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1. 发明专利

JP2013195790A Exposure drawing device, program and exposure drawing method 有权
标题翻译：接触绘图装置，程序和接触绘图方法
公开(公告)号：JP2013195790A
公开(公告)日：2013-09-30
申请号：JP2012063912
申请日：2012-03-21
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUKUDA TSUYOSHI
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an exposure drawing device that can highly accurately correct an exposure position even when an exposure object is a sensitive material of ultra-high sensitivity.SOLUTION: The exposure drawing device comprises: an optical modulation element that is two-dimensionally arrayed such that each of a plurality of micro optical elements corresponds to each of pixels; a light source that is provided with a plurality of light emission parts respectively emitting light with which irradiates the optical modulation element and can adjust a light emission amount; a light collection optical system that is disposed between the optical modulation element and an exposed surface and collects light from the optical modulation element on the exposed surface; position detection means that detects a light collection position of collecting light from each of the plurality of optical modulation elements in a detection surface equivalent to the exposed surface in a state (107) where a light amount emitted from the light source is adjusted such that the light amount is larger than a light amount at which the exposed surface is exposed; acquisition means that acquires a deviation of the light collection position of collecting the light from the plurality of optical modulation elements from a reference position on the basis of a detection result; and correction means (S109) that corrects the light collection position on the exposed surface on the basis of an acquired deviation amount.
摘要翻译：要解决的问题：提供即使当曝光对象是超高灵敏度的敏感材料时也能够高度准确地校正曝光位置的曝光描绘装置。解决方案：曝光绘制装置包括：光调制元件，尺寸排列成使得多个微光学元件中的每一个对应于每个像素; 光源，其设置有分别发射照射光调制元件并可调节发光量的光的多个发光部; 光采集光学系统，其设置在所述光调制元件和暴露表面之间并且在所述暴露表面上收集来自所述光调制元件的光; 位置检测装置，在从所述光源发射的光量被调节到的状态（107）中，检测从所述多个光调制元件中的每一个收集来自与所述露出面相当的检测面的光的收集位置，光量大于暴露表面露出的光量; 获取装置，其基于检测结果从参考位置获取从多个光调制元件收集光的光采集位置的偏差; 和校正装置（S109），其基于获取的偏差量来校正曝光表面上的光采集位置。

2. 发明专利

JP2009111430A Exposure apparatus 有权
标题翻译：曝光装置
公开(公告)号：JP2009111430A
公开(公告)日：2009-05-21
申请号：JP2009032467
申请日：2009-02-16
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUKUDA TSUYOSHI
IPC分类号： H01L21/027 , G01B11/00 , G01B11/26 , G02B26/00 , G03B21/13 , G03B27/72 , G03F7/20
CPC分类号： G03B27/72 , G03B21/13 , G03F7/70275 , G03F7/70291 , G03F7/70358
摘要： PROBLEM TO BE SOLVED: To provide a multi-beam exposure apparatus which performs highly precise drawing by compensating the quantity of distortion of drawing, when exposure processing is carried out with each beam emitted from means of selectively modulating a plurality of pixels. SOLUTION: From a plurality of measured pixels Z set up so as to averagely disperse and scattered in an exposure area of the means of selectively modulating the plurality of pixels, the exposure apparatus detects exposure point position information of a light beam irradiated on an exposure surface with beam position detection means 72, 74. From the position information of each measured pixel Z in the means of selectively modulating the plurality of pixels, and each exposure point position information of the light beam projected on the exposure surface from each measured pixel detected using the beam position detection means, respectively, the exposure apparatus determines the quantity of distortion of the drawing by calculating these relative position deviation with a distortion quantity calculating means and performs the compensation corresponding to this results to enable highly precise drawing. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种多光束曝光装置，当通过选择性调制多个像素而发射的每个光束进行曝光处理时，通过补偿绘制的失真量来执行高精度绘图。解决方案：曝光装置从多个被测量的像素Z设置成在选择性地调制多个像素的装置的曝光区域中平均分散散射，检测照射到光束上的光束的曝光点位置信息具有光束位置检测装置72,74的曝光表面。从选择性地调制多个像素的装置中的每个测量像素Z的位置信息和从每个被测量的投影在曝光表面上的光束的每个曝光点位置信息通过使用光束位置检测装置检测的像素，曝光装置通过使用失真量计算装置计算这些相对位置偏差来确定绘图的失真量，并执行与该结果相对应的补偿以实现高精度绘图。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2014048649A Exposure drawing apparatus and program 有权
标题翻译：接触绘图设备和程序
公开(公告)号：JP2014048649A
公开(公告)日：2014-03-17
申请号：JP2012194360
申请日：2012-09-04
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUKUDA TSUYOSHI , IWASAKI HIROYUKI , BABA TOMOYUKI , TANAKA KUNIHIKO
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an exposure drawing apparatus and program in which exposure amount can be adjusted, and fluctuation of light volume when ejecting light of low light volume can be made small.SOLUTION: An exposure head 16a includes: a laser source 30; a light volume control part 50 that has a reflection surface that reflects light from the laser source 30 and in which reflectance is adjustable, and that ejects reflection light having a light volume corresponding to reflectance in the reflection surface; first optical systems 31, 32 that adjust illuminance distribution of reflection light from the light volume control part 50, and form adjustment light; DMD27 that performs spatial modulation of adjustment light, and generates pattern light corresponding to a drawing pattern; and second optical systems 34, 35 that irradiate the pattern light to a surface to be exposed. The light volume control part 50 has a first reflection surface and a second reflection surface having different reflectances, and one of the first and second surfaces is arranged on a light path depending on a control signal.
摘要翻译：要解决的问题：提供一种可以调节曝光量的曝光描绘装置和程序，并且可以使弹出低光量的光的光量的波动变小。解决方案：曝光头16a包括：激光源30 ; 光量控制部50具有反射来自激光源30的反射面的反射面，反射率可调，反射面的反射率相当于反射光的反射光; 第一光学系统31,32，其调节来自光量控制部50的反射光的照度分布，并形成调整光; 执行调整光的空间调制的DMD27，并且生成与绘图图形对应的图案光; 以及将图案光照射到要暴露的表面的第二光学系统34,35。光量控制部50具有第一反射面和具有不同反射率的第二反射面，第一表面和第二表面之一根据控制信号配置在光路上。

4. 发明专利

JP2011007941A Exposure head and exposure apparatus 有权
标题翻译：暴露头和曝光装置
公开(公告)号：JP2011007941A
公开(公告)日：2011-01-13
申请号：JP2009149821
申请日：2009-06-24
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUKUDA TSUYOSHI , ISHIKAWA HIROMI
IPC分类号： G03F7/20 , B41J2/445 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an exposure head and an exposure apparatus capable of maintaining a high resolution and achieving a large focal depth by performing multi-focal exposure with light beams which are equal in focal length.SOLUTION: The exposure apparatus has a plurality of exposure heads comprising: a light source 66 which irradiates light; a mirror device 50 which generates a plurality of light beams by driving a plurality of two-dimensionally arranged micromirrors; a condensing optical system which condenses each of a plurality of light beams generated by the mirror device 50; an image forming optical system 80, 82 which performs image formation on a photosensitive material with each of a plurality of light beams condensed by the condensing optical system; and a parallel flat plate 10 having a plurality of parts different in thickness arranged on the optical paths of a plurality of light beams between the condensing optical system and the image forming optical system in such a way that the parts meet the optical axes at right angles. A substantially one position of a photosensitive material is repeatedly exposed with light beams different in focal position by relatively moving the plurality of exposure heads to the photosensitive material in a predetermined direction.
摘要翻译：要解决的问题：提供一种能够通过用焦距相等的光束进行多焦曝光来保持高分辨率并实现大的焦深的曝光头和曝光装置。解决方案：曝光装置具有多个的曝光头，包括：照射光的光源66; 镜装置50，其通过驱动多个二维布置的微镜产生多个光束; 聚光光学系统，其凝结由反射镜装置50产生的多个光束中的每一个; 图像形成光学系统80,82，其通过由聚光系统聚光的多个光束中的每一个在感光材料上进行图像形成; 以及平行平板10，其具有布置在聚光光学系统和图像形成光学系统之间的多个光束的光路上的厚度不同的多个部分，使得部件以直角与光轴相遇。通过将多个曝光头沿着预定方向相对移动到感光材料，感光材料的基本上一个位置被重复地用焦点不同的光束曝光。

5. 发明专利

JP2008250147A Alignment mark measuring method and device, and drawing method and device 有权
标题翻译：对准标记测量方法和装置，以及绘图方法和装置
公开(公告)号：JP2008250147A
公开(公告)日：2008-10-16
申请号：JP2007093450
申请日：2007-03-30
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUKUDA TSUYOSHI
IPC分类号： G03F9/00
摘要： PROBLEM TO BE SOLVED: To measure the position of an alignment mark with higher precision by a method of measuring the position of the alignment mark provided in a drawing surface indicative of a reference for the drawing position of an image when the image is drawn on the drawing surface by a modulating means.
SOLUTION: In the alignment mark measuring method, the alignment mark 13 is configured to reflect or transmit light modulated by the modulating means, the light reflected by or transmitted through the alignment mark 13 is detected to acquire the position of the alignment mark 13 based upon a detection signal thereof.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：通过测量设置在表示图像的绘制位置的基准的绘图表面中的对准标记的位置的方法来测量对准标记的位置，图像是通过调制装置在绘图面上绘制。解决方案：在对准标记测量方法中，对准标记13被配置为反射或透射由调制装置调制的光，检测由对准标记13反射或透射的光，以获取对准标记的位置 13基于其检测信号。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2008233006A Method and system for acquisition of drawing location, and method/system of drawing 审中-公开
标题翻译：用于获取绘图位置的方法和系统，以及绘图方法/系统
公开(公告)号：JP2008233006A
公开(公告)日：2008-10-02
申请号：JP2007076529
申请日：2007-03-23
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUKUDA TSUYOSHI , YAMADA ASAMI , MIZUMOTO MANABU
IPC分类号： G01B11/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide method/system for acquisition of drawing location and method/system of drawing for acquiring all pixel coordinate data which indicate all drawing dots locations of modulation means, consisting of numerous pixels in a short time, aimed at improving the productivity. SOLUTION: This method comprises: a step to measure drawing dots locations of the remaining first thinned-out pixels after some pixels are thinned out from numerous pixels and acquire detail measured coordinate data P 1 ; a step to interpolate the above detail measured coordinate data P 1 and acquire first all pixel coordinate data R 1 ; a step to measure drawing dots locations of the remaining second thinned-out pixels after some pixels were further thinned out from the first thinned-out pixels and acquire first simple measured coordinate data Q 1 ; a step to compensate the detail measured coordinate data P 1 and acquire first compensated detail measured coordinate data P 1-1 , based on the relation between the first simple measured coordinate data Q 1 and the detail measured coordinate data P 1 of the second thinned-out pixels among all the detail measured coordinate data P 1 ; and a step to interpolate the above first compensated detail measured coordinate data P 1-1 and acquire second all pixel coordinate data R 1-1 . COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供用于获取绘图位置的方法/系统和用于获取所有像素坐标数据的绘图方法/系统，所述像素坐标数据指示在短时间内由许多像素组成的调制装置的所有绘图点位置，目标提高生产率。解决方案：该方法包括：在从多个像素中稀疏出一些像素并测量细节测量的坐标数据P 1之后，测量剩余的第一稀疏像素的绘制点位置的步骤; 内插上述细节测量坐标数据P 1并获取第一个全部像素坐标数据R 1 的步骤; 在从第一稀疏化像素进一步稀疏一些像素之后，测量剩余的第二稀疏像素的绘制点位置的步骤，并获取第一简单测量坐标数据Q SB> 1; 基于第一简单测量坐标数据Q（1）之间的关系来补偿细节测量坐标数据P 1 的步骤，并获取第一补偿细节测量坐标数据P 1-1 所有细节测量坐标数据P 1中的第二稀疏像素的细节测量坐标数据P 1 ; 以及插入上述第一补偿细节测量坐标数据P 1-1 并获取第二全像素坐标数据R SB SB 1-1的步骤。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2008046383A Method and device for measuring drawing position and drawing method and device 有权
标题翻译：用于测量绘图位置和绘图方法和装置的方法和装置
公开(公告)号：JP2008046383A
公开(公告)日：2008-02-28
申请号：JP2006222187
申请日：2006-08-17
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUKUDA TSUYOSHI , MIZUMOTO MANABU
IPC分类号： G03F7/20 , G01B11/00
CPC分类号： G03F7/70791 , G03F7/70275 , G03F7/70291
摘要： PROBLEM TO BE SOLVED: To provide a method and a device for measuring a drawing position capable of measuring a beam spot position with higher accuracy to achieve drawing with higher accuracy, and to provide a drawing method and a device.
SOLUTION: The method for measuring a drawing position includes steps of relatively moving an exposure head 26 that modulates incident light to form a drawing point on a drawing face with respect to the drawing face, sequentially forming drawing points on the drawing face through the exposure head 26 by the relative movement, and measuring a position of a drawing point during drawing an image by a detection slit 74 formed on the drawing face; wherein relative displacement between the exposure head and the detection slit 74 during the relative movement is measured, and the position of a drawing point measured by the detection slit 74 is corrected based on the measured displacement.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于测量能够以更高精度测量光束点位置的绘图位置的方法和装置，以更高的精度实现绘制，并提供绘图方法和装置。解决方案：用于测量绘图位置的方法包括相对移动曝光头26的步骤，该曝光头26调制入射光以在绘图面上相对于绘图面形成绘图点，在绘图面上依次形成绘图点，通过曝光头26通过相对运动，并且通过形成在绘图面上的检测狭缝74来绘制图像期间的绘图点的位置; 其中测量相对运动期间曝光头和检测狭缝74之间的相对位移，并且基于所测量的位移来校正由检测狭缝74测量的绘图点的位置。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2007271867A Drawing position measurement method and apparatus, and drawing method and apparatus 有权
标题翻译：绘图位置测量方法和装置，以及绘图方法和装置
公开(公告)号：JP2007271867A
公开(公告)日：2007-10-18
申请号：JP2006096797
申请日：2006-03-31
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUKUDA TSUYOSHI , TAKADA TSUNEHISA , MIZUMOTO MANABU
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70791 , G03F7/70291 , G03F9/00 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To more highly accurately measure a position of a drawing point in a drawing position measurement method for measuring the position of the drawing point when an image is drawn by relatively moving a drawing plane and a drawing point forming means which modulates incident light and forms the drawing point on the drawing plane and successively forming drawing points on the drawing plane by the drawing point forming means.
SOLUTION: At least three slits in which at least two are not parallel to each other are formed in the same plane as the drawing plane; beams modulated by the drawing point forming means and passing through at least three slits are detected; and at least two pieces of position information of the drawing points are acquired based on the relative movement position information of the drawing plane corresponding to each detection time of beams passing through the three slits; and the position of the drawing point is measured based on the position information of the at least two drawing points.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了更高精度地测量绘图位置测量方法中的绘制点的位置，该绘图位置测量方法用于通过相对移动绘图平面和绘图点形成装置来绘制图像时测量绘制点的位置其调制入射光，并在绘图平面上形成绘图点，并通过绘图点形成装置在绘图平面上依次形成绘图点。解决方案：至少两个彼此不平行的至少三个狭缝形成在与拉伸平面相同的平面中; 检测由绘图点形成装置调制并通过至少三个狭缝的光束; 并且基于与通过三个狭缝的光束的每个检测时间相对应的绘图面的相对移动位置信息来获取绘图点的至少两个位置信息; 并且基于至少两个绘图点的位置信息来测量绘制点的位置。版权所有（C）2008，JPO＆INPIT

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