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1. 发明申请

US20100153059A1 APPARATUS AND METHOD FOR MEASURING THE POSITIONS OF MARKS ON A MASK 审中-公开
标题翻译：用于测量标记标记位置的装置和方法
公开(公告)号：US20100153059A1
公开(公告)日：2010-06-17
申请号：US12594373
申请日：2008-03-11
申请人： Gerd Klose , Michael Arnz , Albrecht Hof , Helmut Krause , Ulrich Stroessner , Matthias Manger , Uwe Schellhorn , Karl-Heinz Bechstein
发明人： Gerd Klose , Michael Arnz , Albrecht Hof , Helmut Krause , Ulrich Stroessner , Matthias Manger , Uwe Schellhorn , Karl-Heinz Bechstein
IPC分类号： G06F15/00 , G01B21/20
CPC分类号： G01N21/95692 , G01N2021/95676 , G03F1/84
摘要： An apparatus for measuring the positions of marks on a mask is provided, said apparatus comprising a mask holder for holding the mask, a recording unit for recording the marks of the mask held by the mask holder, an actuating module for moving the mask holder and the recording unit relative to each other, and an evaluating module, which numerically calculates the gravity-induced sagging of the mask in the mask holder and determines the positions of the marks on the mask, based on the calculated sagging, the recordings made by the recording unit and the relative movement between the mask holder and the recording unit, wherein, prior to calculating said sagging, the present position of the mask in the mask holder is determined and is taken into consideration in said numerical calculation, and/or the geometrical dimensions of the mask are taken into consideration in said numerical calculation of sagging.
摘要翻译：提供了一种用于测量掩模上的标记位置的装置，所述装置包括用于保持掩模的掩模保持器，用于记录由掩模保持器保持的掩模的标记的记录单元，用于移动掩模保持器的致动模块和所述记录单元相对于所述记录单元，以及评估模块，其对所述掩模保持器中的所述掩模的重力引起的下垂进行数值计算，并基于所计算的下垂来确定所述掩模上的所述标记的位置，记录单元和掩模保持器和记录单元之间的相对运动，其中，在计算所述下垂之前，确定掩模保持器中掩模的当前位置并在所述数值计算中被考虑，和/或几何在下垂的数值计算中考虑到面罩的尺寸。

2. 发明申请

US20110242544A1 METHOD AND APPARATUS FOR MEASURING STRUCTURES ON PHOTOLITHOGRAPHY MASKS 有权
标题翻译：用于测量光刻胶掩模结构的方法和装置
公开(公告)号：US20110242544A1
公开(公告)日：2011-10-06
申请号：US13062566
申请日：2009-09-18
申请人： Ulrich Stroessner , Gerd Klose , Michael Totzeck
发明人： Ulrich Stroessner , Gerd Klose , Michael Totzeck
IPC分类号： G01B11/02 , G01B11/14 , G01J4/00
CPC分类号： G03F1/84 , G03F7/70141
摘要： The invention relates to a method for measuring structures on masks (1) for photolithography, wherein firstly the mask (1) is mounted on a spatially movable platform (2). The position of the platform (2) is controlled in this case. The structure on the mask (1) is illuminated with illumination light from an illumination light source which emits coherent light. The light coming from the mask (1) is imaged onto a detection device (6) by an imaging optical unit (4) and detected. The detected signals are evaluated in an evaluation device (7) and the positions and dimensions of the structures are determined. The invention also relates to an apparatus by which these method steps, in particular, can be carried out. In this case, the accuracy of the position and dimension determination is increased by the properties of the illumination light being coordinated with the structure to be measured. For this purpose, the illumination device (3, 3′) has setting means for coordinating the properties of the illumination light with the structure to be measured.
摘要翻译：本发明涉及一种用于测量用于光刻的掩模（1）上的结构的方法，其中首先将掩模（1）安装在空间上可移动的平台（2）上。在这种情况下，控制平台（2）的位置。掩模（1）上的结构被来自发出相干光的照明光源的照明光照射。来自掩模（1）的光通过成像光学单元（4）成像到检测装置（6）上并进行检测。在评估装置（7）中评估检测到的信号，并确定结构的位置和尺寸。本发明还涉及一种可以进行这些方法步骤的装置。在这种情况下，通过与要测量的结构协调的照明光的特性来增加位置和尺寸确定的精度。为此，照明装置（3,3'）具有用于使照明光的特性与被测量结构协调的设定装置。

3. 发明授权

US08736849B2 Method and apparatus for measuring structures on photolithography masks 有权
标题翻译：用于测量光刻掩模上的结构的方法和装置
公开(公告)号：US08736849B2
公开(公告)日：2014-05-27
申请号：US13062566
申请日：2009-09-18
申请人： Ulrich Stroessner , Gerd Klose , Michael Totzeck
发明人： Ulrich Stroessner , Gerd Klose , Michael Totzeck
IPC分类号： G01N21/00 , G01B11/14 , G03B27/42
CPC分类号： G03F1/84 , G03F7/70141
摘要： The invention relates to a method for measuring structures on masks (1) for photolithography, wherein firstly the mask (1) is mounted on a spatially movable platform (2). The position of the platform (2) is controlled in this case. The structure on the mask (1) is illuminated with illumination light from an illumination light source which emits coherent light. The light coming from the mask (1) is imaged onto a detection device (6) by an imaging optical unit (4) and detected. The detected signals are evaluated in an evaluation device (7) and the positions and dimensions of the structures are determined. The invention also relates to an apparatus by which these method steps, in particular, can be carried out. In this case, the accuracy of the position and dimension determination is increased by the properties of the illumination light being coordinated with the structure to be measured. For this purpose, the illumination device (3, 3′) has setting means for coordinating the properties of the illumination light with the structure to be measured.
摘要翻译：本发明涉及一种用于测量用于光刻的掩模（1）上的结构的方法，其中首先将掩模（1）安装在空间上可移动的平台（2）上。在这种情况下，控制平台（2）的位置。掩模（1）上的结构被来自发出相干光的照明光源的照明光照射。来自掩模（1）的光通过成像光学单元（4）成像到检测装置（6）上并进行检测。在评估装置（7）中评估检测到的信号，并确定结构的位置和尺寸。本发明还涉及一种可以进行这些方法步骤的装置。在这种情况下，通过与要测量的结构协调的照明光的特性来增加位置和尺寸确定的精度。为此，照明装置（3,3'）具有用于使照明光的特性与被测量结构协调的设定装置。

4. 发明申请

US20060007541A1 Imaging system for emulation of a high aperture scanning system 有权
标题翻译：用于高光圈扫描系统仿真的成像系统
公开(公告)号：US20060007541A1
公开(公告)日：2006-01-12
申请号：US10923551
申请日：2004-08-20
申请人： Michael Totzeck , Ulrich Stroessner , Joern Greif-Wuestenbecker
发明人： Michael Totzeck , Ulrich Stroessner , Joern Greif-Wuestenbecker
IPC分类号： G02B5/30
CPC分类号： G03F7/70566 , G02B21/002 , G02B27/286 , G03F7/70666
摘要： The present invention is directed to an optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The imaging system, according to the invention, for emulating high-aperture scanner systems comprises imaging optics, a detector and an evaluating unit, wherein at least one polarization-active optical element is arranged as desired in the imaging beam path for selection of different polarization components of the imaging beam, an optical element with intensity attenuation function can be introduced in the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. With the proposed solution, it is possible in particular to examine lithography masks for defects in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems by means of inspection microscopes with high magnifications. Realistic images of the stepper systems can be generated by emulating the occurring vector effects.
摘要翻译：本发明涉及一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。根据本发明的用于模拟高光圈扫描器系统的成像系统包括成像光学器件，检测器和评估单元，其中至少一个偏振有源光学元件根据需要在成像光束路径中布置以选择不同的极化成像光束的成分，具有强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或样品的图像由检测器接收以用于不同偏振的光束分量，并被传送到评估单元进行进一步处理。利用所提出的解决方案，可以通过借助于具有高放大率的检查显微镜，检查光刻掩模的缺陷，尽管结构越来越小，成像系统的图像侧数值孔径越来越高。可以通过仿真出现的矢量效应来生成步进系统的现实图像。

5. 发明申请

US20120162755A1 MASK INSPECTION MICROSCOPE WITH VARIABLE ILLUMINATION SETTING 有权
标题翻译：具有可变照明设置的屏蔽检测显微镜
公开(公告)号：US20120162755A1
公开(公告)日：2012-06-28
申请号：US13391996
申请日：2010-08-28
申请人： Ulrich Stroessner , Holger Seitz , Norbert Rosenkranz , Mario Laengle
发明人： Ulrich Stroessner , Holger Seitz , Norbert Rosenkranz , Mario Laengle
IPC分类号： G02B21/06
CPC分类号： G02B21/086 , G02B5/005 , G03F1/84
摘要： During mask inspection it is necessary to identify defects which also occur during wafer exposure. Therefore, the aerial images generated in the resist and on the detector have to be as far as possible identical. In order to achieve an equivalent image generation, during mask inspection the illumination and, on the object side, the numerical aperture are adapted to the scanner used. The invention relates to a mask inspection microscope for variably setting the illumination. It serves for generating an image of the structure (150) of a reticle (145) arranged in an object plane in a field plane of the mask inspection microscope. It comprises a light source (5) that emits projection light, at least one illumination beam path (3, 87, 88), and a diaphragm for generating a resultant intensity distribution of the projection light in a pupil plane (135) of the illumination beam path (3, 87, 88) that is optically conjugate with respect to the object plane. According to the invention, the diaphragm is embodied in such a way that the resultant intensity distribution of the projection light has at least one further intensity value between a minimum and a maximum intensity value.
摘要翻译：在面罩检查期间，有必要识别在晶片曝光期间也会发生的缺陷。因此，在抗蚀剂和检测器上产生的空中图像必须尽可能相同。为了实现等效图像生成，在掩模检查期间，照明和物体侧的数值孔径适用于所使用的扫描仪。本发明涉及一种用于可变地设定照明的掩模检查显微镜。其用于生成布置在掩模检查显微镜的场平面中的物平面中的掩模版（145）的结构（150）的图像。它包括发射投影光的光源（5），至少一个照明光束路径（3,87,88）和用于产生投影光在照明光瞳面（135）中的合成强度分布的光阑光束路径（3,87,88），其相对于物平面光学共轭。根据本发明，隔膜的实施方式是使投影光的合成强度分布在最小和最大强度值之间具有至少一个另外的强度值。

6. 发明申请

US20110164313A1 MICROSCOPE FOR RETICLE INSPECTION WITH VARIABLE ILLUMINATION SETTINGS 有权
标题翻译：用可变照明设置进行检测的显微镜
公开(公告)号：US20110164313A1
公开(公告)日：2011-07-07
申请号：US13063294
申请日：2009-09-18
申请人： Ulrich Stroessner
发明人： Ulrich Stroessner
IPC分类号： G02B21/06
CPC分类号： G03F1/84 , G02B21/0016 , G02B21/16
摘要： During mask inspection predominantly defects of interest which also occur during wafer exposure. Therefore, the aerial images generated in the resist and on the detector have to be as far as possible identical. In order to achieve an equivalent image generation, during mask inspection the illumination and, on the object side, the numerical aperture are adapted to the scanner used. A further form of mask inspection microscopes serves for measuring the reticles and is also referred to as a registration tool. The illumination is used by the stated conventional and abaxial illumination settings for optimizing the contrast. The accuracy of the registration measurement is thus increased. The invention relates to a mask inspection microscope for variably setting the illumination. It serves for generating an image of the structure (150) of a reticle (145) arranged in an object plane in a field plane of the mask inspection microscope. It comprises a light source (5) that emits projection light, at least one illumination beam path (3, 87, 88), and a first diaphragm for generating a resultant intensity distribution of the projection light in a pupil plane (135) of the illumination beam path (3, 87, 88), that is optically conjugate with respect to the object plane. According to the invention, the mask inspection microscope has at least one further diaphragm for generating the resultant intensity distribution. The first diaphragm and the at least one further diaphragm influence the resultant intensity distribution of the projection light at least partly at different locations of the pupil plane (135).
摘要翻译：在掩模检查期间，主要是在晶片曝光期间也会发生的感兴趣的缺陷。因此，在抗蚀剂和检测器上产生的空中图像必须尽可能相同。为了实现等效图像生成，在掩模检查期间，照明和物体侧的数值孔径适用于所使用的扫描仪。掩模检查显微镜的另一种形式用于测量掩模版，并且也称为配准工具。通过所述常规和背面照明设置使用照明来优化对比度。因此，登记测量的精度增加。本发明涉及一种用于可变地设定照明的掩模检查显微镜。其用于生成布置在掩模检查显微镜的场平面中的物平面中的掩模版（145）的结构（150）的图像。它包括发射投影光的光源（5），至少一个照明光束路径（3,87,88）和第一光阑，用于产生投影光在瞳孔平面（135）中的合成强度分布照明光束路径（3,87,88），其相对于物平面光学共轭。根据本发明，掩模检查显微镜具有至少一个用于产生所得强度分布的另外的膜片。第一光阑和至少一个其它光阑至少部分地影响瞳孔平面（135）的不同位置处的投射光的合成强度分布。

7. 发明授权

US07961297B2 Method for determining intensity distribution in the image plane of a projection exposure arrangement 有权
标题翻译：用于确定投影曝光装置的图像平面中的强度分布的方法
公开(公告)号：US07961297B2
公开(公告)日：2011-06-14
申请号：US12065451
申请日：2006-09-02
申请人： Joern Greif-Wuestenbecker , Beate Boehme , Ulrich Stroessner , Michael Totzeck , Vladimir Kamenov , Olaf Dittmann , Daniel Kraehmer , Toralf Gruner , Bernd Geh
发明人： Joern Greif-Wuestenbecker , Beate Boehme , Ulrich Stroessner , Michael Totzeck , Vladimir Kamenov , Olaf Dittmann , Daniel Kraehmer , Toralf Gruner , Bernd Geh
IPC分类号： G03B27/72 , G03B27/32 , G03B27/68 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70666 , G03F7/70308
摘要： A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.
摘要翻译：一种用于确定投影曝光装置的焦平面中的强度分布的方法，其中大面积成像系统被仿真并且来自样品的光由仿真成像系统在局部分辨率检测器上表示。还描述了用于执行该方法和仿真装置的装置。由于考虑到系统变迹，本发明使得可以提高再现质量。本发明的方法包括确定输出光瞳中的积分幅度分布，将积分幅度分布与预定的变迹校正相结合，并根据修改的振幅分布计算校正的变迹图像。

8. 发明授权

US07535640B2 Imaging system for emulation of a high aperture scanning system 有权
标题翻译：用于高光圈扫描系统仿真的成像系统
公开(公告)号：US07535640B2
公开(公告)日：2009-05-19
申请号：US10923551
申请日：2004-08-20
申请人： Michael Totzeck , Ulrich Stroessner , Joern Greif-Wuestenbecker
发明人： Michael Totzeck , Ulrich Stroessner , Joern Greif-Wuestenbecker
IPC分类号： G02B27/28
CPC分类号： G03F7/70566 , G02B21/002 , G02B27/286 , G03F7/70666
摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems is provided. The imaging system for emulating high-aperture scanner systems includes imaging optics, a detector and an evaluating unit, wherein at least one polarization-active optical element is arranged as desired in the imaging beam path for selection of different polarization components of the imaging beam, an optical element with intensity attenuation function can be introduced in the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. It is possible to examine lithography masks for defects in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems Realistic images of the stepper systems can be generated by emulating the occurring vector effects.
摘要翻译：提供了一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。用于模拟高光圈扫描仪系统的成像系统包括成像光学器件，检测器和评估单元，其中至少一个偏振有源光学元件根据需要在成像光束路径中布置以选择成像光束的不同偏振分量，可以在成像光束路径中引入具有强度衰减功能的光学元件，由检测器接收掩模和/或样品的图像以用于不同偏振的光束分量，并被传送到评估单元进行进一步处理。尽管结构越来越小，成像系统的图像侧数值孔径越来越高，可以检查光刻掩模的缺陷。可以通过仿真出现的矢量效应来生成步进系统的现实图像。

9. 发明申请

US20080212060A1 Method for Determining Intensity Distribution in the Image Plane of a Projection Exposure Arrangement 有权
标题翻译：确定投影曝光安排图像平面中强度分布的方法
公开(公告)号：US20080212060A1
公开(公告)日：2008-09-04
申请号：US12065451
申请日：2006-09-02
申请人： Joern Greif-Wuestenbecker , Beate Boehme , Ulrich Stroessner , Michael Totzeck , Vladimir Kamenov , Olaf Dittmann , Daniel Kraehmer , Toralf Gruner , Bernd Geh
发明人： Joern Greif-Wuestenbecker , Beate Boehme , Ulrich Stroessner , Michael Totzeck , Vladimir Kamenov , Olaf Dittmann , Daniel Kraehmer , Toralf Gruner , Bernd Geh
IPC分类号： G03B27/54
CPC分类号： G03F7/70666 , G03F7/70308
摘要： A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method consists in includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.
摘要翻译：一种用于确定投影曝光装置的焦平面中的强度分布的方法，其中大面积成像系统被仿真并且来自样品的光由仿真成像系统在局部分辨率检测器上表示。还描述了用于执行该方法和仿真装置的装置。由于考虑到系统变迹，本发明使得可以提高再现质量。本发明的方法包括确定输出光瞳中的积分幅度分布，将积分幅度分布与预定的变迹校正相结合，并根据修改的幅度分布来计算校正的变迹图像。

10. 发明授权

US07626689B2 Method and device for analysing the imaging behavior of an optical imaging element 有权
标题翻译：用于分析光学成像元件的成像行为的方法和装置
公开(公告)号：US07626689B2
公开(公告)日：2009-12-01
申请号：US12158403
申请日：2006-12-15
申请人： Ulrich Stroessner , Joern Greif-Wuestenbecker
发明人： Ulrich Stroessner , Joern Greif-Wuestenbecker
IPC分类号： G01B9/00 , G01B11/00
CPC分类号： G01M11/0285 , G03F7/705 , G03F7/70566 , G03F7/70591 , G03F7/7085
摘要： A method for analyzing the imaging behavior of a first optical imaging element, in which an object is imaged by a second optical imaging element and light in the image plane is detected in a spatially resolved manner. The two optical imaging elements differ in at least one imaging characteristic. Values are determined for intensity and at least one second characteristic and then stored in image points, and processed in an emulation step. An emulation image is produced, taking into account the influence of the second characteristic. A series of images is produced by dividing a range of values of the second characteristic into subdomains, associating an image with each subdomain, and associating the corresponding intensity value with the image points of each image, in case the value of the second characteristic, associated with the image point, falls in the subdomain associated with the respective image.
摘要翻译：以空间分辨的方式检测第一光学成像元件的成像行为的方法，其中物体被第二光学成像元件成像，并且在图像平面中的光被检测。两个光学成像元件在至少一个成像特征上不同。根据强度和至少一个第二特性确定值，然后存储在图像点中，并在仿真步骤中进行处理。考虑到第二特性的影响，产生仿真图像。通过将第二特性的值的范围分为子域，将图像与每个子域相关联，并且将相应的强度值与每个图像的图像点相关联，产生一系列图像，在第二特征的值相关联的情况下与图像点一起落在与相应图像相关联的子域中。

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