plasma processing chamber wherein plasma is used to process the substrate. The step includes a vertical surface which surrounds the outer edge of the substrate and the sloped upper surface extends upwardly and outwardly from the upper periphery of the vertical surface.
摘要翻译：具有延长寿命的热边缘环包括具有倾斜的上表面的环形体。热边缘环包括支撑在等离子体处理室中的半导体衬底的外边缘下方的阶梯，其中使用等离子体来处理衬底。该步骤包括围绕基板的外边缘的垂直表面，并且倾斜的上表面从垂直表面的上周向上和向外延伸。

7. 发明授权

US08084375B2 Hot edge ring with sloped upper surface 有权
标题翻译：热边缘带有倾斜的上表面
公开(公告)号：US08084375B2
公开(公告)日：2011-12-27
申请号：US12917969
申请日：2010-11-02
申请人： Akira Koshiishi , Sathya Mani , Gautam Bhattacharyya , Gregory R. Bettencourt , Sandy Chao
发明人： Akira Koshiishi , Sathya Mani , Gautam Bhattacharyya , Gregory R. Bettencourt , Sandy Chao
IPC分类号： H01L21/00 , C23C16/00
CPC分类号： H01J37/20 , H01J37/317 , H01J37/32091 , H01J37/32623 , H01J2237/2001
摘要： A hot edge ring with extended lifetime comprises an annular body having a sloped upper surface. The hot edge ring includes a step underlying an outer edge of a semiconductor substrate supported in a plasma processing chamber wherein plasma is used to process the substrate. The step includes a vertical surface which surrounds the outer edge of the substrate and the sloped upper surface extends upwardly and outwardly from the upper periphery of the vertical surface.
摘要翻译：具有延长寿命的热边缘环包括具有倾斜的上表面的环形体。热边缘环包括支撑在等离子体处理室中的半导体衬底的外边缘下方的阶梯，其中使用等离子体来处理衬底。该步骤包括围绕基板的外边缘的垂直表面，并且倾斜的上表面从垂直表面的上周向上和向外延伸。

8. 发明授权

US08536071B2 Gasket with positioning feature for clamped monolithic showerhead electrode 有权
标题翻译：垫片具有夹紧单片喷头电极的定位功能
公开(公告)号：US08536071B2
公开(公告)日：2013-09-17
申请号：US13591039
申请日：2012-08-21
申请人： Gregory R. Bettencourt , Gautam Bhattacharyya , Simon Gosselin , Sandy Chao
发明人： Gregory R. Bettencourt , Gautam Bhattacharyya , Simon Gosselin , Sandy Chao
IPC分类号： H01L21/00 , H05H1/24 , C23C16/50 , C23C16/509 , C23C16/455 , C23C16/22
CPC分类号： H01L21/67069 , H01J37/16 , H01J37/3244 , H01J37/32541 , H01J37/32605 , H01J2237/166
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.
摘要翻译：用于等离子体反应室的电极组件，用于半导体衬底处理。该组件包括上部喷头电极，其通过一系列间隔开的凸轮锁定机械地附接到背板。在其上具有突起的导电和导电垫片在喷头电极和背板之间在距离喷头电极的中心三至四英寸的位置处被压缩。保护环围绕背板并且可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以用工具旋转以释放从电极的上表面延伸的锁定销。

9. 发明申请

US20050284528A1 Methods and apparatus for providing fluid to a semiconductor device processing apparatus 有权
标题翻译：用于向半导体器件处理装置提供流体的方法和装置
公开(公告)号：US20050284528A1
公开(公告)日：2005-12-29
申请号：US11048106
申请日：2005-01-28
申请人： Sandy Chao , Songjae Lee , Ho Shin
发明人： Sandy Chao , Songjae Lee , Ho Shin
IPC分类号： F16K27/00 , F17D1/00
CPC分类号： C07C43/23 , C07C217/84 , C07C237/04 , C07F9/12 , F16K27/003 , Y10T137/87249 , Y10T137/87885
摘要： In a first aspect, a valve assembly is provided that includes a valve assembly output adapted to output at least one of DI water and a chemical. A first valve of the valve assembly includes (1) a first input adapted to receive the chemical; (2) a first output adapted to circulate the chemical to a chemical return; and (3) a second output adapted to output the chemical to the valve assembly output. The valve assembly also includes a second valve positioned downstream from the first valve. The second valve includes (1) an input adapted to receive deionized (DI) water; and (2) an output adapted to output DI water to the valve assembly output. A check valve is coupled between the second output of the first valve and the output of the second valve, and the first valve, second valve and check valve are included in a single manifold.
摘要翻译：在第一方面，提供了一种阀组件，其包括适于输出去离子水和化学品中的至少一种的阀组件输出。阀组件的第一阀包括（1）适于接收化学品的第一输入; （2）适于将化学品循环至化学品返回的第一输出; 和（3）适于将化学品输出到阀组件输出的第二输出。阀组件还包括位于第一阀下游的第二阀。第二阀包括（1）适于接收去离子水（DI）的输入口; 和（2）适于将DI水输出到阀组件输出的输出。止回阀联接在第一阀的第二输出和第二阀的输出之间，并且第一阀，第二阀和止回阀包括在单个歧管中。

10. 发明申请

US20060207671A1 Methods and apparatus for providing fluid to a semiconductor device processing apparatus 有权
标题翻译：用于向半导体器件处理装置提供流体的方法和装置
公开(公告)号：US20060207671A1
公开(公告)日：2006-09-21
申请号：US11439783
申请日：2006-05-23
申请人： Sandy Chao , Songjae Lee , Ho Shin
发明人： Sandy Chao , Songjae Lee , Ho Shin
IPC分类号： F17D1/00
CPC分类号： C07C43/23 , C07C217/84 , C07C237/04 , C07F9/12 , F16K27/003 , Y10T137/87249 , Y10T137/87885
摘要： In a first aspect, a valve assembly is provided that includes a valve assembly output adapted to output at least one of DI water and a chemical. A first valve of the valve assembly includes (1) a first input adapted to receive the chemical; (2) a first output adapted to circulate the chemical to a chemical return; and (3) a second output adapted to output the chemical to the valve assembly output. The valve assembly also includes a second valve positioned downstream from the first valve. The second valve includes (1) an input adapted to receive deionized (DI) water; and (2) an output adapted to output DI water to the valve assembly output. A check valve is coupled between the second output of the first valve and the output of the second valve, and the first valve, second valve and check valve are included in a single manifold.
摘要翻译：在第一方面，提供了一种阀组件，其包括适于输出去离子水和化学品中的至少一种的阀组件输出。阀组件的第一阀包括（1）适于接收化学品的第一输入; （2）适于将化学品循环至化学品返回的第一输出; 和（3）适于将化学品输出到阀组件输出的第二输出。阀组件还包括位于第一阀下游的第二阀。第二阀包括（1）适于接收去离子水（DI）的输入口; 和（2）适于将DI水输出到阀组件输出的输出。止回阀联接在第一阀的第二输出和第二阀的输出之间，并且第一阀，第二阀和止回阀包括在单个歧管中。

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