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    • 6. 发明公开
    • ION BEAM SAMPLE PREPARATION APPARATUS AND METHODS
    • 离子束样品制备装置和方法
    • EP2558836A2
    • 2013-02-20
    • EP11769332.5
    • 2011-04-08
    • Gatan, Inc.
    • HUNT, John AndrewCOYLE, Steven Thomas
    • G01N1/28H01J37/20
    • G01N1/32H01J37/31H01J2237/026H01J2237/2007H01J2237/3118
    • Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The shield has features which enable the durable adhering of the sample to the shield for processing the sample with the ion beam. The complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing.
    • 公开了离子束样品制备装置的实施例和使用这些实施例的方法。 该装置包括位于真空室内的离子束照射装置,该离子束照射装置可以引导离子朝向样品,阻挡部分离子导向样品的屏蔽,以及具有屏蔽保持装置的屏蔽保持装置,屏蔽保持装置可替换地且可移除地将屏蔽保持在 一个位置。 当屏蔽保持在屏蔽保持级中时,屏蔽具有基准特征,该基准特征邻接屏蔽保持级上的互补基准特征。 该屏蔽具有能够使样品耐久地粘附到用于用离子束处理样品的屏蔽的特征。 屏蔽和屏蔽保持台上的互补基准特征可以实现样品在样品处理和再处理过程中的准确和可重复定位。
    • 10. 发明公开
    • ION BEAM SAMPLE PREPARATION APPARATUS AND METHODS
    • 离子束样品制备装置和方法
    • EP2558839A2
    • 2013-02-20
    • EP11769335.8
    • 2011-04-08
    • Gatan, Inc.
    • HUNT, John AndrewCOYLE, Steven Thomas
    • G01N1/28H01J37/20
    • G01N1/44G01N1/32H01J37/023H01J37/31H01J2237/0245H01J2237/2007H01J2237/3118
    • Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises a tilting ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. Complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing. The tilting ion beam irradiating means may direct ions at the sample from more than one tilt angle. A rotating shield retention stage is also disclosed which works in concert with the tilting ion beam irradiating means to improve the flexibility and efficiency of the apparatus in preparing samples for microscopic observation.
    • 公开了离子束样品制备装置的实施例和使用这些实施例的方法。 该装置包括:可在真空室中引导离子朝向样品的倾斜离子束照射装置;阻挡朝向样品的一部分离子的屏蔽;以及屏蔽保持装置,其具有屏蔽保持装置,屏蔽保持装置可替换地且可移除地保持屏蔽 在一个位置。 屏蔽和屏蔽保持台上的互补基准特征使得样品在样品处理和再处理过程中能够准确且可重复地定位在装置中。 倾斜离子束照射装置可以从多于一个倾角引导样品中的离子。 还公开了一种旋转护罩保持台,其与倾斜离子束照射装置协同工作,以提高设备在制备用于显微镜观察的样品中的灵活性和效率。