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    • 3. 发明授权
    • Plasma generation apparatus
    • 等离子体发生装置
    • US08492979B2
    • 2013-07-23
    • US12731700
    • 2010-03-25
    • Govardhan GanireddyThangavelu AsokanAdnan Kutubuddin Bohori
    • Govardhan GanireddyThangavelu AsokanAdnan Kutubuddin Bohori
    • H05B31/26B23K9/00
    • H05H1/36H05H1/44
    • Provided is an apparatus, such as an arc mitigating device, which can include a first plasma generation device and a second plasma generation device. The second plasma generation device can include a pair of opposing and spaced apart electrodes and a low voltage, high current energy source connected therebetween. A conduit can be configured to direct plasma between the first and second plasma generation devices, such that the second plasma generation device receives plasma generated by the first plasma generation. The plasma from the first plasma generation device can act to reduce the impedance of an area between the pair of opposing electrodes sufficiently to allow an arc to be established therebetween due to the low voltage, high current energy source.
    • 提供了一种诸如减弧装置的装置,其可以包括第一等离子体产生装置和第二等离子体产生装置。 第二等离子体产生装置可以包括一对相对且间隔开的电极和连接在它们之间的低电压,高电流能量源。 导管可以被配置为在第一和第二等离子体产生装置之间引导等离子体,使得第二等离子体产生装置接收由第一等离子体产生产生的等离子体。 来自第一等离子体产生装置的等离子体可以充分地减小一对相对电极之间的区域的阻抗,以允许由于低电压,高电流能量源而在其间建立电弧。
    • 4. 发明申请
    • PLASMA GENERATION APPARATUS
    • 等离子体发生装置
    • US20110248002A1
    • 2011-10-13
    • US12759049
    • 2010-04-13
    • Adnan Kutubuddin BohoriThangavelu AsokanGovardhan Ganireddy
    • Adnan Kutubuddin BohoriThangavelu AsokanGovardhan Ganireddy
    • B23K10/00
    • H05H1/52H01T2/02
    • Provided is an apparatus, such as an arc mitigating device, that includes an annular body that defines a lumen and a longitudinal axis, the annular body having a body length along the longitudinal axis. An electrode can be disposed coaxially within the lumen. The electrode may extend into the body by an electrode length that is at least about 50% of the body length, and may have diameter less than or equal to about 50% of an inner diameter of the annular body. An ablative material portion can be disposed between the annular body and the electrode. The annular body and the electrode may be configured such that when an arc exists between the annular body and the electrode, the ablative material portion undergoes ablation and thereby generates a plasma.
    • 提供了一种诸如减弧装置的装置,其包括限定内腔和纵向轴线的环形体,环形体具有沿着纵向轴线的主体长度。 电极可以同轴地设置在内腔内。 电极可以通过至少约50体积长度的电极长度延伸到体内,并且可以具有小于或等于环形体内径的约50%的直径。 烧蚀材料部分可以设置在环形体和电极之间。 环形体和电极可以被配置为使得当在环形体和电极之间存在电弧时,烧蚀材料部分经历消融并由此产生等离子体。
    • 5. 发明申请
    • PLASMA GENERATION APPARATUS
    • 等离子体发生装置
    • US20110234099A1
    • 2011-09-29
    • US12731700
    • 2010-03-25
    • Govardhan GanireddyThangavelu AsokanAdnan Kutubuddin Bohori
    • Govardhan GanireddyThangavelu AsokanAdnan Kutubuddin Bohori
    • H05H1/24
    • H05H1/36H05H1/44
    • Provided is an apparatus, such as an arc mitigating device, which can include a first plasma generation device and a second plasma generation device. The second plasma generation device can include a pair of opposing and spaced apart electrodes and a low voltage, high current energy source connected therebetween. A conduit can be configured to direct plasma between the first and second plasma generation devices, such that the second plasma generation device receives plasma generated by the first plasma generation. The plasma from the first plasma generation device can act to reduce the impedance of an area between the pair of opposing electrodes sufficiently to allow an arc to be established therebetween due to the low voltage, high current energy source.
    • 提供了一种诸如减弧装置的装置,其可以包括第一等离子体产生装置和第二等离子体产生装置。 第二等离子体产生装置可以包括一对相对且间隔开的电极和连接在它们之间的低电压,高电流能量源。 导管可以被配置为在第一和第二等离子体产生装置之间引导等离子体,使得第二等离子体产生装置接收由第一等离子体产生产生的等离子体。 来自第一等离子体产生装置的等离子体可以充分地减小一对相对电极之间的区域的阻抗,以允许由于低电压,高电流能量源而在其间建立电弧。