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    • 1. 发明授权
    • Electrophotosensitive materials for migration imaging processes
    • 用于迁移成像过程的电光敏材料
    • US4272595A
    • 1981-06-09
    • US012172
    • 1979-02-14
    • Frank G. WebsterMichael T. ReganLouis J. Rossi
    • Frank G. WebsterMichael T. ReganLouis J. Rossi
    • G03G17/04G03G5/06
    • G03G17/04
    • Electrophotosensitive materials having the structure ##STR1## wherein: M and N may be zero, one or two;L.sup.1, L.sup.2, L.sup.3, L.sup.4, L.sup.5, L.sup.6, and L.sup.7 may be cyano, hydrogen, substituted or unsubstituted alkyl, alkoxy, aralkyl, aryl or heterocycyl and in addition any two of L.sup.1, L.sup.2 and L.sup.3 and any two of L.sup.4, L.sup.5, L.sup.6 and L.sup.7 may together represent the elements needed to complete a carbocyclic or heterocyclic ring having from 5-12 carbon atoms;A.sup.1 may be the same as A.sup.2 and in addition may represent a substituted or unsubstituted aryl group;A.sup.2 represents a basic substituted or unsubstituted heterocyclic nucleus; andB.sup.1 and B.sup.2 represent cyano, cyanoaryl, carboxy, alkoxycarbonyl, aryloxycarbonyl, alkylsulfonyl, acyl, arylcarbonyl, heteroyl groups such as benzofuroyl, nitro, nitro substituted aryl, sulfonyl, fluorosulfonyl, tirfluoromethylsulfonyl, carbamoyl, arylcarbamoyl, and alkylcarbamoyl orB.sup.2 may be combined with .dbd.CL.sup.4 --CL.sup.5 .dbd. or .dbd.CL.sup.6 --CL.sup.7 .dbd. to provide sufficient atoms to form a substituted pyrindine nucleus.
    • 具有结构 的电光敏材料其中:M和N可以是零,一个或两个; L1,L2,L3,L4,L5,L6和L7可以是氰基,氢,取代或未取代的烷基,烷氧基,芳烷基,芳基或杂环基,此外,L1,L2和L3中的任何两个以及L4,L5中的任何两个 L6和L7可以一起代表完成具有5-12个碳原子的碳环或杂环所需的元素; A1可以与A2相同,另外可以表示取代或未取代的芳基; A2表示碱性取代或未取代的杂环核; 并且B1和B2表示氰基,氰基芳基,羧基,烷氧基羰基,芳氧基羰基,烷基磺酰基,酰基,芳基羰基,杂基如苯并呋喃基,硝基,硝基取代的芳基,磺酰基,氟代磺酰基,二氟甲基磺酰基,氨基甲酰基,芳基氨基甲酰基和烷基氨基甲酰基或B2。 用= CL4-CL5 =或= CL6-CL7 =提供足够的原子以形成取代的pyrindine核。
    • 5. 发明授权
    • Organic electrophotosensitive materials for migration imaging processes
    • 用于迁移成像过程的有机电光敏材料
    • US4256819A
    • 1981-03-17
    • US928675
    • 1978-07-28
    • Frank G. WebsterMichael T. Regan
    • Frank G. WebsterMichael T. Regan
    • G03G17/04G03G13/24
    • G03G17/04
    • Electrophotosensitive materials having the structure ##STR1## wherein: Z.sup.1 and Z.sup.2 represent a basic type heterocyclic nucleus;Y represents N or a methine carbon C--G.sup.1 ;G.sup.1 and G.sup.2 may be the same or different and each is H, alkyl, or aryl or taken together complete a mononuclear or fused polynuclear carbocyclic ring;A.sup.1 and A.sup.2 represent alkyl, aryl, carboxy, alkoxycarbonyl, cyano, nitro or together form a heterocyclic nucleus;R.sup.1 and R.sup.2 may be the same or different and each may represent H, alkyl, aralkyl or aryl;R.sup.3 and R.sup.4 represent hydrogen, alkyl, aryl, cyano, or taken together with the atoms to which they are attached represent a 5 to 6 member carbocyclic ring;m and n may be the same or different and may be 0 or 1;p, q and r, which may be the same or different, represent 0, 1 or 2.
    • 具有结构 + TR 的电光敏材料其中:Z1和Z2代表碱式杂环核; Y代表N或次甲碳C-G1; G1和G2可以相同或不同,并且各自为H,烷基或芳基或一起形成单核或稠合多核碳环; A1和A2表示烷基,芳基,羧基,烷氧基羰基,氰基,硝基或一起形成杂环核; R 1和R 2可以相同或不同,各自表示H,烷基,芳烷基或芳基; R 3和R 4表示氢,烷基,芳基,氰基或与它们所连接的原子一起代表5至6个碳环; m和n可以相同或不同,并且可以是0或1; p,q和r可以相同或不同,表示0,1或2。
    • 7. 发明授权
    • Electrophotosensitive materials for migration imaging processes
    • 用于迁移成像过程的电光敏材料
    • US4293626A
    • 1981-10-06
    • US202406
    • 1980-10-31
    • Frank G. WebsterMichael T. ReganLouis J. Rossi
    • Frank G. WebsterMichael T. ReganLouis J. Rossi
    • G03G17/04G03G5/06
    • G03G17/04
    • Electrophotosensitive materials having the structure ##STR1## wherein: M and N may be zero, one or two;L.sup.1, L.sup.2, L.sup.3, L.sup.4, L.sup.5, L.sup.6, and L.sup.7 may be cyano, hydrogen, substituted or unsubstituted alkyl, alkoxy, aralkyl, aryl or heterocycyl and in addition any two of L.sup.1, L.sup.2 and L.sup.3 and any two of L.sup.4, L.sup.5, L.sup.6 and L.sup.7 may together represent the elements needed to complete a carbocyclic or heterocyclic ring having from 5-12 carbon atoms;A.sup.1 may be the same as A.sup.2 and in addition may represent a substituted or unsubstituted aryl group;A.sup.2 represents a basic substituted or unsubstituted heterocyclic nucleus; andB.sup.1 and B.sup.2 represent cyano, cyanoaryl, carboxy, alkoxycarbonyl, aryloxycarbonyl, alkylsulfonyl, acyl, arylcarbonyl, heteroyl groups such as benzofuroyl, nitro, nitro substituted aryl, sulfonyl, fluorosulfonyl, trifluoromethylsulfonyl, carbamoyl, arylcarbamoyl, and alkylcarbamoyl orB.sup.2 may be combined with .dbd.CL.sup.4 -CL.sup.5 .dbd. or .dbd.CL.sup.6 -CL.sup.7 .dbd. to provide sufficient atoms to form a substituted pyrindine nucleus.
    • 具有结构 的电光敏材料其中:M和N可以是零,一个或两个; L1,L2,L3,L4,L5,L6和L7可以是氰基,氢,取代或未取代的烷基,烷氧基,芳烷基,芳基或杂环基,此外,L1,L2和L3中的任何两个以及L4,L5中的任何两个 L6和L7可以一起代表完成具有5-12个碳原子的碳环或杂环所需的元素; A1可以与A2相同,另外可以表示取代或未取代的芳基; A2表示碱性取代或未取代的杂环核; 并且B1和B2表示氰基,氰基芳基,羧基,烷氧基羰基,芳氧基羰基,烷基磺酰基,酰基,芳基羰基,杂基如苯并呋喃基,硝基,硝基取代的芳基,磺酰基,氟代磺酰基,三氟甲磺酰基,氨基甲酰基,芳基氨基甲酰基和烷基氨基甲酰基或B2。 用= CL4-CL5 =或= CL6-CL7 =提供足够的原子以形成取代的pyrindine核。
    • 9. 发明授权
    • Electrically photosensitive materials and elements for
photoelectrophoretic imaging processes
    • 用于光电泳成像过程的电光敏材料和元件
    • US4299894A
    • 1981-11-10
    • US161706
    • 1980-06-23
    • Thomas R. KloseFrank G. Webster
    • Thomas R. KloseFrank G. Webster
    • G03G17/04G03G5/06
    • G03G17/04
    • Electrically photosensitive materials and elements comprising an electrically photosensitive compound of the structure: ##STR1## wherein: n represents zero, 1 or 2;Y represents 0 or S;Z represents 0 or NR in which R represents hydrogen, alkyl, aryl or aralkyl;R.sup.1, R.sup.2 and R.sup.3, which are the same or different, represent hydrogen, alkoxy, hydroxy, alkyl, aryl, alkylcarboxy or arylcarboxy; or R.sup.1 and R.sup.3 taken together with the carbon atoms to which they are attached provide sufficient atoms to complete a carbocyclic ring of 6-14 carbon atoms;R.sup.4 represents hydrogen or cyano; andA represents a nitrogen containing basic heterocyclic nucleus of the type used in cyanine dyes are useful in photoelectrophoretic imaging processes.
    • 电感光材料和元件,其包含以下结构的电光敏化合物:其中:n表示0,1或2; Y表示0或S; Z表示0或NR,其中R表示氢,烷基,芳基或芳烷基; R 1,R 2和R 3相同或不同,表示氢,烷氧基,羟基,烷基,芳基,烷基羧基或芳基羧基; 或者R 1和R 3与它们所连接的碳原子一起提供足够的原子以完成6-14个碳原子的碳环; R4代表氢或氰基; 并且A代表用于花青染料的类型的含氮碱性杂环核可用于光电泳成像过程。