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    • 4. 发明专利
    • Plasma display device substrate structure
    • FR2756096A1
    • 1998-05-22
    • FR9704596
    • 1997-04-15
    • FUJITSU LTD
    • BETSUI KEIICHIHIDAKA SOUICHIRO
    • H01J9/39H01J9/02H01J17/49
    • Production of a plasma display device involves: (a) forming electrodes (X, Y) on one or each of two substrates (11, 21); (b) coating the electrodes with a dielectric layer (17); (c) applying a protective film (18) for protecting the dielectric layer against electrical discharges; (d) applying a temporary protective film (19) for protecting the protective film until the device is assembled; (e) assembling the substrates (11, 21) to form the device; and (f) removing the temporary protective film by plasma formation in the device. Also claimed is production of a plasma display device having electrodes isolated from an electric discharge gas and having a protective film of secondary emission material in contact with the electric discharge gas, in which a temporary protective film (19) protects the protective film until the device is assembled and, after assembly, is removed by plasma formation in the device. Further claimed is a plasma display device substrate structure comprising electrodes (X, Y) on the substrate, a dielectric layer (17) covering the electrodes, a protective film (18) for protecting the dielectric layer against electrical discharges and a temporary protective film (19) for protecting the protective film until the device is assembled.
    • 7. 发明专利
    • DE69125577T2
    • 1997-07-17
    • DE69125577
    • 1991-11-28
    • FUJITSU LTD
    • BETSUI KEIICHI
    • H01J37/09H01J37/04H01J37/12H01L21/027H01L21/30H01J37/147
    • A charged particle beam deflector has a simple structure for providing a uniform potential distribution over each blanking aperture. The deflector is easy to operate, and stabilizes the shape of a charged particle beam component passing through each blanking aperture even with a low deflection voltage. A pair of deflecting electrodes (10,11) are arranged on opposing inner walls of each blanking aperture (1). A voltage applied to the deflecting electrodes is controlled to correctly deflect the charged particle beam component passing through the blanking aperture. A pair of resistance films (12,13) are arranged on the other opposing inner walls of the blanking aperture, to connect both sides of the deflecting electrodes. The deflector may employ patterned beam generating apertures. A pair of deflecting electrodes are formed on opposing inner walls of each of the apertures. A voltage applied to the deflecting electrodes is controlled to correctly deflect a charged particle beam component passing through the aperture.