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1. 发明授权

US06242053B1 Process for coating plastic containers or glass containers by means of a PCVD coating process 失效
标题翻译：通过PCVD涂覆工艺涂覆塑料容器或玻璃容器的方法
公开(公告)号：US06242053B1
公开(公告)日：2001-06-05
申请号：US09081209
申请日：1998-05-20
申请人： Friedrich Anderle , Jürgen Henrich , Wilfried Dicken , Heinrich Grünwald , Michael Liehr , Klaus Nauenburg , Rudolf Beckmann
发明人： Friedrich Anderle , Jürgen Henrich , Wilfried Dicken , Heinrich Grünwald , Michael Liehr , Klaus Nauenburg , Rudolf Beckmann
IPC分类号： C08F246
CPC分类号： C03C17/005 , B05D1/62 , C23C16/509 , C23C16/511 , H01J37/32082 , H01J2237/332 , H05H1/46 , H05H2001/463
摘要： A process and device is shown for coating the delineating surfaces of a hollow object, preferably a hollow object having at least one sealable opening, by means of plasma coating, via the action of plasma on the delineating surface of the hollow object that is to be coated.
摘要翻译：示出了一种工艺和装置，用于通过等离子体涂覆在中空物体的描绘表面上等离子体的作用来涂覆中空物体的描绘表面，优选具有至少一个可密封开口的中空物体涂层。

2. 发明授权

US06426144B1 Process for coating plastic substrates 有权
标题翻译：塑料基材涂布工艺
公开(公告)号：US06426144B1
公开(公告)日：2002-07-30
申请号：US09482010
申请日：2000-01-13
申请人： Heinrich Grünwald , Thomas Schulte , Klaus Nauenburg , Wilfried Dicken , Rudolf Beckmann
发明人： Heinrich Grünwald , Thomas Schulte , Klaus Nauenburg , Wilfried Dicken , Rudolf Beckmann
IPC分类号： C23C16453
CPC分类号： C08J7/123 , B05D1/62 , C23C16/0245 , C23C16/401 , Y10T428/31507 , Y10T428/31667
摘要： A process for coating plastic substrates with a transparent layer compact that is not sensitive to scratches and abrasion and resistant to atmospheric influence with a plasma flame in a vacuum chamber at some distance from the substrate. The process includes the steps of: a cleaning of the substrate with an oxidizing gas in a first procedural step and then a cross linkage with an inert gas in a second procedural step, an oxidizing gas and a silicon-organic compound are used in a third procedural step to produce a first barrier layer, and an oxidizing gas, a silicon-organic compound, and a UV-absorbing compound are used in a fourth procedural step to deposit a sublayer with UV absorbers, an oxidizing gas and a silicon-organic compound are used in a fifth procedural step to deposit a scratch-resistant layer, an inert gas and a silicon-organic compound are used in a sixth procedural step to deposit a smooth layer.
摘要翻译：一种涂覆塑料基材的方法，该透明层压片对于在与基板有一定距离的真空室中的等离子体火焰不易受划痕和磨损影响，并且不受大气影响。该方法包括以下步骤：在第一程序步骤中用氧化气体清洗基底，然后在第二步骤步骤中与惰性气体交联，氧化气体和硅 - 有机化合物用于第三程序在第四步骤中使用氧化气体，硅 - 有机化合物和UV吸收化合物的步骤以使用UV吸收剂沉积子层，使用氧化气体和硅 - 有机化合物在第六程序步骤中，在第五步骤中沉积抗划伤层，惰性气体和硅 - 有机化合物被用于沉积光滑层。

3. 发明授权

US06488384B2 Method for the coating of substrates made of plastic 失效
标题翻译：由塑料制成的基材的涂布方法
公开(公告)号：US06488384B2
公开(公告)日：2002-12-03
申请号：US09470503
申请日：1999-12-22
申请人： Heinrich Grünwald , Thomas Schulte , Klaus Nauenburg , Wilfried Dicken
发明人： Heinrich Grünwald , Thomas Schulte , Klaus Nauenburg , Wilfried Dicken
IPC分类号： G02B508
CPC分类号： C23C14/568 , C23C14/024
摘要： In a method for the coating of substrates made of plastic, with a light-reflecting layer, preferably an aluminum layer, and another layer placed between the substrate and the light-reflecting layer, the additional layer, which has a high barrier effect to substances which migrate or evolve gases from the plastic, is a highly crosslinked hydrocarbon layer, a silicon dioxide, silicon nitride, or silicon oxynitride layer, with a thickness of at least 15 nm, wherein the carbon content of the barrier layer is
摘要翻译：在由塑料制成的基板的涂布方法中，具有光反射层，优选铝层，以及放置在基板和光反射层之间的另一层，对物质具有高屏障效应的附加层其从塑料中迁移或释放气体是厚度为至少15nm的高度交联的烃层，二氧化硅，氮化硅或氮氧化硅层，其中阻挡层的碳含量<15％。

4. 发明授权

US6007875A Method and apparatus for applying protective coatings on reflective layers 失效
标题翻译：在反射层上施加保护涂层的方法和装置
公开(公告)号：US6007875A
公开(公告)日：1999-12-28
申请号：US20715
申请日：1998-02-09
申请人： Heinrich Grunwald , Michael Jung , Wilfried Dicken , Stefan Kunkel , Klaus Nauenburg
发明人： Heinrich Grunwald , Michael Jung , Wilfried Dicken , Stefan Kunkel , Klaus Nauenburg
IPC分类号： C08L83/02 , B05D7/24 , C08F2/00 , C08F2/52 , C08G77/02 , C23C14/12 , C23C14/56 , F21V7/22 , G02B1/10 , C08J7/18
CPC分类号： B05D1/62 , C23C14/566 , C23C14/568 , F21V7/22 , G02B1/105
摘要： A process for applying a protective coating on the reflective layer of projector reflectors by means of plasma polymerization is provided, where a first protective layer which was applied on the reflective layer in a vacuum chamber by plasma polymerization of an organic silicon compound, is provided by means of a plasma in the same processing chamber, under uninterrupted vacuum conditions, with a second, hydrophilic layer substantially composed of a hydrocarbon skeleton and polar functional groups linked thereto, use is made of an apparatus which comprises a plurality of treatment stations (8, 9, 10) held by a fixed, circular cylindrical vacuum chamber wall (16) and a rotatable inner wall cylinder (17) which is enclosed by said vacuum chamber wall (16) and which holds four substrate chambers (12 through 15) and where the wall of the vacuum chamber (16) is provided with four openings (3 through 6) with which the substrate chambers (3 through 6) can be aligned and through which openings the treatment material can act upon the substrates (2, 2', . . . ), with an outer wall (21, 21', . . . ) which encloses the vacuum chamber wall (16) from the outside and extends radially outward from said vacuum chamber wall (16) and joins together the three treatment stations (8, 9, 10) and the loading/unloading station (11), where at least one of the outer chambers (17 through 20) provided between the outer wall, the vacuum chamber wall and the treatment stations (8, 9, 10) is connected on the one hand with the adjoining treatment station and on the other hand with a gas source or an initial substance source (30 through 33).
摘要翻译：提供了通过等离子体聚合在投影仪反射体的反射层上施加保护涂层的方法，其中通过有机硅化合物的等离子体聚合在真空室中施加在反射层上的第一保护层由在不间断的真空条件下，在相同处理室中的等离子体的装置，具有基本上由烃骨架和与其连接的极性官能团的第二亲水层，使用包括多个处理站（8， 9，10）由固定的圆柱形真空室壁（16）和可旋转的内壁圆筒（17）保持，该内壁圆柱体（17）由所述真空室壁（16）包围并保持四个基板室（12至15）真空室（16）的壁设置有四个开口（3至6），基板室（3至6）可通过该开口对准，通过该开口处理材料可以作用在基板（2,2'，...）上。。。），其具有从外部包围真空室壁（16）并从所述真空室壁（16）径向向外延伸的外壁（21,21'...），并将三个处理站（8， 9，10）和装卸站（11），其中设置在外壁，真空室壁和处理站（8,9,10）之间的至少一个外室（17至20）连接一方面与毗邻的处理站，另一方面与气源或初始物质来源（30至33）。

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