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1. 发明申请

US20170010530A1 COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, ORGANIC ELECTROLUMINESCENT ELEMENT, COLORANT, AND METHOD FOR PRODUCING COLORANT 审中-公开
标题翻译：彩色组合物，固化膜，彩色滤光片，制造彩色滤光片的方法，固体成像装置，图像显示装置，有机电致发光元件，颜料和生产颜料的方法
公开(公告)号：US20170010530A1
公开(公告)日：2017-01-12
申请号：US15274360
申请日：2016-09-23
申请人： FUJIFILM Corporation
发明人： Hiroaki IDEI , Kazuya OOTA , Suguru SAMEJIMA , Masayuki HARADA , Akihiro HARA , Junichi ITO
IPC分类号： G03F7/00 , C08F2/38 , C08F2/44 , C08F2/50 , G02B5/22 , G03F7/16 , G03F7/20 , G03F7/26 , G03F7/40 , G03F7/09 , C09B69/10 , C09B67/46
CPC分类号： G03F7/0007 , C08F2/38 , C08F2/44 , C08F2/50 , C08F222/1006 , C08F2220/325 , C08F2220/343 , C08F2222/1013 , C08F2222/1026 , C08F2222/104 , C09B5/14 , C09B11/12 , C09B11/24 , C09B25/00 , C09B49/12 , C09B49/122 , C09B49/126 , C09B67/0033 , C09B67/0034 , C09B69/101 , C09B69/103 , C09B69/105 , C09B69/106 , C09B69/108 , C09B69/109 , G02B5/223 , G03F7/029 , G03F7/031 , G03F7/033 , G03F7/0388 , G03F7/105 , C08F2220/185 , C08F220/06 , C08F220/20
摘要： A coloring composition having excellent light fastness, color migration properties, and flatness, a colorant, and a method for producing a colorant are provided. Further, a cured film, a color filter, a method for manufacturing a color filter, a solid-state imaging device, an image display device, and an organic electroluminescent element, each using such the coloring composition, are also provided. The coloring composition contains a colorant represented by General Formula (1) and a curable compound, and has a specific absorbance of 5 or more at a maximum absorption wavelength of 400 nm to 800 nm. R1 represents an (m+n)-valent linking group, P represents a monovalent substituent having a repeating units derived from a vinyl compound, D represents a colorant structure, and R2 and L1 each independently represent a single bond or a divalent linking group. (D-R2)n—R1-(L1-P)m (1)
摘要翻译：要解决的问题：提供一种着色组合物，颜料和耐光色性，耐平移性优异的颜料的制造方法，提供固化膜，滤色器，滤色器的制造方法，固体摄像装置，图像显示装置和有机电致发光装置。溶液：着色组合物含有由通式（1）表示的颜料和可固化化合物，并且具有特定的在最大吸收波长为400至800nm时吸光度为5或更高。 R表示（m + n）价连接基团，P表示具有衍生自乙烯基化合物的重复单元的一价取代基，D表示颜料结构，而Rand Leach独立地表示单键或二价连接基团。通式（1）是：（D-R）-R-（L-P）。选择的图：无

2. 发明申请

US20160327858A1 COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, AND IMAGE DISPLAY DEVICE 有权
标题翻译：彩色组合物，固化膜，彩色滤光片，制造彩色滤光片的方法，固态成像装置和图像显示装置
公开(公告)号：US20160327858A1
公开(公告)日：2016-11-10
申请号：US15212377
申请日：2016-07-18
申请人： FUJIFILM Corporation
发明人： Daisuke SASAKI , Junichi ITO , Yuushi KANEKO
IPC分类号： G03F7/00 , G03F7/20 , C09B69/10 , G02B5/20 , C09B11/24 , G03F7/16 , G03F7/32
CPC分类号： G03F7/0007 , C09B11/24 , C09B11/28 , C09B69/10 , G02B5/201 , G02B5/223 , G03F7/027 , G03F7/105 , G03F7/16 , G03F7/2002 , G03F7/32
摘要： Provided are a coloring composition which makes it possible to providing a color filter having surface unevenness relieved; and a cured film, a color filter, a method for manufacturing the color filter, a solid-state imaging device, and an image display device, each of which uses the coloring composition. The coloring composition includes a colorant compound represented by General Formula (1), a curable compound, and a solvent, in which one of Ar1 and Ar2 is a group represented by General Formula (2), and the other of Ar1 and Ar2 is a hydrogen atom, a group represented by the following General Formula (2), or the like, R5 and R6 each independently represent a hydrogen atom or the like, R7 represents a monovalent substituent, R8 represents a halogen atom or the like, and p represents an integer of 0 to 4, R1 and R2 each independently represent an alkyl group having 3 or more carbon atoms, or the like, and X1 to X3 each independently represent a hydrogen atom or the like. The colorant compound represented by General Formula (1) has a counter anion inside and/or outside the molecule.
摘要翻译：提供了一种可以提供没有平面不规则的滤色器的着色组合物。还提供了：固化膜，滤色器，彩色滤光片的制造方法，固态成像元件和使用着色组合物的图像显示装置。含有可固化化合物和由通式（1）表示的颜料化合物的着色组合物和溶剂; 其中Ar1和Ar2中的一个是由通式（2）表示的基团，Ar1和Ar2中的另一个是氢原子或下述通式（2）表示的基团，R5和R6独立地表示氢原子等 R 7表示一价取代基，R 8表示卤素原子等，p表示0〜4的整数。 R 1和R 2独立地表示具有3个以上碳原子的烷基等，X 1〜X 3独立地表示氢原子等。由通式（1）表示的颜料化合物在分子的内部和/或外部具有抗衡阴离子。

3. 发明申请

US20140356771A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE 审中-公开
标题翻译：丙烯酸类敏感性或辐射敏感性树脂组合物，使用其的耐腐蚀膜，图案形成方法，电子器件和电子器件的制造方法
公开(公告)号：US20140356771A1
公开(公告)日：2014-12-04
申请号：US14446599
申请日：2014-07-30
申请人： FUJIFILM Corporation
发明人： Shuhei YAMAGUCHI , Hidenori TAKAHASHI , Junichi ITO , Kei YAMAMOTO
IPC分类号： G03F7/038 , G03F7/20
CPC分类号： G03F7/0388 , C08F220/18 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/20 , G03F7/2041 , G03F7/325
摘要： There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (II) and a repeating unit represented by formula (III) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (C).
摘要翻译：提供了一种光化射线敏感或辐射敏感性树脂组合物，其具有：（A）具有由式（I）表示的重复单元的树脂; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）具有由式（II）表示的重复单元中的至少一个重复单元（x）和基本上不包含氟原子或硅原子的式（III）表示的重复单元的树脂，其中，重复单元（x）相对于树脂（C）中的所有重复单元为90％以上。

4. 发明申请

US20140234759A1 ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN 审中-公开
标题翻译：丙酰胺或辐射敏感性树脂组合物，丙烯酰胺或辐射敏感性膜及其形成方法
公开(公告)号：US20140234759A1
公开(公告)日：2014-08-21
申请号：US14229240
申请日：2014-03-28
申请人： FUJIFILM Corporation
发明人： Shohei KATAOKA , Akinori SHIBUYA , Junichi ITO , Tomoki MATSUDA , Toshiaki FUKUHARA , Naohiro TANGO , Kaoru IWATO , Masahiro YOSHIDOME , Shinichi SUGIYAMA , Yoko TOKUGAWA
IPC分类号： G03F7/038
CPC分类号： G03F7/038 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition containing (A) a resin containing a repeating unit represented by general formula (1) below and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group, and (B) a compound that generates the acid when exposed to actinic rays or radiation, where L represents a bivalent connecting group, R1 represents a hydrogen atom or an alkyl group, and Z represents a cyclic acid anhydride structure.
摘要翻译：根据一个实施方案，提供了一种光化射线或辐射敏感性树脂组合物，其含有（A）含有下述通式（1）表示的重复单元的树脂和通过酸作用分解的重复单元产生碱溶性基团，（B）当暴露于光化学射线或辐射时产生酸的化合物，其中L表示二价连接基团，R 1表示氢原子或烷基，Z表示环状酸酐结构体。

5. 发明申请

US20230015767A1 PHOTOSENSITIVE COLORING COMPOSITION, CURED SUBSTANCE, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND ASYMMETRIC DIKETOPYRROLOPYRROLE COMPOUND 有权
公开(公告)号：US20230015767A1
公开(公告)日：2023-01-19
申请号：US17895309
申请日：2022-08-25
申请人： FUJIFILM Corporation
发明人： Ryosuke KATO , Yushi KANEKO , Junichi ITO
IPC分类号： G03F7/004 , G03F7/00 , G03F7/028
摘要： Provided are a photosensitive coloring composition including a pigment and a diketopyrrolopyrrole compound A represented by Formula 1, in which, in a case where molar contents of the diketopyrrolopyrrole compound A and a diketopyrrolopyrrole compound B represented by Formula 1 are each denoted by mA and mB, a value of mA/(mA+mB) is 10 mol % to 100 mol %, and a content of the pigment is 35% by mass or more with respect to a total solid content of the photosensitive coloring composition; a cured substance of the photosensitive coloring composition, a color filter including the cured substance, a solid-state imaging element or an image display device, and a novel asymmetric diketopyrrolopyrrole compound.
Diketopyrrolopyrrole compound A: A1 represents a monovalent organic group having an acidic or a basic functional group, and B1 represents a monovalent organic group not having an acidic or a basic functional group.
Diketopyrrolopyrrole compound B: A1 and B1 represent monovalent organic groups having an acidic or a basic functional group.

6. 发明申请

US20220213296A1 DISPERSION LIQUID, COMPOSITION, CURED FILM, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE 有权
公开(公告)号：US20220213296A1
公开(公告)日：2022-07-07
申请号：US17700427
申请日：2022-03-21
申请人： FUJIFILM Corporation
发明人： Yushi KANEKO , Ryosuke KATO , Takahiro OYA , Junichi ITO , Yoshinori TAGUCHI
IPC分类号： C08K9/06 , C08K3/36 , C08G77/04 , C08G77/20 , C08G77/26 , C08G77/24 , C08G77/28 , G03F7/075 , G03F7/00 , G02B5/22
摘要： A dispersion liquid contains an inorganic oxide particle surface-treated with at least one of a compound represented by Formula Si(RA1)(XA1)3 or a compound represented by Formula Si(RA2)(RA20)(XA2)2, polysiloxane having at least one of a T unit represented by Formula [RB1SiO3/2] or a D unit represented by Formula [RB2RB20SiO], and an organic solvent, where a content of the polysiloxane is 0.5% to 39% by mass with respect to a total amount of the inorganic oxide particle and the polysiloxane, in which in the formula, RA1, RA2, RB1, and RB2 represent a functional group, XA1 and XA2 represent a hydroxyl group or a hydrolyzable group, and RA20 and RB20 represent an alkyl group or an aryl group.

7. 发明申请

US20160122547A1 METHOD FOR PRODUCING DYE MULTIMER, AND METHOD FOR PRODUCING COLORING COMPOSITION 审中-公开
标题翻译：生产染色剂多组分的方法，以及生产着色组合物的方法
公开(公告)号：US20160122547A1
公开(公告)日：2016-05-05
申请号：US14994837
申请日：2016-01-13
申请人： FUJIFILM Corporation
发明人： Suguru SAMEJIMA , Tetsuya WATANABE , Yuushi KANEKO , Junichi ITO , Naotsugu MURO , Yoshinori TAGUCHI , Kazuya OOTA
IPC分类号： C09B69/10 , G02B5/22
CPC分类号： C09B69/109 , C09B11/12 , C09B11/24 , C09B23/04 , C09B23/06 , C09B47/00 , C09B69/00 , C09B69/103 , C09B69/105 , G02B5/223 , G03F7/0007 , G03F7/027 , G03F7/105
摘要： Provided are a method for producing a dye multimer having excellent heat resistance, and a coloring composition including a dye multimer obtained by the production method.The method for producing a dye multimer includes reacting a compound having a dye structure with a polymer.
摘要翻译：提供一种制备耐热性优异的染料多聚体的方法，以及包含通过该制备方法获得的染料多聚体的着色组合物。制备染料多聚体的方法包括使具有染料结构的化合物与聚合物反应。

8. 发明申请

US20160004157A1 METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE 有权
标题翻译：形成图案，丙烯酸或辐射敏感性树脂组合物的方法，紫外线或辐射敏感膜，制造电子器件和电子器件的方法
公开(公告)号：US20160004157A1
公开(公告)日：2016-01-07
申请号：US14853574
申请日：2015-09-14
申请人： FUJIFILM CORPORATION
发明人： Junichi ITO , Akinori SHIBUYA , Akiyoshi GOTO , Michihiro SHIRAKAWA , Kei YAMAMOTO , Fumihiro YOSHINO
IPC分类号： G03F7/038 , G03F7/32 , G03F7/004 , G03F7/20
CPC分类号： G03F7/038 , C07C381/12 , C08F220/14 , C08F220/18 , C08F220/26 , C08F220/28 , C08F220/30 , C08F220/36 , C08F232/08 , G03F7/0045 , G03F7/0397 , G03F7/20 , G03F7/2041 , G03F7/325 , H01L21/0274
摘要： A method of forming a pattern includes (a) forming a film of an actinic-ray- or radiation-sensitive resin composition, (b) exposing the film to light, and (c) developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern. The actinic-ray- or radiation-sensitive resin composition includes (A) a resin whose solubility in the developer comprising an organic solvent is lowered when acted on by an acid, which resin contains a repeating unit with any of lactone structures of general formula (1) below, and (B) a compound that when exposed to actinic rays or radiation, generates an acid.
摘要翻译：形成图案的方法包括（a）形成光化射线或辐射敏感性树脂组合物的膜，（b）将膜曝光，和（c）用包含有机溶剂的显影剂显影曝光的膜从而形成负模式。光化射线或辐射敏感性树脂组合物包括（A）当在含有有机溶剂的显影剂中的溶解度降低的树脂（A）作用于酸时，树脂含有具有通式（III）的内酯结构的重复单元 1）和（B）当暴露于光化射线或辐射时产生酸的化合物。

9. 发明申请

US20150079508A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 有权
标题翻译：图案形成方法，电泳敏感性或辐射敏感性树脂组合物，电阻膜，电子器件的制造方法和电子器件
公开(公告)号：US20150079508A1
公开(公告)日：2015-03-19
申请号：US14550181
申请日：2014-11-21
申请人： FUJIFILM Corporation
发明人： Junichi ITO , Shuhei YAMAGUCHI , Hidenori TAKAHASHI , Kei YAMAMOTO
IPC分类号： G03F7/038 , G03F7/30
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/22 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/0397 , G03F7/091 , G03F7/11 , G03F7/2041 , G03F7/32 , G03F7/325 , G03F7/40 , H01L21/027 , H01L21/0273
摘要： There is provided a pattern forming method comprising (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition; (ii) a step of exposing the film; and (iii) a step of performing development by using a developer containing an organic solvent to form a negative pattern, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin capable of increasing the polarity by an action of an acid to decrease the solubility in a developer containing an organic solvent, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin having a repeating unit having a fluorine atom and not having a CF3 partial structure.
摘要翻译：提供了一种图案形成方法，其包括（i）通过光化射线敏感或辐射敏感树脂组合物形成膜的步骤; （ii）曝光胶片的步骤; （iii）通过使用含有有机溶剂的显影剂形成负型图案进行显影的工序，其中，所述光化射线敏感性或辐射敏感性树脂组合物含有（A）能够通过降低在含有有机溶剂的显影剂中的溶解性的酸，（B）在用光化射线或辐射照射时能够产生酸的化合物，（C）溶剂，（D）具有重复单元的树脂，不具有CF 3部分结构的氟原子。

10. 发明申请

US20140248562A1 ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN 有权
标题翻译：丙酰胺或辐射敏感性树脂组合物，丙烯酸类或辐射敏感性膜及其形成方法
公开(公告)号：US20140248562A1
公开(公告)日：2014-09-04
申请号：US14271606
申请日：2014-05-07
申请人： FUJIFILM CORPORATION
发明人： Akinori SHIBUYA , Yoko TOKUGAWA , Tomoki MATSUDA , Junichi ITO , Shohei KATAOKA , Toshiaki FUKUHARA , Naohiro TANGO , Kaoru IWATO , Masahiro YOSHIDOME , Shinichi SUGIYAMA
IPC分类号： G03F7/038
CPC分类号： G03F7/038 , C07C303/32 , C07C309/04 , C07C309/12 , C07D295/16 , C07D327/06 , C07D339/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325
摘要： According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin.
摘要翻译：根据一个实施方案，提供了一种光化射线或辐射敏感性树脂组合物，其包含（A）下述通式（1）表示的化合物，当暴露于光化射线或辐射时产生酸，和（B）树脂。

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