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1. 发明专利

JP2014194534A Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, electronic device, and compound 有权
标题翻译：图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，制造电子器件的方法，电子器件和化合物
公开(公告)号：JP2014194534A
公开(公告)日：2014-10-09
申请号：JP2014030830
申请日：2014-02-20
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： KATAOKA SHOHEI , SHIBUYA AKINORI , FUKUHARA TOSHIAKI , FURUYA SO , SHIRAKAWA MICHIHIRO
IPC分类号： G03F7/004 , C07C311/51 , C08F20/18 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： G03F7/038 , C07C25/18 , C07C233/04 , C07C235/88 , C07C311/03 , C07C311/06 , C07C311/51 , C07C311/53 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D327/06 , C07D333/46 , C07D333/76 , C07D411/06 , C08F220/26 , G03F7/0392 , G03F7/0397 , G03F7/20 , G03F7/325 , H01L21/0275
摘要： PROBLEM TO BE SOLVED: To provide a pattern forming method, a photosensitive or radiation-sensitive resin composition, a resist film and a compound, a method for manufacturing an electronic device, and an electronic device, which exhibit high roughness performance and defocusing performance in the formation of an ultrafine pattern (particularly a trench pattern or a hole pattern in a size of 50 nm or less), and excellent resolution and exposure latitude.SOLUTION: The pattern forming method includes steps of (1) forming a film comprising the following photosensitive or radiation-sensitive resin composition, (2) exposing the film, and (3) developing the film with an organic solvent-containing developer to form a negative pattern. The photosensitive or radiation-sensitive resin composition comprises a compound (A) expressed by general formula (I-1), a compound (B) which is different from the compound (A) and generates an acid by irradiation with actinic rays or radiation, and a resin (P) which does not react with an acid generated from the compound (A) but shows decrease in the solubility with an organic solvent-containing developer by an action of an acid from the compound (B). Also disclosed are the photosensitive or radiation-sensitive resin composition, a resist film, the compound (A), a method for manufacturing an electronic device, and an electronic device.
摘要翻译：要解决的问题：为了提供图案形成方法，感光性或辐射敏感性树脂组合物，抗蚀剂膜和化合物，电子器件的制造方法和电子器件，其具有高的粗糙度性能和散焦性能超细图案（特别是50nm以下的沟槽图案或孔图案）的形成，以及优异的分辨率和曝光宽容度。图案形成方法包括以下步骤：（1）形成包含以下感光或辐射敏感性树脂组合物，（2）曝光该膜，和（3）用含有机溶剂的显影剂显影该膜以形成负型图案。光敏或辐射敏感性树脂组合物包含由通式（I-1）表示的化合物（A），与化合物（A）不同的化合物（B）），并通过用光化射线或辐射照射产生酸，和不与化合物（A）产生的酸反应的树脂（P），但是通过化合物（B）的酸作用，与含有机溶剂的显影剂的溶解度降低。还公开了光敏或辐射敏感性树脂组合物，抗蚀剂膜，化合物（A），电子器件的制造方法和电子器件。

2. 发明专利

JP2013190497A Actinic ray-sensitive or radiation-sensitive resin composition, and pattern formation method using the same 审中-公开
标题翻译：丙烯酸类敏感性或辐射敏感性树脂组合物和使用其的图案形成方法
公开(公告)号：JP2013190497A
公开(公告)日：2013-09-26
申请号：JP2012055139
申请日：2012-03-12
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： KATAOKA SHOHEI , FUKUHARA TOSHIAKI , SHIBUYA AKINORI , TANGO NAOHIRO
IPC分类号： G03F7/004 , C07C43/32 , C07C53/12 , C07C53/18 , C07C69/14 , C07C255/14 , C08F220/28 , G03F7/039
摘要： PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition allowing both suppression of pattern collapse and formation of a pattern being excellent in storage stability upon water intrusion and having an excellent shape.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition of the present invention is characterized by containing (A) a resin comprising a repeating unit having a cyclic acid anhydride structure and a repeating unit generating an alkali-soluble group by decomposition with the action of an acid; (B) a compound generating an acid by irradiation with an actinic ray or radiation; and (C) a compound represented by any of the general formulas (C1-1) to (C1-4) and having a boiling point of 250°C or less at an atmospheric pressure of 1013 hPa.
摘要翻译：要解决的问题：提供光化学敏感或辐射敏感性树脂组合物，其允许抑制图案塌陷和形成在水侵入时储存稳定性优异且具有优异形状的图案。溶解度：光化学敏感或辐射敏感性树脂组合物的特征在于含有（A）包含具有环状酸酐结构的重复单元的树脂和通过酸分解产生碱溶性基团的重复单元; （B）通过用光化射线或辐射照射产生酸的化合物; 和（C）在1013hPa的大气压下由通式（C1-1）至（C1-4）中任一个表示的且沸点为250℃或更低的化合物。

3. 发明专利

JP2012133053A Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition 有权
标题翻译：化学敏感性或辐射敏感性树脂组合物和耐蚀膜和使用组合物的图案形成方法
公开(公告)号：JP2012133053A
公开(公告)日：2012-07-12
申请号：JP2010283867
申请日：2010-12-20
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUKUHARA TOSHIAKI , YAMAGUCHI SHUHEI , YAMAMOTO KEI
IPC分类号： G03F7/004 , C08F212/14 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of decreasing elution of an acid from an exposed portion of a resist film into an immersion liquid in an immersion exposure process and suppressing watermark defects and development defects, and to provide a resist film and a pattern forming method using the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains: (A) a resin the solubility of which with an alkali developing solution is increased by an action of an acid; (B) a compound generating an acid by irradiation with actinic rays or radiation; (C) a hydrophobic resin having a sulfonamide structure; and (D) a mixture solvent comprising two or more kinds of solvents and having a boiling point of 200°C or more. The resist film and the pattern forming method are obtained by using the composition.
摘要翻译：要解决的问题：提供一种能够在浸没曝光工艺中将酸从抗蚀剂膜的暴露部分浸入浸液中的光敏性或辐射敏感性树脂组合物，并且抑制水印缺陷和显影缺陷，并提供使用该组合物的抗蚀剂膜和图案形成方法。光敏射线敏感性树脂组合物含有：（A）通过酸的作用使其与碱性显影液的溶解度增加的树脂; （B）通过用光化射线或辐射照射产生酸的化合物; （C）具有磺酰胺结构的疏水性树脂; 和（D）包含两种或更多种溶剂并且沸点为200℃或更高的混合溶剂。通过使用该组合物获得抗蚀剂膜和图案形成方法。版权所有（C）2012，JPO＆INPIT

4. 发明专利

JP2010102335A Positive photosensitive composition and pattern forming method using the same 有权
标题翻译：正极光敏组合物和使用其的图案形成方法
公开(公告)号：JP2010102335A
公开(公告)日：2010-05-06
申请号：JP2009223408
申请日：2009-09-28
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUKUHARA TOSHIAKI , SHIBUYA AKINORI , KATO TAKAYUKI
IPC分类号： G03F7/039 , C08F220/10 , G03F7/004 , G03F7/38 , H01L21/027
CPC分类号： C08F20/28 , C08F20/26 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/111
摘要： PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which suppresses the occurrence of development defects and scum and a pattern forming method using the same, with respect to a positive photosensitive composition for use in the production process of a semiconductor such as IC, in the production process of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes. SOLUTION: The positive photosensitive composition includes: a resin having a specific repeating unit having a polar group and a specific repeating unit having a lactone structure and being capable of increasing a solubility of the resin in an alkali developer by an action of an acid; a compound capable of generating an acid upon irradiation with actinic rays or radiation; and a solvent. The pattern forming method using the same is also provided. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供抑制显影缺陷和浮渣的发生的正性感光性组合物及使用其的图案形成方法相对于半导体的制造方法中使用的正型感光性组合物，例如 IC，在液晶，热敏头等的电路基板的制造过程中或在其他光制造工艺中。解决方案：正型光敏组合物包括：具有极性基团的特定重复单元的树脂和具有内酯结构的特定重复单元，并且能够通过以下方式提高树脂在碱性显影剂中的溶解度酸; 能够在用光化射线或辐射照射时产生酸的化合物; 和溶剂。还提供了使用该图案形成方法的图案形成方法。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2008268933A Positive resist composition and pattern forming method 有权
标题翻译：积极抵抗组成和图案形成方法
公开(公告)号：JP2008268933A
公开(公告)日：2008-11-06
申请号：JP2008076600
申请日：2008-03-24
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUKUHARA TOSHIAKI , KANNA SHINICHI , KANDA HIROMI
IPC分类号： G03F7/039 , C08F20/28 , C08F210/14 , C08F212/04 , C08F216/14 , C08F220/20 , C08F222/40 , G03F7/004 , G03F7/023 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a positive resist composition with improved line edge roughness due to normal exposure and immersion exposure and excellent followability to water during immersion exposure, and a pattern forming method using the same. SOLUTION: The positive photosensitive composition comprises: (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound generating an acid in irradiation with active light or radiation; (C) a resin that contains neither fluorine nor silicon and has a repeating unit having the predetermined structure; and (D) a solvent, wherein each symbol represents a predetermined group or the like. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供由于正常曝光和浸渍曝光以及在浸渍曝光期间对水的优异追随性而提供的具有改善的线边缘粗糙度的正性抗蚀剂组合物以及使用其的图案形成方法。正光敏组合物包含：（A）具有由式（I）表示的可酸分解重复单元并通过酸作用增加其在碱显影剂中的溶解度的树脂; （B）以活性光或辐射照射产生酸的化合物; （C）既不含氟也不含硅且具有预定结构的重复单元的树脂; 和（D）溶剂，其中每个符号表示预定的基团等。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2014026102A Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition to be used for the method 有权
标题翻译：用于方法的图案形成方法和丙烯酸敏感或辐射敏感性树脂组合物
公开(公告)号：JP2014026102A
公开(公告)日：2014-02-06
申请号：JP2012166049
申请日：2012-07-26
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： KATAOKA SHOHEI , SHIBUYA AKINORI , GOTO AKIYOSHI , MATSUDA TOMOKI , FUKUHARA TOSHIAKI
IPC分类号： G03F7/004 , C07C25/18 , C07C309/09 , C07C309/12 , C07C309/14 , C07C309/42 , C07C311/48 , C07C381/12 , C07D295/22 , C09K3/00 , G03F7/038 , G03F7/039 , G03F7/32 , H01L21/027
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/30 , G03F7/325
摘要： PROBLEM TO BE SOLVED: To provide a pattern forming method excellent in roughness performance such as line width roughness and excellent in exposure latitude, and an actinic ray-sensitive or radiation-sensitive resin composition to be used for the method.SOLUTION: The pattern forming method includes steps of: (i) forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition which contains a compound (A) expressed by general formula (I), a resin (P) that shows decrease in the solubility with a developing solution containing an organic solvent by an action of an acid, and a compound (B) that generates an acid by irradiation with actinic rays or radiation; (ii) irradiating the film with actinic rays or radiation; and (iii) developing the film irradiated with actinic rays or radiation by use of a developing solution containing an organic solvent.
摘要翻译：要解决的问题：提供一种粗糙度优异的图案形成方法，例如线宽粗糙度和优异的曝光宽容度，以及用于该方法的光化射线敏感或辐射敏感性树脂组合物。解决方案：图案形成方法包括以下步骤：（i）形成含有光化射线敏感或辐射敏感性树脂组合物的膜，其含有由通式（I）表示的化合物（A），表现出与通过酸的作用含有有机溶剂的显影溶液和通过用光化射线或辐射照射产生酸的化合物（B）; （ii）用光化射线或辐射照射薄膜; 和（iii）通过使用含有机溶剂的显影溶液显影用光化射线或辐射照射的薄膜。

7. 发明专利

JP2013182023A Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film and pattern formation method using said composition, and electronic device manufacturing method and electronic device 审中-公开
标题翻译：丙烯酸敏感性或辐射敏感性树脂组合物，丙烯酸类敏感性或辐射敏感性膜和使用组合物的图案形成方法，以及电子设备制造方法和电子设备
公开(公告)号：JP2013182023A
公开(公告)日：2013-09-12
申请号：JP2012043845
申请日：2012-02-29
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： TOKUGAWA YOKO , KATAOKA SHOHEI , SHIBUYA AKINORI , ITO JUNICHI , MATSUDA TOMOKI , IWATO KAORU , SUGIYAMA SHINICHI , TANGO NAOHIRO , FUKUHARA TOSHIAKI , YOSHITOME MASAHIRO
IPC分类号： G03F7/004 , C07C309/06 , C07C309/12 , C07C309/17 , C07C309/22 , C07C311/09 , C07C381/12 , C08F220/28 , C09K3/00 , G03F7/039
摘要： PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition excellent in DOF and pattern roughness characteristics such as LWR without much deterioration in performance over time; an actinic ray-sensitive or radiation-sensitive film and a pattern formation method which use the composition; and an electronic device manufacturing method and an electronic device.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin whose solubility in an alkaline developer is increased by the action of an acid, (B) a compound which is represented by the specified general formula (1) and generates an acid upon exposure to an actinic ray or radiation, and (C) a low molecular weight compound having on a nitrogen atom a group leaving by the action of an acid. (The meaning of each symbol in the formula is described in the claims.)
摘要翻译：要解决的问题：提供：具有优异的DOF和图案粗糙度特性如LWR的光化射线敏感或辐射敏感性树脂组合物，随着时间的推移性能不会降低; 光化射线敏感或辐射敏感膜和使用该组合物的图案形成方法; 电子器件的制造方法和电子器件。光解射线敏感性或辐射敏感性树脂组合物含有（A）通过酸的作用使在碱性显影剂中的溶解度增加的树脂，（B）化合物其由指定的通式（1）表示，并且在暴露于光化射线或辐射时产生酸，和（C）在氮原子上具有通过酸作用离去的基团的低分子量化合物。（公式中每个符号的含义在权利要求中描述。）

8. 发明专利

JP2013137338A Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method using composition, and method for manufacturing electronic device and electronic device 审中-公开
标题翻译：丙烯酸类敏感性或辐射敏感性树脂组合物，耐腐蚀性膜和使用组合物的图案形成方法，以及制造电子器件和电子器件的方法
公开(公告)号：JP2013137338A
公开(公告)日：2013-07-11
申请号：JP2011287025
申请日：2011-12-27
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUKUHARA TOSHIAKI , KATAOKA SHOHEI , TANGO NAOHIRO , SHIBUYA AKINORI , ITO JUNICHI , MATSUDA TOMOKI , IWATO KAORU , SUGIYAMA SHINICHI , YOSHITOME MASAHIRO , TOKUGAWA YOKO
IPC分类号： G03F7/039 , C08F220/26 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition, capable of forming a resist film that is excellent in a pattern cross-sectional shape and in suppressing occurrence of pattern collapse and defects attributed to residual water and is never deteriorated in performance of suppressing occurrence of the defects attributed to residual water and obtaining the excellent pattern cross-sectional shape even when the resist film is produced by using a resist solution left to stand for a certain time, to provide a resist film formed by using the composition, a pattern forming method using the composition, and to provide a method for manufacturing an electronic device and an electronic device.SOLUTION: There is provided an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin having a repeating unit expressed by general formula (1) and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group; (B) a compound that generates an acid by irradiation with actinic rays or radiation; and (C) a resin having at least any of a fluorine atom and a silicon atom. In general formula (1), L represents a single bond or a divalent connecting group, and Z represents a cyclic acid anhydride group.
摘要翻译：要解决的问题：为了提供能够形成图案截面形状优异的抗蚀剂膜并抑制图案塌陷的发生和残留水分的缺陷的光化射线敏感性或辐射敏感性树脂组合物，并且为即使当通过使用静置一定时间的抗蚀剂溶液制造抗蚀剂膜时，也不会降低由残留水引起的缺陷的发生的性能，并获得优异的图案横截面形状，以提供由使用该组合物，使用该组合物的图案形成方法，并提供一种电子器件和电子器件的制造方法。解决方案：提供一种光化射线敏感或辐射敏感性树脂组合物，其包含：（A）树脂具有由通式（1）表示的重复单元和通过酸的作用分解以产生碱的重复单元流氓小组（B）通过用光化射线或辐射照射产生酸的化合物; 和（C）至少具有氟原子和硅原子的任何一种的树脂。在通式（1）中，L表示单键或二价连接基，Z表示环状酸酐基。

9. 发明专利

JP2013076946A Actinic ray sensitive or radiation sensitive resin composition, and actinic ray sensitive or radiation sensitive film and pattern forming method using the same 有权
标题翻译：化学敏感性或辐射敏感性树脂组合物，以及丙烯酸敏感或辐射敏感性膜和使用其的图案形成方法
公开(公告)号：JP2013076946A
公开(公告)日：2013-04-25
申请号：JP2011218278
申请日：2011-09-30
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： KATAOKA SHOHEI , SHIBUYA AKINORI , ITO JUNICHI , MATSUDA TOMOKI , FUKUHARA TOSHIAKI , TANGO NAOHIRO , IWATO KAORU , YOSHITOME MASAHIRO , SUGIYAMA SHINICHI , TOKUGAWA YOKO
IPC分类号： G03F7/039 , C08F220/28
CPC分类号： G03F7/038 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： PROBLEM TO BE SOLVED: To provide an actinic ray sensitive or radiation sensitive resin composition capable of suppressing occurrence of pattern collapse and improving line edge roughness, and to provide an actinic ray sensitive or radiation sensitive film and pattern forming method using the same.SOLUTION: An actinic ray sensitive or radiation sensitive resin composition includes: (A) a resin comprising a repeating unit represented by the following general formula (1) and a repeating unit that is decomposed by action of an acid to generate an alkali-soluble group; and (B) a compound generating an acid by irradiation with an actinic ray or radiation. In the general formula (1), L represents a divalent linking group. Rrepresents a hydrogen atom or an alkyl group, and Z represents a cyclic acid anhydride structure.
摘要翻译：要解决的问题：提供能够抑制图案塌陷的发生和线边缘粗糙度的光化射线敏感或辐射敏感性树脂组合物，并且提供使用其的光化学敏感或辐射敏感的膜和图案形成方法。光敏射线敏感性树脂组合物包括：（A）包含由以下通式（1）表示的重复单元的树脂和通过酸作用分解产生碱的重复单元可溶组合和（B）通过用光化射线或辐射照射产生酸的化合物。在通式（1）中，L表示二价连接基团。 R 1 表示氢原子或烷基，Z表示环状酸酐结构。版权所有（C）2013，JPO＆INPIT

10. 发明专利

JP2011186089A Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：JP2011186089A
公开(公告)日：2011-09-22
申请号：JP2010049938
申请日：2010-03-05
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUKUHARA TOSHIAKI
IPC分类号： G03F7/039 , C08F20/26 , G03F7/004 , G03F7/38 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a pattern forming method excellent in both of pattern shapes and roughness characteristics. SOLUTION: The pattern forming method includes: forming a film by using an active ray-sensitive or radiation-sensitive resin composition containing a resin which has a repeating unit expressed by general formula (1), and whose solubility with an alkali developing solution is increased by the action of an acid, and a compound that generates an acid by irradiation with active rays or radiation; exposing the film; and developing the exposed film by using an aqueous solution of tetramethylammonium hydroxide having a concentration of less than 2.38 mass%. COPYRIGHT: (C)2011,JPO&INPIT

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