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    • 4. 发明专利
    • Inspection chip producing method and specimen detecting method
    • 检验芯片生产方法和样本检测方法
    • JP2009222483A
    • 2009-10-01
    • JP2008065631
    • 2008-03-14
    • Fujifilm Corp富士フイルム株式会社
    • MURAKAMI NAOKITOMARU YUICHI
    • G01N21/65B82Y15/00
    • G01N21/658
    • PROBLEM TO BE SOLVED: To provide an inspection chip producing method capable of detecting a specimen with high sensitivity. SOLUTION: The method includes a microstructure producing step of producing a microstructure where metallic portions having dimensions permitting excitation of localized plasmons are formed and distributed on one surface of a substrate, a specimen attaching step of attaching the specimen to the surfaces of the metallic portions of the microstructure, and a metallic particle attaching step of attaching metallic particles having dimensions permitting excitation of localized plasmons to the metallic portions and the specimen, wherein a substance capable of specifically binding to the specimen is not fixed to at least either the metallic portions or the metallic particles. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种能够以高灵敏度检测样品的检查芯片制造方法。 解决方案:该方法包括一种微结构制造步骤,其制造微结构,其中具有允许局部等离子体激元激发的尺寸的金属部分形成并分布在基板的一个表面上;试样附着步骤,将试样附着到 微结构的金属部分和金属颗粒附着步骤,其将具有允许激发局部等离子体激元的尺寸的金属颗粒附着到金属部分和样品上,其中能够特异性结合样品的物质不固定在金属 部分或金属颗粒。 版权所有(C)2010,JPO&INPIT
    • 5. 发明专利
    • Plating thickness monitoring device and plating stopping device
    • 镀锌厚度监测装置和镀层停止装置
    • JP2007154287A
    • 2007-06-21
    • JP2005354276
    • 2005-12-08
    • Fujifilm Corp富士フイルム株式会社
    • TANI TAKEHARUNAYA MASAYUKITOMARU YUICHI
    • C25D21/12
    • G01N21/554G01B11/0625G01N21/648
    • PROBLEM TO BE SOLVED: To provide a plating thickness monitoring device for correctly judging the thickness of a plating material layered in a pore during plating.
      SOLUTION: A member 40 to be plated is irradiated with reference light L by a reference light irradiating means 10, the characteristics of reflected light Le emitted from the member 40 to be plated by receiving the irradiation of the reference light L are detected by a detecting means 20, and a plating thickness monitoring means 30 investigates the thickness of a plating material 45S layered in the pore 5 formed at the member 40 to be plated based on the detection result from the detecting means 20 during plating.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种用于在电镀期间正确判断层压在孔中的电镀材料的厚度的电镀厚度监测装置。

      解决方案:通过参考光照射装置10照射被镀的构件40的参考光L,检测通过接收基准光L的照射而从待被覆盖的构件40发射的反射光Le的特性 通过检测装置20,电镀厚度监测装置30根据电镀期间检测装置20的检测结果,研究层叠在形成于待镀层件40的孔5中的电镀材料45S的厚度。 版权所有(C)2007,JPO&INPIT

    • 6. 发明专利
    • Photoelectric converting device
    • 光电转换器件
    • JP2010027794A
    • 2010-02-04
    • JP2008186294
    • 2008-07-17
    • Fujifilm Corp富士フイルム株式会社
    • NAYA MASAYUKITSUKAHARA JIROTOMARU YUICHI
    • H01L31/04
    • H01L31/06H01L31/0352H01L31/08Y02E10/50
    • PROBLEM TO BE SOLVED: To provide a high efficiency photoelectric converting device, in which a fine uneven structure such as a fine metal structure and an optical resonant structure are uniformly formed in a wide area region, enabling tight binding between the fine metal bodies forming the fine metal structure and a dielectric substrate, and easy take-out of electric charges is achieved. SOLUTION: The photoelectric converting device includes: a first conductive electrode layer; a metal filled dielectric layer formed on the first electrode layer and including a dielectric substrate in which a plurality of micropores are formed, and a plurality of fine metal bodies made of a metal material which fills the plurality of micropores; a photoelectric converting layer formed on the metal filled dielectric layer and made of a photoelectric converting material; and a second conductive electrode layer formed on the photoelectric converting layer. Each of the fine metal bodies includes: a filling part that fills the micropores of the dielectric substrate and a protruding part that protrudes from the dielectric substrate into the photoelectric converting layer, and is a conductive metal body connected to the first electrode layer at the other end of the filling part; the photoelectric converting layer is formed on the dielectric substrate so as to cover the protruding part; and at least one of the first and the second electrode layers is a transparent conductive layer. The problems are solved by taking-out electric charges from the first electrode layer or the second electrode layer. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:为了提供一种高效率的光电转换装置,其中在广泛区域区域均匀地形成精细的金属结构和光学谐振结构的细小的不均匀结构,能够紧密地结合细金属 形成精细金属结构的主体和电介质基板,并且容易地取出电荷。 光电转换装置包括:第一导电电极层; 形成在所述第一电极层上并且包括其中形成有多个微孔的电介质基板的金属填充介电层和由填充所述多个微孔的金属材料制成的多个细金属体; 形成在金属填充介电层上并由光电转换材料制成的光电转换层; 以及形成在光电转换层上的第二导电电极层。 每个细金属体包括:填充介质基板的微孔的填充部分和从电介质基板突出到光电转换层中的突出部分,并且是另一个连接到第一电极层的导电金属体 填充部分的末端; 在电介质基板上形成光电转换层以覆盖突出部分; 并且第一和第二电极层中的至少一个是透明导电层。 通过从第一电极层或第二电极层取出电荷来解决问题。 版权所有(C)2010,JPO&INPIT
    • 7. 发明专利
    • Method of forming microstructure
    • 形成微结构的方法
    • JP2009235505A
    • 2009-10-15
    • JP2008084082
    • 2008-03-27
    • Fujifilm Corp富士フイルム株式会社
    • TOMARU YUICHIMURAKAMI NAOKINAYA MASAYUKI
    • C25D5/20B82B3/00C25D5/34C25D11/04C25D11/20C25D21/10G01N21/65
    • PROBLEM TO BE SOLVED: To provide a method of forming a microstructure by which the uniformity of the filling of a metal into fine pores is improved to dispense with a surface treatment step of removing projecting part generated after the metal is filled into the pores by polishing or the like to make flat or the surface treatment step is carried out for a short time and as a result, excellent workability is attained and the microstructure having the metal microbody generating the intensified electric field is obtained.
      SOLUTION: The method of forming the microstructure includes a micropore forming step (A) of: forming micropores on the surface of the base material; a plating liquid dipping step (B) of: dipping the base material in which the micropores are formed in the micropore forming step (A) into a plating liquid; a vibration step (C) of: infiltrating the plating liquid into the micropores by vibrating the base material and plating liquid by a vibration means after plating liquid dipping step (B); and a metal filling step (D) of: filling the metal into the micropores by electroplating to form the metal microbody generating the intensified electric field while performing the vibration step (C) or after the vibration step (C).
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种形成微结构的方法,通过该方法,金属填充到细孔中的均匀性得到改善,以省去将金属填充后产生的突出部分去除的表面处理步骤 通过抛光等使平坦化的微细孔或表面处理工序进行短时间,结果得到优异的加工性,得到具有产生强化电场的金属微粒的微结构。 < P>解决方案:形成微结构的方法包括:微孔形成步骤(A):在基材的表面上形成微孔; 电镀液浸渍工序(B):在微孔形成工序(A)中将形成微孔的基材浸入镀液中; 振动步骤(C):通过在电镀液体浸渍步骤(B)之后通过振动装置振动基底材料和电镀液​​体将电镀液浸入微孔中; 以及金属填充步骤(D),其通过电镀将金属填充到微孔中,以形成在执行振动步骤(C)期间或振动步骤(C)之后产生强化电场的金属微体。 版权所有(C)2010,JPO&INPIT
    • 8. 发明专利
    • Mass spectroscope
    • 质谱仪
    • JP2009231066A
    • 2009-10-08
    • JP2008075367
    • 2008-03-24
    • Fujifilm Corp富士フイルム株式会社
    • NAYA MASAYUKITOMARU YUICHIMURAKAMI NAOKI
    • H01J49/16G01N27/62G01N27/64H01J49/40
    • H01J49/164
    • PROBLEM TO BE SOLVED: To provide a mass spectroscope capable of highly-accurately and efficiently performing mass spectrometry of a material to be measured in a simple structure.
      SOLUTION: The mass spectroscope includes: a device for mass spectrometry, which has a surface on which a metallic body capable of exciting plasmon through irradiation with a laser beam is formed and attaches the material to be measured to the surface; a photoirradiation means which irradiates the surface of the device for mass spectrometry with a laser beam, thereby ionizing a measurement sample adhering to the surface and desorbing it from the surface; and a detecting means which detects the mass of the measurement sample from time of flight of the measurement sample, desorbed from the surface of the device for mass spectrometry and then ionized, wherein the photoirradiation means has a polarized light-adjusting mechanism which adjusts the polarization direction of a laser beam, thereby solving the problem.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供能够以简单的结构高精度且有效地进行被测量材料的质谱分析的质谱仪。 质谱仪包括:质谱仪,其表面上形成能够通过用激光束照射激发等离子体的金属体,并将待测量的材料附着在表面上; 照射装置,其用激光束照射用于质谱的装置的表面,从而电离附着在表面上的测量样品并从表面解吸; 以及检测装置,其从所述测定样品的飞行时间检测所述测定样品的质量,从所述用于质谱的装置的表面脱离,然后离子化,其中,所述光照射装置具有调整所述偏振的偏振光调整机构 激光束的方向,从而解决了这个问题。 版权所有(C)2010,JPO&INPIT
    • 9. 发明专利
    • Manufacturing method of microstructure and microstructure
    • 微结构和微结构的制造方法
    • JP2009090423A
    • 2009-04-30
    • JP2007264320
    • 2007-10-10
    • Fujifilm Corp富士フイルム株式会社
    • TOMARU YUICHI
    • B82B3/00B82B1/00C25D1/00C25D11/04C25D11/18C25D11/20C25D11/24G01N21/65
    • G01N21/658Y10T428/24612
    • PROBLEM TO BE SOLVED: To provide a manufacturing method of a new microstructure having a metal nanostructure which generates an intensified electric field by an antenna effect of a sharpened tip portion, and to provide the microstructure. SOLUTION: The manufacturing method of the microstructure includes a micropore-forming step, a metal filling step, and an exposure step. The micropore-forming step forms a micropore on a base material, wherein the micropore has an opening in a surface of the base material, an inside diameter varies in a depth direction, and it has a recessed portion which protrudes more slenderly at an end portion. The metal filling step fills the micropore with metal, and forms a metal microbody having a projection at a tip portion, wherein the projection consists of the metal filled into the protruded recessed portion. The exposure step removes at least a part of the base material from the tip portion side of the metal microbody, and exposes at least the projection at the tip portion of the metal microbody. The manufacturing method of the microstructure having the metal microbody to generate the intensified electric field includes these steps. COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:提供具有金属纳米结构的新的微结构的制造方法,其通过尖锐尖端部的天线效应产生强化的电场,并提供微结构。 解决方案:微结构的制造方法包括微孔形成步骤,金属填充步骤和曝光步骤。 微孔形成步骤在基材上形成微孔,其中微孔在基材的表面具有开口,内径在深度方向上变化,并且其具有在端部处更细长地突出的凹部 。 金属填充步骤用金属填充微孔,并形成在尖端部分具有突起的金属微体,其中突起由填充到突出凹部中的金属组成。 曝光步骤从金属微体的顶端部分去除基材的至少一部分,并且至少露出金属微体的顶端部分的突出部。 具有金属微粒以产生强化电场的微结构的制造方法包括这些步骤。 版权所有(C)2009,JPO&INPIT
    • 10. 发明专利
    • Sensor and sensing device
    • 传感器和感应装置
    • JP2008164412A
    • 2008-07-17
    • JP2006353910
    • 2006-12-28
    • Fujifilm Corp富士フイルム株式会社
    • TOMARU YUICHI
    • G01N21/75G01N21/27G01N21/45G01N21/78G01N33/543G01N33/553
    • G01N21/45G01N21/553
    • PROBLEM TO BE SOLVED: To provide a sensor for immunoassay that does not require special treatment such as coloring matter coating for preparation of a labeling particle, facilitates the measurement, and has high design flexibility of the wavelength characteristic of detected light, and to provide a sensing device using it.
      SOLUTION: The sensor 1 has a translucent body 12 whose surface is a sensing plane 20 on a reflector 11, and the sensing plane 20 has a detecting section 31 to which a specific substance R to be detected can be bonded. The sensor 1 detects an optical interference effect of a structure that is formed when the substance R to be detected and the labeling particle S are bonded to the sensing plane 20 and is formed of the layer of the reflector 11, translucent body 12, and labeling particle S.
      COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供不需要特殊处理的传感器,例如用于制备标记颗粒的着色剂涂层,便于测量,并且具有高检测光的波长特性的高设计灵活性,以及 以提供使用它的感测装置。 解决方案:传感器1具有透光体12,其表面是反射器11上的感测平面20,感测平面20具有能够结合待检测的特定物质R的检测部31。 传感器1检测当被检测物质R和标记颗粒S结合到检测平面20时形成的结构的光学干涉效应,并且由反射体11,半透明体12和标签 粒子S.版权所有(C)2008,JPO&INPIT