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    • 2. 发明申请
    • METHOD FOR GENERATING HOMOPLASMIC CELLS FROM HETEROPLASMIC CELLS
    • 从异位细胞产生嗜酸细胞的方法
    • US20120040464A1
    • 2012-02-16
    • US12965195
    • 2010-12-10
    • Feng LingTakehiko ShibataRong NiuMinoru YoshidaYu-ichi Goto
    • Feng LingTakehiko ShibataRong NiuMinoru YoshidaYu-ichi Goto
    • C12N15/01C12N5/071
    • C12N5/04A01H1/06
    • It is an object of the present invention to provide a method, which comprises allowing a eukaryotic cell to come into contact with a reactive oxygen species or a chemical species that generates such a reactive oxygen species in the cell, and thereby changing the percentage of mutant mtDNA (mitochondrial genomic DNA) in the cell, and cells obtained by the above-described method.The present invention relates to a method, which comprises allowing cells to come into contact with a reactive oxygen species by, for example, adding the reactive oxygen species such as hydrogen peroxide to a medium containing the cells, and then culturing the cells under suitable culture conditions, so that the percentage of mtDNA having specific mutation in the cell can be changed. In addition, the present invention also relates to cells, in which the percentage of the mtDNA having specific mutation has been changed by the above-described method.
    • 本发明的目的是提供一种方法,其包括使真核细胞与活性氧物质或在细胞中产生这种活性氧的化学物质接触,从而改变突变体 细胞中的mtDNA(线粒体基因组DNA),以及通过上述方法获得的细胞。 本发明涉及一种方法,其包括使细胞与活性氧物质接触,例如通过将诸如过氧化氢的活性氧物质加入到含有细胞的培养基中,然后在合适的培养基下培养细胞 条件,使得可以改变在细胞中具有特异性突变的mtDNA的百分比。 此外,本发明还涉及通过上述方法改变具有特异性突变的mtDNA的百分比的细胞。
    • 3. 发明授权
    • Pattern inspection device of substrate surface and pattern inspection method of the same
    • 基板表面图案检查装置及图案检验方法相同
    • US08736830B2
    • 2014-05-27
    • US13145968
    • 2009-12-10
    • Masahiro WatanabeToshihiko NakataYasuhiro YoshitakeHideaki SasazawaMinoru Yoshida
    • Masahiro WatanabeToshihiko NakataYasuhiro YoshitakeHideaki SasazawaMinoru Yoshida
    • G01N21/00
    • G01Q60/22G01N21/95607G11B5/84
    • There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
    • 提供了一种用于基板表面的图案检查装置,其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。 用于基板表面的图案检查装置包括:具有精细重复图案的近场光学头101; a&thetas; 驱动单元311,其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201,用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。