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    • 2. 发明授权
    • Process for depositing ceramic or organoceramic material on a substrate
    • 在基材上沉积陶瓷或有机陶瓷材料的方法
    • US09169552B2
    • 2015-10-27
    • US13394013
    • 2010-08-19
    • Till MerkelChristian Lehnert
    • Till MerkelChristian Lehnert
    • C23C2/40C23C16/40C23C16/448C23C16/455
    • C23C16/402C23C16/4488C23C16/45512
    • A process for the application of layers composed of ceramic or organoceramic materials on surfaces of metals, semimetals or compounds thereof and also components or assemblies made of these materials by a chemical deposition process from the gas phase at atmospheric pressure or 30% below this and process temperatures during deposition below 500° C. The deposition process is carried out in one operation, wherein the reactive chemical substances and the precursors are homogeneously backmixed in the common gas space, and the average residence time as a ratio of volume of the gas space to gas throughput is matched to the rate-determining step of the catalyzed gas-phase reaction of the coating process so as to achieve a deposition rate of from 10 to 2000 nm per hour.
    • 在由金属,半金属或其化合物的表面上施加由陶瓷或有机陶瓷材料组成的层的方法以及由这些材料制成的组件或组件的方法,其通过化学沉积工艺从大气压下的气相或低于该温度的30% 沉积过程中的温度低于500℃。沉积过程在一个操作中进行,其中反应性化学物质和前体在公共气体空间中均匀地回混,平均停留时间作为气体空间的体积比与 气体通过量与涂覆工艺的催化气相反应的速率确定步骤相匹配,以达到每小时10-2000nm的沉积速率。
    • 3. 发明申请
    • METHOD FOR APPLYING LAYERS
    • 应用层的方法
    • US20120219711A1
    • 2012-08-30
    • US13394013
    • 2010-08-19
    • Till MerkelChristian Lehnert
    • Till MerkelChristian Lehnert
    • C23C16/448
    • C23C16/402C23C16/4488C23C16/45512
    • A process for the application of layers composed of ceramic or organoceramic materials on surfaces of metals, semimetals or compounds thereof and also components or assemblies made of these materials by a chemical deposition process from the gas phase at atmospheric pressure or 30% below this and process temperatures during deposition below 500° C. The deposition process is carried out in one operation, wherein the reactive chemical substances and the precursors are homogeneously backmixed in the common gas space, and the average residence time as a ratio of volume of the gas space to gas throughput is matched to the rate-determining step of the catalyzed gas-phase reaction of the coating process so as to achieve a deposition rate of from 10 to 2000 nm per hour.
    • 在由金属,半金属或其化合物的表面上施加由陶瓷或有机陶瓷材料组成的层的方法以及由这些材料制成的组件或组件的方法,其通过化学沉积工艺从大气压下的气相或低于该温度的30% 沉积过程中的温度低于500℃。沉积过程在一个操作中进行,其中反应性化学物质和前体在公共气体空间中均匀地回混,平均停留时间作为气体空间的体积比与 气体通过量与涂覆工艺的催化气相反应的速率确定步骤相匹配,以达到每小时10-2000nm的沉积速率。