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1. 发明申请

US20090297956A1 PHOTOLITHOGRAPHY WITH OPTICAL MASKS HAVING MORE TRANSPARENT FEATURES SURROUNDED BY LESS TRANSPARENT FEATURES 有权
标题翻译：具有透明特征的透明特征的光学照相机
公开(公告)号：US20090297956A1
公开(公告)日：2009-12-03
申请号：US12128456
申请日：2008-05-28
申请人： Fenghong Zhang , Xinyu Zhang , Jian Xu
发明人： Fenghong Zhang , Xinyu Zhang , Jian Xu
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F7/70441 , G03F1/36 , G03F1/50
摘要： In photolithographic exposure, a feature (144) of an optical mask is projected onto a dark area (160). The light intensity inside the dark area is reduced by providing a non-printable clear cutout (410) inside the feature. The optical mask has the same optical pathlength outside the feature (144) adjacent to the entire outer boundary of the feature as at the cutout, the optical pathlength being measured along the optical mask's thickness.
摘要翻译：在光刻曝光中，将光学掩模的特征（144）投影到暗区（160）上。通过在特征内部提供不可打印的清晰切口（410）来减少暗区内的光强度。光掩模在与切口处相同的特征的整个外边界附近的特征（144）之外具有相同的光程，沿着光学掩模的厚度测量光程。

2. 发明授权

US07771903B2 Photolithography with optical masks having more transparent features surrounded by less transparent features 有权
标题翻译：具有光学掩模的光刻具有更透明的特征，由较不透明的特征包围
公开(公告)号：US07771903B2
公开(公告)日：2010-08-10
申请号：US12128456
申请日：2008-05-28
申请人： Fenghong Zhang , Xinyu Zhang , Jian Xu
发明人： Fenghong Zhang , Xinyu Zhang , Jian Xu
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F7/70441 , G03F1/36 , G03F1/50
摘要： In photolithographic exposure, a feature (144) of an optical mask is projected onto a dark area (160). The light intensity inside the dark area is reduced by providing a non-printable clear cutout (410) inside the feature. The optical mask has the same optical pathlength outside the feature (144) adjacent to the entire outer boundary of the feature as at the cutout, the optical pathlength being measured along the optical mask's thickness.
摘要翻译：在光刻曝光中，将光学掩模的特征（144）投影到暗区（160）上。通过在特征内部提供不可打印的清晰切口（410）来减少暗区内的光强度。光掩模在与切口处相同的特征的整个外边界附近的特征（144）之外具有相同的光程，沿着光学掩模的厚度测量光程。

3. 发明申请

US20100068658A1 PHOTOLITHOGRAPHIC PATTERNING OF ARRAYS OF PILLARS HAVING WIDTHS AND LENGTHS BELOW THE EXPOSURE WAVELENGTHS 审中-公开
标题翻译：具有宽度和长度的支柱阵列的平面图的曝光波长
公开(公告)号：US20100068658A1
公开(公告)日：2010-03-18
申请号：US12233298
申请日：2008-09-18
申请人： Fenghong Zhang , Jian Xu , Xinyu Zhang , Ching-Hwa Chen , Leu Mei
发明人： Fenghong Zhang , Jian Xu , Xinyu Zhang , Ching-Hwa Chen , Leu Mei
IPC分类号： G03F7/20
CPC分类号： G03F1/00 , G03F7/70558
摘要： A pillar array is printed in positive photoresist using an optical mask (108) having an array of features (310) corresponding to the pillars. The pillars' width/length dimensions are below the exposure wavelength. Superior results can be achieved (less peeling off of the pillars and less overexposure at the center of each pillar) if the mask features (310) are downsized relative to the pillars' target sizes, and the exposure energy is reduced. Negative photoresist (with a dark field mask) can be used, and can provide good results (in terms of pillars peeling-off) if the combined area of the features (410) corresponding to the pillars is smaller than the area between the features (410).
摘要翻译：使用具有对应于柱的特征阵列（310）的光学掩模（108）将柱阵列印刷在正性光致抗蚀剂中。支柱的宽度/长度尺寸低于曝光波长。如果掩模特征（310）相对于柱体的目标尺寸减小，并且曝光能量减小，则可以实现优异的结果（较少的柱的剥离和在每个柱的中心处较少的过度曝光）。如果与柱相对应的特征（410）的组合面积小于特征之间的面积，则可以使用负光致抗蚀剂（具有暗场掩模），并且可以提供良好的结果（在柱子剥离方面） 410）。

4. 发明申请

US20090127723A1 AIM-Compatible Targets for Use with Methods of Inspecting and Optionally Reworking Summed Photolithography Patterns Resulting from Plurally-Overlaid Patterning Steps During Mass Production of Semiconductor Devices 审中-公开
标题翻译： AIM兼容的目标，用于检查和选择返工的方法在半导体设备批量生产过程中由多重叠加的图案化步骤产生的归一化光刻图案
公开(公告)号：US20090127723A1
公开(公告)日：2009-05-21
申请号：US12102616
申请日：2008-04-14
申请人： Fenghong ZHANG , Xinyu Zhang
发明人： Fenghong ZHANG , Xinyu Zhang
IPC分类号： H01L23/544 , G03F7/00 , G01B11/03
CPC分类号： G03F7/70633 , G03F1/70 , G03F9/7049 , G03F9/7053 , G03F9/7076 , G03F9/7084 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： Alignment targets include optically resolvable regions and SEM resolvable regions. SEM measurements taken of the SEM resolvable regions produce correction factors that can be applied to optical measurements taken of the optically resolvable regions where the correction factors improve the accuracy of the optical measurements. When one or more batches of wafers from a continuous production run are to be measured, a small sub-sample is measured with use of an SEM scan of their SEM resolvable regions. Then the correction factors developed from the SEM scans are applied to optical measurements taken of others of the wafers in the same mass production run.
摘要翻译：对准目标包括光学可分辨区域和SEM可分辨区域。 SEM可分辨区域的SEM测量产生可用于光学可分辨区域的光学测量的校正因子，其中校正因子提高了光学测量的精度。当测量来自连续生产运行的一批或多批晶片时，使用其SEM可分辨区域的SEM扫描来测量小的子样品。然后，从SEM扫描发展出的校正因子被应用于在相同批量生产运行中对其他晶片进行的光学测量。

5. 发明申请

US20090253079A1 FORMING REVERSE ILLUMINATION PATTERNS 审中-公开
标题翻译：形成逆向照明模式
公开(公告)号：US20090253079A1
公开(公告)日：2009-10-08
申请号：US12098845
申请日：2008-04-07
申请人： Fenghong Zhang , Xinyu Zhang
发明人： Fenghong Zhang , Xinyu Zhang
IPC分类号： G03F7/00
CPC分类号： G03F7/70325 , G03F7/70091
摘要： In photolithographic exposure, the illumination pattern (120R) formed on a photosensitive surface (106) is a reverse of the pattern (130) on the optical mask (124). The reverse pattern (120R) is obtained using off-axis illumination when the photosensitive surface is at other than the best focus position.
摘要翻译：在光刻曝光中，形成在光敏表面（106）上的照明图案（120R）与光学掩模（124）上的图案（130）相反。当感光表面处于除最佳聚焦位置之外时，使用离轴照明获得反向图案（120R）。

6. 发明申请

US20140058769A1 SOCIAL NETWORK FOR TOUR PLANNING 审中-公开
标题翻译：旅游规划社会网络
公开(公告)号：US20140058769A1
公开(公告)日：2014-02-27
申请号：US13973506
申请日：2013-08-22
申请人： Xinyu Zhang , Hang Xie
发明人： Xinyu Zhang , Hang Xie
IPC分类号： G06Q10/02 , G06Q50/00
CPC分类号： G06Q10/02 , G06Q50/01
摘要： A social networking system server which includes a processor, wherein the processor utilizes computer readable program code to initiate, implement, and conclude, a travel plan. The computer readable program code comprising a series of computer readable program steps to effect coordinating a global, on-line social networking system (“SNS”). The computer readable program code further includes a series of computer readable program steps to effect initiating a travel plan for a first SNS member, purchasing goods on-line, implementing a tour plan, and concluding the tour plan.
摘要翻译：一种包括处理器的社交网络系统服务器，其中所述处理器利用计算机可读程序代码来启动，实现和结束旅行计划。该计算机可读程序代码包括一系列计算机可读程序步骤，以实现协调全球在线社交网络系统（“SNS”）。计算机可读程序代码还包括一系列计算机可读程序步骤，以实现启动第一SNS成员的旅行计划，在线购买商品，实施旅游计划以及结束旅游计划。

7. 发明申请

US20130148590A1 Method and an Apparatus for Transmitting Physical Random Access Channel Signal 有权
标题翻译：用于发送物理随机接入信道信号的方法和装置
公开(公告)号：US20130148590A1
公开(公告)日：2013-06-13
申请号：US13380924
申请日：2011-03-31
申请人： Yanhui Hu , Xinyu Zhang
发明人： Yanhui Hu , Xinyu Zhang
IPC分类号： H04W74/08
CPC分类号： H04W72/04 , H04L5/14 , H04L25/022 , H04L25/03159 , H04L25/03343 , H04L27/2613 , H04L27/265 , H04L2025/03414 , H04W24/10 , H04W48/08 , H04W74/0833 , H04W76/00 , H04W88/08
摘要： A method and an apparatus for transmitting a physical random access channel signal are disclosed by in the present invention. The method includes: when transmitting a physical random access channel (PRACH) signal, a terminal carries out pre-compensation for the frequency domain signal according to the estimated frequency spectrum gain of downlink channel, converting it into the time domain signal and transmits it to the base station. In the present invention, by way of measuring the spectral response of the downlink channel and carrying out pre-compensation for the frequency selective fading when transmitting the PRACH signal, using the symmetry of the uplink channel and downlink channel in the TD system, the adverse effect on the PRACH detection due to multipath channel could be effectively eliminated and the detection probability of the PRACH signal and measuring accuracy of transmission delay could be improved.
摘要翻译：在本发明中公开了用于发送物理随机接入信道信号的方法和装置。该方法包括：当发送物理随机接入信道（PRACH）信号时，终端根据下行链路信道的估计频谱增益对频域信号进行预补偿，将其转换为时域信号，并将其发送到基站。在本发明中，通过测量下行链路信道的频谱响应，在发送PRACH信号时对频率选择性衰落进行预补偿，利用TD系统中的上行链路信道和下行链路信道的对称性，可以有效地消除由于多径信道对PRACH检测的影响，可以提高PRACH信号的检测概率和传输延迟的测量精度。

8. 发明申请

US20080318420A1 TWO STEP CHEMICAL MECHANICAL POLISH 审中-公开
标题翻译：两步化学机械抛光
公开(公告)号：US20080318420A1
公开(公告)日：2008-12-25
申请号：US11766922
申请日：2007-06-22
申请人： Denny K. Wong , Weechen Gan , Xinyu Zhang
发明人： Denny K. Wong , Weechen Gan , Xinyu Zhang
IPC分类号： H01L21/4763
CPC分类号： H01L21/3212 , H01L21/31053
摘要： In one embodiment, a method includes providing two structures with a spacing therebetween over a semiconductor substrate, providing a conformal first layer over the two structures and within the space therebetween, depositing a conformal protective layer over the first layer, planarizing the protective layer until a top surface of the first layer is exposed, and planarizing the first layer and the protective layer until a top surface of the two structures is exposed and a portion of the protective layer is between the two structures.
摘要翻译：在一个实施例中，一种方法包括提供在半导体衬底之间具有间隔的两个结构，在两个结构之间并且在它们之间的空间内提供共形的第一层，在第一层之上沉积保形层，使保护层平坦化，直至暴露第一层的顶表面，并且使第一层和保护层平坦化，直到两个结构的顶表面露出并且保护层的一部分在两个结构之间。

9. 发明申请

US20060051401A1 Controlled nanofiber seeding 审中-公开
标题翻译：受控纳米纤维播种
公开(公告)号：US20060051401A1
公开(公告)日：2006-03-09
申请号：US10936437
申请日：2004-09-07
申请人： Sanjeev Manohar , Xinyu Zhang
发明人： Sanjeev Manohar , Xinyu Zhang
IPC分类号： A61K9/70
CPC分类号： A61K47/34
摘要： The present invention includes compositions and methods for the controlled formation of nano and micropolymers in a single-step that includes a structural substrate, an oxidatively reactive monomer and an oxidant to form a polymer that takes the morphology of the structural substrate.
摘要翻译：本发明包括用于在单步中可控地形成纳米和微聚合物的组合物和方法，其包括结构底物，氧化反应性单体和氧化剂以形成具有结构基材形态的聚合物。

10. 发明授权

US08762552B2 Fine granularity access control for a storage area network 有权
标题翻译：存储区域网络的细粒度访问控制
公开(公告)号：US08762552B2
公开(公告)日：2014-06-24
申请号：US11105937
申请日：2005-04-13
申请人： Gurumurthy D Ramkumar , Hans Logan Henriquez , David Brooks Hamilton , Xinyu Zhang , Parry Kejriwal
发明人： Gurumurthy D Ramkumar , Hans Logan Henriquez , David Brooks Hamilton , Xinyu Zhang , Parry Kejriwal
IPC分类号： G06F15/16 , G06F15/173 , G06F17/30 , G06F21/45 , H04L29/06 , H04L29/08 , G06F3/06
CPC分类号： G06F17/30035 , G06F3/067 , G06F21/45 , H04L29/08549 , H04L63/102 , H04L63/105 , H04L67/12
摘要： A SAN management software program controls access to resources in the SAN by associating individual users with one or more administration domains. A user that is associated with an administration domain that includes a port of a SAN switch can configure or otherwise access the port but is restricted from accessing ports outside of that administration domain. Likewise, access to other sub-fabric resources can be restricted and allowed to individual users and users in specific roles or groups. In this manner, the SAN administrative user has very specific control over which users can access which SAN resources and what level of access these users are granted.
摘要翻译： SAN管理软件程序通过将单个用户与一个或多个管理域关联来控制对SAN中资源的访问。与包含SAN交换机端口的管理域相关联的用户可以配置或以其他方式访问端口，但是不能访问该管理域外的端口。同样，可以限制对其他子结构资源的访问，并允许单个用户和特定角色或组中的用户访问。以这种方式，SAN管理用户对哪些用户可以访问哪些SAN资源以及授予这些用户的访问级别进行非常具体的控制。

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