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1. 发明公开

EP1103345A2 Cloth cleaning device and polishing machine 有权
标题翻译： Poliermaschine
公开(公告)号：EP1103345A2
公开(公告)日：2001-05-30
申请号：EP00310348.8
申请日：2000-11-22
申请人： Fujikoshi Machinery Corporation
发明人： Nishimoto, Yoshinobu , Nakajima, Makoto , Nakamura, Yoshio , Denda, Yasuhide , Miyagawa, Chihiro
IPC分类号： B24B37/04 , B24B53/007 , B08B3/02
CPC分类号： B24B53/017 , B08B3/024
摘要： The cloth cleaning device 30 of a polishing machine 10 is capable of fully cleaning a polishing cloth 12a including a part in the vicinity of a center roller 14. In the cloth cleaning device 30, an arm 22 is moved, in a plane parallel to the polishing cloth 12a, between a first position, which is located above the polishing cloth 12a, and a second position, which is located outside of the polishing cloth 12a. A jet nozzle 31 is attached to the arm 22 and jetting high pressure water 31a toward the polishing cloth 12a. An enclosing member 40 encloses the jet nozzle 31 so as to prevent the high pressure water 31a, which has been jetted out from the jet nozzle 31, from scattering. The jet nozzle 31 is headed toward the center roller 14 and the high pressure water 31a is jetted toward the part of the polishing cloth 12a in the vicinity of the center roller 14 when the arm 22 moves the jet nozzle 31 close to the center roller 14.
摘要翻译：抛光机10的布清洁装置30能够完全清洁包括中心辊14附近的一部分的抛光布12a。在布清洁装置30中，臂22在平行于中心辊14的平面中移动位于抛光布12a上方的第一位置和位于抛光布12a外侧的第二位置之间的抛光布12a。将喷嘴31安装在臂22上，朝向抛光布12a喷射高压水31a。封闭构件40封闭喷嘴31，以防止从喷嘴31喷出的高压水31a飞散。当臂22将喷嘴31移动到中心辊14附近时，喷嘴31朝着中心辊14朝向中心辊14附近的抛光布12a的部分喷射高压水31a 。

2. 发明授权

EP1103345B1 Polishing machine 有权
标题翻译：抛光机
公开(公告)号：EP1103345B1
公开(公告)日：2008-05-14
申请号：EP00310348.8
申请日：2000-11-22
申请人： Fujikoshi Machinery Corporation
发明人： Nishimoto, Yoshinobu , Nakajima, Makoto , Nakamura, Yoshio , Denda, Yasuhide , Miyagawa, Chihiro
IPC分类号： B24B37/04 , B24B53/007 , B08B3/02
CPC分类号： B24B53/017 , B08B3/024

3. 发明公开

EP1103345A3 Cloth cleaning device and polishing machine 有权
标题翻译： Tuchreinigungsvorrichtung und Poliermaschine
公开(公告)号：EP1103345A3
公开(公告)日：2003-09-24
申请号：EP00310348.8
申请日：2000-11-22
申请人： Fujikoshi Machinery Corporation
发明人： Nishimoto, Yoshinobu , Nakajima, Makoto , Nakamura, Yoshio , Denda, Yasuhide , Miyagawa, Chihiro
IPC分类号： B24B37/04 , B24B53/007 , B08B3/02
CPC分类号： B24B53/017 , B08B3/024
摘要： The cloth cleaning device 30 of a polishing machine 10 is capable of fully cleaning a polishing cloth 12a including a part in the vicinity of a center roller 14. In the cloth cleaning device 30, an arm 22 is moved, in a plane parallel to the polishing cloth 12a, between a first position, which is located above the polishing cloth 12a, and a second position, which is located outside of the polishing cloth 12a. A jet nozzle 31 is attached to the arm 22 and jetting high pressure water 31a toward the polishing cloth 12a. An enclosing member 40 encloses the jet nozzle 31 so as to prevent the high pressure water 31a, which has been jetted out from the jet nozzle 31, from scattering. The jet nozzle 31 is headed toward the center roller 14 and the high pressure water 31a is jetted toward the part of the polishing cloth 12a in the vicinity of the center roller 14 when the arm 22 moves the jet nozzle 31 close to the center roller 14.
摘要翻译：抛光机10的布清洁装置30能够完全清洁包括中心辊14附近的一部分的抛光布12a。在布清洁装置30中，臂22在平行于中心辊14的平面中移动位于抛光布12a上方的第一位置和位于抛光布12a外侧的第二位置之间的抛光布12a。将喷嘴31安装在臂22上，朝向抛光布12a喷射高压水31a。封闭构件40封闭喷嘴31，以防止从喷嘴31喷出的高压水31a飞散。当臂22将喷嘴31移动到中心辊14附近时，喷嘴31朝着中心辊14朝向中心辊14附近的抛光布12a的部分喷射高压水31a 。

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