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1. 发明授权

US09236411B2 Color filter patterning using hard mask 有权
标题翻译：使用硬掩模进行彩色滤光片图案化
公开(公告)号：US09236411B2
公开(公告)日：2016-01-12
申请号：US13197568
申请日：2011-08-03
申请人： Gang Chen , Duli Mao , Hsin-Chih Tai , Howard E. Rhodes
发明人： Gang Chen , Duli Mao , Hsin-Chih Tai , Howard E. Rhodes
IPC分类号： H01L29/49 , H01L27/146
CPC分类号： H01L27/14621 , H01L27/1464 , H01L27/14685
摘要： Embodiments are disclosed of an apparatus comprising a color filter arrangement including a set of color filters. The set of color filters includes a pair of first color filters, each having first and second hard mask layers formed thereon, a second color filter having the first hard mask layer formed thereon, and a third color filter having no hard mask layer formed thereon. Other embodiments are disclosed and claimed.
摘要翻译：公开了一种包括包括一组滤色器的滤色器装置的装置的实施例。该组滤色器包括一对第一和第二硬掩模层形成在其上的第一滤色器，其上形成有第一硬掩模层的第二滤色器和不形成硬掩模层的第三滤色器。公开和要求保护其他实施例。

2. 发明授权

US08952309B2 Image sensor with micro-lens coating 有权
标题翻译：具有微透镜涂层的图像传感器
公开(公告)号：US08952309B2
公开(公告)日：2015-02-10
申请号：US13252883
申请日：2011-10-04
申请人： Gang Chen , Hsin-Chih Tai , Duli Mao , Howard E. Rhodes
发明人： Gang Chen , Hsin-Chih Tai , Duli Mao , Howard E. Rhodes
IPC分类号： H01L27/148 , H01L27/146
CPC分类号： H01L27/14627 , H01L27/14685 , Y10T29/49885
摘要： Techniques and architectures for providing a coating for one or more micro-lenses of a pixel array. In an embodiment, a pixel element includes a micro-lens and a coating portion extending over a surface of the micro-lens, where a profile of the coating portion is super-conformal to, or at least conformal to, a profile of the micro-lens. In another embodiment, the coating portion is formed at least in part by orienting the surface of the micro-lens to face generally downward with the direction of gravity, the orienting to allow a fluid coating material to flow for formation of the coating portion.
摘要翻译：用于为像素阵列的一个或多个微透镜提供涂层的技术和架构。在一个实施例中，像素元件包括微透镜和在微透镜的表面上延伸的涂层部分，其中涂层部分的轮廓与微观透镜的轮廓超共形或至少共形 -镜片。在另一个实施例中，涂覆部分至少部分地通过使微透镜的表面定向以与重力方向大致向下的方式形成，定向以允许流体涂覆材料流动以形成涂覆部分。

3. 发明授权

US08497536B2 Dual-facing camera assembly 有权
标题翻译：双面相机组合
公开(公告)号：US08497536B2
公开(公告)日：2013-07-30
申请号：US13235121
申请日：2011-09-16
申请人： Gang Chen , Ashish Shah , Duli Mao , Hsin-Chih Tai , Howard E. Rhodes
发明人： Gang Chen , Ashish Shah , Duli Mao , Hsin-Chih Tai , Howard E. Rhodes
IPC分类号： H01L31/062 , H01L31/113
CPC分类号： H01L27/14645 , H01L27/14605 , H01L27/1462 , H01L27/14621 , H01L27/14627 , H01L27/14634 , H01L27/14636 , H01L27/1464 , H01L27/1469
摘要： Embodiments of the invention relate to a camera assembly including a rear-facing camera and a front-facing camera operatively coupled together (e.g., bonded, stacked on a common substrate).In some embodiments of the invention, a system having an array of frontside illuminated (FSI) imaging pixels is bonded to a system having an array of backside illuminated (BSI) imaging pixels, creating a camera assembly with a minimal size (e.g., a reduced thickness compared to prior art solutions). An FSI image sensor wafer may be used as a handle wafer for a BSI image sensor wafer when it is thinned, thereby decreasing the thickness of the overall camera module. According to other embodiments of the invention, two package dies, one a BSI image sensor, the other an FSI image sensor, are stacked on a common substrate such as a printed circuit board, and are operatively coupled together via redistribution layers.
摘要翻译：本发明的实施例涉及一种照相机组件，其包括背面照相机和可操作地耦合在一起的例如相机（例如，粘合的，堆叠在公共衬底上）的前置照相机。在本发明的一些实施例中，具有前侧照明（FSI）成像像素阵列的系统被结合到具有背面照明（BSI）成像像素阵列的系统，从而产生具有最小尺寸的照相机组件（例如，减小的厚度与现有技术的解决方案相比）。可以使用FSI图像传感器晶片作为BSI图像传感器晶片的处理晶片，当其变薄时，从而减小整个相机模块的厚度。根据本发明的其它实施例，两个封装管芯，一个BSI图像传感器，另一个是FSI图像传感器，堆叠在诸如印刷电路板的公共基板上，并且通过再分配层可操作地耦合在一起。

4. 发明申请

US20130092982A1 PARTIAL BURIED CHANNEL TRANSFER DEVICE FOR IMAGE SENSORS 有权
标题翻译：用于图像传感器的部分通道传输设备
公开(公告)号：US20130092982A1
公开(公告)日：2013-04-18
申请号：US13273026
申请日：2011-10-13
申请人： Gang Chen , Sing-Chung Hu , Hsin-Chih Tai , Duli Mao , Manoj Bikumandla , Wei Zheng , Yin Qian , Zhibin Xiong , Vincent Venezia , Keh-Chiang Ku , Howard E. Rhodes
发明人： Gang Chen , Sing-Chung Hu , Hsin-Chih Tai , Duli Mao , Manoj Bikumandla , Wei Zheng , Yin Qian , Zhibin Xiong , Vincent Venezia , Keh-Chiang Ku , Howard E. Rhodes
IPC分类号： H01L27/148 , H01L31/18 , H01L31/101
CPC分类号： H01L27/14616 , H01L27/14689
摘要： Embodiments of an image sensor pixel that includes a photosensitive element, a floating diffusion region, and a transfer device. The photosensitive element is disposed in a substrate layer for accumulating an image charge in response to light. The floating diffusion region is dispose in the substrate layer to receive the image charge from the photosensitive element. The transfer device is disposed between the photosensitive element and the floating diffusion region to selectively transfer the image charge from the photosensitive element to the floating diffusion region. The transfer device includes a buried channel device including a buried channel gate disposed over a buried channel dopant region. The transfer device also includes a surface channel device including a surface channel gate disposed over a surface channel region. The surface channel device is in series with the buried channel device. The surface channel gate has the opposite polarity of the buried channel gate.
摘要翻译：包括感光元件，浮动扩散区域和转印装置的图像传感器像素的实施例。感光元件设置在基板层中，用于响应于光积累图像电荷。浮动扩散区域设置在衬底层中以从感光元件接收图像电荷。转移装置设置在感光元件和浮动扩散区域之间以选择性地将图像电荷从感光元件转移到浮动扩散区域。传输装置包括掩埋沟道器件，其包括设置在掩埋沟道掺杂区域上的掩埋沟道栅极。转移装置还包括表面通道装置，其包括设置在表面通道区域上的表面通道门。表面通道装置与掩埋通道装置串联。表面沟道栅极具有与掩埋沟道栅极相反的极性。

5. 发明申请

US20130033627A1 COLOR FILTER PATTERNING USING HARD MASK 有权
标题翻译：使用硬面罩的彩色滤镜图案
公开(公告)号：US20130033627A1
公开(公告)日：2013-02-07
申请号：US13197568
申请日：2011-08-03
申请人： Gang Chen , Duli Mao , Hsin-Chih Tai , Howard E. Rhodes
发明人： Gang Chen , Duli Mao , Hsin-Chih Tai , Howard E. Rhodes
IPC分类号： H04N9/07 , G02B5/22 , B44C1/22
CPC分类号： H01L27/14621 , H01L27/1464 , H01L27/14685
摘要： Embodiments are disclosed of an apparatus comprising a color filter arrangement including a set of color filters. The set of color filters includes a pair of first color filters, each having first and second hard mask layers formed thereon, a second color filter having the first hard mask layer formed thereon, and a third color filter having no hard mask layer formed thereon. Other embodiments are disclosed and claimed.
摘要翻译：公开了一种包括包括一组滤色器的滤色器装置的装置的实施例。该组滤色器包括一对第一和第二硬掩模层形成在其上的第一滤色器，其上形成有第一硬掩模层的第二滤色器和不形成硬掩模层的第三滤色器。公开和要求保护其他实施例。

6. 发明授权

US08575035B2 Methods of forming varying depth trenches in semiconductor devices 有权
标题翻译：在半导体器件中形成不同深度沟槽的方法
公开(公告)号：US08575035B2
公开(公告)日：2013-11-05
申请号：US13402674
申请日：2012-02-22
申请人： Gang Chen , Duli Mao , Hsin-Chih Tai , Howard E. Rhodes
发明人： Gang Chen , Duli Mao , Hsin-Chih Tai , Howard E. Rhodes
IPC分类号： H01L31/02 , H01L21/76
CPC分类号： H01L21/76229 , H01L27/1463 , H01L27/14689
摘要： A method of forming trenches in a semiconductor device includes forming an etchant barrier layer above a first portion of a semiconductor layer. A first trench is etched in a second portion of the semiconductor layer using a first etchant. The second portion of the semiconductor layer is not disposed underneath the etchant barrier layer. The etchant barrier layer is etched through using a second etchant that does not substantially etch the semiconductor layer. A second trench is etched in the first portion of the semiconductor layer using a third etchant. The third etchant also extends a depth of the first trench.
摘要翻译：在半导体器件中形成沟槽的方法包括在半导体层的第一部分上方形成蚀刻剂阻挡层。使用第一蚀刻剂在半导体层的第二部分中蚀刻第一沟槽。半导体层的第二部分不设置在蚀刻剂阻挡层下方。通过使用不基本上蚀刻半导体层的第二蚀刻剂蚀刻蚀刻剂阻挡层。使用第三蚀刻剂在半导体层的第一部分中蚀刻第二沟槽。第三蚀刻剂还延伸第一沟槽的深度。

7. 发明申请

US20130207212A1 LATERAL LIGHT SHIELD IN BACKSIDE ILLUMINATED IMAGING SENSORS 有权
标题翻译：背光照明成像传感器中的侧光
公开(公告)号：US20130207212A1
公开(公告)日：2013-08-15
申请号：US13370085
申请日：2012-02-09
申请人： Duli Mao , Hsin-Chih Tai , Vincent Venezia , Yin Qian , Gang Chen , Howard E. Rhodes
发明人： Duli Mao , Hsin-Chih Tai , Vincent Venezia , Yin Qian , Gang Chen , Howard E. Rhodes
IPC分类号： H01L31/0216 , H01L31/18
CPC分类号： H01L27/1462 , H01L27/14623 , H01L27/1464 , H01L27/14685
摘要： A backside illuminated image sensor includes a semiconductor layer and a trench disposed in the semiconductor layer. The semiconductor layer has a frontside surface and a backside surface. The semiconductor layer includes a light sensing element of a pixel array disposed in a sensor array region of the semiconductor layer. The pixel array is positioned to receive external incoming light through the backside surface of the semiconductor layer. The semiconductor layer also includes a light emitting element disposed in a periphery circuit region of the semiconductor layer external to the sensor array region. The trench is disposed in the semiconductor layer between the light sensing element and the light emitting element. The trench is positioned to impede a light path between the light emitting element and the light sensing element when the light path is internal to the semiconductor layer.
摘要翻译：背面照明图像传感器包括设置在半导体层中的半导体层和沟槽。半导体层具有前表面和背面。半导体层包括设置在半导体层的传感器阵列区域中的像素阵列的光感测元件。像素阵列被定位成接收穿过半导体层的背面的外部入射光。半导体层还包括设置在传感器阵列区域外侧的半导体层的外围电路区域中的发光元件。沟槽设置在光感测元件和发光元件之间的半导体层中。当光路在半导体层内部时，沟槽定位成阻碍发光元件和光感测元件之间的光路。

8. 发明申请

US20140048897A1 PIXEL WITH NEGATIVELY-CHARGED SHALLOW TRENCH ISOLATION (STI) LINER 审中-公开
标题翻译： PIXEL带负电荷的浅层隔离（STI）衬垫
公开(公告)号：US20140048897A1
公开(公告)日：2014-02-20
申请号：US13587811
申请日：2012-08-16
申请人： Yin Qian , Hsin-Chih Tai , Gang Chen , Duli Mao , Vincent Venezia , Howard E. Rhodes
发明人： Yin Qian , Hsin-Chih Tai , Gang Chen , Duli Mao , Vincent Venezia , Howard E. Rhodes
IPC分类号： H01L31/02 , H01L31/18
CPC分类号： H01L27/1463 , H01L27/14689
摘要： Embodiments of a pixel including a substrate having a front surface and a photosensitive region formed in or near the front surface of the substrate. An isolation trench is formed in the front surface of the substrate adjacent to the photosensitive region. The isolation trench includes a trench having a bottom and sidewalls, a passivation layer formed on the bottom and the sidewalls, and a filler to fill the portion of the trench not filled by the passivation layer.
摘要翻译：包括具有形成在基板的表面中或附近的前表面和感光区域的基板的像素的实施例。在与感光区域相邻的基板的前表面中形成隔离沟槽。隔离沟槽包括具有底部和侧壁的沟槽，形成在底部和侧壁上的钝化层，以及用于填充未被钝化层填充的沟槽部分的填料。

9. 发明授权

US08643132B2 In-pixel high dynamic range imaging 有权
标题翻译：像素高动态范围成像
公开(公告)号：US08643132B2
公开(公告)日：2014-02-04
申请号：US13155969
申请日：2011-06-08
申请人： Gang Chen , Duli Mao , Hsin-Chih Tai , Howard E. Rhodes
发明人： Gang Chen , Duli Mao , Hsin-Chih Tai , Howard E. Rhodes
IPC分类号： H01L31/06 , H01L31/062 , H01L31/113
CPC分类号： H01L27/14616 , H01L27/14612 , H01L27/14643
摘要： Embodiments of the invention describe providing high dynamic range imaging (HDRI or simply HDR) to an imaging pixel by coupling a floating diffusion node of the imaging pixel to a plurality of metal-oxide semiconductor (MOS) capacitance regions. It is understood that a MOS capacitance region only turns “on” (i.e., changes the overall capacitance of the floating diffusion node) when the voltage at the floating diffusion node (or a voltage difference between a gate node and the floating diffusion node) is greater than its threshold voltage; before the MOS capacitance region is “on” it does not contribute to the overall capacitance or conversion gain of the floating diffusion node.Each of the MOS capacitance regions will have different threshold voltages, thereby turning “on” at different illumination conditions. This increases the dynamic range of the imaging pixel, thereby providing HDR for the host imaging system.
摘要翻译：本发明的实施例描述了通过将成像像素的浮动扩散节点耦合到多个金属氧化物半导体（MOS）电容区域来向成像像素提供高动态范围成像（HDRI或简单的HDR）。可以理解，当浮动扩散节点处的电压（或者栅极节点和浮动扩散节点之间的电压差）为（...）时，MOS电容区域只会变为“导通”（即，改变浮动扩散节点的整体电容）大于其阈值电压; 在MOS电容区域“接通”之前，它不会对浮动扩散节点的整体电容或转换增益有贡献。每个MOS电容区域将具有不同的阈值电压，从而在不同的照明条件下“打开”。这增加了成像像素的动态范围，从而为主机成像系统提供HDR。

10. 发明申请

US20130082163A1 IMAGE SENSOR WITH MICRO-LENS COATING 有权
标题翻译：具有微透镜涂层的图像传感器
公开(公告)号：US20130082163A1
公开(公告)日：2013-04-04
申请号：US13252883
申请日：2011-10-04
申请人： Gang Chen , Hsin-Chih Tai , Duli Mao , Howard E. Rhodes
发明人： Gang Chen , Hsin-Chih Tai , Duli Mao , Howard E. Rhodes
IPC分类号： H01L27/148 , B23P25/00
CPC分类号： H01L27/14627 , H01L27/14685 , Y10T29/49885
摘要： Techniques and architectures for providing a coating for one or more micro-lenses of a pixel array. In an embodiment, a pixel element includes a micro-lens and a coating portion extending over a surface of the micro-lens, where a profile of the coating portion is super-conformal to, or at least conformal to, a profile of the micro-lens. In another embodiment, the coating portion is formed at least in part by orienting the surface of the micro-lens to face generally downward with the direction of gravity, the orienting to allow a fluid coating material to flow for formation of the coating portion.
摘要翻译：用于为像素阵列的一个或多个微透镜提供涂层的技术和架构。在一个实施例中，像素元件包括微透镜和在微透镜的表面上延伸的涂层部分，其中涂层部分的轮廓与微观透镜的轮廓超共形或至少共形 -镜片。在另一个实施例中，涂覆部分至少部分地通过使微透镜的表面定向以与重力方向大致向下的方式形成，定向以允许流体涂覆材料流动以形成涂覆部分。

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