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1. 发明授权

US4572827A Process for preparing finely-divided silicon dioxide in good yield 失效
标题翻译：以高产率制备细碎二氧化硅的方法
公开(公告)号：US4572827A
公开(公告)日：1986-02-25
申请号：US594150
申请日：1984-10-18
申请人： Gosta Flemmert
发明人： Gosta Flemmert
IPC分类号： C01B33/16 , B01J12/00 , C01B7/19 , C01B33/18
CPC分类号： C01B33/184 , B01J12/005 , C01B33/183 , C01B7/193 , C01P2006/12 , C01P2006/22 , C01P2006/80
摘要： Process and apparatus are provided for preparing finely-divided silicon dioxide in good yield by reaction of silicon fluoride in the vapor phase with water vapor, combustible gas and free oxygen-containing gas in a flame reaction zone to form hydrogen fluoride and silicon dioxide entrained in a gaseous reaction mixture; withdrawing the gaseous reaction mixture from the flame reaction zone; and then immediately and rapidly cooling the gaseous reaction mixture and entrained silicon dioxide to a temperature below 700.degree. C. by passing the gaseous reaction mixture in a turbulent flow at a Reynolds number above 300 under constraint through a straight narrow passage in alignment with the gas flow, the passage having a diameter within the range from about 20 to about 150 mm and smooth walls constituting a cooling surface.
摘要翻译：提供了工艺和装置，用于通过在气相中的氟化硅与水蒸气，可燃气体和游离含氧气体在火焰反应区中反应来以良好的收率制备细分二氧化硅，以形成氟化氢和二氧化碳气态反应混合物; 从火焰反应区取出气态反应混合物; 然后立即并快速地将气态反应混合物和夹带的二氧化硅冷却至低于700℃的温度，通过使气态反应混合物在雷诺数高于300的湍流中在约束条件下通过与气体对准的直的窄通道流动，通道具有在约20至约150mm的范围内的直径和构成冷却表面的平滑壁。

2. 发明授权

US4559218A Process and apparatus for preparing finely-divided silicon dioxide having good thixotropic properties 失效
标题翻译：用于制备具有良好触变特性的细碎二氧化硅的方法和装置
公开(公告)号：US4559218A
公开(公告)日：1985-12-17
申请号：US575476
申请日：1984-01-30
申请人： Gosta Flemmert
发明人： Gosta Flemmert
IPC分类号： C01B33/16 , B01J12/00 , C01B7/19 , C01B33/18 , C01B33/12
CPC分类号： C01B7/193 , B01J12/005 , C01B33/183 , C01B33/184 , C01P2006/12 , C01P2006/22
摘要： Process and apparatus are provided for preparing finely-divided silicon dioxide having high thickening capacity and good thixotropic properties by reaction of silicon fluoride in the vapor phase with water vapor, combustible gas and free oxygen-containing gas in a flame reaction zone to form silicon dioxide and hydrogen fluoride while cooling the gaseous reaction mixture in that portion of the reaction zone adjacent the base of the flame by contact with a cooling surface maintained at a temperature below 500.degree. C. but above the dew point of the reaction waste gases generated in the flame reaction.
摘要翻译：提供了制备和设备，用于通过在气相中的氟化硅与水蒸汽，可燃气体和游离含氧气体在火焰反应区中反应形成二氧化硅，制备具有高增稠能力和良好触变性能的细碎二氧化硅和氟化氢，同时通过与保持在低于500℃的温度的冷却表面接触而在邻近火焰基底的那部分反应区域中冷却气态反应混合物，但高于在该温度下产生的反应废气的露点火焰反应。

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