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1. 发明申请

WO2013118851A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE 审中-公开
标题翻译：图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，使用其的电子器件的制造方法和电子器件
公开(公告)号：WO2013118851A1
公开(公告)日：2013-08-15
申请号：PCT/JP2013/052969
申请日：2013-02-04
申请人： FUJIFILM CORPORATION
发明人： TAKIZAWA, Hiroo , TSUCHIMURA, Tomotaka , KAWABATA, Takeshi , TSURUTA, Takuya
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , G03F7/32
CPC分类号： G03F7/0388 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0397 , G03F7/20 , G03F7/2002 , G03F7/325
摘要： There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a compound capable of decomposing by the action of an acid to generate an acid, and (D) a solvent; (2) a step of exposing the film by using an actinic ray or radiation, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.
摘要翻译：提供了一种图案形成方法，其包括（1）通过使用含有（A）含有酸可分解重复单元的树脂并且能够降低溶解度的光化射线敏感或辐射敏感性树脂组合物形成膜的步骤对于含有机溶剂的显影剂，通过酸的作用，（B）能够在用光化射线或辐射照射时能够产生酸的化合物，（C）能够通过酸的作用分解以产生酸的化合物，酸，和（D）溶剂; （2）通过使用光化射线或辐射使膜曝光的步骤，以及（4）通过使用含有机溶剂的显影剂显影曝光的膜以形成负图案的步骤。

2. 发明申请

WO2014010392A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANKS INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD AND PHOTOMASK 审中-公开
标题翻译：丙烯酸敏感或辐射敏感性树脂组合物，紫外线敏感或辐射敏感膜，包括丙烯酸敏感或辐射敏感膜的掩模层，图案形成方法和光电子
公开(公告)号：WO2014010392A1
公开(公告)日：2014-01-16
申请号：PCT/JP2013/067157
申请日：2013-06-17
申请人： FUJIFILM CORPORATION
发明人： TSURUTA, Takuya , TSUCHIMURA, Tomotaka , YATSUO, Tadateru
IPC分类号： G03F7/004 , C07C309/65 , C07C381/12 , C07D327/08 , G03F7/038 , H01L21/027
CPC分类号： G03F7/0045 , C07C309/65 , C07C381/12 , C07C2601/14 , C07D327/08 , C07D333/46 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0397 , G03F7/2037 , G03F7/325
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y 1 and Y 2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A)
摘要翻译：光化射线敏感或辐射敏感性树脂组合物包括：通过用光化射线或辐射照射产生酸的化合物（A），其中所述酸通过共价键与由以下通式（M）表示的基团连接。在该式中，Y1和Y2各自独立地表示氢原子，烷基，环烷基，烯基，炔基，芳基或酰基。 Z表示氢原子或取代基。 *表示与化合物（A）的残基的连接位点，

3. 发明申请

WO2014017268A1 RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 审中-公开
标题翻译：树脂组合物和使用其的图案形成方法
公开(公告)号：WO2014017268A1
公开(公告)日：2014-01-30
申请号：PCT/JP2013/068303
申请日：2013-06-26
申请人： FUJIFILM CORPORATION
发明人： TSURUTA, Takuya , TSUCHIMURA, Tomotaka , IWATO, Kaoru
IPC分类号： C08F12/22 , C08F20/30 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： C08F12/24 , C08F8/02 , C08F12/32 , C08F212/14 , G03F7/004 , G03F7/0045 , G03F7/0382 , G03F7/0388 , G03F7/0392 , G03F7/20 , C08F212/32 , C08F212/08 , C08F220/32 , C08F220/36
摘要： A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): wherein R 1 represents a hydrogen atom, a methyl group, or a halogen atom; R 2 and R 3 represent a hydrogen atom, an alkyl group, or a cycloalkyl group; L represents a divalent linking group or a single bond; Y represents a substituent excluding a methylol group; Z represents a hydrogen atom or a substituent; m represents an integer of 0 to 4; n represents an integer of 1 to 5; and m+n is 5 or less.
摘要翻译：本发明的树脂组合物包含含有下述通式（1）表示的重复单元（Q）的高分子化合物（A）：其中，R1表示氢原子，甲基或卤素原子; R2和R3表示氢原子，烷基或环烷基; L表示二价连接基团或单键; Y表示除羟甲基之外的取代基; Z表示氢原子或取代基; m表示0〜4的整数， n表示1〜5的整数， m + n为5以下。

4. 发明授权

EP3125277B1 SEMICONDUCTOR ELEMENT COMPRISING INSULATING LAYER-FORMING COMPOSITION 有权转让
公开(公告)号：EP3125277B1
公开(公告)日：2020-06-03
申请号：EP15769500.8
申请日：2015-03-23
申请人： FUJIFILM Corporation
发明人： NAGATA, Yuzo , TAKIZAWA, Hiroo , TSUCHIMURA, Tomotaka , TSURUTA, Takuya
IPC分类号： C08F212/14 , C08F12/24 , H01L21/02 , H01L51/00 , H01L51/05

5. 发明公开

EP3299423A1 COLORING COMPOSITION, FILM, COLOR FILTER, METHOD FOR FORMING PATTERN, METHOD FOR PRODUCING COLOR FILTER, SOLID-STATE IMAGING DEVICE, AND INFRARED SENSOR 有权转让
标题翻译：着色组合物，薄膜，滤色片，图案形成方法，制造滤色片的方法，固态成像装置和红外传感器
公开(公告)号：EP3299423A1
公开(公告)日：2018-03-28
申请号：EP16799868.1
申请日：2016-05-17
申请人： FUJIFILM Corporation
发明人： MORI, Masahiro , OOTA, Kazuya , SHIMADA, Kazuto , ARAYAMA, Kyohei , TSURUTA, Takuya , TAKISHITA, Hirotaka
IPC分类号： C09B67/20 , C09B3/14 , C09B23/00 , C09B47/04 , C09B57/00 , C09B67/22 , G02B5/20 , G02B5/22 , G03F7/004 , H01L27/14
CPC分类号： C09B57/007 , C09B3/14 , C09B23/00 , C09B23/164 , C09B47/04 , C09B57/00 , G02B5/20 , G02B5/208 , G02B5/22 , G03F7/0007 , G03F7/004 , G03F7/031 , G03F7/16 , G03F7/2002 , G03F7/26 , H01L27/14
摘要： Provided is a coloring composition with which a film capable of allowing transmission of infrared light in a state where noise generated from visible light is small can be formed. In addition, also provided are a film, a color filter, a pattern forming method, a method for manufacturing a color filter, a solid image pickup element, and an infrared sensor in which the coloring composition is used. The coloring composition includes a coloring material that shields light in a visible range; and an infrared absorber. It is preferable that the coloring material that shields light in the visible range includes two or more chromatic colorants and that a combination of the two or more chromatic colorants forms black. Alternatively, it is preferable that the coloring material that shields light in the visible range includes an organic black colorant. It is preferable that the organic black colorant is at least one selected from the group consisting of a perylene compound and a bisbenzofuranone compound.
摘要翻译：提供一种着色组合物，可以形成能够使可见光产生的噪音小的状态下的红外光透射的膜。另外，还提供了使用着色组合物的膜，滤色器，图案形成方法，制造滤色器的方法，固体图像拾取元件和红外传感器。着色组合物包括遮蔽可见光范围内的光的着色材料; 和红外吸收剂。优选遮蔽可见光范围内的光的着色材料包括两种或更多种彩色着色剂，并且两种或更多种彩色着色剂的组合形成黑色。或者，优选遮蔽可见光范围内的光的着色材料包括有机黑色着色剂。有机黑色着色剂优选为选自苝化合物和双苯并呋喃酮化合物中的至少一种。

6. 发明公开

EP3125277A1 SEMICONDUCTOR ELEMENT AND INSULATING-LAYER-FORMING COMPOSITION 有权转让
标题翻译：哈萨克斯坦民主共和国的独立组织
公开(公告)号：EP3125277A1
公开(公告)日：2017-02-01
申请号：EP15769500.8
申请日：2015-03-23
申请人： FUJIFILM Corporation
发明人： NAGATA, Yuzo , TAKIZAWA, Hiroo , TSUCHIMURA, Tomotaka , TSURUTA, Takuya
IPC分类号： H01L21/312 , C08F212/00 , C08F220/10 , H01L21/283 , H01L29/786 , H01L51/05 , H01L51/30
摘要： Provided is a semiconductor element having a semiconductor layer and an insulating layer adjacent to the semiconductor layer, in which the insulating layer is formed of a crosslinked product of a polymer compound having a repeating unit (IA) represented by the following General Formula (IA) and a repeating unit (IB) represented by the following General Formula (IB).

In General Formula (IA), R 1a represents a hydrogen atom, a halogen atom, or an alkyl group. L 1a and L 2a each independently represent a single bond or a linking group. X represents a crosslinkable group. m2a represents an integer of 1 to 5, and in a case where m2a is 2 or more, m2a number of X's may be the same or different from each other. m1a represents an integer of 1 to 5, and in a case where m1a is 2 or more, m1a number of (-L 2a -(X) m2a )'s may be the same or different from each other. In General Formula (IB),' R 1b represents a hydrogen atom, a halogen atom, or an alkyl group. L 1b represents a single bond or a linking group, and Ar 1b represents an aromatic ring. m1b represents an integer of 1 to 5.
摘要翻译：提供一种半导体元件，其具有与半导体层相邻的半导体层和绝缘层，其中绝缘层由具有由以下通式（IA）表示的重复单元（IA）的高分子化合物的交联产物形成，和由以下通式（IB）表示的重复单元（IB）。在通式（IA）中，R 1a表示氢原子，卤素原子或烷基。 L 1a和L 2a各自独立地表示单键或连接基团。 X表示可交联基团。 m2a表示1〜5的整数，并且在m2a为2以上的情况下，m 2的数X可以相同也可以不同。 m1a表示1〜5的整数，并且在m1a为2以上的情况下，（a1a-2a（x）m2a）的m1a数可以相同也可以不同。通式（IB）中，R 1b表示氢原子，卤素原子或烷基。 L 1b表示单键或连接基团，Ar 1b表示芳香环。 m1b表示1〜5的整数。

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