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    • 7. 发明授权
    • Apparatus for applying dielectric or metallic materials
    • 适用于电介质或金属材料的设备
    • US5070811A
    • 1991-12-10
    • US271175
    • 1988-11-14
    • Albert FeuersteinRainer Ludwig
    • Albert FeuersteinRainer Ludwig
    • H01J37/317C23C14/32H01J37/32
    • H01J37/32422C23C14/32
    • In an apparatus for applying dielectric or metallic substances, such as silicon dioxide, for example, to a substrate (15) disposed in a vacuum chamber (16, 17), the apparatus having an electron emitter (9) and having solenoid coils (30, 42) disposed in the area of the vacuum chamber, the electron emitter (9) is disposed in a separate generator chamber (37) forming the anode (11) and communicating with the vacuum chamber (17), so that, after the process gas is introduced into the generator chamber (37) a large-area plasma jet (8) is produced which is guided by the action of magnets (6, 20, 30, 42) between the electron emitter (9) and a melting furnace (7) disposed in the vacuum chamber (17), while the vapor stream issuing from the melting furnace (7) is accelerated and reaches the substrate (15) as activated vapor.
    • 在用于将诸如二氧化硅的电介质或金属物质例如施加到设置在真空室(16,17)中的衬底(15)的装置中,该装置具有电子发射器(9)并具有电磁线圈(30) ,42),所述电子发射器(9)设置在形成所述阳极(11)并与所述真空室(17)连通的分离的发电机室(37)中,从而在所述过程 气体被引入发生器室(37)中,产生大面积的等离子体射流(8),其由电子发射器(9)和熔炉(...)之间的磁体(6,20,30,42)的作用引导, 7)设置在真空室(17)中,同时从熔化炉(7)发出的蒸气流作为活化蒸气被加速并到达基板(15)。