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1. 发明授权

US3907574A Photopolymerizable composition 失效
标题翻译：可光聚合组合物
公开(公告)号：US3907574A
公开(公告)日：1975-09-23
申请号：US44060974
申请日：1974-02-07
申请人： FUJI PHOTO FILM CO LTD
发明人： YONEZAWA TERUHIKO , KITA NOBUYUKI
IPC分类号： C08L1/00 , C08F2/00 , C08F2/48 , C08F2/50 , C08F20/00 , C08F20/20 , C08F20/34 , C08F246/00 , C08F290/00 , C08F299/00 , C08L29/00 , C08L29/04 , C08L33/00 , C08L33/02 , C09D11/00 , C09D11/10 , G03F7/027 , G03F7/035 , G03C1/70
CPC分类号： G03F7/027 , C08F20/20 , Y10S430/112 , Y10S430/118
摘要： A photopolymerizable composition which comprises (a) 80 to 50% by weight of a divinylurethane compound represented by the following general formula,

in which R1, R2 and R3 each represents a hydrogen atom or a methyl group, n represents 1, 2 or 3, A represents a divalent residue of a cyclic carboxylic acid anhydride having 4 to 10 carbon atoms, B represents -R4- or -R4NHCOOR5OOCNHR4-, in which R4 represents an alkylene group with 4 to 13 carbon atoms, cycloalkylene group or arylene group and R5 represents an alkylene chain with 2 to 8 carbon atoms or an oxyalkylene chain with 2 to 4 carbon atoms, (b) 20 to 50% by weight of an organic high molecular weight polymer miscibile with the divinylurethane compound and having carboxyl groups on the side chains and an acid number of 30 or more and (c) 0.01 to 10% by weight of a light sensitizer capable of initiating the photopolymerization of an ethylenically unsaturated compound upon exposure to active radiation.
摘要翻译：一种可光聚合组合物，其包含（a）80至50重量％的由以下通式表示的二乙烯基氨基甲酸酯化合物：R1OR2OOR3O | PARALLEL | PARALLEL PARALLEL | PARALLEL CH2 = C-COCH2CHO-（CA-COCH2CHO）n-CNH 2-B 其中R 1，R 2和R 3各自表示氢原子或甲基，n表示1,2或3，A表示具有4至10个碳原子的环状羧酸酐的二价残基，B表示-R4-或 - R4NHCOOR5OOCNHR4-，其中R4表示具有4至13个碳原子的亚烷基，环亚烷基或亚芳基，R 5表示具有2至8个碳原子的亚烷基链或具有2至4个碳原子的氧化烯链，（b）20至 50重量％的有机高分子量聚合物与二乙烯基氨基甲酸酯化合物不相容并且在侧链上具有羧基，酸值为30以上，（c）0.01〜10重量％的能够引发乙烯的光聚合暴露于活性辐射下的不饱和化合物。

2. 发明专利

AT321660T 未知
公开(公告)号：AT321660T
公开(公告)日：2006-04-15
申请号：AT02001118
申请日：2002-01-24
申请人： FUJI PHOTO FILM CO LTD
发明人： KITA NOBUYUKI , TAKII KAZUYOSHI
IPC分类号： G03F7/004 , B41C1/055 , B41C1/10 , B41N1/14 , G03F7/00 , G03F7/11 , G03F7/36
摘要： A process for producing a lithographic printing plate by on-press developing a heat-sensitive lithographic printing plate precursor having on a metallic base in this order (1) an ink-receptive layer , (2) a hydrophilic layer containing colloidal particles of an oxide or hydroxide of at least one element, e.g., silicon or aluminum, and (3) a hydrophilic overcoat layer capable of being removed on a printing machine, which includes: rotating a plate cylinder having attached thereto the heat-sensitive lithographic printing plate precursor which has been exposed; subsequently supplying an ink and a dampening water to the plate surface by simultaneously bringing a dampening roll and an inking roll into contact with the plate surface or by bringing a water-metering roll into contact with an inking roll and then bringing the inking roll, which functions also to dampen, into contact with the plate surface; and thereby removing the overcoat layer and the exposed parts of the hydrophilic layer.

3. 发明专利

AT318704T 未知
公开(公告)号：AT318704T
公开(公告)日：2006-03-15
申请号：AT00127280
申请日：2000-12-19
申请人： FUJI PHOTO FILM CO LTD
发明人： KITA NOBUYUKI
IPC分类号： G03F7/11 , B41C1/10 , B41M5/26 , B41N1/14 , G03F7/00
摘要： A heat-sensitive lithographic printing plate precursor having on a support (1) an ink-receptive layer comprising an oleophilic organic high molecular compound and (2) a water-receptive layer easily allowing removal by a fountain solution or a printing ink when heated, which are arranged in this order; with the water-receptive layer being a layer formed using a coating solution comprising a solvent capable of dissolving the organic high molecular compound of the ink-receptive layer in a proportion of 1 to 40 weight % of the total solvents in the coating solution.

4. 发明专利

DE60112637D1 未知
公开(公告)号：DE60112637D1
公开(公告)日：2005-09-22
申请号：DE60112637
申请日：2001-03-19
申请人： FUJI PHOTO FILM CO LTD
发明人： KITA NOBUYUKI
IPC分类号： G03F7/004 , B41C1/10 , B41N1/14 , G03F7/00 , G03F7/11
摘要： A heat-sensitive lithographic printing plate precursor is disclosed, comprising a metal substrate having thereon 1) an ink-receptive layer, 2) a water-receptive layer comprising a colloidal particulate oxide or hydroxide of at least one element selected from the group consisting of beryllium, magnesium, aluminum, silicon, titanium, boron, germanium, tin, zirconium, iron, vanadium, antimony and transition metals, or additionally 3) a water-soluble overcoat layer, at least one layer of the ink-receptive layer, the water-receptive layer and the overcoat layer containing a compound capable of converting light into heat and the ink-receptive layer containing an epoxy resin having a softening point of 120 DEG C or more.

5. 发明专利

AT278550T 未知
公开(公告)号：AT278550T
公开(公告)日：2004-10-15
申请号：AT00115024
申请日：2000-07-24
申请人： FUJI PHOTO FILM CO LTD
发明人： KITA NOBUYUKI , KAWASHIRI , AKIYAMA KEIJI , OOHASHI HIDEKAZU
IPC分类号： B41C1/10
摘要： A heat-sensitive precursor of lithographic printing plates, which comprises a hydrophilic layer provided on a substrate having an ink-receptive surface or coated with an ink-receptive layer; the printing plate precursor further having a water-soluble overcoat layer on the hydrophilic layer, and the hydrophilic layer being a three-dimensionally cross-linked hydrophilic layer, the heated area of that is easily removed by a fountain solution or ink when subjected to printing operations.

6. 发明专利

DE3481652D1 未知
公开(公告)号：DE3481652D1
公开(公告)日：1990-04-19
申请号：DE3481652
申请日：1984-06-20
申请人： FUJI PHOTO FILM CO LTD
发明人： NAKAKITA EIJI , KOIKE AKINOBU , SEKIYA TOSHIYUKI , MISU HIROSHI , KITA NOBUYUKI
IPC分类号： G03F7/004 , G03C1/52 , G03F7/016 , G03F7/021 , G03F7/023
摘要： A presensitized lithographic printing plate precursor is described, comprising an aluminum support that has been rendered hydrophilic having provided thereon a light-sensitive layer composed of a light-sensitive composition comprising (1) an organic solvent-soluble and substantially water-insoluble diazo resin, (2) a substantially water-insoluble, film-forming polymeric compound, and at least one of (3a) an organic solvent-soluble polymeric compound having a sulfonic acid group or a sulfonic acid salt group in its side chain and (3b) a substituted or unsubstituted dipicolinic acid or a salt thereof, the total amount of (3a) and (3b) components being about 1 to about 100% by weight, based on the weight of the diazo resin.

7. 发明专利

DE3822909A1 未知
公开(公告)号：DE3822909A1
公开(公告)日：1989-01-19
申请号：DE3822909
申请日：1988-07-06
申请人： FUJI PHOTO FILM CO LTD
发明人： KITA NOBUYUKI , KOIKE MITSURU
IPC分类号： C08F2/50 , G03C5/16 , G03F7/029 , G03F7/10 , C07D253/02 , C07D405/10 , C07D409/10 , G03C1/70

8. 发明专利

DE2851641A1 未知
公开(公告)号：DE2851641A1
公开(公告)日：1979-05-31
申请号：DE2851641
申请日：1978-11-29
申请人： FUJI PHOTO FILM CO LTD
发明人： SATO SHIGERU , IKEDA SADAHARU , UCHIDA TOSHIO , KITA NOBUYUKI
IPC分类号： C08F2/00 , C08F2/50 , G03F7/029 , C08F22/00
摘要： A photopolymerizable composition comprising a polymerizable ethylenically unsaturated compound, optionally, a linear organic polymer, and a photopolymerization initiator comprising a combination of a compound represented by the general formula (I) (I) wherein Z represents the non-metal atomic group necessary to form a nitrogen containing heterocyclic nucleus, R1 represents an alkyl group or a substituted alkyl group, and R2 represents an alkyl group or an aryl group having a comparatively high photopolymerization initiating ability; and a compound represented by the general formula (II) wherein X represents a halogen atom, Y represents -CX3, -NH2, -NHR1, -NR12 or OR1, R1 represents an alkyl group or an aryl group and R represents an alkyl group, an alkyl group substituted with at least one chlorine atom, an aryl group, a substituted aryl group or a substituted alkenyl group.

9. 发明专利

DE2435389A1 Photoresist compsn. contg. aromatic azide and polymer - with cis-4-cyclo-hexene-1,2-di-carboxylate or carbamido side chains 未知
公开(公告)号：DE2435389A1
公开(公告)日：1975-02-13
申请号：DE2435389
申请日：1974-07-23
申请人： FUJI PHOTO FILM CO LTD
发明人： KITA NOBUYUKI , YONEZAWA TERUHIKO , NARITOMI YASUHISA
IPC分类号： C08F2/00 , C08F2/50 , G03F7/012 , G03C1/70 , H05K3/06
摘要： Light-sensitive compsn. comprises 1-30, pref. 2-15 (wt.) % aromatic azide (I) and 99-70% high-mol. polymer (II) with cis-4-cyclohexene-1,2-dicarboxylate or cis-4-cyclohexene-1,2-dicarbamido gps. as side chains, (II) being soluble in an organic solvent. Compsn. is used for the prodn. of photo-resists and lithographic printing plates. The compsn. has high speed, excellent long-term stability and excellent development characteristics.

10. 发明专利

DE2405714A1 未知
公开(公告)号：DE2405714A1
公开(公告)日：1974-08-08
申请号：DE2405714
申请日：1974-02-06
申请人： FUJI PHOTO FILM CO LTD
发明人： KITA NOBUYUKI , YONEZAWA TERUHIKO
IPC分类号： C08L1/00 , C08F2/00 , C08F2/48 , C08F2/50 , C08F20/00 , C08F20/20 , C08F20/34 , C08F246/00 , C08F290/00 , C08F299/00 , C08L29/00 , C08L29/04 , C08L33/00 , C08L33/02 , C09D11/00 , C09D11/10 , G03F7/027 , G03F7/035 , G03C1/68
摘要： A photopolymerizable composition which comprises (a) 80 to 50% by weight of a divinylurethane compound represented by the following general formula, R1OR2OOR3O ¦ PARALLEL ¦ PARALLEL PARALLEL ¦ PARALLEL CH2=C-COCH2CHO-(C-A-COCH2CHO)n-CNH 2-B in which R1, R2 and R3 each represents a hydrogen atom or a methyl group, n represents 1, 2 or 3, A represents a divalent residue of a cyclic carboxylic acid anhydride having 4 to 10 carbon atoms, B represents -R4- or -R4NHCOOR5OOCNHR4-, in which R4 represents an alkylene group with 4 to 13 carbon atoms, cycloalkylene group or arylene group and R5 represents an alkylene chain with 2 to 8 carbon atoms or an oxyalkylene chain with 2 to 4 carbon atoms, (b) 20 to 50% by weight of an organic high molecular weight polymer miscibile with the divinylurethane compound and having carboxyl groups on the side chains and an acid number of 30 or more and (c) 0.01 to 10% by weight of a light sensitizer capable of initiating the photopolymerization of an ethylenically unsaturated compound upon exposure to active radiation.

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