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1. 发明申请

US20050046845A1 System and method of measurement, system and method of alignment, lithographic apparatus and method 有权
标题翻译：系统和测量方法，系统和对准方法，光刻设备和方法
公开(公告)号：US20050046845A1
公开(公告)日：2005-03-03
申请号：US10882685
申请日：2004-07-02
申请人： Gerrit Nijmeijer , Anastasius Jacobus Bruinsma , Christiaan Hoogendam , Jeroen Broekhuijse , Sigurd Dressler , Edwin Eduard Nicolaas Krijnen , Robbert Van Leeuwen , Roeland Vanneer , Cornelis Ottens
发明人： Gerrit Nijmeijer , Anastasius Jacobus Bruinsma , Christiaan Hoogendam , Jeroen Broekhuijse , Sigurd Dressler , Edwin Eduard Nicolaas Krijnen , Robbert Van Leeuwen , Roeland Vanneer , Cornelis Ottens
IPC分类号： G03F7/207 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/68 , G01B11/02
CPC分类号： G03F9/7088 , G03F7/70808 , G03F7/70841 , G03F7/70858 , G03F9/7015 , G03F9/7096 , H01L21/682
摘要： A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted on a second frame of the apparatus that is thermally and mechanically decoupled from the first frame. An optical coupling is provided between the first frame and the second frame.
摘要翻译：光刻设备包括测量系统，该测量系统包括至少一个光学部件和至少一个电气部件。电气部件被配置为散热。光学部件安装在设备的第一框架上，并且电气部件安装在与第一框架热和机械分离的设备的第二框架上。在第一框架和第二框架之间设置光耦合器。

2. 发明申请

US20050179909A1 Lithographic apparatus, device manufacturing method, and method for determining z-displacement 有权
标题翻译：光刻设备，器件制造方法和用于确定z-位移的方法
公开(公告)号：US20050179909A1
公开(公告)日：2005-08-18
申请号：US10779864
申请日：2004-02-18
申请人： Edwin Eduard Nicolaas Krijnen
发明人： Edwin Eduard Nicolaas Krijnen
IPC分类号： G01B11/00 , G01B9/02 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70775
摘要： The present invention provides a method for determining a displacement in a z-direction, of an object which is fixed in a holder of an apparatus, by means of an interferometer system, wherein the object is illuminated by a beam of radiation, said beam being provided by said apparatus and having an optical axis extending in the z-direction. The method comprises arranging the measuring mirror(s) and/or measuring laser beam of an interferometer system such that no relevant part of the laser beam is parallel to the z-direction. This ensures that the interferometer system and its parts may be arranged away from the beam of radiation, allowing larger diameter projection systems for said beam of radiation, as well as more homogeneous air showers around said object. Thus the quality of the illumination of the object may be improved. The invention further provides a lithographic apparatus incorporating the method, as well as a device manufacturing method using the lithographic apparatus and/or the method for determining z-displacement according to the invention.
摘要翻译：本发明提供了一种用于通过干涉仪系统确定固定在设备的保持器中的物体在z方向上的位移的方法，其中物体被辐射束照射，所述光束是由所述装置提供并且具有在z方向上延伸的光轴。该方法包括布置测量镜和/或测量干涉仪系统的激光束，使得激光束的相关部分不与z方向平行。这确保干涉仪系统及其部件可以远离辐射束布置，允许用于所述辐射束的更大直径的投影系统以及围绕所述物体的更均匀的空气淋浴。因此，可以提高对象的照明质量。本发明还提供一种包含该方法的光刻设备，以及使用光刻设备的装置制造方法和/或根据本发明的用于确定z位移的方法。

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