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1. 发明申请

US20110128647A1 METHOD OF DISK ALIGNMENT USING PRINTED ALIGNMENT MARKS 有权
标题翻译：使用打印对齐标记进行磁盘对准的方法
公开(公告)号：US20110128647A1
公开(公告)日：2011-06-02
申请号：US12629791
申请日：2009-12-02
申请人： Gennady Gauzner , David S. Kuo , Justin Jia-Jen Hwu , Li-Ping Wang , Zhaoning Yu , Kim Yang Lee
发明人： Gennady Gauzner , David S. Kuo , Justin Jia-Jen Hwu , Li-Ping Wang , Zhaoning Yu , Kim Yang Lee
IPC分类号： G11B21/02 , G11B5/82 , G11B33/00 , G11B33/10
CPC分类号： G11B25/043 , B82Y10/00 , G11B5/743 , G11B5/746 , G11B5/82 , G11B5/855 , Y10T29/49021
摘要： Processes include aligning a disc with a template at a location so that the pattern from the template is transferred to the disc in a relative orientation. The relative orientation provides that when the disc with the transferred pattern is finally assembled into a hard disc drive, an inner diameter of the spindle hole of the disc may be abutted against an outer diameter of the disc drive spindle, and the data-containing patterns on the discs will be aligned concentrically with a center of the disc drive spindle. While the data-containing patterns are aligned concentrically with the disc drive spindle, the substrate itself is allowed to be non-concentric. Still other aspects include a disc having eccentric formations including PIM and one or more of bit patterns and servo information formed on a disc surface, the eccentricity of the formations is determined based on an expected difference between the radius of the spindle hole of the disc and the radius of the spindle on which the disc will be placed during assembly, with the PIM used to determine the angular alignment of the disc with the spindle.
摘要翻译：过程包括将光盘与模板在一个位置对齐，使得来自模板的图案以相对方向被传送到光盘。相对方向规定，当具有转印图案的光盘最终组装成硬盘驱动器时，盘的主轴孔的内径可以抵靠盘驱动主轴的外径，并且包含数据的图案碟盘将与盘片驱动主轴的中心同心对齐。当包含数据的图案与盘驱动器心轴同心对准时，衬底本身被允许为非同心的。其它方面还包括具有包括PIM和形成在盘表面上的位图形和伺服信息中的一种或多种的偏心构造的盘，基于盘的主轴孔的半径和在组装过程中将放置光盘的主轴的半径，PIM用于确定光盘与主轴的角度对齐。

2. 发明授权

US08792201B2 Method of disc alignment using printed alignment marks 有权
标题翻译：使用印刷对准标记的盘对准方法
公开(公告)号：US08792201B2
公开(公告)日：2014-07-29
申请号：US12629791
申请日：2009-12-02
申请人： Gennady Gauzner , David S. Kuo , Justin Jia-Jen Hwu , Li-Ping Wang , Zhaoning Yu , Kim Yang Lee
发明人： Gennady Gauzner , David S. Kuo , Justin Jia-Jen Hwu , Li-Ping Wang , Zhaoning Yu , Kim Yang Lee
IPC分类号： G11B21/02 , G11B5/82 , B82Y10/00 , G11B5/855 , G11B5/74 , G11B25/04
CPC分类号： G11B25/043 , B82Y10/00 , G11B5/743 , G11B5/746 , G11B5/82 , G11B5/855 , Y10T29/49021
摘要： Processes include aligning a disc with a template at a location so that the pattern from the template is transferred to the disc in a relative orientation. The relative orientation provides that when the disc with the transferred pattern is finally assembled into a hard disc drive, an inner diameter of the spindle hole of the disc may be abutted against an outer diameter of the disc drive spindle, and the data-containing patterns on the discs will be aligned concentrically with a center of the disc drive spindle. While the data-containing patterns are aligned concentrically with the disc drive spindle, the substrate itself is allowed to be non-concentric. Still other aspects include a disc having eccentric formations including PIM and one or more of bit patterns and servo information formed on a disc surface, the eccentricity of the formations is determined based on an expected difference between the radius of the spindle hole of the disc and the radius of the spindle on which the disc will be placed during assembly, with the PIM used to determine the angular alignment of the disc with the spindle.
摘要翻译：过程包括将光盘与模板在一个位置对齐，使得来自模板的图案以相对方向被传送到光盘。相对方向规定，当具有转印图案的光盘最终组装成硬盘驱动器时，盘的主轴孔的内径可以抵靠盘驱动主轴的外径，并且包含数据的图案碟盘将与盘片驱动主轴的中心同心对齐。当包含数据的图案与盘驱动器心轴同心对准时，衬底本身被允许为非同心的。其它方面还包括具有包括PIM和形成在盘表面上的位图形和伺服信息中的一种或多种的偏心构造的盘，基于盘的主轴孔的半径和在组装过程中将放置光盘的主轴的半径，PIM用于确定光盘与主轴的角度对齐。

3. 发明授权

US09284649B2 Method of patterning a stack 有权
标题翻译：堆叠图案的方法
公开(公告)号：US09284649B2
公开(公告)日：2016-03-15
申请号：US13173906
申请日：2011-06-30
申请人： Michael R. Feldbaum , Justin Jia-Jen Hwu , David S. Kuo , Gennady Gauzner , Kim Yang Lee , Li-Ping Wang
发明人： Michael R. Feldbaum , Justin Jia-Jen Hwu , David S. Kuo , Gennady Gauzner , Kim Yang Lee , Li-Ping Wang
IPC分类号： B32B9/00 , C23F4/00 , G03F7/00 , G11B5/855 , B82Y10/00 , B82Y40/00
CPC分类号： C23F4/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/855 , Y10T428/265
摘要： The embodiments disclose a method of fabricating a stack, including replacing a metal layer of a stack imprint structure with an oxide layer, patterning the oxide layer stack using chemical etch processes to transfer the pattern image and cleaning etch residue from the stack imprint structure to substantially prevent contamination of the metal layers.
摘要翻译：实施方案公开了一种制造叠层的方法，包括用氧化物层代替堆叠印记结构的金属层，使用化学蚀刻工艺对氧化物层堆叠进行图案化以将图案图像转移并将蚀刻残留物从堆叠印记结构清洗到基本上防止金属层的污染。

4. 发明申请

US20130004763A1 METHOD OF PATTERNING A STACK 有权
标题翻译：堆叠堆栈的方法
公开(公告)号：US20130004763A1
公开(公告)日：2013-01-03
申请号：US13173906
申请日：2011-06-30
申请人： Michael R. Feldbaum , Justin Jia-Jen Hwu , David S. Kuo , Gennady Gauzner , Kim Yang Lee , Li-Ping Wang
发明人： Michael R. Feldbaum , Justin Jia-Jen Hwu , David S. Kuo , Gennady Gauzner , Kim Yang Lee , Li-Ping Wang
IPC分类号： B32B3/00 , C23F1/08 , B32B19/00 , C23F1/00
CPC分类号： C23F4/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/855 , Y10T428/265
摘要： The embodiments disclose a method of fabricating a stack, including replacing a metal layer of a stack imprint structure with an oxide layer, patterning the oxide layer stack using chemical etch processes to transfer the pattern image and cleaning etch residue from the stack imprint structure to substantially prevent contamination of the metal layers.
摘要翻译：实施方案公开了一种制造叠层的方法，包括用氧化物层代替堆叠印记结构的金属层，使用化学蚀刻工艺对氧化物层堆叠进行图案化以将图案图像转移并将蚀刻残留物从堆叠印记结构清洗到基本上防止金属层的污染。

5. 发明申请

US20130001195A1 METHOD OF STACK PATTERNING USING A ION ETCHING 有权
标题翻译：使用离子蚀刻的堆叠图案的方法
公开(公告)号：US20130001195A1
公开(公告)日：2013-01-03
申请号：US13174132
申请日：2011-06-30
申请人： Michael R. Feldbaum , Justin Jia-Jen Hwu , David S. Kuo , Gennady Gauzner , Li-Ping Wang
发明人： Michael R. Feldbaum , Justin Jia-Jen Hwu , David S. Kuo , Gennady Gauzner , Li-Ping Wang
IPC分类号： C23F1/04 , C23F1/08
CPC分类号： H01J37/30 , H01J37/3053 , H01J37/3056 , H01J2237/2007 , H01J2237/31749
摘要： The embodiments disclose a method of stack patterning, including loading a stack into a stationary stack stage, rotating one or more ion beam grid assemblies substantially concentrically aligned with the stationary stack stage to etch the stack and controlling the operation of the one or more ion beam grid assemblies to achieve substantial axial uniformity of the etched stack.
摘要翻译：实施例公开了一种堆叠图案化的方法，包括将堆叠装载到固定堆叠台中，使基本上与固定堆叠台同心对准的一个或多个离子束栅格组件旋转，以蚀刻堆叠并控制一个或多个离子束栅格组件以实现蚀刻堆叠的显着的轴向均匀性。

6. 发明授权

US09330885B2 Method of stack patterning using a ion etching 有权
标题翻译：使用离子蚀刻的叠层图案化方法
公开(公告)号：US09330885B2
公开(公告)日：2016-05-03
申请号：US13174132
申请日：2011-06-30
申请人： Michael R. Feldbaum , Justin Jia-Jen Hwu , David S. Kuo , Gennady Gauzner , Li-Ping Wang
发明人： Michael R. Feldbaum , Justin Jia-Jen Hwu , David S. Kuo , Gennady Gauzner , Li-Ping Wang
IPC分类号： B44C1/22 , C23F1/00 , C03C15/00 , C03C25/68 , H01L21/302 , H01L21/461 , H01J37/30 , H01J37/305
CPC分类号： H01J37/30 , H01J37/3053 , H01J37/3056 , H01J2237/2007 , H01J2237/31749
摘要： The embodiments disclose a method of stack patterning, including loading a stack into a stationary stack stage, rotating one or more ion beam grid assemblies substantially concentrically aligned with the stationary stack stage to etch the stack and controlling the operation of the one or more ion beam grid assemblies to achieve substantial axial uniformity of the etched stack.
摘要翻译：实施例公开了一种堆叠图案化的方法，包括将堆叠装载到固定堆叠台中，使基本上与固定堆叠台同心对准的一个或多个离子束栅格组件旋转，以蚀刻堆叠并控制一个或多个离子束栅格组件以实现蚀刻堆叠的显着的轴向均匀性。

7. 发明申请

US20120196089A1 CHEMICALLY-MODIFIED PILLAR SURFACE TO GUIDE CYLINDER-FORMING P(S-b-MMA) BLOCK COPOLYMER ASSEMBLY 有权
标题翻译：化学改性柱面指导气缸成型P（S-b-MMA）嵌段共聚物组件
公开(公告)号：US20120196089A1
公开(公告)日：2012-08-02
申请号：US13018414
申请日：2011-01-31
申请人： XiaoMin Yang , Wei Hu , Zhaoning Yu , Justin Jia-Jen Hwu , Kim Yang Lee
发明人： XiaoMin Yang , Wei Hu , Zhaoning Yu , Justin Jia-Jen Hwu , Kim Yang Lee
IPC分类号： B32B3/00 , B05D3/02 , B28B11/08
CPC分类号： B81C1/00031 , B81C2201/0149 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/165 , Y10T428/24479
摘要： A method of self-assembling density multiplied block copolymers (BCP) structures includes applying a block copolymer (BCP) to a feature-imprinted resist layer. The BCP is thermally annealed to laterally segregate the BCP into self-assembled columns of a first polymer block surrounded by a second polymer block.
摘要翻译：自组装密度倍增嵌段共聚物（BCP）结构的方法包括将嵌段共聚物（BCP）施加到特征印记的抗蚀剂层上。 BCP被热退火以将BCP横向分离成由第二聚合物嵌段包围的第一聚合物嵌段的自组装柱。

8. 发明授权

US09469525B2 Modified surface for block copolymer self-assembly 有权
标题翻译：用于嵌段共聚物自组装的改性表面
公开(公告)号：US09469525B2
公开(公告)日：2016-10-18
申请号：US13018414
申请日：2011-01-31
申请人： XiaoMin Yang , Wei Hu , Zhaoning Yu , Justin Jia-Jen Hwu , Kim Yang Lee
发明人： XiaoMin Yang , Wei Hu , Zhaoning Yu , Justin Jia-Jen Hwu , Kim Yang Lee
IPC分类号： B81C1/00 , G03F7/00 , G03F7/16 , B82Y10/00 , B82Y40/00
CPC分类号： B81C1/00031 , B81C2201/0149 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/165 , Y10T428/24479
摘要： A method of self-assembling density multiplied block copolymers (BCP) structures includes applying a block copolymer (BCP) to a feature-imprinted resist layer. The BCP is thermally annealed to laterally segregate the BCP into self-assembled columns of a first polymer block surrounded by a second polymer block.
摘要翻译：自组装密度倍增嵌段共聚物（BCP）结构的方法包括将嵌段共聚物（BCP）施加到特征印记的抗蚀剂层上。 BCP被热退火以将BCP横向分离成由第二聚合物嵌段包围的第一聚合物嵌段的自组装柱。

9. 发明申请

US20130337176A1 NANO-SCALE VOID REDUCTION 审中-公开
标题翻译： NANO-SCALE VOID减少
公开(公告)号：US20130337176A1
公开(公告)日：2013-12-19
申请号：US13527584
申请日：2012-06-19
申请人： Justin Jia-Jen Hwu , Gennady Gauzner , Thomas Larson Greenberg
发明人： Justin Jia-Jen Hwu , Gennady Gauzner , Thomas Larson Greenberg
IPC分类号： B05D5/00 , B05C9/12 , B05D3/12
CPC分类号： G03F7/0002
摘要： Resist imprinting void reduction method may include sealing a chamber. The chamber may be filled with an ambient inert gas, wherein the inert gas a solubility in a resist layer on a substrate greater than Helium. The method may also include establishing a pressure within the chamber sufficient to cause absorption of the ambient inert gas by the resist layer, and sufficient to suppress evaporation of the resist layer.
摘要翻译：抗蚀刻印痕空隙缩小法可包括密封腔室。室可以填充有环境惰性气体，其中惰性气体在基板上的抗蚀剂层中的溶解度大于氦。该方法还可以包括在室内建立足以使抗蚀剂层吸收环境惰性气体并足以抑制抗蚀剂层蒸发的压力。

10. 发明申请

US20130070370A1 Planarization Method for Media 有权
标题翻译：媒体平面化方法
公开(公告)号：US20130070370A1
公开(公告)日：2013-03-21
申请号：US13618691
申请日：2012-09-14
申请人： Yuan Xu , Wei Hu , Justin Jia-Jen Hwu , Gene Gauzner , Koichi Wago , David Shiao-Min Kuo
发明人： Yuan Xu , Wei Hu , Justin Jia-Jen Hwu , Gene Gauzner , Koichi Wago , David Shiao-Min Kuo
IPC分类号： G11B5/74
CPC分类号： G11B5/743 , B44D3/18
摘要： A planarization process may planarize a media disk that has data trenches between data features and larger servo trenches between servo features. A filler material layer is deposited on the media disk and provides step coverage of the trenches. The filler material has data recesses over the data trenches and servo recesses over the servo trenches that must be removed to produce a planar media surface. A first planarization process is used to remove the data recesses and a second planarization process is used to remove the servo recesses.
摘要翻译：平坦化处理可以平坦化在伺服特征之间具有数据特征和较大伺服沟槽之间的数据沟槽的介质盘。填充材料层沉积在介质盘上并提供沟槽的台阶覆盖。填充材料在伺服沟槽上的数据沟槽和伺服凹槽上具有必须被移除以产生平面介质表面的数据凹槽。使用第一平面化处理来去除数据凹槽，并且使用第二平面化处理来去除伺服凹部。

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