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    • 2. 发明申请
    • METHOD OF MANUFACTURING SEMICONDUCTOR LIGHT EMITTING DEVICE
    • 制造半导体发光器件的方法
    • US20120107987A1
    • 2012-05-03
    • US13286834
    • 2011-11-01
    • Won Goo HURYoung Chul SHINGi Bum KIMSeung Woo CHOI
    • Won Goo HURYoung Chul SHINGi Bum KIMSeung Woo CHOI
    • H01L33/02
    • H01L33/42H01L33/025H01L2933/0016
    • There is provided a method of manufacturing a semiconductor light emitting device, the method including: forming a light emitting structure by sequentially growing an n-type nitride semiconductor layer, an active layer, and a p-type nitride semiconductor layer on a substrate; forming a transparent electrode on the p-type nitride semiconductor layer through a sputtering process; and forming a nitrogen gas atmosphere in an interior of a reaction chamber in which the sputtering process is performed, prior to or during the sputtering process.In the case of the semiconductor light emitting device obtained according to embodiments of the invention, a deterioration phenomenon in electrode characteristics caused due to a nitrogen vacancy may be minimized in manufacturing a transparent electrode through a sputtering process to thereby allow for the provision of a transparent electrode having significantly improved electrical characteristics.
    • 提供一种制造半导体发光器件的方法,该方法包括:通过在衬底上依次生长n型氮化物半导体层,有源层和p型氮化物半导体层来形成发光结构; 通过溅射法在p型氮化物半导体层上形成透明电极; 以及在溅射工艺之前或期间在其中进行溅射工艺的反应室的内部形成氮气气氛。 在根据本发明的实施例获得的半导体发光器件的情况下,由于氮空位引起的电极特性的劣化现象在通过溅射工艺制造透明电极时可能被最小化,从而允许提供透明 电极具有显着改善的电特性。