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1. 发明申请

US20050123690A1 Atomic layer deposition method of depositing an oxide on a substrate 有权
标题翻译：在衬底上沉积氧化物的原子层沉积方法
公开(公告)号：US20050123690A1
公开(公告)日：2005-06-09
申请号：US10733201
申请日：2003-12-09
申请人： Garo Derderian , Shuang Meng , Danny Dynka
发明人： Garo Derderian , Shuang Meng , Danny Dynka
IPC分类号： C23C16/40 , C23C16/44 , C23C16/455 , C23C16/00 , C23C14/10
CPC分类号： C23C16/45542 , C23C16/402 , C23C16/403 , C23C16/407 , C23C16/45531
摘要： The invention includes atomic layer deposition methods of depositing an oxide on a substrate. In one implementation, a substrate is positioned within a deposition chamber. A first species is chemisorbed onto the substrate to form a first species monolayer within the deposition chamber from a gaseous precursor. The chemisorbed first species is contacted with remote plasma oxygen derived at least in part from at least one of O2 and O3 and with remote plasma nitrogen effective to react with the first species to form a monolayer comprising an oxide of a component of the first species monolayer. The chemisorbing and the contacting with remote plasma oxygen and with remote plasma nitrogen are successively repeated effective to form porous oxide on the substrate. Other aspects and implementations are contemplated.
摘要翻译：本发明包括在衬底上沉积氧化物的原子层沉积方法。在一个实施方式中，衬底位于沉积室内。第一种物质被化学吸附到基底上以在气相前体的沉积室内形成第一物质单层。化学吸附的第一物质与至少部分从O 2和O 3 3中的至少一个导出的远程等离子体氧接触，并且与远程等离子体氮有效地与第一物质反应物质形成包含第一物质单层的组分的氧化物的单层。连续重复化学吸附和与远程等离子体氧和远程等离子体氮的接触，以在衬底上形成多孔氧化物。考虑了其他方面和实现。

2. 发明申请

US20060257584A1 Atomic layer deposition method of depositing an oxide on a substrate 有权
标题翻译：在衬底上沉积氧化物的原子层沉积方法
公开(公告)号：US20060257584A1
公开(公告)日：2006-11-16
申请号：US11491383
申请日：2006-07-20
申请人： Garo Derderian , Shuang Meng , Danny Dynka
发明人： Garo Derderian , Shuang Meng , Danny Dynka
IPC分类号： H05H1/24 , C23C16/00
CPC分类号： C23C16/45542 , C23C16/402 , C23C16/403 , C23C16/407 , C23C16/45531
摘要： The invention includes atomic layer deposition methods of depositing an oxide on a substrate. In one implementation, a substrate is positioned within a deposition chamber. A first species is chemisorbed onto the substrate to form a first species monolayer within the deposition chamber from a gaseous precursor. The chemisorbed first species is contacted with remote plasma oxygen derived at least in part from at least one of O2 and O3 and with remote plasma nitrogen effective to react with the first species to form a monolayer comprising an oxide of a component of the first species monolayer. The chemisorbing and the contacting with remote plasma oxygen and with remote plasma nitrogen are successively repeated effective to form porous oxide on the substrate. Other aspects and implementations are contemplated.
摘要翻译：本发明包括在衬底上沉积氧化物的原子层沉积方法。在一个实施方式中，衬底位于沉积室内。第一种物质被化学吸附到基底上以在气相前体的沉积室内形成第一物质单层。化学吸附的第一物质与至少部分从O 2和O 3 3中的至少一个导出的远程等离子体氧接触，并且与远程等离子体氮有效地与第一物质反应物质形成包含第一物质单层的组分的氧化物的单层。连续重复化学吸附和与远程等离子体氧和远程等离子体氮的接触，以在衬底上形成多孔氧化物。考虑了其他方面和实现。

3. 发明授权

US07431966B2 Atomic layer deposition method of depositing an oxide on a substrate 有权
标题翻译：在衬底上沉积氧化物的原子层沉积方法
公开(公告)号：US07431966B2
公开(公告)日：2008-10-07
申请号：US10733201
申请日：2003-12-09
申请人： Garo J. Derderian , Shuang Meng , Danny Dynka
发明人： Garo J. Derderian , Shuang Meng , Danny Dynka
IPC分类号： C23C16/00 , B05D3/06 , B05D5/12 , C23C16/06 , C23C16/40
CPC分类号： C23C16/45542 , C23C16/402 , C23C16/403 , C23C16/407 , C23C16/45531
摘要： The invention includes atomic layer deposition methods of depositing an oxide on a substrate. In one implementation, a substrate is positioned within a deposition chamber. A first species is chemisorbed onto the substrate to form a first species monolayer within the deposition chamber from a gaseous precursor. The chemisorbed first species is contacted with remote plasma oxygen derived at least in part from at least one of O2 and O3 and with remote plasma nitrogen effective to react with the first species to form a monolayer comprising an oxide of a component of the first species monolayer. The chemisorbing and the contacting with remote plasma oxygen and with remote plasma nitrogen are successively repeated effective to form porous oxide on the substrate. Other aspects and implementations are contemplated.
摘要翻译：本发明包括在衬底上沉积氧化物的原子层沉积方法。在一个实施方式中，衬底位于沉积室内。第一种物质被化学吸附到基底上以在气相前体的沉积室内形成第一物质单层。化学吸附的第一物质与至少部分从O 2和O 3 3中的至少一个导出的远程等离子体氧接触，并且与远程等离子体氮有效地与第一物质反应物质形成包含第一物质单层的组分的氧化物的单层。连续重复化学吸附和与远程等离子体氧和远程等离子体氮的接触，以在衬底上形成多孔氧化物。考虑了其他方面和实现。

4. 发明授权

US07838084B2 Atomic layer deposition method of depositing an oxide on a substrate 有权
标题翻译：在衬底上沉积氧化物的原子层沉积方法
公开(公告)号：US07838084B2
公开(公告)日：2010-11-23
申请号：US11491383
申请日：2006-07-20
申请人： Garo J. Derderian , Shuang Meng , Danny Dynka
发明人： Garo J. Derderian , Shuang Meng , Danny Dynka
IPC分类号： H05H1/24 , B05D19/00 , C23C16/00 , C23C16/06
CPC分类号： C23C16/45542 , C23C16/402 , C23C16/403 , C23C16/407 , C23C16/45531
摘要： The invention includes atomic layer deposition methods of depositing an oxide on a substrate. In one implementation, a substrate is positioned within a deposition chamber. A first species is chemisorbed onto the substrate to form a first species monolayer within the deposition chamber from a gaseous precursor. The chemisorbed first species is contacted with remote plasma oxygen derived at least in part from at least one of O2 and O3 and with remote plasma nitrogen effective to react with the first species to form a monolayer comprising an oxide of a component of the first species monolayer. The chemisorbing and the contacting with remote plasma oxygen and with remote plasma nitrogen are successively repeated effective to form porous oxide on the substrate. Other aspects and implementations are contemplated.
摘要翻译：本发明包括在衬底上沉积氧化物的原子层沉积方法。在一个实施方式中，衬底位于沉积室内。第一种物质被化学吸附到基底上以在气相前体的沉积室内形成第一物质单层。化学吸附的第一物质与至少部分地从O 2和O 3中的至少一种导出的远程等离子体氧接触，并且与远离等离子体氮有效地与第一物质反应以形成包含第一物质单层的组分的氧化物的单层。连续重复化学吸附和与远程等离子体氧和远程等离子体氮的接触，以在衬底上形成多孔氧化物。考虑了其他方面和实现。

5. 发明申请

US20050223994A1 Substrate susceptors for receiving semiconductor substrates to be deposited upon and methods of depositing materials over semiconductor substrates 失效
标题翻译：用于接收要沉积的半导体衬底的衬底感受体和在半导体衬底上沉积材料的方法
公开(公告)号：US20050223994A1
公开(公告)日：2005-10-13
申请号：US10822093
申请日：2004-04-08
申请人： Eric Blomiley , Nirmal Ramaswamy , Ross Dando , Joel Drewes , Danny Dynka
发明人： Eric Blomiley , Nirmal Ramaswamy , Ross Dando , Joel Drewes , Danny Dynka
IPC分类号： C23C8/00 , C23C14/50 , C23C14/54 , C23C16/00 , C23C16/458 , C23C16/48 , C23C16/52 , C30B25/02 , C30B29/06
CPC分类号： C23C16/481 , C23C14/505 , C23C14/541 , C23C16/45521 , C23C16/4584 , C23C16/52 , C30B25/02 , C30B29/06
摘要： In one implementation, a substrate susceptor for receiving a semiconductor substrate for selective epitaxial silicon-comprising depositing thereon, where the depositing comprises measuring emissivity of the susceptor from at least one susceptor location in a non-contacting manner, includes a body having a front substrate receiving side, a back side, and a peripheral edge. At least one susceptor location from which emissivity is to be measured is received on at least one of the front substrate receiving side, the back side, and the edge. Such at least one susceptor location comprises an outermost surface comprising a material upon which selective epitaxial silicon will not deposit upon during selective epitaxial silicon depositing on a semiconductor substrate received by the susceptor for at least an initial thickness of epitaxial silicon depositing on said substrate. Other aspects and implementations are contemplated.
摘要翻译：在一个实施方案中，用于接收用于选择性外延硅的半导体衬底的衬底感受体包括沉积在其上，其中所述沉积包括以非接触方式从至少一个感受器位置测量所述基座的发射率，所述衬底基座包括具有前衬底接收侧，后侧和周缘。在前基板接收侧，后侧和边缘中的至少一个上接收要测量发射率的至少一个感受器位置。这样的至少一个感受器位置包括最外表面，其包括材料，选择性外延硅将不会沉积在选择性外延硅沉积在由基座接收的半导体衬底上，以至少沉积在所述衬底上的外延硅的初始厚度。考虑了其他方面和实现。

6. 发明授权

US6100640A Indirect activation of a getter wire in a hermetically sealed field emission display 失效
标题翻译：在气密密封的场致发射显示器中间接激活吸气丝
公开(公告)号：US6100640A
公开(公告)日：2000-08-08
申请号：US82354
申请日：1998-05-20
申请人： David A. Cathey , Danny Dynka
发明人： David A. Cathey , Danny Dynka
IPC分类号： H01J9/26 , H01J9/385 , H01J29/94 , G09G3/10
CPC分类号： H01J9/261 , H01J29/94 , H01J9/385 , H01J2329/00
摘要： A getter wire formed in a closed configuration in a vacuum sealed package is inductively heated until it evaporates, thereby forming a thin film on the inner walls of the package to getter gas molecules within the sealed package.
摘要翻译：在真空密封封装中形成为封闭结构的吸气丝被感应加热直到其蒸发，从而在封装的内壁上形成薄膜以在密封包装内的吸气剂分子。

7. 发明授权

US5788551A Field emission display package and method of fabrication 失效
标题翻译：场发射显示封装及其制造方法
公开(公告)号：US5788551A
公开(公告)日：1998-08-04
申请号：US677725
申请日：1996-07-08
申请人： Danny Dynka , David A. Cathey, Jr. , Larry D. Kinsman
发明人： Danny Dynka , David A. Cathey, Jr. , Larry D. Kinsman
IPC分类号： H01J9/02 , H01J9/26 , H01J9/385 , H01J9/39 , H01J9/40 , H01J31/12
CPC分类号： H01J9/261 , H01J9/385 , H01J2329/00
摘要： A method for evacuating and sealing a field emission display package is provided. The method includes forming a cover plate, a backplate, and a peripheral seal therebetween. The backplate is formed as a sub-assembly which includes a seal ring and a getter material. The seal ring includes compressible protrusions for initially separating the cover plate from the seal ring to provide evacuation openings. During a sealing and evacuation process the packages are placed in the reaction chamber of a furnace. The pressure in the reaction chamber is then reduced and the temperature is increased in a staged sequence. During the evacuating and sealing process the evacuation openings formed by the compressible protrusions provide a flow path for evacuation. As the sealing and evacuation process continues, the compressible protrusions and seal ring flow and commingle to form the peripheral seal. At the same time the getter material is activated and pumps contaminants from the sealed spaced formed within the package.
摘要翻译：提供一种用于排放和密封场致发射显示包的方法。该方法包括在其间形成盖板，背板和周边密封件。背板形成为包括密封环和吸气材料的子组件。密封环包括用于将盖板与密封环分开的可压缩突起，以提供抽空开口。在密封和排空过程中，将包装物放置在炉的反应室中。然后反应室中的压力降低，温度以分级顺序增加。在排气和密封过程中，由可压缩突起形成的抽空开口提供用于抽空的流动路径。随着密封和排气过程的继续，可压缩的突起和密封环流动并相互组合形成周边密封。同时吸气剂材料被激活并从包装内形成的密封间隔中抽出污染物。

8. 发明申请

US20050028734A1 Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces 有权
公开(公告)号：US20050028734A1
公开(公告)日：2005-02-10
申请号：US10932470
申请日：2004-09-01
申请人： Craig Carpenter , Ross Dando , Danny Dynka
发明人： Craig Carpenter , Ross Dando , Danny Dynka
IPC分类号： C23C16/44 , C23C16/455 , C23C16/54 , C23C16/00
CPC分类号： C23C16/54 , C23C16/4401 , C23C16/45519 , C23C16/45544
摘要： Reactors having gas distributors for depositing materials onto micro-device workpieces, systems that include such reactors, and methods for depositing materials onto micro-device workpieces are disclosed herein. In one embodiment, a reactor for depositing materials onto a micro-device workpiece includes a reaction chamber, a passageway, and a door assembly. The reaction chamber includes a gas distributor configured to provide a flow of gas(es) to a micro-device workpiece on a workpiece holder. The passageway, which has a first end open to the reaction chamber and a second end apart from the reaction chamber, is configured to provide ingression to and egression from the chamber for processing the micro-device workpiece. The door assembly is configured to open and sealably close a door at the second end of the passageway. A gas conditioning system positioned in the door is configured to maintain a desired concentration and phase of gas constituents in the passageway.

9. 发明授权

US06417618B2 Low-voltage cathode for scrubbing cathodoluminescent layers for field emission displays and method 失效
标题翻译：用于擦除阴极发光层用于场发射显示器的低电压阴极和方法
公开(公告)号：US06417618B2
公开(公告)日：2002-07-09
申请号：US09957111
申请日：2001-09-19
申请人： Charles M. Watkins , Danny Dynka
发明人： Charles M. Watkins , Danny Dynka
IPC分类号： H01J2918
CPC分类号： H01J9/39 , H01J2329/00
摘要： Field emission displays having novel cathodoluminescent layers are disclosed. In one embodiment, the cathodoluminescent layers are exposed to electron irradiation with an electron current having a duty cycle in excess of ten percent. In alternate aspects, the electron irradiation (scrubbing) may be performed in a vacuum, and an accelerating voltage may be maintained between the cathodoluminescent layer and an source of electrons. The cathodoluminescent layer may be reversibly darkened by the scrubbing. The cathodoluminescent layers may be formed on a transparent conductive layer formed on a transparent insulating viewing screen to provide a faceplate. In one aspect, the cathodoluminescent layers are irradiated with electrons having a density of greater than one hundred microamperes/cm2. Significantly, this results in improved emitter life in a field emission display. The display including the scrubbed faceplate has significantly enhanced performance and increased useful life compared to displays including faceplates that have not been scrubbed.
摘要翻译：公开了具有新型阴极发光层的场发射显示器。在一个实施例中，阴极发光层以占空比超过10％的电子电流暴露于电子辐射。在替代方面，电子照射（洗涤）可以在真空中进行，并且可以在阴极发光层和电子源之间保持加速电压。阴极发光层可以通过洗涤而可逆地变暗。阴极发光层可以形成在形成在透明绝缘观察屏幕上的透明导电层上，以提供面板。在一个方面，用密度大于100微安/ cm2的电子照射阴极发光层。重要的是，这导致在场发射显示器中改善发射器寿命。与包括未被擦洗的面板的显示器相比，包括洗涤面板的显示器具有显着增强的性能和增加的使用寿命。

10. 发明授权

US06299500B1 Low-voltage cathode for scrubbing cathodoluminescent layers for field emission displays and method 失效
标题翻译：用于擦除阴极发光层用于场发射显示器的低电压阴极和方法
公开(公告)号：US06299500B1
公开(公告)日：2001-10-09
申请号：US09633554
申请日：2000-08-07
申请人： Charles M. Watkins , Danny Dynka
发明人： Charles M. Watkins , Danny Dynka
IPC分类号： H01J922
CPC分类号： H01J9/39 , H01J2329/00
摘要： The present invention includes a low voltage, high current density, large area cathode for scrubbing of cathodoluminescent layers. The cathodoluminescent layers are formed on a transparent conductive layer formed on a transparent insulating viewing screen to provide a faceplate. An electrical coupling is formed to the transparent conductive layer to provide a return path for electrons. The faceplate and the cathodoluminescent layers are placed on a conveyer in a vacuum. The cathodoluminescent layers are irradiated with an electron beam having a density of greater than one hundred microamperes/Cm2. The electron beam may be provided by a cathode including an insulating base, a first post secured to the insulating base near a first edge of the insulating base and a second post including a spring-loaded tip secured to the insulating base near a second edge of the insulating base. The cathode also includes a first wire cathode having a first end coupled to the first post and a second end coupled to the spring-loaded tip of the second post. The first wire cathode is maintained in a tensioned state by the spring-loaded tip. The electron irradiation scrubs oxygen-bearing species from the cathodoluminescent layer. Significantly, this results in improved emitter life when the faceplate is incorporated in a field emission display. The display including the scrubbed faceplate has significantly enhanced performance and increased useful life compared to displays including faceplates that have not been scrubbed.
摘要翻译：本发明包括低电压，高电流密度，用于洗涤阴极发光层的大面积阴极。阴极发光层形成在透明绝缘观察屏上形成的透明导电层上，以提供面板。对透明导电层形成电耦合以提供电子返回路径。面板和阴极发光层在真空中放置在输送机上。阴极发光层用密度大于100微安/ Cm 2的电子束照射。电子束可以由包括绝缘基底的阴极提供，在绝缘基底的第一边缘附近固定到绝缘基底的第一柱，以及第二柱，该第二柱包括固定到第二边缘附近的绝缘基底的弹簧加载尖端绝缘基座。阴极还包括第一线阴极，其具有联接到第一柱的第一端和联接到第二柱的弹簧加载尖端的第二端。第一线阴极通过弹簧加载尖端保持在张紧状态。电子辐射从阴极发光层中洗涤含氧物质。显着地，当面板被并入场致发射显示器时，这导致改善的发射器寿命。与包括未被擦洗的面板的显示器相比，包括洗涤面板的显示器具有显着增强的性能和增加的使用寿命。

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